Abstract: A head module of an imprint lithography system includes a base, a control body coupled to the base, a first set of actuators configured to generate a first force to translate the control body relative to the base along a first axis and to rotate the control body relative to the base about a second axis perpendicular to the first axis and about a third axis perpendicular to the first axis and to the second axis, a second set of actuators configured to generate a second force to translate the control body relative to the base in a plane defined by the second axis and the third axis and to rotate the control body relative to the base about the first axis, and a flexure coupling the base and the control body and restricting translation and rotation of the control body with respect to the base.

Abstract: An imprint lithography system that pressurizes and depressurizes an air cavity behind a retained imprint template or substrate so as to deflect the template or substrate to aid in filling the template pattern with fluid resist and/or separating the template from the cured resist on the substrate. The system includes a controller, pressure sensors, and an impedance valve for modulating the air cavity pressure so as to reduce pressure wave oscillations within the cavity that otherwise negatively impact overlay accuracy control, fluid spread control and separation control.

Abstract: Methods, systems, and apparatus, including computer programs encoded on a computer storage medium, for aligning a template and a substrate, the method including obtaining a moiré image based on an interaction of light between corresponding features of the template and the substrate, the moiré image including a plurality of moiré fringe strips; compressing each moiré fringe strip of the moiré image by an optical lens array based on a pixel height of an acquisition device, the acquisition device including one or more line scan cameras; processing the compressed moiré image by each of the line scan cameras of the acquisition device to determine a misalignment between the template and the substrate; and based on the determined misalignment, adjusting a relative positioning between the template and the substrate.

Abstract: A head module of an imprint lithography system includes a base, a control body coupled to the base, a first set of actuators configured to generate a first force to translate the control body relative to the base along a first axis and to rotate the control body relative to the base about a second axis perpendicular to the first axis and about a third axis perpendicular to the first axis and to the second axis, a second set of actuators configured to generate a second force to translate the control body relative to the base in a plane defined by the second axis and the third axis and to rotate the control body relative to the base about the first axis, and a flexure coupling the base and the control body and restricting translation and rotation of the control body with respect to the base.

Abstract: The present invention provides an imprint apparatus which molds an imprint material on a shot region formed on a substrate by using a mold including a pattern surface on which a pattern is formed, comprising a holding unit configured to change a position and orientation of the mold, and a control unit configured to cause the holding unit to incline the mold, and bring the mold and the imprint material into contact with each other while the mold is inclined, wherein after the control unit obtains a shift amount by which a mark on the mold shifts by inclining the mold, and changes relative positions of the mold and the substrate according to the shift amount, the control unit brings the mold and the imprint material into contact with each other.

Abstract: The present invention provides an imprint apparatus which forms a pattern on a substrate by molding an imprint material on the substrate using a mold, comprising a supply unit configured to supply droplets of the imprint material onto the substrate; and a processing unit configured to acquire arrangement patterns of the droplets on the substrate, wherein based on the arrangement pattern corresponding to a first portion of the mold and the arrangement pattern corresponding to a second portion of the mold, the processing unit acquires the arrangement pattern corresponding to a boundary portion between the first portion and the second portion.

Abstract: Methods, systems, and apparatus, including computer programs encoded on a computer storage medium, for aligning a template and a substrate, the method including obtaining a moiré image based on an interaction of light between corresponding features of the template and the substrate, the moiré image including a plurality of moiré fringe strips; compressing each moiré fringe strip of the moiré image by an optical lens array based on a pixel height of an acquisition device, the acquisition device including one or more line scan cameras; processing the compressed moiré image by each of the line scan cameras of the acquisition device to determine a misalignment between the template and the substrate; and based on the determined misalignment, adjusting a relative positioning between the template and the substrate.

Abstract: An imprint lithography system that pressurizes and depressurizes an air cavity behind a retained imprint template or substrate so as to deflect the template or substrate to aid in filling the template pattern with fluid resist and/or separating the template from the cured resist on the substrate. The system includes a controller, pressure sensors, and an impedance valve for modulating the air cavity pressure so as to reduce pressure wave oscillations within the cavity that otherwise negatively impact overlay accuracy control, fluid spread control and separation control.

Abstract: The present invention provides an imprint apparatus which forms a pattern on a substrate by molding an imprint material on the substrate using a mold, comprising a supply unit configured to supply droplets of the imprint material onto the substrate; and a processing unit configured to acquire arrangement patterns of the droplets on the substrate, wherein based on the arrangement pattern corresponding to a first portion of the mold and the arrangement pattern corresponding to a second portion of the mold, the processing unit acquires the arrangement pattern corresponding to a boundary portion between the first portion and the second portion.

Abstract: The present invention provides an imprint apparatus which molds an imprint material on a shot region formed on a substrate by using a mold including a pattern surface on which a pattern is formed, comprising a holding unit configured to change a position and orientation of the mold, and a control unit configured to cause the holding unit to incline the mold, and bring the mold and the imprint material into contact with each other while the mold is inclined, wherein after the control unit obtains a shift amount by which a mark on the mold shifts by inclining the mold, and changes relative positions of the mold and the substrate according to the shift amount, the control unit brings the mold and the imprint material into contact with each other.

Abstract: Systems for controlling velocity of a contact line and height profile between a template and a substrate during imprinting of polymerizable material are described.

Abstract: Systems for controlling velocity of a contact line and height profile between a template and a substrate during imprinting of polymerizable material are described.

Abstract: Systems and methods for controlling velocity of a contact line and height profile between a template and a substrate during imprinting of polymerizable material are described.

Abstract: The present invention is directed towards a choice of the shape of the patterned fields for Level 0 (patterned by imprint or photolithography or e-beam, etc.) and Level 1 (patterned by imprint) such that these shapes when tessellated together eliminate the open areas causes by the moats.

Abstract: In nano-imprint lithography it is important to detect thickness non-uniformity of a residual layer formed on a substrate. Such non-uniformity is compensated such that a uniform residual layer may be formed. Compensation is performed by calculating a corrected fluid drop pattern.

Abstract: Imprint lithography may comprise generating a fluid map, generating a fluid drop pattern, and applying a fluid to a substrate according to the fluid drop pattern. The fluid drop pattern may be generated using a stochastic process such as a Monte Carlo or structured experiment over the expected range of process variability for drop locations and drop volumes. Thus, variability in drop placement, volume, or both may be compensated for, resulting in surface features being substantially filled with the fluid during imprint.

Abstract: Imprint lithography may comprise generating a fluid map, generating a fluid drop pattern, and applying a fluid to a substrate according to the fluid drop pattern. The fluid drop pattern may be generated using edge weighting through one or more modified Lloyd's method iterations to result in surface features being substantially filled with the fluid during imprint.

Abstract: Systems and methods for alignment of template and substrate at the edge of substrate are described.

Abstract: Imprint lithography benefits from precise alignment between a template and a substrate during imprinting. A moiré signal resulting from indicia on the template and the substrate are acquired by a system comprising a line-scan camera and a digital micromirror device (DMD) which provides a high bandwidth, low-latency signal. Once acquired, the moiré signal may be used directly to align the template and the substrate without need for discrete position/angle encoders.

Abstract: A method of patterning a substrate comprising a plurality of fields, including, inter alia, positioning a first volume of fluid on a first subset of the plurality of fields of the substrate, with the first volume of fluid being subjected to a first evaporation time; positioning a second volume of fluid on a second subset of the plurality of fields of the substrate, differing from the first subset, with the second volume of fluid being subjected to a second evaporation time, differing from the first evaporation time; and patterning the first and second subsets of the plurality of fields, with the first subset of the plurality of fields being patterned prior to the second subset of the plurality of fields being patterned, with a volume associated with the second subset of the plurality of fields being greater than a volume associated with the first subset of the plurality of fields to compensate for the second evaporation time being greater than the first evaporation time.