Abstract: A method of patterning a substrate includes providing a first relief pattern on a substrate, wherein the first relief pattern includes a first resist, coating the first relief pattern with a solubility-shifting agent, depositing a second resist on the first relief pattern such that the second resist is in contact with the first relief pattern, and diffusing the solubility-shifting agent a predetermined distance into the second resist to provide a solubility-shifted region of the second resist. The solubility-shifted region of the second resist borders the first relief pattern. Then, the method includes developing the second resist such that the solubility-shifted region is dissolved providing gaps between the first relief pattern and the second resist where a portion of the substrate is exposed and etching the substrate using the first relief pattern and the second resist as a combined etch mask.

Abstract: A method of microfabrication includes depositing a first layer of a first resist that includes a first chemical marker on a substrate, measuring a first fluorescence intensity of the first layer from the first fluorescent chemical marker, forming a first relief pattern from the first layer of the first resist, and measuring a second fluorescence intensity of the first layer from the first chemical marker subsequent to forming the first relief pattern. Then, the method includes depositing a solubility-shifting agent on the first relief pattern, depositing a second resist on the first relief pattern, diffusing the solubility-shifting agent into the second resist to provide a solubility-shifted region of the second resist, developing the second resist such that the solubility-shifted region of the second resist is dissolved and a portion of the substrate is exposed, and measuring a third fluorescence intensity of the first layer from the first chemical marker.

Abstract: A method of microfabrication includes providing a first relief pattern on a target layer, wherein the first relief pattern comprises a first resist having a first etch selectivity, coating the first relief pattern with a solubility-shifting agent, depositing a second resist on the first relief pattern, wherein the second resist has a second etch selectivity that is different from the first etch selectivity, diffusing the solubility-shifting agent into the second resist to provide a solubility-shifted region of the second resist, developing the second resist such that the solubility-shifted region is dissolved providing gaps between the first relief pattern and the second resist where a portion of the target layer is exposed, and filling the gaps between the first relief pattern and the second resist with a fill material.

Abstract: A method of patterning a substrate is described. The method includes the steps of providing a resist layer on the substrate, exposing the resist later to a first pattern of actinic radiation to form a latent imagine in the resist layer, and exposing the resist layer to a second pattern of actinic radiation to form a second latent imagine in the resist later, wherein the first latent image and the second latent image are adjacent. The method further includes developing the resist layer to form a relief patten that includes a first set of trenches corresponding to the first pattern of actinic radiation and a second set of trenches corresponding to the second pattern of actinic radiation, wherein the first set of trenches and the second set of trenches are not contiguous.

Abstract: A method of microfabrication includes providing a first relief pattern on a substrate, forming carbon—containing sidewall spacers—in the first relief pattern, removing the first relief pattern, and coating the carbon—containing sidewall spacers with a solubility—shifting agent. Then, the method includes depositing a first polymer fill on the carbon—containing sidewall spacers, diffusing the solubility—shifting agent a predetermined distance into the first polymer fill to provide a solubility—shifted region of the first polymer fill, wherein the solubility—shifted region of the first polymer fill borders the carbon—containing sidewall spacers, and developing the first polymer fill such that the solubility—shifted region is dissolved providing trenches between the carbon—containing sidewall spacers and the first polymer fill where a portion of the substrate is exposed.

Abstract: A method of patterning a substrate includes depositing an underlayer on the substrate, coating the underlayer with a solubility-shifting agent, layering a photoresist on the substrate, such that the photoresist covers the solubility-shifting agent and diffusing the solubility-shifting agent a predetermined distance into the photoresist to provide a solubility-shifted region of the photoresist, wherein the solubility-shifted region forms a footer layer in a bottom portion of the photoresist. Then, the method includes exposing the photoresist to a pattern of actinic radiation, developing the photoresist to form a relief pattern over the footer layer, wherein the relief pattern comprises structures separated by gaps, and etching the substrate to remove portions of the footer layer under the gaps, such that uniform structures are provided.

Abstract: A method of microfabrication includes providing a substrate having an existing pattern, wherein the existing pattern comprises features formed within a base layer such that a top surface of the substrate has features uncovered and the base layer is uncovered, depositing a selective attachment agent on the substrate, wherein the selective attachment agent includes a solubility-shifting agent, depositing a first resist on the substrate, activating the solubility shifting agent such that a portion of the first resist becomes insoluble to a first developer, developing the first resist using the first developer such that a relief pattern comprising openings is formed, wherein the openings expose the features of the existing layer, and executing a selective growth process that grows a selective-deposition material on the features and within the openings of the relief pattern to provide self-aligned selective deposition features.

Abstract: A method of microfabrication includes providing a substrate having an existing pattern, wherein the existing pattern includes features formed within a base layer such that a top surface of the substrate has features uncovered and the base layer is uncovered, depositing a selective attachment agent on the substrate, wherein the selective attachment agent comprises a solubility-shifting agent, depositing a first resist on the substrate, activating the solubility shifting agent such that a portion of the first resist becomes insoluble to a first developer, and developing the first resist using the first developer such that the portion of the first resist insoluble to the first developer remains.

Abstract: A method of patterning a substrate includes providing a first photoresist on a substrate, layering a second photoresist on the first photoresist, exposing the second photoresist to a first pattern of actinic radiation, and developing the second photoresist such that portions of the second photoresist are dissolved providing gaps between features of the second photoresist, wherein the gaps uncover portions of the first photoresist. Then, the method includes exposing the first photoresist to a second pattern of actinic radiation and developing the first photoresist such that portions of the uncovered portions of the first photoresist are dissolved providing gaps between the features of the first photoresist where a portion of the substrate is exposed.

Abstract: Infiltrated three-dimensional articles are provided. An article includes a first polymeric material having an exterior surface and an interior volume; and a second polymeric material that is a thermoplastic polymer or a reaction product of a polymerizable composition disposed in at least a portion of the interior volume of the first polymeric material to a depth from the exterior surface. Methods of making the articles are provided. A method includes curing a photopolymerizable composition containing at least one reactive component and at least one photoinitiator to form an additive manufactured three-dimensional structure of a first polymeric material having an exterior surface and an interior volume. The method further includes contacting at least a portion the three-dimensional structure with a fluid to form an infiltrated structure; and curing or drying the fluid of the infiltrated structure to form an infiltrated three-dimensional article.

Abstract: An article includes a flexible structured film with a first major surface and a second major surface, wherein a first major surface of the flexible structured film has a plurality of posts separated by land areas, and the posts have an exposed surface. An anti-biofouling layer resides in the land areas, and the anti-biofouling layer has a methylated surface. An inorganic layer is on the exposed surfaces of the posts, wherein the inorganic layer includes a metal or a metal oxide. An analyte binding layer is on the inorganic layer, wherein the analyte binding layer is chosen from a reactive silane, a functionalizable hydrogel, a functionalizable polymer, and mixtures and combinations thereof. An exposed surface of the analyte binding layer includes at least one functional group selected to bind with a biochemical analyte.

Abstract: A monomer represented by the formula: (I) wherein: each R1 independently represents an alkyl group having from 1 to 4 carbon atoms; Z represents an alkyl group having 1 to 40 carbon atoms, or a group represented by the formula (II) wherein: each L independently represents a divalent alkylene group having 1 to 12 carbon atoms, each n independently represents 0, 1, or 2; and p represents 0 or 1. A polymerizable composition includes the monomer and can be polymerized to form a polymerized composition. Polymers prepared by polymerization of the monomer are also disclosed.

Abstract: The present disclosure provides a multilayer film. The multilayer film includes at least two layers including a sealant layer and a second layer in contact with the sealant layer. The sealant layer contains (A) a first ethylene-based polymer having a density from 0.900 g/cc to 0.925 g/cc and a melt index from 0.5 g/10 min to 30 g/10 min; and (B) a polyethylene-polydimethylsiloxane block copolymer having a weight average molecular weight from 1,000 g/mol to 10,000 g/mol. The second layer contains a second ethylene-based polymer.

Abstract: A reaction product of components comprising: an alicyclic hydrocarbon containing at least one 5- or 6-membered ring and having at least two carbon-carbon multiple bonds; and a first organosilane represented by the formula. Each R independently represents an aliphatic hydrocarbyl group having from 1 to 8 carbon atoms. Z represents —(CH2)y— or —(OSiR2)y— and y is an integer from 1 to 18. A method of making the reaction product and curable compositions containing the reaction product are also disclosed.

Abstract: The present disclosure provides a multilayer film. The multilayer film includes at least two layers including a sealant layer and a second layer in contact with the sealant layer. The sealant layer contains (A) a first ethylene-based polymer having a density from 0.900 g/cc to 0.925 g/cc and a melt index from 0.5 g/10 min to 30 g/10 min; and (B) a polyethylene-polydimethylsiloxane block copolymer having a weight average molecular weight from 1,000 g/mol to 10,000 g/mol. The second layer contains a second ethylene-based polymer.

Abstract: An article includes a flexible structured film with a first major surface and a second major surface, wherein a first major surface of the flexible structured film has a plurality of posts separated by land areas, and the posts have an exposed surface. An anti-biofouling layer resides in the land areas, and the anti-biofouling layer has a methylated surface. An inorganic layer is on the exposed surfaces of the posts, wherein the inorganic layer includes a metal or a metal oxide. An analyte binding layer is on the inorganic layer, wherein the analyte binding layer is chosen from a reactive silane, a functionalizable hydrogel, a functionalizable polymer, and mixtures and combinations thereof. An exposed surface of the analyte binding layer includes at least one functional group selected to bind with a biochemical analyte.

Abstract: A process to form a composition comprising an ethylene/vinylarene multiblock interpolymer, said process comprising polymerizing, in a single reactor, a mixture comprising ethylene, a vinylarene, and optionally an alpha-olefin, in the presence of at least the following a)-c): a) a first metal complex selected from the following Formula (A), as described herein: b) a second metal complex selected from the following Formula (B), as described herein, and c) a chain shuttling agent selected from the following: a dialkyl zinc, a trialkyl aluminum, or a combination thereof.

Abstract: A curable composition comprises an addition polymerizable cycloolefin comprising a ring containing a single car-bon-carbon double bond; an addition polymerization catalyst; and at least one of hollow glass microspheres, expanded polymeric mi-crospheres, or expandable polymeric microspheres. The curable composition may be 1-part or 2-part. Methods of curing the curable composition are disclosed. Cured compositions, and articles including the same are also disclosed.

Abstract: An interpolymer, which comprises at least one siloxane group, and prepared by polymerizing a mixture comprising one or more “addition polymerizable monomers” and at least one siloxane monomer, in the presence of a catalyst system comprising a Group 3-10 metal complex, and the siloxane monomer is selected from the following Formula 1: Aa-Si(Bb)(Cc)(Hh0)—O—(Si(Dd)(Ee) (Hh1)—O)x—Si(Ff)(Gg)(Hh2), described herein. An ethylene/siloxane interpolymer comprising at least one chemical unit of Structure 1, or at least one chemical unit of Structure 2, each described herein. A process to form an interpolymer, which comprises, in polymerized form, at least one siloxane monomer, or at least one silane monomer without a siloxane linkage, said process comprising polymerizing a mixture comprising one or more “addition polymerizable monomers” and at least one monomer of Formula 4, described herein, in the presence of a catalyst system comprising a metal complex from Formula A or Formula B, each described herein.

Abstract: The present disclosure provides a multilayer film. The multilayer film includes at least two layers including a sealant layer and a second layer in contact with the sealant layer. The sealant layer contains (A) a first ethylene-based polymer having a density from 0.900 g/cc to 0.925 g/cc and a melt index from 0.5 g/10 min to 30 g/10 min; and (B) a polyethylene-polydimethylsiloxane block copolymer having a weight average molecular weight from 1,000 g/mol to 10,000 g/mol. The second layer contains a second ethylene-based polymer.