Abstract: A method for compensating for printing substrate deformation in a multicolor duplex printing operation by way of a computer. The substrate deformation that arises when individual color separations are printed onto the first and second sides of the printing substrate in the printing units is established and compensated for in the course of an automated register correction process. The computer calculates a forecast of the substrate deformation on a basis of the established first side deformation parameters of the printing substrate. When further color separations are printed onto the second side the forecast is used as an input parameter for a compensation of the substrate deformation of the second side.

Abstract: An email payment system and method to provide users with the ability to initiate and send payments to one more recipients via email messaging. A user interface is provided in an email client that allows a user to insert payment with the email. Payment details are collected through one or more payment modals displayed in the email client. A payment object is inserted into the body of the email and is displayed to both the sender and recipient. The payment details captured in the payment object are communicated to a payment processor. The payment processor uses electronic payment accounts associated with the corresponding sender and recipient email addresses to identify the relevant electronic payment accounts and transfer the payment between said accounts. A status of the payment transaction is tracked and displayed within the payment object of the emails residing in both the sender and recipient email client.

Abstract: A distance measure between a beginning and an end of a material strip wound onto a body in a tangential direction can be determined by creating a height profile of a surface of the material strip, which covers the beginning and the end of the wound material strip in the tangential direction. If a position value of the beginning of the material strip is determined in the created height profile, the distance measure can be determined using this position value and the height profile covering the end of the material strip.

Abstract: Measurements are obtained from locations across a substrate before or after performing a lithographic process step. Examples of such measurements include alignment measurements made prior to applying a pattern to the substrate, and measurements of a performance parameter such as overlay, after a pattern has been applied. A set of measurement locations is selected from among all possible measurement locations. At least a subset of the selected measurement locations are selected dynamically, in response to measurements obtained using a preliminary selection of measurement locations. Preliminary measurements of height can be used to select measurement locations for alignment. In another aspect, outlier measurements are detected based on supplementary data such as height measurements or historic data.

Abstract: A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. A functional relationship between local height deviations across a substrate and focus information, such as a determined focus amount, is determined for a substrate, e.g., a reference substrate. Height deviations are subsequently measured for another substrate, e.g. a production substrate. The height deviations for the subsequent substrate and the functional relationship are used to determine predicted focus information for the subsequent substrate. The predicted focus information is then used to control the lithographic apparatus to apply a product pattern to the product substrate.

Abstract: Corrections are calculated for use in controlling a lithographic apparatus. Using a metrology apparatus a performance parameter is measured at sampling locations across one or more substrates to which a lithographic process has previously been applied. A process model is fitted to the measured performance parameter, and an up-sampled estimate is provided for process-induced effects across the substrate. Corrections are calculated for use in controlling the lithographic apparatus, using an actuation model and based at least in part on the fitted process model. For locations where measurement data is available, this is added to the estimate to replace the process model values. Thus, calculation of actuation corrections is based on a modified estimate which is a combination of values estimated by the process model and partly on real measurement data.

Abstract: In a method and apparatus for planning a data acquisition of a region of interest of an object under examination in medical imaging, wherein the region of interest is larger than a region of sensitivity of the medical imaging apparatus, a level of detail corresponding to the user's requirements is enabled by the planning including the division of the region of interest into at least two sub-regions based on at least one predefined parameter, and raw medical data are recorded from each of the at least two sub-regions.

Abstract: Embodiments provide image capturing apparatuses having a screen, a plurality of mirrors and a plurality of cameras. The plurality of mirrors and the plurality of cameras is arranged such that the plurality of cameras capture a portion of the screen via a respective one of the plurality of mirrors, wherein the plurality of cameras is arranged obliquely with respect to the screen.

Abstract: An apparatus for parameterizing a plant includes a recorder for recording a three-dimensional data set of the plant including not only volume elements of non-covered elements of the plant, but also volume elements of elements of the plants that are covered by other elements, and a parameterizer for parameterizing the three-dimensional data set for obtaining plant parameters.

Abstract: A method for using flexible triggered segmentation to optimize magnetic resonance imaging includes partitioning a k-space table into a plurality of k-space segments, each respective k-space segment comprising one or more phase-encoding steps from a plurality of slice-encoding lines. A cardiac cycle is monitored using an electrical signal tracking system and used to trigger acquisition of the plurality of k-space segments over a plurality of acquisition windows.

Abstract: A magnetic resonance system is operated in a preliminary examination so as to acquire magnetic resonance data while an object undergoing investigation is in a first position relative to the scanner of the magnetic resonance system. Using the first magnetic resonance data, or image data derived therefrom, a processor reconstructs an image of the object. The image has a distortion in relation to the object. The processor presents the image to a person operating the system at a display device. The processor reconstructs the image such that the distortion is determined by a target position that is independent of the position of the object.

Abstract: In a method and apparatus for capturing magnetic resonance data from an imaging volume of a patient in which liquid, such as particular blood, is moving, a bSSFP magnetic resonance sequence is executed in which nuclear spins located within the imaging volume are cyclically excited by radiation of a radio-frequency pulse, using a magnetic resonance scanner. A ramp pulse is used as the radio-frequency pulse, which establishes a flip angle of the spins that is spatially variable within the imaging volume.

Abstract: In a magnetic resonance apparatus and an operating method therefor, an MR image data record is provided to a computer, wherein at least one image of the magnetic resonance image data record is distorted. The computer generates a selection symbol for selecting a measurement volume, wherein the selection symbol is distorted so as to have a rectangular cross section after a distortion correction, and superimposing the selection symbol onto an image of the magnetic resonance image data record.

Abstract: A lithographic apparatus applies a pattern onto a substrate using an optical projection system. The apparatus includes an optical level sensor and an associated processor for obtaining a height map of the substrate surface prior to applying the pattern. A controller uses the height map to control focusing with respect to the projection system when applying the pattern. The processor is further arranged to use information relating to processing previously applied to the substrate to define at least first and second regions of the substrate and to vary the manner in which the measurement signals are used to control the focusing, between the first and second regions. For example, an algorithm to calculate height values from optical measurement signals can be varied according to differences in known structure and/or materials. Measurements from certain regions can be selectively excluded from calculation of the height map and/or from use in the focusing.

Abstract: A transfer management system receives a request to transfer an amount of funds from a transferring account maintained by a transferring bank to a receiving account maintained by a receiving bank. The transfer management system determines whether the transferring bank maintains an intermediate transferring account, and whether the receiving bank maintains an intermediate receiving account. If the transferring bank maintains an intermediate transferring account and the receiving maintains an intermediate receiving account, the transfer management system transmits to a transferring bank system of the transferring bank an intra-bank transfer request. The intra-bank transfer request is to transfer the amount of funds from the transferring account to the intermediate transferring account.

Abstract: A system and a method for detecting a replacement component of a device. The method includes detecting a first identifier of a device which includes at least one replaceable component, using a mobile terminal; detecting a second identifier of at least one replacement component, using the mobile terminal; transmitting the detected first and second identifiers to a computing device; generating a control signal based on the first and second identifiers; transmitting the generated control signal to the device; and controlling the device with the aid of the control signal.

Abstract: A first substrate (2002) has a calibration pattern applied to a first plurality of fields (2004) by a lithographic apparatus. Further substrates (2006, 2010) have calibration patterns applied to further pluralities of fields (2008, 2012). The different pluralities of fields have different sizes and/or shapes and/or positions. Calibration measurements are performed on the patterned substrates (2002, 2006, 2010) and used to obtain corrections for use in controlling the apparatus when applying product patterns to subsequent substrates. Measurement data representing the performance of the apparatus on fields of two or more different dimensions (2004, 2008, 2012) is gathered together in a database (2013) and used to synthesize the information needed to calibrate the apparatus for a new size. Calibration data is also obtained for different scan and step directions.

Abstract: A magnetic resonance scan sequence is executed in which nuclear spins are prepared in a preparation region with preparation parameters. The scan sequence provides first image data that image a scan region. The first image data are based on magnetic resonance data acquired with ultrashort echo times. The first image data are combined with reference image data that map the scan region, in order to obtain a resultant image.

Abstract: A lithography system configured to apply a pattern to a substrate, the system including a lithography apparatus configured to expose a layer of the substrate according to the pattern, and a machine learning controller configured to control the lithography system to optimize a property of the pattern, the machine learning controller configured to be trained on the basis of a property measured by a metrology unit configured to measure the property of the exposed pattern in the layer and/or a property associated with exposing the pattern onto the substrate, and to correct lithography system drift by adjusting one or more selected from: the lithography apparatus, a track unit configured to apply the layer on the substrate for lithographic exposure, and/or a control unit configured to control an automatic substrate flow among the track unit, the lithography apparatus, and the metrology unit.