Patents by Inventor Peter Trefonas

Peter Trefonas has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170170400
    Abstract: A light emitting device comprising a polymeric charge transfer layer, wherein the polymeric charge transfer layer is formed from a composition comprising a polymer, said polymer comprising one or more polymerized units derived from Structure A, and one or more polymerized units derived from Structure (B), each as follows: A) a monomer having the Structure (A), as defined herein: and B) a monomer that comprises one or more dienophile moieties.
    Type: Application
    Filed: August 20, 2015
    Publication date: June 15, 2017
    Inventors: Liam P. Spencer, Liang Hong, Chun Liu, Minrong Zhu, Jichang Feng, Jing Jing Yan, Zhengming Tang, Shaoguang Feng, Peter Trefonas, III, David D. Devore, Nolan T. McDougal
  • Publication number: 20170170398
    Abstract: The invention provides compositions comprising BCB-functionalized materials for use in OLEDs applications. The inventive compositions can be used to form hole-transporting materials for use in electroluminescent devices. In particular, the invention provides for compositions, charge transport film layers, and light emitting devices, comprising, or formed from, a polymer, which comprises one or more polymerized units derived from Structure (A).
    Type: Application
    Filed: August 19, 2015
    Publication date: June 15, 2017
    Inventors: Liam P. Spencer, Nolan T. McDougal, Peter Trefonas, III, David D. Devore
  • Patent number: 9663682
    Abstract: Disclosed herein is an article comprising a substrate; upon which is disposed a composition comprising: a first block copolymer that comprises a first block and a second block; where the first block has a higher surface energy than the second block; a second block copolymer that comprises a first block and a second block; where the first block of the first block copolymer is chemically the same as or similar to the first block of the second block copolymer and the second block of the first block copolymer is chemically the same as or similar to the second block of the second block copolymer; where the first and the second block copolymer have a chi parameter greater than 0.04 at a temperature of 200° C.
    Type: Grant
    Filed: June 22, 2015
    Date of Patent: May 30, 2017
    Assignees: DOW GLOBAL TECHNOLOGIES LLC, ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Jieqian Zhang, Phillip D. Hustad, Peter Trefonas, III, Mingqi Li, Valeriy V. Ginzburg, Jeffrey D. Weinhold
  • Publication number: 20170123316
    Abstract: Block copolymers comprise a first block comprising an alternating copolymer, and a second block comprising a unit comprising a hydrogen acceptor. The block copolymers find particular use in pattern shrink compositions and methods in semiconductor device manufacture for the provision of high resolution patterns.
    Type: Application
    Filed: October 19, 2016
    Publication date: May 4, 2017
    Inventors: Huaxing Zhou, Vipul Jain, Jin Wuk Sung, Peter Trefonas, III, Phillip D. Hustad, Mingqi Li
  • Publication number: 20170084847
    Abstract: Aspects of the invention provide a composition having a blend of an electron transport material and an organo alkali-metal salt wherein the salt has a glass transition greater than 115° C. The organo-alkali metal salt may be selected from the group consisting of lithium 2-(2-pyridyl)phenolate (LiPP), lithium 2-(2?,2?-bipyridine-6?-yl)phenolate (LiBPP), 2-(isoquinoline-10-yl)phenolate (LiIQP), and lithium 2-(2-phenylquinazolin-4-yl)phenolate and lithium 2-(4-phenylquinazolin-2-yl)phenolate. In a preferred embodiment, the organo-alkali metal salt is lithium 2-(2?,2?-bipyridine-6?-yl)phenolate (LiBPP). Aspects of the invention also provide films and devices having a film layer prepared from the composition.
    Type: Application
    Filed: March 29, 2016
    Publication date: March 23, 2017
    Inventors: Timothy S. De Vries, Kenneth L. Kearns, JR., Travis E. McIntire, Sukrit Mukhopadhyay, Peter Trefonas, III, William H. H. Woodward
  • Publication number: 20170073453
    Abstract: Polymeric reaction products of certain aromatic alcohols with certain aromatic aldehydes are useful as underlayers in semiconductor manufacturing processes.
    Type: Application
    Filed: November 29, 2016
    Publication date: March 16, 2017
    Inventors: Li CUI, Sung Wook CHO, Mingqi LI, Shintaro YAMADA, Peter TREFONAS, III, Robert L. AUGER
  • Publication number: 20170054100
    Abstract: The present invention is directed to a process for preparing a hole transport layer in which a hole transport composition comprising a blend of a hole transport material and transition metal oxide or metal sulfide nanoparticles is deposited as a solution onto a substrate, such as an anode, and then is annealed in a subsequent step. It has been discovered that annealing the hole transport layer comprising the blend of an hole transport material and transition metal nanoparticles improves hole mobility of the hole transport layer in comparison to an identical hole transport layer that has not been subjected to an annealing step.
    Type: Application
    Filed: March 29, 2016
    Publication date: February 23, 2017
    Inventors: Timothy S. De Vries, Ashley S. Inman, Kenneth L. Kearns, JR., Chun Liu, Travis E. McIntire, Peter Trefonas, III, William H. H. Woodward
  • Patent number: 9576799
    Abstract: Disclosed herein is a method for doping a substrate, comprising disposing a coating of a composition comprising a copolymer, a dopant precursor and a solvent on a substrate; where the copolymer is capable of phase segregating and embedding the dopant precursor while in solution; and annealing the substrate at a temperature of 750 to 1300° C. for 0.1 second to 24 hours to diffuse the dopant into the substrate. Disclosed herein too is a semiconductor substrate comprising embedded dopant domains of diameter 3 to 30 nanometers; where the domains comprise Group 13 or Group 15 atoms, wherein the embedded spherical domains are located within 30 nanometers of the substrate surface.
    Type: Grant
    Filed: April 29, 2015
    Date of Patent: February 21, 2017
    Assignees: DOW GLOBAL TECHNOLOGIES, LLC, ROHM AND HAAS ELECTRONIC MATERIALS LLC, THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
    Inventors: Rachel A. Segalman, Peter Trefonas, III, Bhooshan C. Popere, Andrew T. Heitsch
  • Publication number: 20170045643
    Abstract: In one aspect, structures are provided that comprise (a) a one-dimensional periodic plurality of layers, wherein at least two of the layers have a refractive index differential sufficient to provide effective contrast; and (b) one or more light-emitting nanostructure materials effectively positioned with respect to the refractive index differential interface, wherein the structure provides a polarized output emission.
    Type: Application
    Filed: March 10, 2016
    Publication date: February 16, 2017
    Inventors: Brian Cunningham, Gloria G. See, Peter Trefonas, III, Jieqian Zhang, Jong Keun Park, Kevin Howard, Kishori Deshpande, Trevor Ewers
  • Publication number: 20170038686
    Abstract: An anthraquinone compound which is suitable for forming a color filter used for a liquid crystal display device, a composition containing a resin and the anthraquinone compound, an article having a polymer layer formed from the composition and a color filter containing the compound are developed.
    Type: Application
    Filed: April 18, 2014
    Publication date: February 9, 2017
    Inventors: Guihong Liao, Yang Li, Peter Trefonas, III, Geun Huh, Hua Ren, Chao He, Yu Cai, Yanping Sun
  • Publication number: 20170037178
    Abstract: A block copolymer useful in electron beam and extreme ultraviolet photolithography includes a first block with units derived from a base-solubility-enhancing monomer and an out-of-band absorbing monomer, and a second block having a low surface energy. Repeat units derived from the out-of-ban absorbing monomer allow the copolymer to absorb significantly in the wavelength range 150 to 400 nanometers. When incorporated into a photoresist composition with a photoresist random polymer, the block copolymer self-segregates to form a top layer that effectively screens out-of-band radiation.
    Type: Application
    Filed: August 7, 2015
    Publication date: February 9, 2017
    Inventors: James W. Thackeray, Ke Du, Peter Trefonas, III, Idriss Blakey, Andrew Keith Whittaker
  • Publication number: 20170037171
    Abstract: A copolymer is prepared by the polymerization of monomers that include an ultraviolet absorbing monomer, and a base-solubility-enhancing monomer. The copolymer is useful for forming a topcoat layer for electron beam and extreme ultraviolet lithographies. Also described are a layered article including the topcoat layer, and an associated method of forming an electronic device.
    Type: Application
    Filed: August 7, 2015
    Publication date: February 9, 2017
    Inventors: James W. Thackeray, Ke Du, Peter Trefonas, III, Idriss Blakey, Andrew Keith Whittaker
  • Patent number: 9562169
    Abstract: The invention provides a composition comprising at least the following A and B: A) a polymer comprising, in polymerized from, at least one “monomer that comprises at least one hydroxyl group;” and B) an organometal compound comprising at least one metal selected from Ti, Zr, Hf, Co, Mn, Zn, or combinations thereof, and wherein the organometal compound is present in an amount greater than 5 weight percent, based on the sum weight of A and B.
    Type: Grant
    Filed: June 25, 2015
    Date of Patent: February 7, 2017
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Deyan Wang, Jibin Sun, Peter Trefonas, Kathleen M. O'Connell
  • Publication number: 20170031244
    Abstract: A composite, which is a blend comprising: a nanoparticle comprising a core and a coating surrounding the core; and a polymer, wherein the coating of the nanoparticle comprises a ligand, wherein the ligand is a substituted or unsubstituted C1-C16 carboxylic acid or a salt thereof, a substituted or unsubstituted C1-C16 amino acid or a salt thereof, a substituted or unsubstituted C1-C16 dialkyl phosphonate, or a combination thereof; and wherein the polymer is a polymerization product of a photoacid generator comprising a polymerizable group; at least one unsaturated monomer, which is different from the photoacid generator comprising a polymerizable group; and a chain transfer agent of formula (I); wherein: Z is a y valent C1-20 organic group, x is 0 or 1, and Rd is a substituted or unsubstituted C1-20 alkyl, C3-20 cycloalkyl, C6-20 aryl, or C7-20 aralkyl.
    Type: Application
    Filed: July 29, 2015
    Publication date: February 2, 2017
    Inventors: James W. Thackeray, Meiliana Siauw, Peter Trefonas, III, Idriss Blakey, Andrew Keith Whittaker
  • Patent number: 9540476
    Abstract: Polymeric reaction products of certain aromatic alcohols with certain aromatic aldehydes are useful as underlayers in semiconductor manufacturing processes.
    Type: Grant
    Filed: December 12, 2014
    Date of Patent: January 10, 2017
    Assignees: Rohm and Haas Electronic Materials LLC, Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Li Cui, Sung Wook Cho, Mingqi Li, Shintaro Yamada, Peter Trefonas, III, Robert L. Auger
  • Publication number: 20160365478
    Abstract: In one aspect, methods are provided for fabrication of multiple layers of a nanostructure material composite, and devices produced by such methods. In another aspect, methods are provided that include use of an overcoating fluoro-containing layer that can facilitate transfer of a nanostructure material layer, and devices produced by such methods.
    Type: Application
    Filed: December 19, 2014
    Publication date: December 15, 2016
    Inventors: Moonsub Shim, Nuri Oh, You Zhai, Sooji Nam, John A. Rogers, Bong Hoon Kim, Sang Y. Yang, Peter Trefonas, III, Kishori Deshpande, Jaebum Joo, Jieqian J. Zhang, Jong Keun Park
  • Patent number: 9508549
    Abstract: Methods of forming an electronic device comprise: (a) providing a semiconductor substrate comprising a porous feature on a surface thereof; (b) applying a composition over the porous feature, wherein the composition comprises a polymer and a solvent, wherein the polymer comprises a repeat unit of the following general formula (I): wherein: Ar1, Ar2, Ar3 and Ar4 independently represent an optionally substituted divalent aromatic group; X1 and X2 independently represent a single bond, —O—, —C(O)—, —C(O)O—, —OC(O)—, —C(O)NR1—, —NR2C(O)—, —S—, —S(O)—, —SO2— or an optionally substituted C1-20 divalent hydrocarbon group, wherein R1 and R2 independently represent H or a C1-20 hydrocarbyl group; m is 0 or 1; n is 0 or 1; and o is 0 or 1; and (c) heating the composition; wherein the polymer is disposed in pores of the porous feature. The methods find particular applicability in the manufacture of semiconductor devices for forming low-k and ultra-low-k dielectric materials.
    Type: Grant
    Filed: December 17, 2015
    Date of Patent: November 29, 2016
    Assignees: Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC
    Inventors: Jong Keun Park, Phillip D. Hustad, Emad Aqad, Mingqi Li, Cheng-Bai Xu, Peter Trefonas, III, James W. Thackeray
  • Patent number: 9490117
    Abstract: A method of forming a pattern by directed self-assembly, comprising: (a) providing a semiconductor substrate comprising one or more layers to be patterned; (b) applying a crosslinkable underlayer composition over the one or more layers to be patterned to form a crosslinkable underlayer, wherein the crosslinkable underlayer composition comprises a crosslinkable polymer comprising a first unit formed from a monomer of the following general formula (I-A) or (I-B): wherein: P is a polymerizable functional group; L is a single bond or an m+1-valent linking group; X1 is a monovalent electron donating group; X2 is a divalent electron donating group; Ar1 and Ar2 are trivalent and divalent aryl groups, respectively, and carbon atoms of the cyclobutene ring are bonded to adjacent carbon atoms on the same aromatic ring of Ar1 or Ar2; m and n are each an integer of 1 or more; and each R1 is independently a monovalent group; (c) heating the crosslinkable underlayer to form a crosslinked underlayer; (d) forming a self-
    Type: Grant
    Filed: December 31, 2014
    Date of Patent: November 8, 2016
    Assignees: Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC
    Inventors: Jong Keun Park, Jibin Sun, Christopher D. Gilmore, Jieqian Zhang, Phillip D. Hustad, Peter Trefonas, III, Kathleen M. O'Connell
  • Patent number: 9478713
    Abstract: In one aspect, structures are provided comprising: a substrate having a first surface and a second surface; and a polymeric layer disposed on the first surface of the substrate, the polymeric layer comprising a polymer and a plurality of light-emitting nanocrystals; the polymeric layer having a patterned surface, the patterned surface having a patterned first region having a first plurality of recesses and a patterned second region having a second plurality of recesses, wherein the plurality of recesses in each region has a first periodicity in a first direction, and a second periodicity in a second direction which intersects the first direction, wherein the first periodicity of the first region is different from the first periodicity of the second region.
    Type: Grant
    Filed: May 27, 2015
    Date of Patent: October 25, 2016
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC, The Board of Trustees of the University of Illinois
    Inventors: Brian T. Cunningham, Gloria G. See, Peter Trefonas, Jong Keun Park, Kishori Deshpande, Jieqian Zhang, Jaebum Joo
  • Patent number: 9464224
    Abstract: A transformative wavelength conversion medium is provided, comprising: a phosphor; and, a curable liquid component, wherein the curable liquid component, comprises: an aliphatic resin component, wherein the aliphatic resin component has an average of two epoxide groups per molecule; and, a curing agent; wherein the curable liquid component contains less than 0.5 wt % of monoepoxide molecules (based on the total weight of the aliphatic resin component); and, wherein the curable liquid component is a liquid at 25° C. and atmospheric pressure; and, wherein the phosphor is dispersed in the curable liquid component.
    Type: Grant
    Filed: November 21, 2014
    Date of Patent: October 11, 2016
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Kishori Deshpande, Robert E. Hefner, Jr., Peter Trefonas, Maurice J. Marks, Jong Keun Park, Jieqian Zhang