Abstract: A method and structures are provided for implementing semiconductor signal-capable capacitors with deep trench and Through-Silicon-Via (TSV) technologies. A deep trench N-well structure is formed and an implant is provided in the deep trench N-well structure with a TSV formed in a semiconductor chip. At least one angled implant is created around the TSV in a semiconductor chip. The TSV is surrounded with a dielectric layer and filled with a conducting material which forms one electrode of the capacitor. A connection is made to one implant forming a second electrode to the capacitor.

Abstract: A method and system are provided for implementing enhanced memory performance management with configurable bandwidth versus power usage in a chip stack of memory chips. A chip stack of memory chips is connected in a predefined density to allow a predefined high bandwidth connection between each chip in the stack, such as with through silicon via (TSV) interconnections. Large-bandwidth data transfers are enabled from the memory chip stack by trading off increased power usage for memory performance on a temporary basis.

Abstract: A method, apparatus, and structure are provided for implementing selective rework for chip stacks. A backside metal layer to create resistive heating is added to a chip backside in a chip stack. A rework tool applies a predefined current to the backside metal layer to reflow solder connections and enables separating selected chips in the chip stack.

Abstract: A system comprises a first integrated circuit (IC) chip that includes a first electronic component; a second IC chip that includes a second electronic component; a through silicon via (TSV) in the second IC chip that electrically couples the first electronic component to the second electronic component; and a signal gating transistor that fully occludes the TSV.

Abstract: A method and apparatus are provided for implementing interleaved-dielectric joining of multi-layer laminates. First and second multi-layer laminates are provided, each having with a laminated portion and an unlaminated portion. The first and second multi-layer laminates are joined together at the unlaminated portions by interleaving a plurality of dielectric layers of the first and second multi-layer laminates. Respective conductors carried by adjacent dielectric layers are connected. The interleaved unlaminated portions are laminated together with heat and pressure, to create a larger laminate of the joined first and second multi-layer laminates.

Abstract: A semiconductor chip has a gated through silicon via (TSVG). The TSVG may be switched so that the TSVG can be made conducting or non-conducting. The semiconductor chip may be used between a lower level semiconductor chip and a higher semiconductor chip to control whether a voltage supply on the lower level semiconductor chip is connected to or disconnected from a voltage domain in the upper level semiconductor chip. The TSVG comprises an FET controlled by the lower level chip as a switch.

Abstract: A system comprises a first integrated circuit (IC) chip that includes a first electronic component; a second IC chip that includes a second electronic component; a through silicon via (TSV) in the second IC chip that electrically couples the first electronic component to the second electronic component; and a signal gating transistor that fully occludes the TSV.

Abstract: Method and apparatus and associated method of detecting microchip tampering may include a conductive element in electrical communication with multiple sensors for verifying that signal degradation occurs at an expected region of the conductive element. A detected variance from the expected region may automatically trigger an action for impeding an integrated circuit exploitation process.

Abstract: A design structure for controlling computer-readable memory includes a plurality of memory locations, a usage frequency of a data unit stored in a first memory location is determined. The data unit is moved to a second memory location, different from the first memory location that is selected based on a correspondence between a known latency of the second memory location and the usage frequency of the data unit, in which the second memory location is the primary data storage location for the data unit.

Abstract: A field-effect transistor has a gate, a source, and a drain. The gate has a via extending through a semiconductor chip substrate from one surface to an opposite surface of the semiconductor chip substrate. The source has a first toroid of ion dopants implanted in the semiconductor chip substrate surrounding one end of the via on the one surface of the semiconductor chip substrate. The drain has a second toroid of ion dopants implanted in the semiconductor chip substrate surrounding an opposite end of the via on the opposite surface of the semiconductor chip substrate.

Abstract: A method, program product and apparatus include resistance structures positioned proximate security sensitive microchip circuitry. Alteration in the position, makeup or arrangement of the resistance structures may be detected and initiate an action for defending against a reverse engineering or other exploitation effort. The resistance structures may be automatically and selectively designated for monitoring. Some of the resistance structures may have different resistivities. The sensed resistance may be compared to an expected resistance, ratio or other resistance-related value. The structures may be intermingled with false structures, and may be overlapped or otherwise arranged relative to one another to further complicate unwelcome analysis.

Abstract: A semiconductor chip has a gated through silicon via (TSVG). The TSVG may be switched so that the TSVG can be made conducting or non-conducting. The semiconductor chip may be used between a lower level semiconductor chip and a higher semiconductor chip to control whether a voltage supply on the lower level semiconductor chip is connected to or disconnected from a voltage domain in the upper level semiconductor chip. The TSVG comprises an FET controlled by the lower level chip as a switch.

Abstract: A method and apparatus include conductive material doped within a microchip that accumulates a detectable charge in the presence of ions. Such ions may result from a focused ion beam or other unwelcome technology exploitation effort. Circuitry sensing the charge buildup in the embedded, doped material may initiate a defensive action intended to defeat the tampering operation.

Abstract: A method and apparatus are provided for implementing interleaved-dielectric joining of multi-layer laminates. First and second multi-layer laminates are provided, each having with a laminated portion and an unlaminated portion. The first and second multi-layer laminates are joined together at the unlaminated portions by interleaving a plurality of dielectric layers of the first and second multi-layer laminates. Respective conductors carried by adjacent dielectric layers are connected. The interleaved unlaminated portions are laminated together with heat and pressure, to create a larger laminate of the joined first and second multi-layer laminates.

Abstract: Method and apparatus for optimally placing memory devices within a computer system. A memory controller may include circuitry configured to retrieve or one or more performance metrics a plurality of memory devices connected thereto. Based on the performance metrics and one or more predefined rules for placing memory devices, the circuitry may determine an optimal placement of the memory devices in the system.

Abstract: An apparatus and method detect microchip tampering by including a capacitance circuit that comprises a protective cover. Dielectric material may be sandwiched between the cover and a backside metal layer, which may be proximate a protected surface of the microchip. Changes in the capacitance of the above circuit caused by alteration of the cover or other component of the capacitance circuit may be sensed and prompt defensive action.

Abstract: Apparatus, method and program product may detect an attempt to tamper with a microchip by detecting an unacceptable alteration in a measured capacitance associated with capacitance structures proximate the backside of a microchip. The capacitance structures typically include metallic shapes and may connect using through-silicon vias to active sensing circuitry within the microchip. In response to the sensed change, a shutdown, spoofing, self-destruct or other defensive action may be initiated to protect security sensitive circuitry of the microchip.

Abstract: A method of making an integrated circuit package includes forming a through hole in an integrated circuit and assembling a die containing the integrated circuit on a carrier so that the die is mechanically and electrically connected to the carrier. Thereafter, an underfill material is dispensed between the die and the carrier via the through hole.

Abstract: System and method for designing an electronic package. A placement manager receives a physical design of an electronic package from a packaging design tool. The placement manager receives design constraints regarding the physical design for the electronic package. The placement manager inserts specifications for at least one de-gassing opening in the physical design for the electronic package, wherein the specification for at least one de-gassing opening are created in accordance with said design constraints regarding said physical design of said electronic package. The placement manager outputs an updated physical design of the electronic package.

Abstract: A design structure embodied in a machine readable medium used in a design process includes random access memory device having an array of individual memory cells arranged into rows and columns, each memory cell having an access device associated therewith. Each row of the array further includes a plurality of N word lines associated therewith, with a wherein N corresponds to a number of independently accessible partitions of the array, wherein each access device in a given row is coupled to only one of the N word lines of the row. Logic in signal communication with the array receives a plurality of row address bits and determine, for a requested row identified by the row address bits, which of the N partitions within the requested row are to be accessed, such that access devices within a selected row, but not within a partition to be accessed, are not activated.