Abstract: The present disclosure provides a secondary imaging optical lithography method and apparatus.

Abstract: Provided is a method of fabricating a micro-nano structure, including: forming a reflective layer and a fluid polymer layer sequentially on a surface of a substrate; pressurizing the substrate and a mask having a micro-nano pattern to attach to each other, squeezing the fluid polymer layer into a light-transmission area of the mask, and curing the fluid polymer layer; and exposing, wherein a fluid polymer in the light-transmission area is configured to sense light under a combined effect of a transmitted light and a light reflected by the reflective layer, such that a micro-nano structure is obtained. The method solves the problem of limited diffraction, improves the processing resolution by reducing the transmission loss of evanescent waves through reflective light field enhancement, and reduces the difficulty and cost of mask processing and pattern defects by using shallow pressurizing in combination with exposure.

Abstract: Provided is a multifunctional lithography device, including: a vacuum substrate-carrying stage configured to place a substrate and adsorb the substrate on the vacuum substrate-carrying stage by controlling an airflow, so as to control a gap between the substrate and the mask plate; a mask frame arranged above the vacuum substrate-carrying stage and configured to fix the mask plate; a substrate-carrying stage motion system arranged below the vacuum substrate-carrying stage and configured to adjust a position of the vacuum substrate-carrying stage, so that a distance between the substrate and the mask plate satisfies a preset condition; an ultraviolet light source system arranged above the mask plate and configured to generate an ultraviolet light for lithography; and a three-axis alignment optical path system configured to align the ultraviolet light with the mask plate.

Abstract: Provided is an intelligent correction device control system for a super-resolution lithography precision mask, including: a sixteen-way pneumatic fine-tuning mask deformation control subsystem configured to deform a mask, detect a force value of a mask deformation, compare the force value of the mask deformation with an output force set value, and generate a first control feedback quantity to adjust a force deforming the mask, so as to control a deformation quantity of the mask; and an alignment subsystem configured to acquire images of the mask and a substrate, and adjust a position between the mask and the substrate according to the images, so as to align the mask with the substrate.

Abstract: Provided is a method of fabricating a micro-nano structure, including: forming a reflective layer and a fluid polymer layer sequentially on a surface of a substrate; pressurizing the substrate and a mask having a micro-nano pattern to attach to each other, squeezing the fluid polymer layer into a light-transmission area of the mask, and curing the fluid polymer layer; and exposing, wherein a fluid polymer in the light-transmission area is configured to sense light under a combined effect of a transmitted light and a light reflected by the reflective layer, such that a micro-nano structure is obtained. The method solves the problem of limited diffraction, improves the processing resolution by reducing the transmission loss of evanescent waves through reflective light field enhancement, and reduces the difficulty and cost of mask processing and pattern defects by using shallow pressurizing in combination with exposure.

Abstract: An ultra high molecular weight polyethylene (UHMWPE) membrane has at least one nanoporous UHMWPE film, where each of the nanoporous UHMWPE film is biaxial oriented with a thickness of 0.1 to 12 ?m and pores that exclude particles in excess of 10 nm with a total porosity of 65 to 75 percent. The nanoporous UHMWPE film can be coated or laminated by a hydrophilic polymer to form a Janus membrane and can be made with a multilayer composite structure. The UHMWPE membrane can be used in a device for molecular distillation (MD), reverse osmosis (RO), or forward osmosis (FO).

Abstract: A superconducting integrated circuit design method based on placement and routing by different-layer JTLs comprises: cutting a bias line at a cell data interface of a cell library, and reserving a position of a via; placing and arranging cells on a logic cell layer according to a schematic circuit logic diagram; connecting clock lines of each of the cells by using a JTL and a splitter of the logic cell layer; and performing data connection on each of the cells by using JTLs of a transverse JTL routing layer and a longitudinal JTL routing layer which are not in the same layer as the logic cell layer, wherein the JTL of the transverse JTL routing layer is used as a transverse routing cell for data between the cells, the JTL of the longitudinal JTL routing layer is used as a longitudinal routing cell for data between the cells.

Abstract: Disclosed are a method of manufacturing a polyethylene membrane comprising: stretching a polyethylene film in a first direction during a first stretching; attaching a plurality of rods on side edges of the polyethylene film; attaching a tape on the polyethylene film; stretching the polyethylene film having the rods attached thereto in a second direction during a second stretching; and annealing the polyethylene film after the second stretching. The second direction can be a transverse direction of the first direction, and the first stretching and the second stretching can be performed at the same (or higher) temperature and the same stretching speed as each other.

Abstract: Provided is a simple and easy to operate device for collecting and extracting fecal samples. The collection device of the invention comprises a top cap mounted with a sample collection means, a middle cap inserted with an elastic sealing funnel, and a bottom container having only one opening. The device can collect fecal samples with a quantitative sampling accuracy comparable to that of the conventional weighing method. It can also be easily adapted to automated multi-sample extraction and immunoassays.

Abstract: The present disclosure relates to a field of dry etching technology. The present disclosure provides an ultra-large area scanning reactive ion etching machine and an etching method thereof. The ultra-large area scanning reactive ion etching machine includes: an injection chamber (101), an etching reaction chamber (102), a transition chamber (103), and an etching ion generation chamber (104). By moving a sample holder (111) among the injection chamber (100), the etching reaction chamber (102) and the transition chamber (103) in a scanning direction, a scanning etching is performed on a sample (100) placed on the sample holder (111), which may realize a large-area, uniform and efficient etching.

Abstract: An all-solid-state battery system having a solid-state electrolyte composite is provided. The solid-state electrolyte composite includes a porous framework providing support and mechanical strength for the solid-state electrolyte composite and a plurality of ionic conductors filling voids of the porous framework for maximizing ionic conductance of the solid-state electrolyte composite. The porous framework may be made of ultra-high-molecular-weight polyethylene (UHMWPE) polymers and the plurality of ionic conductors may be made of poly(ethylene oxide)-LiN(SO2CF3)2 (PEO-LiTFSI) polymers. The all-solid-state battery system includes battery cells each including a cathode current collector, a cathode disposed beneath and connected to the cathode current collector, the solid-state electrolyte composite disposed beneath and connected to the cathode, an anode disposed beneath and connected to the solid-state electrolyte composite, and an anode current collector disposed beneath and connected to the anode.

Abstract: The present disclosure proposes an apparatus for coating photoresist and a method for coating photoresist. The apparatus for coating photoresist comprises a gas supply unit (10) configured to supply gas to a photoresist application unit (20); wherein the photoresist application unit (20) comprises: a device cavity (202) enclosed by sidewalls, a bottom plate and a cover plate (206), a rotation platform (204) configured to carry a substrate (205) and bring the substrate to rotate; a guide unit conformal with the substrate, and configured to uniformly blow the gas supplied by the gas supply unit over a surface of the substrate on which the photoresist is coated; and a gas extraction unit (203) configured to extract gas from the device cavity (202). The present disclosure realizes uniformly and rapidly coating the photoresist on a large substrate.

Abstract: The embodiments of the present disclosure propose a negative refraction imaging lithographic method and equipment. The lithographic method includes: coating photoresist on a device substrate; fabricating a negative refraction imaging structure, wherein the negative refraction imaging structure exhibits optical negative refraction in response to beam emitted by exposure source; pressing a mask to be close to the negative refraction imaging structure; disposing the mask and the negative refraction imaging structure above the device substrate at a projection distance; and light emitted by the exposure source passes through the mask, the negative refraction imaging structure, the projection gap and is sequentially projected onto the photoresist for exposure.

Abstract: This invention relates to a method and process which dynamically monitors data from an on-going randomized clinical trial associated with a drug, device, or treatment. In one embodiment, the present invention automatically and continuously unblinds the study data without human involvement. In one embodiment, a complete trace of statistical parameters such as treatment effect, trend ratio, maximum trend ratio, mean trend ratio, minimum sample size ratio, confidence interval and conditional power are calculated continuously at all points along the information time. In one embodiment, the invention discloses a graphical user interface-based method and system to early conclude a decision, i.e., futile, promising, sample size re-estimate, for an on-going clinical trial. In one embodiment, exact type I error rate control, median unbiased estimate of treatment effect, and exact two-sided confidence interval can be continuously calculated.

Abstract: A device for the extraction of an analyte from a fecal sample, the device comprising a housing comprising a detachable cap with an integral spatula, within the housing is an extraction buffer that solubilizes feces into a liquid phase and a solid phase and a separation gel that is submerged within the extraction buffer and positioned at a bottom of the housing, wherein the separation gel when under a sufficient centrifugal force has a separating density that is equal to or greater than a liquid phase density of the liquid phase and less than a solid phase density of the solid phase, thereby permitting separation of the liquid and solid phases, further wherein the separating density is between 0.098 and 1.08 g/cm3.

Abstract: Disclosed are a method of manufacturing a polyethylene membrane comprising: stretching a polyethylene film in a first direction during a first stretching; attaching a plurality of rods on side edges of the polyethylene film; attaching a tape on the polyethylene film; stretching the polyethylene film having the rods attached thereto in a second direction during a second stretching; and annealing the polyethylene film after the second stretching. The second direction can be a transverse direction of the first direction, and the first stretching and the second stretching can be performed at the same (or higher) temperature and the same stretching speed as each other.

Abstract: The present disclosure proposes an apparatus for coating photoresist and a method for coating photoresist. The apparatus for coating photoresist comprises a gas supply unit (10) configured to supply gas to a photoresist application unit (20); wherein the photoresist application unit (20) comprises: a device cavity (202) enclosed by sidewalls, a bottom plate and a cover plate (206), a rotation platform (204) configured to carry a substrate (205) and bring the substrate to rotate; a guide unit conformal with the substrate, and configured to uniformly blow the gas supplied by the gas supply unit over a surface of the substrate on which the photoresist is coated; and a gas extraction unit (203) configured to extract gas from the device cavity (202). The present disclosure realizes uniformly and rapidly coating the photoresist on a large substrate.

Abstract: The present invention relates to novel macrocyclic sulfondiimine compounds of general formula (I) as described and defined herein, and methods for their preparation, their use for the treatment and/or prophylaxis of disorders, in particular of hyper-proliferative disorders and/or virally induced infectious diseases and/or of cardiovascular diseases. The invention further relates to intermediate compounds useful in the preparation of said compounds of general formula (I).

Abstract: The present disclosure provides a secondary imaging optical lithography method and apparatus.

Abstract: An ultra high molecular weight polyethylene (UHMWPE) membrane has at least one nanoporous UHMWPE film, where each of the nanoporous UHMWPE film is biaxial oriented with a thickness of 0.1 to 12 ?m and pores that exclude particles in excess of 10 nm with a total porosity of 65 to 75 percent. The nanoporous UHMWPE film can be coated or laminated by a hydrophilic polymer to form a Janus membrane and can be made with a multilayer composite structure. The UHMWPE membrane can be used in a device for molecular distillation (MD), reverse osmosis (RO), or forward osmosis (FO).