Patents by Inventor Phillip D. Hustad

Phillip D. Hustad has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8716166
    Abstract: The invention generally relates to chain shuttling agents (CSAs), a process of preparing the CSAs, a composition comprising a CSA and a catalyst, a process of preparing the composition, a processes of preparing polyolefins, end functional polyolefins, and telechelic polyolefins with the composition, and the polyolefins, end functional polyolefins, and telechelic polyolefins prepared by the processes.
    Type: Grant
    Filed: November 2, 2012
    Date of Patent: May 6, 2014
    Assignee: Dow Global Technologies LLC
    Inventors: Thomas P. Clark, Nahrain E. Kamber, Sara B. Klamo, Phillip D. Hustad, David R. Wilson
  • Patent number: 8710143
    Abstract: A composition for use in forming a multi-block copolymer, said copolymer containing therein two or more segments or blocks differing in chemical or physical properties, a polymerization process using the same, and the resulting polymers, wherein the composition comprises the admixture or reaction product resulting from combining: (A) a first metal complex olefin polymerization catalyst, (B) a second metal complex olefin polymerization catalyst capable of preparing polymers differing in chemical or physical properties from the polymer prepared by catalyst (A) under equivalent polymerization conditions, and (C) a chain shuttling agent.
    Type: Grant
    Filed: July 31, 2012
    Date of Patent: April 29, 2014
    Assignee: Dow Global Technologies LLC
    Inventors: Daniel J. Arriola, Edmund M. Carnahan, Yunwa Wilson Cheung, David D. Devore, David D. Graf, Phillip D. Hustad, Roger L. Kuhlman, Colin Li Pi Shan, Benjamin C. Poon, Gordon R. Roof, James C. Stevens, Pamela J. Stirn, Timothy T. Wenzel
  • Patent number: 8710150
    Abstract: A block copolymer composition containing a diblock copolymer blend including a first poly(methyl methacrylate)-b-poly((trimethylsilyl)methyl methacrylate) diblock copolymer; and, a second poly(methyl methacrylate)-b-poly((trimethylsilyl)methyl methacrylate) diblock copolymer. Also provided are substrates treated with the block copolymer composition.
    Type: Grant
    Filed: February 10, 2012
    Date of Patent: April 29, 2014
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Shih-Wei Chang, Valeriy V. Ginzburg, Erin B. Vogel, Daniel J. Murray, Peter Trefonas, Phillip D. Hustad
  • Patent number: 8697810
    Abstract: A copolymer composition including a block copolymer having a poly(methyl methacrylate) block and a poly((trimethylsilyl)methyl methacrylate) block is provided; wherein the block copolymer exhibits a number average molecular weight, MN, of 1 to 1,000 kg/mol; and, wherein the block copolymer exhibits a polydispersity, PD, of 1 to 2. Also provided are substrates treated with the copolymer composition.
    Type: Grant
    Filed: February 10, 2012
    Date of Patent: April 15, 2014
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Erin B. Vogel, Valeriy V. Ginzburg, Shih-Wei Chang, Daniel J. Murray, Phillip D. Hustad, Peter Trefonas
  • Publication number: 20140014002
    Abstract: A method for processing a substrate is provided; wherein the method comprises applying a film of a copolymer composition, comprising a poly(styrene)-b-poly(siloxane) block copolymer component; and, an antioxidant to a surface of the substrate; optionally, baking the film; subjecting the film to a high temperature annealing process under a gaseous atmosphere for a specified period of time; followed by a treatment of the annealed film to remove the poly(styrene) from the annealed film and to convert the poly(siloxane) in the annealed film to SiOx.
    Type: Application
    Filed: July 12, 2012
    Publication date: January 16, 2014
    Applicants: DOW GLOBAL TECHNOLOGIES LLC, ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Xinyu Gu, Shih-Wei Chang, Phillip D. Hustad, Jeffrey D. Weinhold, Peter Trefonas
  • Patent number: 8513356
    Abstract: A diblock copolymer blend containing a unique combination of an ordered poly(styrene)-b-poly(methyl methacrylate) diblock copolymer and a disordered poly(styrene)-b-poly(methyl methacrylate) diblock copolymer is provided. Also provided are substrates treated with the diblock copolymer blend.
    Type: Grant
    Filed: February 10, 2012
    Date of Patent: August 20, 2013
    Assignee: Dow Global Technologies LLC
    Inventors: Rahul Sharma, Valeriy V. Ginzburg, Phillip D. Hustad, Jeffrey D. Weinhold
  • Publication number: 20130209693
    Abstract: A copolymer composition including a block copolymer having a poly(methyl methacrylate) block and a poly((trimethylsilyl)methyl methacrylate) block is provided; wherein the block copolymer exhibits a number average molecular weight, MN, of 1 to 1,000 kg/mol; and, wherein the block copolymer exhibits a polydispersity, PD, of 1 to 2. Also provided are substrates treated with the copolymer composition.
    Type: Application
    Filed: February 10, 2012
    Publication date: August 15, 2013
    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Erin B. Vogel, Valeriy V. Ginzburg, Shih-Wei Chang, Daniel J. Murray, Phillip D. Hustad, Peter Trefonas
  • Publication number: 20130209694
    Abstract: A block copolymer composition containing a diblock copolymer blend including a first poly(methyl methacrylate)-b-poly((trimethylsilyl)methyl methacrylate) diblock copolymer; and, a second poly(methyl methacrylate)-b-poly((trimethylsilyl)methyl methacrylate) diblock copolymer. Also provided are substrates treated with the block copolymer composition.
    Type: Application
    Filed: February 10, 2012
    Publication date: August 15, 2013
    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Shih-Wei Chang, Valeriy V. Ginzburg, Erin B. Vogel, Daniel J. Murray, Peter Trefonas, Phillip D. Hustad
  • Publication number: 20130209696
    Abstract: A diblock copolymer blend containing a unique combination of an ordered poly(styrene)-b-poly(methyl methacrylate) diblock copolymer and a disordered poly(styrene)-b-poly(methyl methacrylate) diblock copolymer is provided. Also provided are substrates treated with the diblock copolymer blend.
    Type: Application
    Filed: February 10, 2012
    Publication date: August 15, 2013
    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Rahul Sharma, Valeriy V. Ginzburg, Phillip D. Hustad, Jeffrey D. Weinhold
  • Publication number: 20130209344
    Abstract: A method for processing a substrate is provided; wherein the method comprises applying a film of a copolymer composition, comprising a poly(styrene)-b-poly(dimethylsiloxane) block copolymer component to a surface of the substrate; optionally, baking the film; subjecting the film to a high temperature annealing process under particularized atmospheric conditions for a specified period of time; followed by a treatment of the annealed film to remove the poly(styrene) from the annealed film and to convert the poly(dimethylsiloxane) in the annealed film to SiOx.
    Type: Application
    Filed: February 10, 2012
    Publication date: August 15, 2013
    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Shih-Wei Chang, Jeffrey D. Weinhold, Phillip D. Hustad, Peter Trefonas
  • Patent number: 8475933
    Abstract: The present invention relates to compositions and processes of making and using interpolymers having a controlled molecular weight distribution. Multilayer films and film layers derived from novel ethylene/?-olefin interpolymers are also disclosed.
    Type: Grant
    Filed: March 20, 2012
    Date of Patent: July 2, 2013
    Assignee: Dow Global Technologies LLC
    Inventors: Rajen M. Patel, David W. Fuchs, Pradeep Jain, Seema Karande, Mehmet Demirors, Mark Grant Spencer, Kim L. Walton, Angela N. Taha, Phillip D. Hustad, Roger L. Kuhlman, Anthony J. Castelluccio
  • Patent number: 8415434
    Abstract: A polymerization process and the resulting polymer composition, said process comprising polymerizing one or more addition polymerizable monomers and a polymerizable shuttling agent in the presence of at least one addition polymerization catalyst comprising a metal compound or complex and a cocatalyst under conditions characterized by the formation of a branched polymer, preferably comprising pseudo-block molecular architecture.
    Type: Grant
    Filed: December 23, 2010
    Date of Patent: April 9, 2013
    Assignee: Dow Global Technologies LLC
    Inventors: Daniel J. Arriola, Edmund M. Carnahan, David D. Devore, Phillip D. Hustad, Brian A. Jazdzewski, Roger L. Kuhlman, Francis J. Timmers, Timothy T. Wenzel
  • Patent number: 8389655
    Abstract: A process for preparing polymers, especially multi-block copolymer containing therein two or more segments or blocks differing in chemical or physical properties, by contacting propylene, 4-methyl-1-pentene, or other C4-8 ?-olefins and one or more copolymerizable comonomers, especially ethylene in the presence of a composition comprising the admixture or reaction product resulting from combining: (A) a first metal complex olefin polymerization catalyst, (B) a second metal complex olefin polymerization catalyst capable of preparing polymers differing in chemical or physical properties from the polymer prepared by catalyst (A) under equivalent polymerization conditions, and (C) a chain shuttling agent.
    Type: Grant
    Filed: April 19, 2011
    Date of Patent: March 5, 2013
    Assignee: Dow Global Technologies, LLC
    Inventors: Daniel J. Arriola, Edmund M. Carnahan, David D. Devore, Phillip D. Hustad, Roger L. Kuhlman, Timothy T. Wenzel
  • Publication number: 20130030092
    Abstract: A composition for use in forming a multi-block copolymer, said copolymer containing therein two or more segments or blocks differing in chemical or physical properties, a polymerization process using the same, and the resulting polymers, wherein the composition comprises the admixture or reaction product resulting from combining: (A) a first metal complex olefin polymerization catalyst, (B) a second metal complex olefin polymerization catalyst capable of preparing polymers differing in chemical or physical properties from the polymer prepared by catalyst (A) under equivalent polymerization conditions, and (C) a chain shuttling agent.
    Type: Application
    Filed: July 31, 2012
    Publication date: January 31, 2013
    Inventors: Daniel J. Arriola, Edmund M. Carnahan, Yunwa Wilson Cheung, David D. Devore, David D. Graf, Phillip D. Hustad, Roger L. Kuhlman, Colin Li Pi Shan, Benjamin C. Poon, Gordon R. Roof, James C. Stevens, Pamela J. Stirn, Timothy T. Wenzel
  • Patent number: 8362184
    Abstract: Embodiments of the invention provide a class of mesophase separated butene/?-olefin block interpolymers with controlled block sequences. The butene/?-olefin interpolymers are characterized by an average block index, ABI, which is greater than zero and up to about 1.0 and a molecular weight distribution, Mw/Mn, greater than about 1.4. Preferably, the block index is from about 0.2 to about 1. In addition or alternatively, the block butene/?-olefin interpolymer is characterized by having at least one fraction obtained by Temperature Rising Elution Fractionation (‘TREF’), wherein the fraction has a block index greater than about 0.3 and up to about 1.0 and the butene/?-olefin interpolymer has a molecular weight distribution, Mw/Mn, greater than about 1.4.
    Type: Grant
    Filed: January 30, 2009
    Date of Patent: January 29, 2013
    Assignee: DOW Global Technologies, LLC
    Inventors: Gary R. Marchand, Yunwa W. Cheung, Benjamin C. Poon, Jeffrey D. Weinhold, Kim L. Walton, Pankaj Gupta, Colin Li Pi Shan, Phillip D. Hustad, Roger L. Kuhlman, Edmund M. Carnahan, Eddy I. Garcia-Meitin, Patricia L. Roberts
  • Patent number: 8362162
    Abstract: The present invention relates to compositions and processes of making polymers having a controlled molecular weight distribution. The molecular weight distribution is controlled, for example, by controlling the relative monomer concentrations during contact with a pre-catalyst and/or using a catalyst comprising a catalytic amount of a molecule having the structure: wherein M=group 2-8 metal, preferably group 4 as a neutral or charged moiety; Y=any substituent including fused rings; L=any ligating group, especially a pyridyl or pyridylamide; X=alkyl, aryl, substituted alkyl, H or hydride, halide, or other anionic moiety; y=an integer from 0 to the complete valence of M; R=alkyl, aryl, haloalkyl, haloaryl, hydrogen, etc; x=1-6, especially 2; Dashed line=optional bond, especially a weak bond; and X and (CR2)x may be tethered or part of a ring.
    Type: Grant
    Filed: December 7, 2006
    Date of Patent: January 29, 2013
    Assignee: Dow Global Technologies LLC
    Inventors: Phillip D. Hustad, Roger L. Kuhlman, Robert D. J. Froese, Timothy T. Wenzel, Joseph N. Coalter, III
  • Patent number: 8324416
    Abstract: The invention generally relates to chain shuttling agents (CSAs), a process of preparing the CSAs, a composition comprising a CSA and a catalyst, a process of preparing the composition, a processes of preparing polyolefins, end functional polyolefins, and telechelic polyolefins with the composition, and the polyolefins, end functional polyolefins, and telechelic polyolefins prepared by the processes.
    Type: Grant
    Filed: July 28, 2010
    Date of Patent: December 4, 2012
    Assignee: Dow Global Technologies, LLC
    Inventors: Thomas P. Clark, Nahrain E. Kamber, Sara B. Klamo, Phillip D. Hustad, David R. Wilson
  • Patent number: 8293859
    Abstract: Embodiments of the invention provide a class of butene/?-olefin block interpolymers. The butene/?-olefin inter-polymers are characterized by an average block index, ABI, which is greater than zero and up to about 1.0 and a molecular weight distribution, Mw/Mn, greater than about 1.3. Preferably, the block index is from about 0.2 to about 1. In addition or alternatively, the block butene/?-olefin interpolymer is characterized by having at least one fraction obtained by Temperature Rising Elution Fractionation (‘TREF’), wherein the fraction has a block index greater than about 0.3 and up to about 1.0 and the butene/?-olefin interpolymer has a molecular weight distribution, Mw/Mn, greater than about 1.4.
    Type: Grant
    Filed: January 30, 2009
    Date of Patent: October 23, 2012
    Assignee: Dow Global Technologies, LLC
    Inventors: Gary R. Marchand, Yunwa W. Cheung, Benjamin C. Poon, Jeffrey D. Weinhold, Kim L. Walton, Pankaj Gupta, Colin Li Pi Shan, Phillip D. Hustad, Roger L. Kuhlman, Edmund M. Carnahan, Eddy I. Garcia-Meitin, Patricia L. Roberts
  • Patent number: 8273838
    Abstract: Embodiments of the invention provide a class of propylene/?-olefin block interpolymers. The propylene/?-olefin interpolymers are characterized by an average block index, ABI, which is greater than zero and up to about 1.0 and a molecular weight distribution, Mw/Mn, greater than about 1.3. Preferably, the block index is from about 0.2 to about 1. In addition or alternatively, the block propylene/?-olefin interpolymer is characterized by having at least one fraction obtained by Temperature Rising Elution Fractionation (“TREF”), wherein the fraction has a block index greater than about 0.3 and up to about 1.0 and the propylene/?-olefin interpolymer has a molecular weight distribution, Mw/Mn, greater than about 1.3.
    Type: Grant
    Filed: March 15, 2007
    Date of Patent: September 25, 2012
    Assignee: Dow Global Technologies LLC
    Inventors: Colin Li Pi Shan, Lonnie G. Hazlitt, Yunwa Wilson Cheung, Benjamin C. Poon, Phillip D. Hustad, Roger L. Kuhlman, Edmund M. Carnahan, XiaoHua Qiu, Angela N. Taha
  • Patent number: 8273449
    Abstract: The instant invention is a polyethylene film, and method of making the same. The polyethylene film according to instant invention includes at least one heterogeneously branched ethylene/?-olefin copolymer having a density in the range of about 0.910 to about 0.930 g/cm3, a molecular weight distribution in the range of about 2.8 to 3.8, a melt index (I2) in the range of about 0.3 to about 4 g/10 min, and an I10/I2 ratio in the range of 6.5 to about 7.8. The film has a normalized dart impact strength of equal or greater than (6666-7012*density) g/mil, a normalized tear strength of equal or greater than (440*e?(density?0.915)2/2*(0.00949)2) g/mil, and a haze in the range of 3 to 10 percent. The method of making the polyethylene film according to instant invention includes the following steps: (1) providing at least one heterogeneously branched ethylene/?-olefin copolymer having a density in the range of about 0.910 to about 0.930 g/cm3, a molecular weight distribution in the range of about 2.8 to 3.
    Type: Grant
    Filed: April 4, 2008
    Date of Patent: September 25, 2012
    Assignee: Dow Global Technologies LLC
    Inventors: Sylvie Desjardins, Marc A. Springs, Phillip D. Hustad, Nathan J. Wiker, Jesus Nieto, Wayde V. Konze