Patents by Inventor Pin Kao

Pin Kao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11854808
    Abstract: A photo mask includes a plurality of device features, a first assist feature, and a second assist feature. The device features are in a patterning region of a device region. The first assist feature are in the patterning region and adjacent to the device features. The first assist feature is for correcting an optical proximity effect in a photolithography process. The second assist feature is in a non-patterning region of the device region. The second assist feature is a sub-resolution correction feature, and a first distance between the second assist feature and one of the device features closest to the second assist feature is greater than a second distance between adjacent two of the device features.
    Type: Grant
    Filed: August 30, 2021
    Date of Patent: December 26, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Bao-Chin Li, Chung-Kai Huang, Ko-Pin Kao, Ching-Yen Hsaio
  • Patent number: 11833510
    Abstract: Disclosed herein are systems and methods for serial flow emulsion processes. Systems and methods as described herein result in reduced cross-contamination.
    Type: Grant
    Filed: September 15, 2020
    Date of Patent: December 5, 2023
    Assignee: DROPWORKS, INC.
    Inventors: Christopher Michael Perkins, Matthew Ryan Dunn, Andrew Carl Larsen, Donna Kelley, Michael Barich, Kristopher Holub, Pin Kao
  • Publication number: 20230384211
    Abstract: A process tube device can detect the presence of any external materials that may reside within a fluid flowing in the tube. The process tube device detects the external materials in-situ which obviates the need for a separate inspection device to inspect the surface of a wafer after applying fluid on the surface of the wafer. The process tube device utilizes at least two methods of detecting the presence of external materials. The first is the direct measurement method in which a light detecting sensor is used. The second is the indirect measurement method in which a sensor utilizing the principles of Doppler shift is used. Here, contrary to the first method that at least partially used reflected or refracted light, the second method uses a Doppler shift sensor to detect the presence of the external material by measuring the velocity of the fluid flowing in the tube.
    Type: Application
    Filed: July 28, 2023
    Publication date: November 30, 2023
    Inventors: Yu-Jen YANG, Chung-Pin CHOU, Yan-Cheng CHEN, Kai-Lin Chuang, Jun-Xiu Liu, Sheng-Ching Kao
  • Publication number: 20230378205
    Abstract: A semiconductor device includes a plurality of isolation structures, wherein each isolation structure of the plurality of isolation structures is spaced from an adjacent isolation structure of the plurality of isolation structures. The semiconductor device further includes a gate structure. The gate structure includes a first sidewall and a second sidewall angled with respect to the first sidewall. The gate structure further includes a first surface extending between the first sidewall and the second sidewall, wherein a dimension of the gate structure in a first direction is less than a dimension of each of the plurality of isolation structures in the first direction.
    Type: Application
    Filed: July 31, 2023
    Publication date: November 23, 2023
    Inventors: Chia-Yu WEI, Fu-Cheng CHANG, Hsin-Chi CHEN, Ching-Hung KAO, Chia-Pin CHENG, Kuo-Cheng LEE, Hsun-Ying HUANG, Yen-Liang LIN
  • Publication number: 20230360975
    Abstract: In a method of inspection of a semiconductor substrate a first beam of light is split into two or more second beams of light. The two or more second beams of light are respectively transmitted onto a first set of two or more first locations on top of the semiconductor substrate. In response to the transmitted two or more second beams of light, two or more reflected beams of light from the first set of two or more first locations are received. The received two or more reflected beams of light are detected to generate two or more detected signals. The two or more detected signals are analyzed to determine whether a defect exists at the set of the two or more first locations.
    Type: Application
    Filed: July 18, 2023
    Publication date: November 9, 2023
    Inventors: Sheng He HUANG, Chung-Pin CHOU, Shiue-Ming GUO, Hsuan-Chia KAO, Yan-Cheng CHEN, Sheng-Ching KAO, Jun Xiu LIU
  • Patent number: 11806743
    Abstract: A spin dispenser module and methods for using the same is disclosed. The spin dispenser module includes a cup having a basin with sidewalls and an exhaust, a rotatable platform situated inside the cup adapted for holding and rotating a substrate, a liquid dispenser disposed over the rotatable platform for dispensing a liquid coating material on top of the substrate, one or more ejector inlets disposed over the rotatable platform, the one or more ejectors connected to a negative pressure source, and a motor coupled to the rotatable platform to rate the rotatable platform at different rotational speeds. The one or more ejector inlets may be translatable and/or rotatable with optionally adjustable suction pressure. The ejector inlets operate after a liquid coating material is dispensed to avoid deposition of suspended organic compounds after a coating is formed.
    Type: Grant
    Filed: May 27, 2022
    Date of Patent: November 7, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
    Inventors: Ching-Hai Yang, Yao-Hwan Kao, Shang-Sheng Li, Kuo-Pin Chen, Hsiang-Kai Tseng, Chuan-Wei Chen
  • Patent number: 11784198
    Abstract: A semiconductor device includes a plurality of isolation structures, wherein each isolation structure of the plurality of isolation structures is spaced from an adjacent isolation structure of the plurality of isolation structures in a first direction. The semiconductor device further includes a gate structure. The gate structure includes a top surface; a first sidewall angled at a non-perpendicular angle with respect to the top surface; and a second sidewall angled with respect to the top surface. The gate structure further includes a first horizontal surface extending between the first sidewall and the second sidewall, wherein the first horizontal surface is parallel to the top surface, and a dimension of the gate structure in a second direction, perpendicular to the first direction, is less than a dimension of each of the plurality of isolation structures in the second direction.
    Type: Grant
    Filed: June 2, 2022
    Date of Patent: October 10, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chia-Yu Wei, Fu-Cheng Chang, Hsin-Chi Chen, Ching-Hung Kao, Chia-Pin Cheng, Kuo-Cheng Lee, Hsun-Ying Huang, Yen-Liang Lin
  • Publication number: 20230297174
    Abstract: The present invention provides a mouse shell with cooling touch, which includes a plastic material and a thermally conductive material, and the thermally conductive material is selected from the group consisting of thermally conductive powders, a thermally conductive object and a combination thereof. The thermally conductive powders are dispersed in the plastic material. The thermally conductive object is covered by the plastic material, or the thermally conductive object is attached beneath the plastic material. The thermally conductive powders are selected from the group consisting of metal powders, alloy powders, ceramic powders and combinations thereof. The thermally conductive object is selected from a metal object, an alloy object, a ceramic object and combinations thereof.
    Type: Application
    Filed: May 20, 2022
    Publication date: September 21, 2023
    Inventors: Han-Pin Kao, Chun-Che Wu
  • Publication number: 20230292629
    Abstract: A method for forming a semiconductor memory structure includes forming an MTJ stack over a substrate. The method also includes etching the MTJ stack to form an MTJ device. The method also includes depositing a metal layer over a top surface and sidewalls of the MTJ device. The method also includes oxidizing the metal layer to form an oxidized metal layer. The method also includes depositing a cap layer over the oxidized metal layer. The method also includes oxidizing the cap layer to form an oxidized cap layer. The method also includes removing an un-oxidized portion of the cap layer.
    Type: Application
    Filed: March 9, 2022
    Publication date: September 14, 2023
    Inventors: Tzu-Ting LIU, Yu-Jen WANG, Chih-Pin CHIU, Hung-Chao KAO, Chih-Chuan SU, Liang-Wei WANG, Chen-Chiu HUANG, Dian-Hau CHEN
  • Patent number: 11749571
    Abstract: In a method of inspection of a semiconductor substrate a first beam of light is split into two or more second beams of light. The two or more second beams of light are respectively transmitted onto a first set of two or more first locations on top of the semiconductor substrate. In response to the transmitted two or more second beams of light, two or more reflected beams of light from the first set of two or more first locations are received. The received two or more reflected beams of light are detected to generate two or more detected signals. The two or more detected signals are analyzed to determine whether a defect exists at the set of the two or more first locations.
    Type: Grant
    Filed: August 31, 2021
    Date of Patent: September 5, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Sheng He Huang, Chung-Pin Chou, Shiue-Ming Guo, Hsuan-Chia Kao, Yan-Cheng Chen, Sheng-Ching Kao, Jun Xiu Liu
  • Publication number: 20230207653
    Abstract: Methods and semiconductor structures are provided. A method according to the present disclosure includes receiving a workpiece that includes a first gate structure disposed over a first active region, a second gate structure disposed over a second active region, a first gate spacer extending along a sidewall of the first gate structure and disposed at least partially over a top surface of the first active region, a second gate spacer extending along a sidewall of the second gate structure and disposed at least partially over a top surface of the second active region, and a source/drain feature. The method also includes treating a portion of the first gate spacer and a portion of the second gate spacer with a remote radical of hydrogen or oxygen, removing the treated portions, and after the removal, depositing a metal fill material over the source/drain feature.
    Type: Application
    Filed: May 20, 2022
    Publication date: June 29, 2023
    Inventors: Szu-Wei Tseng, Wei-Yuan Lu, Wei-Yang Lee, Chia-Pin Lin, Tzu-Wei Kao
  • Publication number: 20230066993
    Abstract: A photo mask includes a plurality of device features, a first assist feature, and a second assist feature. The device features are in a patterning region of a device region. The first assist feature are in the patterning region and adjacent to the device features. The first assist feature is for correcting an optical proximity effect in a photolithography process. The second assist feature is in a non-patterning region of the device region. The second assist feature is a sub-resolution correction feature, and a first distance between the second assist feature and one of the device features closest to the second assist feature is greater than a second distance between adjacent two of the device features.
    Type: Application
    Filed: August 30, 2021
    Publication date: March 2, 2023
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Bao-Chin LI, Chung-Kai HUANG, Ko-Pin KAO, Ching-Yen HSAIO
  • Patent number: 11504710
    Abstract: Disclosed herein are systems and methods for serial flow emulsion processes. Systems and methods as described herein result in reduced cross-contamination.
    Type: Grant
    Filed: April 5, 2021
    Date of Patent: November 22, 2022
    Assignee: DROPWORKS, INC.
    Inventors: Christopher Michael Perkins, Matthew Ryan Dunn, Andrew Carl Larsen, Donna Kelley, Michael Barich, Kristopher Holub, Pin Kao
  • Publication number: 20220341848
    Abstract: A biochemical substance analysis system (5) is used to detect biological characteristics of a sample in a flow cell (38), and includes a detection system (51), a scheduling system (53), a biochemical reaction system (55). and a control system (57). The scheduling system (53) is used to schedule the flow cell (38) at different sites, including sites in the detection system (51) and sites in the biochemical reaction system (55). The biochemical reaction system (55) is used to allow the sample to react in the flow cell (38). The detection system (51) is used to detect a signal from the reacted sample to obtain a signal representing the biological characteristics of the sample. The control system (57) is used to control the detection system (51), the scheduling system (53), and the biochemical reaction system (55) to cooperate. The disclosure improves automation degree and flux of the biochemical substance analysis.
    Type: Application
    Filed: September 24, 2019
    Publication date: October 27, 2022
    Inventors: HEMING JIANG, CHUTIAN XING, JOON MO YANG, XIANGKUN SUI, JIAN LIU, Razvan Chirita, ZHONGHAI WANG, Simon Robert Adams, LE WANG, Mark Frederick Senko, Craig Edward Uhrich, SICHENG WEN, Pin Kao, FENG MU
  • Patent number: 11471886
    Abstract: Disclosed herein are systems and methods for serial flow emulsion processes. Systems and methods as described herein result in reduced cross-contamination.
    Type: Grant
    Filed: September 15, 2020
    Date of Patent: October 18, 2022
    Assignee: Dropworks, Inc.
    Inventors: Christopher Michael Perkins, Matthew Ryan Dunn, Andrew Carl Larsen, Donna Kelley, Michael Barich, Kristopher Holub, Pin Kao
  • Patent number: 11471884
    Abstract: Disclosed herein are systems and methods for serial flow emulsion processes. Systems and methods as described herein result in reduced cross-contamination.
    Type: Grant
    Filed: April 1, 2019
    Date of Patent: October 18, 2022
    Assignee: DROPWORKS, INC.
    Inventors: Christopher Michael Perkins, Matthew Ryan Dunn, Andrew Carl Larsen, Donna Kelley, Michael Barich, Kristopher Holub, Pin Kao
  • Patent number: 11426726
    Abstract: Disclosed herein are systems and methods for serial flow emulsion processes. Systems and methods as described herein can result in reduced cross-contamination, greater accuracy and precision, less expensive materials and processes, decreased run times, and/or other advantages, e.g., through use of improved injectors, partitioners, detectors, and/or other elements useful in serial flow emulsion systems and processes.
    Type: Grant
    Filed: April 5, 2021
    Date of Patent: August 30, 2022
    Assignee: DROPWORKS, INC.
    Inventors: Christopher Michael Perkins, Matthew Ryan Dunn, Andrew Carl Larsen, Donna Kelley, Michael Barich, Kristopher Holub, Pin Kao
  • Patent number: 11226983
    Abstract: Systems and methods for synchronizing data between an online data source and a client application. The method includes, in response to a change in a permission associated with a user to a protected data set included in a shared data space of the online data source, receiving, with the client application associated with the user, a protected data synchronization token issued by the online data source associated with the protected data set and downloading, with the client application, the protected data set included in the shared data space from the online data source to the client application using the protected data synchronization token without re-downloading a public data set included in the shared data space. After downloading the protected data set, the method includes synchronizing the shared data space, including the protected data set and the public data set, using a stored data space synchronization token.
    Type: Grant
    Filed: June 18, 2019
    Date of Patent: January 18, 2022
    Assignee: Microsoft Technology Licensing, LLC
    Inventors: Chih-Pin Kao, Xi Tong, Keping Zhao, Lin Wang, Gregory Powell Young, Deepak Sreenivas Pemmaraju
  • Publication number: 20210291125
    Abstract: Disclosed herein are systems and methods for serial flow emulsion processes. Systems and methods as described herein result in reduced cross-contamination.
    Type: Application
    Filed: April 5, 2021
    Publication date: September 23, 2021
    Inventors: Christopher Michael Perkins, Matthew Ryan Dunn, Andrew Carl Larsen, Donna Kelley, Michael Barich, Kristopher Holub, Pin Kao
  • Publication number: 20210291187
    Abstract: Disclosed herein are systems and methods for serial flow emulsion processes. Systems and methods as described herein result in reduced cross-contamination.
    Type: Application
    Filed: April 5, 2021
    Publication date: September 23, 2021
    Inventors: Christopher Michael Perkins, Matthew Ryan Dunn, Andrew Carl Larsen, Donna Kelley, Michael Barich, Kristopher Holub, Pin Kao