Patents by Inventor Phillip D. Hustad

Phillip D. Hustad has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12386261
    Abstract: A method of microfabrication includes forming a first relief pattern on a target layer of a substrate, coating the first relief pattern with a first solubility-shifting agent, layering a first polymeric fill on the first relief pattern, and diffusing the first solubility-shifting agent into the first polymeric fill to provide a solubility-shifted region of the first polymeric fill. Then the method includes forming a second relief pattern over the first relief pattern, coating the second relief pattern with a second solubility-shifting agent, layering a second polymeric fill on the second relief pattern, and diffusing the second solubility-shifting into the second polymeric fill to provide a solubility-shifted region of the second polymeric fill. Finally, the solubility-shifted regions of the first polymeric fill and the second polymeric fill are developed and the target layer is etched.
    Type: Grant
    Filed: August 25, 2022
    Date of Patent: August 12, 2025
    Assignee: Geminatio, Inc.
    Inventors: Brennan Peterson, Phillip D. Hustad
  • Publication number: 20250233019
    Abstract: A method of microfabrication includes providing a substrate having an existing pattern of features formed within a first layer, depositing a selective attachment agent on the substrate, wherein the selective attachment agent attaches to the features and includes a solubility-shifting agent, depositing a first resist on the substrate, activating the solubility-shifting agent such that a portion of the first resist over the features becomes soluble to a first developer, developing the first resist using the first developer such that a relief pattern having openings that expose the features of the existing layer is formed, growing a selective growth material on the features and within the openings of the relief pattern to provide self-aligned selective growth features, removing the first resist, depositing a fill layer on the substrate, and repeating the steps a predetermined number of times to provide a stacked device including a predetermined number of levels.
    Type: Application
    Filed: October 25, 2022
    Publication date: July 17, 2025
    Applicant: Geminatio, Inc.
    Inventors: Brennan Peterson, Phillip D. Hustad
  • Publication number: 20250216784
    Abstract: A method of microfabrication includes forming a first relief pattern on a target layer of a substrate, coating the first relief pattern with a first solubility-shifting agent, layering a first polymeric fill on the first relief pattern, and diffusing the first solubility-shifting agent into the first polymeric fill to provide a solubility-shifted region of the first polymeric fill. Then the method includes forming a second relief pattern over the first relief pattern, coating the second relief pattern with a second solubility-shifting agent, layering a second polymeric fill on the second relief pattern, and diffusing the second solubility-shifting into the second polymeric fill to provide a solubility-shifted region of the second polymeric fill. Finally, the solubility-shifted regions of the first polymeric fill and the second polymeric fill are developed and the target layer is etched.
    Type: Application
    Filed: August 25, 2022
    Publication date: July 3, 2025
    Applicant: Geminatio, Inc.
    Inventors: Brennan Peterson, Phillip D. Hustad
  • Publication number: 20250216790
    Abstract: A method includes depositing an overcoat in openings of a relief pattern supported by a substrate. The relief pattern includes a solubility-shifting agent. The overcoat and the relief pattern have different solubility-shifting mechanisms. The method further includes generating a catalyst by activating the solubility-shifting agent and diffusing the catalyst a predetermined distance from structures of the relief pattern into the overcoat to form soluble regions in the overcoat. The soluble regions is soluble in a predetermined developer while the relief pattern remains insoluble in the predetermined developer. The method further includes developing the substrate with the predetermined developer to remove the soluble regions of the overcoat.
    Type: Application
    Filed: December 20, 2024
    Publication date: July 3, 2025
    Inventors: Phillip D. Hustad, Jordan B. Greenough, Max J. Klemes
  • Publication number: 20250218775
    Abstract: A method includes forming mandrels over a substrate. The mandrels include a first material having a first solubility-shifting mechanism. The method further includes absorbing a solubility-shifting agent into the mandrels to form absorbed regions in the mandrels and depositing a resist layer over the mandrels and the substrate. The resist layer includes a second material having a second solubility-shifting mechanism different from the first solubility-shifting mechanism. The method further includes diffusing a catalyst of/from the solubility-shifting agent into the resist layer to form solubility-shifted regions in the resist layer, and selectively removing the solubility-shifted regions of the resist layer. Remaining regions of the resist layer and the mandrels form a patterned mask over the substrate.
    Type: Application
    Filed: December 19, 2024
    Publication date: July 3, 2025
    Inventors: Phillip D. Hustad, Jordan B. Greenough, Max J. Klemes
  • Publication number: 20250216763
    Abstract: A method for forming a patterned mask includes providing a patterned resist layer on a substrate and depositing an overcoat resist layer over the patterned resist layer. The patterned resist layer includes a first material including a first polymer. The overcoat resist layer includes a second material including a second polymer and a solubility shifting agent. The method further includes diffusing at least a catalyst portion of the solubility shifting agent from the overcoat resist layer into exterior regions of the patterned resist layer and chemically transforming the exterior regions of the patterned resist layer to anti-spacer regions of a third material to a first depth into the patterned resist layer. The method may also include removing the exterior regions to form an anti-spacer pattern having openings to the substrate corresponding to the exterior regions, at least part of which may have a critical dimension corresponding to the first depth.
    Type: Application
    Filed: December 20, 2024
    Publication date: July 3, 2025
    Inventors: Phillip D. Hustad, Jordan B. Greenough, Max J. Klemes
  • Publication number: 20250216782
    Abstract: A method for forming a patterned mask can include providing first and second structures on a substrate, where the first structure includes a solubility shifting agent therein, and where the first structure is insoluble in a first developer containing an organic solvent, where the second structure includes a first polymer and a first reactant, and where the second structure is insoluble in the first developer containing the organic solvent, and diffusing at least a catalyst portion of the solubility shifting agent from the first structure into a first region of the second structure and chemically transforming the first region of the second structure to a converted region of a converted material to a first depth into the second structure using the catalyst portion of the solubility shifting agent as a chemical reaction catalyst, such that the converted material is soluble in the first developer containing the organic solvent.
    Type: Application
    Filed: December 19, 2024
    Publication date: July 3, 2025
    Inventors: Phillip D. Hustad, Jordan B. Greenough, Max J. Klemes
  • Publication number: 20250216783
    Abstract: A method for forming a patterned mask includes providing first and second structures. The first structure includes a first material including a first polymer, and a first converted region of a second material extending into the first structure. The second material has been chemically transformed from the first material by a catalyst portion of a first solubility shifting agent diffused into the first converted region. The second structure includes a third material including a second polymer with a functional group protected by a protecting group, and has an overburden region overlying the first converted region. The method further includes chemically transforming the overburden region to a second converted region of a fourth material using a catalyst portion of a second solubility shifting agent. The first and third materials are insoluble in a developer containing a polar solvent and the second and fourth materials are soluble in the developer.
    Type: Application
    Filed: December 19, 2024
    Publication date: July 3, 2025
    Inventors: Phillip D. Hustad, Jordan B. Greenough, Max J. Klemes
  • Publication number: 20250132156
    Abstract: A method of patterning a substrate includes providing a first relief pattern on a substrate, wherein the first relief pattern includes a first resist, coating the first relief pattern with a solubility-shifting agent, depositing a second resist on the first relief pattern such that the second resist is in contact with the first relief pattern, and diffusing the solubility-shifting agent a predetermined distance into the second resist to provide a solubility-shifted region of the second resist. The solubility-shifted region of the second resist borders the first relief pattern. Then, the method includes developing the second resist such that the solubility-shifted region is dissolved providing gaps between the first relief pattern and the second resist where a portion of the substrate is exposed and etching the substrate using the first relief pattern and the second resist as a combined etch mask.
    Type: Application
    Filed: August 25, 2022
    Publication date: April 24, 2025
    Applicant: Geminatio, Inc.
    Inventors: Brennan Peterson, Phillip D. Hustad
  • Publication number: 20250132166
    Abstract: A method of microfabrication includes providing a first relief pattern on a target layer, wherein the first relief pattern comprises a first resist having a first etch selectivity, coating the first relief pattern with a solubility-shifting agent, depositing a second resist on the first relief pattern, wherein the second resist has a second etch selectivity that is different from the first etch selectivity, diffusing the solubility-shifting agent into the second resist to provide a solubility-shifted region of the second resist, developing the second resist such that the solubility-shifted region is dissolved providing gaps between the first relief pattern and the second resist where a portion of the target layer is exposed, and filling the gaps between the first relief pattern and the second resist with a fill material.
    Type: Application
    Filed: August 25, 2022
    Publication date: April 24, 2025
    Applicant: Geminatio, Inc.
    Inventors: Brennan Peterson, Phillip D. Hustad
  • Publication number: 20250130501
    Abstract: A method of patterning a substrate is described. The method includes the steps of providing a resist layer on the substrate, exposing the resist later to a first pattern of actinic radiation to form a latent imagine in the resist layer, and exposing the resist layer to a second pattern of actinic radiation to form a second latent imagine in the resist later, wherein the first latent image and the second latent image are adjacent. The method further includes developing the resist layer to form a relief patten that includes a first set of trenches corresponding to the first pattern of actinic radiation and a second set of trenches corresponding to the second pattern of actinic radiation, wherein the first set of trenches and the second set of trenches are not contiguous.
    Type: Application
    Filed: August 25, 2022
    Publication date: April 24, 2025
    Applicant: Geminatio, Inc.
    Inventors: Brennan Peterson, Phillip D. Hustad
  • Publication number: 20250132207
    Abstract: A method of microfabrication includes depositing a first layer of a first resist that includes a first chemical marker on a substrate, measuring a first fluorescence intensity of the first layer from the first fluorescent chemical marker, forming a first relief pattern from the first layer of the first resist, and measuring a second fluorescence intensity of the first layer from the first chemical marker subsequent to forming the first relief pattern. Then, the method includes depositing a solubility-shifting agent on the first relief pattern, depositing a second resist on the first relief pattern, diffusing the solubility-shifting agent into the second resist to provide a solubility-shifted region of the second resist, developing the second resist such that the solubility-shifted region of the second resist is dissolved and a portion of the substrate is exposed, and measuring a third fluorescence intensity of the first layer from the first chemical marker.
    Type: Application
    Filed: August 25, 2022
    Publication date: April 24, 2025
    Applicant: Geminatio, Inc.
    Inventors: Brennan Peterson, Phillip D. Hustad
  • Publication number: 20250068064
    Abstract: A method of microfabrication includes providing a first relief pattern on a substrate, forming carbon—containing sidewall spacers—in the first relief pattern, removing the first relief pattern, and coating the carbon—containing sidewall spacers with a solubility—shifting agent. Then, the method includes depositing a first polymer fill on the carbon—containing sidewall spacers, diffusing the solubility—shifting agent a predetermined distance into the first polymer fill to provide a solubility—shifted region of the first polymer fill, wherein the solubility—shifted region of the first polymer fill borders the carbon—containing sidewall spacers, and developing the first polymer fill such that the solubility—shifted region is dissolved providing trenches between the carbon—containing sidewall spacers and the first polymer fill where a portion of the substrate is exposed.
    Type: Application
    Filed: August 25, 2022
    Publication date: February 27, 2025
    Applicant: Geminatio, Inc.
    Inventors: Brennan Peterson, Phillip D. Hustad
  • Publication number: 20240419079
    Abstract: A method of patterning a substrate includes depositing an underlayer on the substrate, coating the underlayer with a solubility-shifting agent, layering a photoresist on the substrate, such that the photoresist covers the solubility-shifting agent and diffusing the solubility-shifting agent a predetermined distance into the photoresist to provide a solubility-shifted region of the photoresist, wherein the solubility-shifted region forms a footer layer in a bottom portion of the photoresist. Then, the method includes exposing the photoresist to a pattern of actinic radiation, developing the photoresist to form a relief pattern over the footer layer, wherein the relief pattern comprises structures separated by gaps, and etching the substrate to remove portions of the footer layer under the gaps, such that uniform structures are provided.
    Type: Application
    Filed: October 25, 2022
    Publication date: December 19, 2024
    Applicant: Geminatio, Inc.
    Inventors: Brennan Peterson, Phillip D. Hustad
  • Publication number: 20240404828
    Abstract: A method of microfabrication includes providing a substrate having an existing pattern, wherein the existing pattern comprises features formed within a base layer such that a top surface of the substrate has features uncovered and the base layer is uncovered, depositing a selective attachment agent on the substrate, wherein the selective attachment agent includes a solubility-shifting agent, depositing a first resist on the substrate, activating the solubility shifting agent such that a portion of the first resist becomes insoluble to a first developer, developing the first resist using the first developer such that a relief pattern comprising openings is formed, wherein the openings expose the features of the existing layer, and executing a selective growth process that grows a selective-deposition material on the features and within the openings of the relief pattern to provide self-aligned selective deposition features.
    Type: Application
    Filed: August 25, 2022
    Publication date: December 5, 2024
    Applicant: Geminatio, Inc.
    Inventors: Brennan Peterson, Phillip D. Hustad
  • Publication number: 20240377749
    Abstract: A method of microfabrication includes providing a substrate having an existing pattern, wherein the existing pattern includes features formed within a base layer such that a top surface of the substrate has features uncovered and the base layer is uncovered, depositing a selective attachment agent on the substrate, wherein the selective attachment agent comprises a solubility-shifting agent, depositing a first resist on the substrate, activating the solubility shifting agent such that a portion of the first resist becomes insoluble to a first developer, and developing the first resist using the first developer such that the portion of the first resist insoluble to the first developer remains.
    Type: Application
    Filed: August 25, 2022
    Publication date: November 14, 2024
    Applicant: Geminatio, Inc.
    Inventors: Brennan Peterson, Phillip D. Hustad
  • Publication number: 20240377744
    Abstract: A method of patterning a substrate includes providing a first photoresist on a substrate, layering a second photoresist on the first photoresist, exposing the second photoresist to a first pattern of actinic radiation, and developing the second photoresist such that portions of the second photoresist are dissolved providing gaps between features of the second photoresist, wherein the gaps uncover portions of the first photoresist. Then, the method includes exposing the first photoresist to a second pattern of actinic radiation and developing the first photoresist such that portions of the uncovered portions of the first photoresist are dissolved providing gaps between the features of the first photoresist where a portion of the substrate is exposed.
    Type: Application
    Filed: October 25, 2022
    Publication date: November 14, 2024
    Applicant: Geminatio, Inc.
    Inventors: Brennan Peterson, Phillip D. Hustad
  • Publication number: 20240343004
    Abstract: Infiltrated three-dimensional articles are provided. An article includes a first polymeric material having an exterior surface and an interior volume; and a second polymeric material that is a thermoplastic polymer or a reaction product of a polymerizable composition disposed in at least a portion of the interior volume of the first polymeric material to a depth from the exterior surface. Methods of making the articles are provided. A method includes curing a photopolymerizable composition containing at least one reactive component and at least one photoinitiator to form an additive manufactured three-dimensional structure of a first polymeric material having an exterior surface and an interior volume. The method further includes contacting at least a portion the three-dimensional structure with a fluid to form an infiltrated structure; and curing or drying the fluid of the infiltrated structure to form an infiltrated three-dimensional article.
    Type: Application
    Filed: July 18, 2022
    Publication date: October 17, 2024
    Inventors: Phillip D. Hustad, Benjamin C. Mac Murray
  • Patent number: 12097498
    Abstract: An article includes a flexible structured film with a first major surface and a second major surface, wherein a first major surface of the flexible structured film has a plurality of posts separated by land areas, and the posts have an exposed surface. An anti-biofouling layer resides in the land areas, and the anti-biofouling layer has a methylated surface. An inorganic layer is on the exposed surfaces of the posts, wherein the inorganic layer includes a metal or a metal oxide. An analyte binding layer is on the inorganic layer, wherein the analyte binding layer is chosen from a reactive silane, a functionalizable hydrogel, a functionalizable polymer, and mixtures and combinations thereof. An exposed surface of the analyte binding layer includes at least one functional group selected to bind with a biochemical analyte.
    Type: Grant
    Filed: November 24, 2021
    Date of Patent: September 24, 2024
    Assignee: 3M INNOVATIVE PROPERTIES COMPANY
    Inventors: Henrik B. van Lengerich, Caleb T. Nelson, Kayla C. Niccum, Jeffrey L. Solomon, Paul B. Armstrong, Joshua M. Fishman, Tonya D. Bonilla, Phillip D. Hustad, David J. Tarnowski
  • Publication number: 20240279251
    Abstract: A monomer represented by the formula: (I) wherein: each R1 independently represents an alkyl group having from 1 to 4 carbon atoms; Z represents an alkyl group having 1 to 40 carbon atoms, or a group represented by the formula (II) wherein: each L independently represents a divalent alkylene group having 1 to 12 carbon atoms, each n independently represents 0, 1, or 2; and p represents 0 or 1. A polymerizable composition includes the monomer and can be polymerized to form a polymerized composition. Polymers prepared by polymerization of the monomer are also disclosed.
    Type: Application
    Filed: March 30, 2022
    Publication date: August 22, 2024
    Inventors: Claire Hartmann-Thompson, Erik M. Townsend, Binhong Lin, Phillip D. Hustad