Abstract: A single phase liquid formulation useful for producing an organic charge transporting film; said formulation comprising: (a) a first polymer resin having Mw less than 5,000; (b) a second polymer resin having Mw at least 7,000; (c) a first solvent having a boiling point from 50 to 165° C.; and (d) a second solvent having a boiling point from 180 to 300° C.

Abstract: Disclosed herein is a device comprising a substrate; where the substrate comprises a plurality of brush polymers that are covalently or ionically bonded to the substrate; where at least a portion of the brush polymers comprise a covalently bonded emitter moiety.

Abstract: A method of making a multilayer structure is provided, comprising providing a substrate; providing a coating composition, comprising: a liquid carrier and a MX/graphitic carbon precursor material having a formula (I); disposing the coating composition on the substrate to form a composite; optionally, baking the composite; annealing the composite under a forming gas atmosphere; whereby the composite is converted into an MX layer and a graphitic carbon layer disposed on the substrate providing the multilayer structure; wherein the MX layer is interposed between the substrate and the graphitic carbon layer in the multilayer structure.

Abstract: Disclosed herein is an article comprising a substrate; a first region having a first brush polymer chemically bonded to the substrate; where the first brush polymer comprises repeat units of a first ethylenically unsaturated monomer and a second ethylenically unsaturated monomer; where the first ethylenically unsaturated monomer comprises a first electroactive moiety and where the second ethylenically unsaturated monomer comprises a second electroactive moiety that is different from the first electroactive moiety; where at least one of the first electroactive moiety or the second electroactive moiety is an emitter moiety and where the repeat units of the first ethylenically unsaturated monomer are covalently bonded to repeat units of the second ethylenically unsaturated monomer.

Abstract: A method of making a graphitic carbon sheet is provided, comprising providing a substrate; providing a coating composition, comprising: a liquid carrier and a MX/graphitic carbon precursor material having a formula (I); disposing the coating composition on the substrate to form a composite; optionally, baking the composite; annealing the composite under a forming gas atmosphere; whereby the composite is converted into an MX layer and a graphitic carbon layer disposed on the substrate providing a multilayer structure; wherein the MX layer is interposed between the substrate and the graphitic carbon layer in the multilayer structure; exposing the multilayer structure to an acid; and, recovering the graphitic carbon layer as the freestanding graphitic carbon sheet.

Abstract: Methods and systems for producing nanostructure materials are provided. In one aspect, a process is provided that comprises a) heating one or more nanostructure material reagents by 100° C. or more within 5 seconds or less; and b) reacting the nanostructure material reagents to form a nanostructure material reaction product. In a further aspect, a process is provided comprising a) flowing a fluid composition comprising one or more nanostructure material reagents through a reactor system; and b) reacting the nanostructure material reagents to form a nanostructure material reaction product comprising Cd, In or Zn. In a yet further aspect, methods are provided that include flowing one or more nanostructure material reagents through a first reaction unit; cooling the one or more nanostructure material reagents or reaction product thereof that have flowed through the first reaction unit; and flowing the cooled one or more nanostructure material reagents or reaction product thereof through a second reaction unit.

Abstract: A method of making a multilayer structure is provided, comprising providing a substrate; providing a coating composition, comprising: a liquid carrier, a polycyclic aromatic additive and a MX/graphitic carbon precursor material having a formula (I); disposing the coating composition on the substrate to form a composite; optionally, baking the composite; annealing the composite under a forming gas atmosphere; whereby the composite is converted into an MX layer and a graphitic carbon layer disposed on the substrate providing the multilayer structure; wherein the MX layer is interposed between the substrate and the graphitic carbon layer in the multilayer structure.

Abstract: Disclosed herein is a graft block copolymer comprising a first block polymer; the first block polymer comprising a backbone polymer and a first graft polymer; where the first graft polymer comprises a surface energy reducing moiety that comprises a halocarbon moiety, a silicon containing moiety, or a combination of a halocarbon moiety and a silicon containing moiety; a second block polymer; the second block polymer being covalently bonded to the first block; wherein the second block comprises the backbone polymer and a second graft polymer; where the second graft polymer comprises a functional group that is operative to undergo acid-catalyzed deprotection causing a change of solubility of the graft block copolymer in a developer solvent.

Abstract: A method of forming a pattern comprises diffusing an acid formed by irradiating a portion of a photosensitive layer, into an underlayer comprising an acid sensitive copolymer having acid decomposable groups and attachment groups covalently bonded to the surface of the substrate and/or forming an interpolymer crosslink. Diffusing comprises heating the underlayer and photosensitive layer. The acid sensitive group reacts with the diffused acid to form a polar region on the underlayer, with the shape of the pattern. The photosensitive layer is removed, forming a self-assembling layer comprising a block copolymer having a first block with an affinity for the polar region, and a second block having less affinity for the polar region. The first block forms a domain aligned to the polar region, and the second block forms another domain aligned to the first. Removing either domain exposes a portion of the underlayer.

Abstract: A copolymer is prepared by the polymerization of monomers that include an ultraviolet absorbing monomer, and a base-solubility-enhancing monomer. The copolymer is useful for forming a topcoat layer for electron beam and extreme ultraviolet lithographies. Also described are a layered article including the topcoat layer, and an associated method of forming an electronic device.

Abstract: The present invention relates to a polymeric charge transfer layer comprising a polymer and a p-dopant. The polymer comprises as polymerized units, Monomer A, Monomer B, and Monomer C crosslinking agent. The present invention further relates to an organic electronic device, especially an organic light emitting device containing the polymeric charge transfer layer.

Abstract: A photoimageable composition for preparing a polymeric binder having of one or more of monomer unit copolymers, a photoactive compound, and one or more organometallic compounds is provided. The copolymers include one or more hydroxyl or carboxyl functional groups that react with the organometallic compound to form a crosslinked network upon curing. The photoimageable compositions may be particularly useful in forming a pixel-defining layer of an electronic device. such as an organic light emitting diode. In particular, photoimageable compositions in accordance with embodiments of the present invention are insoluble in the developer prior to exposure to radiation, soluble in the developer following radiation exposure, and have relatively high glass transition temperatures (Tg) making them useful in forming a pixel-defining layer.

Abstract: Block copolymers comprise a first block comprising an alternating copolymer, and a second block comprising a unit comprising a hydrogen acceptor. The block copolymers find particular use in pattern shrink compositions and methods in semiconductor device manufacture for the provision of high resolution patterns.

Abstract: Disclosed herein is a gas sensor comprising a piezoelectric substrate; and a first polymeric layer disposed on the substrate; where the first polymeric layer has a first surface contacting a substrate and a second surface having a higher surface area than the first surface, where the first polymeric layer comprises a repeat unit that is effective to adsorb molecules present in the atmosphere.

Abstract: Disclosed herein is a composition comprising a block copolymer; where the block copolymer comprises a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other and the block copolymer forms a phase separated structure; and an additive polymer; where the additive polymer comprises a reactive moiety that is reacted to a substrate upon which it is disposed; and where the additive polymer comprises a homopolymer that is the chemically and structurally the same as one of the polymers in the block copolymer or where the additive polymer comprises a random copolymer that has a preferential interaction with one of the blocks of the block copolymers.

Abstract: Aspects of the invention provide a composition having a blend of an electron transport material and an organo alkali-metal salt wherein the salt has a glass transition greater than 115° C. The organo-alkali metal salt may be selected from the group consisting of lithium 2-(2-pyridyl)phenolate (LiPP), lithium 2-(2?,2?-bipyridine-6?-yl)phenolate (LiBPP), 2-(isoquinoline-10-yl)phenolate (LiIQP), and lithium 2-(2-phenylquinazolin-4-yl)phenolate and lithium 2-(4-phenylquinazolin-2-yl)phenolate. In a preferred embodiment, the organo-alkali metal salt is lithium 2-(2?,2?-bipyridine-6?-yl)phenolate (LiBPP). Aspects of the invention also provide films and devices having a film layer prepared from the composition.

Abstract: A copolymer is prepared by the polymerization of monomers that include an ultraviolet absorbing monomer, and a base-solubility-enhancing monomer. The copolymer is useful for forming a topcoat layer for electron beam and extreme ultraviolet lithographies. Also described are a layered article including the topcoat layer, and an associated method of forming an electronic device.

Abstract: In one aspect, the present invention relates to coating compositions that comprise a resin component, wherein the predominant portion of the resin component comprising one or more resins that are at least substantially free of fluorine. Coating compositions of the invention are useful as photoresist overcoat layers, including in immersion lithography processing.

Abstract: Disclosed herein is a gas sensor comprising a substrate; a first polymeric layer having a first surface and a second surface disposed on the substrate; where the first surface contacts the substrate and where the second surface is opposed to the first surface and has a higher surface area than the first surface; where the first polymeric layer comprises repeat units that have a deprotected hydrogen donor; and a second polymeric layer disposed on the first polymeric layer; where the second polymeric layer is derived from a repeat unit that comprises a hydrogen acceptor.

Abstract: In one aspect, structures are provided that comprise (a) a one-dimensional periodic plurality of layers, wherein at least two of the layers have a refractive index differential sufficient to provide effective contrast; and (b) one or more light-emitting nanostructure materials effectively positioned with respect to the refractive index differential interface, wherein the structure provides a polarized output emission.