Patents by Inventor Peter Polcik
Peter Polcik has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11866805Abstract: A superalloy target wherein the superalloy target has a polycrystalline structure of random grain orientation, the average grain size in the structure is smaller than 20 ?m, and the porosity in the structure is smaller than 10%. Furthermore, the invention includes a method of producing a superalloy target by powder metallurgical production, wherein the powder-metallurgical production starts from alloyed powder(s) of a superalloy and includes the step of spark plasma sintering (SPS) of the alloyed powder(s).Type: GrantFiled: April 19, 2018Date of Patent: January 9, 2024Assignees: OERLIKON SURFACE SOLUTIONS AG, PFAFFIKON, PLANSEE COMPOSITE MATERIALS GMBHInventors: Peter Polcik, Jurgen Ramm
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Patent number: 11814702Abstract: A superalloy workpiece includes a superalloy substrate and an interface layer (IF-1) of essentially the same superalloy composition directly on a surface of the superalloy substrate. A transition layer (TL) of essentially the same superalloy and superalloy oxides or a different metal composition and different metal oxides is on the interface layer (IF-1). The oxygen content of the transition layer increases from the interface layer (IF-1) towards a barrier layer (IF-2) of super alloy oxides or of different metal oxides.Type: GrantFiled: April 19, 2018Date of Patent: November 14, 2023Assignee: OERLIKON SURFACE SOLUTIONS AG, PFAFFIKONInventors: Jurgen Ramm, Beno Widrig, Peter Polcik, Malko Gindrat
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Patent number: 11767587Abstract: A target for use in a physical vapor deposition process includes a matrix composed of a composite material selected from the group consisting of aluminum-based material, titanium-based material and chromium-based material and all combinations thereof. The matrix is doped with doping elements and the doping elements are embedded as constituents of ceramic compounds or aluminum alloys in the matrix. The doping elements are selected from the group of the lanthanides: La, Ce, Nb, Sm and Eu. A process for producing such a target and a use of such a target in a physical vapor deposition process are also provided.Type: GrantFiled: February 19, 2018Date of Patent: September 26, 2023Assignee: Plansee Composite Materials GmbHInventors: Peter Polcik, Szilard Kolozsvari, Paul Mayrhofer, Helmut Riedl
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Patent number: 11610760Abstract: A vacuum arc source for arc evaporation of boride includes: a cathode made of at least 90 at-% of boride, in particular made of more than 98 at-% of boride; an anode, which is preferably in the shape of a disk; a body made of a material which is less preferred by arc discharge compared to the cathode, the body surrounding the cathode in such a way that during operation of the vacuum arc source, movement of an arc on an arc surface of the cathode is limited by the body. At least 90 at-% of the material of the anode is of the same chemical composition as the cathode.Type: GrantFiled: March 13, 2019Date of Patent: March 21, 2023Assignee: Plansee Composite Materials GmbHInventors: Peter Polcik, Szilard Kolozsvari, Igor Zhirkov, Johanna Rosen
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Patent number: 11466357Abstract: The present invention relates to coatings comprising or consisting of one or more ternary TM-diboride coating films. The ternary TM-diboride coating films showing exceptionally high phase stability and mechanical properties, even at high temperatures or even after exposition to high temperatures.Type: GrantFiled: October 8, 2018Date of Patent: October 11, 2022Assignee: Oerlikon Surface Solutions AG, PfaffikonInventors: Vincent Moraes, Paul Heinz Mayrhofer, Hamid Bolvardi, Mirjam Arndt, Peter Polcik
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Patent number: 11101116Abstract: A target includes a target plate and a stabilizing layer which is joined to the rear side of the target plate. The stabilizing layer was produced by high-kinetic-energy spraying of stabilizing material onto the target plate. A process for producing a target is also provided.Type: GrantFiled: June 30, 2015Date of Patent: August 24, 2021Assignees: Plansee SE, Plansee Composite Materials GmbHInventors: Rudolf Gradinger, Martin Kathrein, Szilard Kolozsvari, Peter Polcik
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Publication number: 20210257186Abstract: A vacuum arc source for arc evaporation of boride includes: a cathode made of at least 90 at-% of boride, in particular made of more than 98 at-% of boride; an anode, which is preferably in the shape of a disk; a body made of a material which is less preferred by arc discharge compared to the cathode, the body surrounding the cathode in such a way that during operation of the vacuum arc source, movement of an arc on an arc surface of the cathode is limited by the body. At least 90 at-% of the material of the anode is of the same chemical composition as the cathode.Type: ApplicationFiled: March 13, 2019Publication date: August 19, 2021Inventors: Peter Polcik, Szilard Kolozsvari, Igor Zhirkov, Johanna Rosen
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Patent number: 11081325Abstract: The present invention relates to a conductive target material comprising essentially one lithium compound, preferably lithium phosphate, and carbon, and also typical impurities. The invention further relates to a process for producing a conductive target material and to the use thereof.Type: GrantFiled: September 3, 2014Date of Patent: August 3, 2021Assignees: Plansee SE, Plansee Composite Materials GmbHInventors: Peter Polcik, Enrico Franzke, Marcus Wolff
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Patent number: 10920325Abstract: A process for producing a hard material layer on a substrate. A multilayer coating system is applied to the substrate by alternate deposition of CrTaN and AlTiN by way of physical vapor deposition (PVD). The CrTaN and/or the AlTiN are preferably deposited from a composite target.Type: GrantFiled: March 3, 2017Date of Patent: February 16, 2021Assignees: Ceratizit Austria Gesellschaft m.b.H., Plansee Composite Materials GmbHInventors: Christoph Czettl, Markus Pohler, Peter Polcik, Martin Kathrein
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Publication number: 20200332407Abstract: The present invention relates to coatings comprising or consisting of one or more ternary TM-diboride coating films. The ternary TM-diboride coating films showing exceptionally high phase stability and mechanical properties, even at high temperatures or even after exposition to high temperatures.Type: ApplicationFiled: October 8, 2018Publication date: October 22, 2020Inventors: Vincent MORAES, Paul Heinz MAYRHOFER, Hamid BOLVARDI, Mirjam ARNDT, Peter POLCIK
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Patent number: 10787735Abstract: A process for producing a coating source for physical vapour deposition provides the coating source with a target layer formed of an at least two-phase composite which contains a metallic phase and at least one further phase and a mechanical stabilizing layer which is joined to the target layer on one side of the target layer. A first powder mixture which corresponds in terms of its composition to the at least two-phase composite and a second powder mixture which corresponds in terms of its composition to the mechanical stabilizing layer are densified hot in superposed layers. A coating source for physical vapour deposition is also provided.Type: GrantFiled: January 20, 2016Date of Patent: September 29, 2020Assignee: Plansee Composite Materials GmbHInventors: Peter Polcik, Sabine Woerle
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Patent number: 10781102Abstract: A coating source for physical vapor deposition to produce doped carbon layers. The coating source is produced by way of sintering from pulverulent components and is formed of carbon as matrix material in a proportion of at least 75 mol % and at least one dopant in a proportion in the range from 1 mol % to 25 mol %.Type: GrantFiled: March 15, 2016Date of Patent: September 22, 2020Assignee: Plansee Composite Materials GmbHInventors: Peter Polcik, Sabine Woerle, Ulrich Miller
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Publication number: 20200165718Abstract: Superalloy workpiece including a superalloy substrate and an interface layer (IF-1) of essentially the same superalloy composition directly on a surface of the superalloy substrate, followed by a transition layer (TL) of essentially the same superalloy and supperalloy oxides or a different metal composition and different metal oxides whereby oxygen content of the transition layer is increasing from IF-1 towards a barrier layer (IF-2) of super alloy oxides or of different metal oxides.Type: ApplicationFiled: April 19, 2018Publication date: May 28, 2020Inventors: Jurgen Ramm, Beno Widrig, Peter Polcik, Malko Gindrat
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Publication number: 20200048738Abstract: A superalloy target wherein the superalloy target has a polycrystalline structure of random grain orientation, the average grain size in the structure is smaller than 20 ?m, and the porosity in the structure is smaller than 10%. Furthermore, the invention includes a method of producing a superalloy target by powder metallurgical production, wherein the powder-metallurgical production starts from alloyed powder(s) of a superalloy and includes the step of spark plasma sintering (SPS) of the alloyed powder(s).Type: ApplicationFiled: April 19, 2018Publication date: February 13, 2020Inventors: Peter Polcik, Jurgen Ramm
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Publication number: 20190368029Abstract: A target for use in a physical vapor deposition process includes a matrix composed of a composite material selected from the group consisting of aluminum-based material, titanium-based material and chromium-based material and all combinations thereof. The matrix is doped with doping elements and the doping elements are embedded as constituents of ceramic compounds or aluminum alloys in the matrix. The doping elements are selected from the group of the lanthanides: La, Ce, Nb, Sm and Eu. A process for producing such a target and a use of such a target in a physical vapor deposition process are also provided.Type: ApplicationFiled: February 19, 2018Publication date: December 5, 2019Inventors: PETER POLCIK, SZILARD KOLOZSVARI, PAUL MAYRHOFER, HELMUT RIEDL
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Patent number: 10240229Abstract: The present invention concerns substrates coated with an Mo1-x-ySiXBY layer, said layer comprising the T2 phase, and a method for the production thereof.Type: GrantFiled: May 26, 2015Date of Patent: March 26, 2019Assignee: OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKONInventors: Richard Rachbauer, Mirjam Arndt, Paul Heinz Mayrhofer, Peter Polcik, Annika Vieweg, Jiri Kalas, Helmut Riedl
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Publication number: 20190062924Abstract: A process for producing a hard material layer on a substrate. A multilayer coating system is applied to the substrate by alternate deposition of CrTaN and AlTiN by way of physical vapor deposition (PVD). The CrTaN and/or the AlTiN are preferably deposited from a composite target.Type: ApplicationFiled: March 3, 2017Publication date: February 28, 2019Inventors: CHRISTOPH CZETTEL, MARKUS POHLER, PETER POLCIK, MARTIN KATHREIN
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Publication number: 20190003036Abstract: A coating source for physical vapor deposition has a coating material which consists of a brittle material and has cracks. The coating source additionally has a support element which is joined to the coating material at a surface of the coating material. Furthermore, the coating material has structuring on at least parts of a surface of the coating material. There is also described a process for producing a coating source.Type: ApplicationFiled: December 7, 2016Publication date: January 3, 2019Inventors: PETER POLCIK, SABINE WOERLE, RONNIE INNERWINKLER
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Publication number: 20180340254Abstract: A process for producing a coating source for physical vapour deposition provides the coating source with a target layer formed of an at least two-phase composite which contains a metallic phase and at least one further phase and a mechanical stabilizing layer which is joined to the target layer on one side of the target layer. A first powder mixture which corresponds in terms of its composition to the at least two-phase composite and a second powder mixture which corresponds in terms of its composition to the mechanical stabilizing layer are densified hot in superposed layers. A coating source for physical vapour deposition is also provided.Type: ApplicationFiled: January 20, 2016Publication date: November 29, 2018Inventors: PETER POLCIK, SABINE WOERLE
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Patent number: 10109468Abstract: A target, in particular a sputtering target, includes a target plate of a brittle material and a back plate. The back plate is connected to the target plate over an area and the target plate has micro cracks which pass through from the front side to the rear side of the target plate and divide the target plate into adjacent fragments. A process is also provided for producing such a target which is suitable, in particular, for the use of extremely high power densities. A vacuum coating process uses at least one such target as a sputtering target and as a result particularly high power densities can be used on the target during the sputtering.Type: GrantFiled: June 26, 2015Date of Patent: October 23, 2018Assignees: Plansee Composite Materials GmbH, Oerlikon Surface Solutions AG, PfaeffikonInventors: Peter Polcik, Sabine Woerle, Siegfried Krassnitzer, Juerg Hagmann