Abstract: A method of forming a polymeric foam material is provided and includes providing a precursor material having a first thickness, the precursor material being an open-cell foam material and applying a uniaxial compressive force to the precursor material to compress the precursor material to a second thickness, the compressive force causing a cell structure of the precursor material to collapse. The method also includes heating the precursor material at a molding temperature for a first time period while the compressive force is applied, the first time period being sufficient to heat the precursor material to a softening temperature, removing the compressive force from the precursor material, and maintaining the cell structure of the precursor material in a collapsed state.

Abstract: A method of forming a polymeric foam material is provided and includes providing a precursor material having a first thickness, the precursor material being an open-cell foam material and applying a uniaxial compressive force to the precursor material to compress the precursor material to a second thickness, the compressive force causing a cell structure of the precursor material to collapse. The method also includes heating the precursor material at a molding temperature for a first time period while the compressive force is applied, the first time period being sufficient to heat the precursor material to a softening temperature, removing the compressive force from the precursor material, and maintaining the cell structure of the precursor material in a collapsed state.

Abstract: A method of forming a polymeric foam material is provided and includes providing a precursor material having a first thickness, the precursor material being an open-cell foam material and applying a uniaxial compressive force to the precursor material to compress the precursor material to a second thickness, the compressive force causing a cell structure of the precursor material to collapse. The method also includes heating the precursor material at a molding temperature for a first time period while the compressive force is applied, the first time period being sufficient to heat the precursor material to a softening temperature, removing the compressive force from the precursor material, and maintaining the cell structure of the precursor material in a collapsed state.

Abstract: A method of forming a polymeric foam material is provided and includes providing a precursor material having a first thickness, the precursor material being an open-cell foam material and applying a uniaxial compressive force to the precursor material to compress the precursor material to a second thickness, the compressive force causing a cell structure of the precursor material to collapse. The method also includes heating the precursor material at a molding temperature for a first time period while the compressive force is applied, the first time period being sufficient to heat the precursor material to a softening temperature, removing the compressive force from the precursor material, and maintaining the cell structure of the precursor material in a collapsed state.

Abstract: Rubber in its uncured state is very tacky and rubber forms such as pellets, sheets, etc., tend to be hard to process due to the agglomeration and sticking of these rubber forms. Aspects of the invention use cured rubber powder as an anti-tack agent in a molding rubber mixture. In one aspect, the cured rubber powder has a particle size between 50 and 250 ?m in the uncured rubber forms, a diameter of between 1 and 10 mm, and a length of between 1 and 15 mm.

Abstract: A programming method for a memory device is provided. The memory device includes a first transistor, a memory cell string, and a second transistor which are electrically connected in series. The memory cell string includes a target memory cell, first and second peripheral memory cells adjacent to the target memory cell, and a plurality of non-target memory cells which are not adjacent to the target memory cell. The programming method includes following steps. The first transistor is turned on, and the second transistor is turned off. A pass voltage is applied to turn on the non-target memory cells, and an assistant voltage is applied to turn on the first and second peripheral memory cells. A programming voltage is applied to program the target memory cell. The assistant voltage is greater than the pass voltage and is less than the programming voltage.

Abstract: Rubber in its uncured state is very tacky and rubber forms such as pellets, sheets, etc., tend to be hard to process due to the agglomeration and sticking of these rubber forms. Aspects of the invention use cured rubber powder as an anti-tack agent in a molding rubber mixture. In one aspect, the cured rubber powder has a particle size between 50 and 250 ?m in the uncured rubber forms, a diameter of between 1 and 10 mm, and a length of between 1 and 15 mm.

Abstract: A non-volatile memory system includes a bit line and a plurality of memory cells associated with the bit line and coupled in a serial manner. The system further has a control circuitry in communication with the memory cells, wherein the control circuitry programs a target cell selected from the memory cells by applying a bit line voltage on the bit line in order to promote hot carrier injection into the target cell. The circuit also applies a programming voltage on the target cell under a hot carrier injection mechanism. Moreover, the circuit also applies a control voltage on a control cell, which is adjacent to the target cell when programming the target cell, wherein the control voltage is dependent on the threshold voltage of the control cell and the control voltage is less than the programming voltage.

Abstract: Provided is a memory device including a first dielectric layer, a T-shaped gate, two charge storage layers and two second dielectric layers. The first dielectric layer is disposed on a substrate. The T-shaped gate is disposed on the first dielectric layer and has an upper gate and a lower gate, wherein two gaps are present respectively at both sides of the lower gate and between the upper gate and the substrate. The charge storage layers are respectively embedded into the gaps. A second dielectric layer is disposed between each charge storage layer and the upper gate, between each charge storage layer and the lower gate and between each charge storage layer and the substrate.

Abstract: A memory device includes a plurality of memory cells arranged in series in the semiconductor body, such as a NAND string, having a plurality of word lines. A selected memory cell is programmed by hot carrier injection. The program operation is based on metering a flow of carriers between a first semiconductor body region on a first side of the selected cell in the NAND string and a second semiconductor body region on a second side of the selected cell. A program potential higher than a hot carrier injection barrier level is applied to the selected cell, and then the drain to source voltage across the selected cell and the flow of carriers in the selected cell reach a level sufficient to support hot carrier injection, which is controlled by a switch cell adjacent the selected cell.

Abstract: A method of programming a memory is provided. The memory has a first cell, having a first S/D region and a second S/D region shared with a second cell. The second cell has a third S/D region opposite to the second S/D region. When programming the first cell, a first voltage is applied to a control gate of the first cell, a second voltage is applied to a control gate of the second cell to slightly turn on a channel of the second cell, a third and a fourth voltage are respectively applied to the first and the third S/D regions, and the second S/D region is floating. A carrier flows from the third S/D region to the first S/D region, and is injected into a charge storage layer of the first cell by source-side injection.

Abstract: A memory device includes a plurality of memory cells arranged in series in the semiconductor body, such as a NAND string, having a plurality of word lines. A selected memory cell is programmed by hot carrier injection. The program operation is based on metering a flow of carriers between a first semiconductor body region on a first side of the selected cell in the NAND string and a second semiconductor body region on a second side of the selected cell. A program potential higher than a hot carrier injection barrier level is applied to the selected cell, and then the drain to source voltage across the selected cell and the flow of carriers in the selected cell reach a level sufficient to support hot carrier injection, which is controlled by a combination of a switch cell adjacent the selected cell and modulation of a source side voltage applied to the NAND string.

Abstract: A non-volatile memory system includes a bit line and a plurality of memory cells associated with the bit line and coupled in a serial manner. The system further has a control circuitry in communication with the memory cells, wherein the control circuitry programs a target cell selected from the memory cells by applying a bit line voltage on the bit line in order to promote hot carrier injection into the target cell. The circuit also applies a programming voltage on the target cell under a hot carrier injection mechanism. Moreover, the circuit also applies a control voltage on a control cell, which is adjacent to the target cell when programming the target cell, wherein the control voltage is dependant on the threshold voltage of the control cell and the control voltage is less than the programming voltage.

Abstract: Provided is a memory device including a first dielectric layer, a T-shaped gate, two charge storage layers and two second dielectric layers. The first dielectric layer is disposed on a substrate. The T-shaped gate is disposed on the first dielectric layer and has an upper gate and a lower gate, wherein two gaps are present respectively at both sides of the lower gate and between the upper gate and the substrate. The charge storage layers are respectively embedded into the gaps. A second dielectric layer is disposed between each charge storage layer and the upper gate, between each charge storage layer and the lower gate and between each charge storage layer and the substrate.

Abstract: A method for erasing a memory array is provided. The memory array comprises a plurality of memory cell strings, and each of the memory cell strings comprises a plurality of memory cells connected to a plurality of word lines. The method for erasing the memory array includes the following steps. A first voltage is applied to a substrate of the memory array. A second voltage is applied to a word line of a selected memory cell, and a plurality of passing voltages are applied to other word lines. And, a third voltage and a fourth voltage are respectively applied to a first source/drain region and a second source/drain region of the selected memory cell, so that a band to band (BTB) hot hole injecting method is induced to erase the specific memory cell, wherein the third voltage is not equal to the fourth voltage.

Abstract: A method for programming a memory array is provided. The memory array includes a memory cell string composed of a first transistor, a plurality of memory cells and a second transistor connected in series, and the method for programming the memory array includes following steps. In a setup phase, a switching memory cell in the memory cells is turned off, and a first voltage and a second voltage are applied to a first source/drain and a second source/drain of the switching memory cell. In a programming phase, a bit line connected to the memory cell string is floating, and a ramp signal is provided to a word line electrically connected to the switching memory cell.

Abstract: A method for programming a memory array is provided. The memory array includes a memory cell string composed of a first transistor, a plurality of memory cells and a second transistor connected in series, and the method for programming the memory array includes following steps. In a setup phase, a switching memory cell in the memory cells is turned off, and a first voltage and a second voltage are applied to a first source/drain and a second source/drain of the switching memory cell. In a programming phase, a bit line connected to the memory cell string is floating, and a ramp signal is provided to a word line electrically connected to the switching memory cell.

Abstract: A memory device includes a plurality of memory cells arranged in series in the semiconductor body, such as a NAND string, having a plurality of word lines. A selected memory cell is programmed by hot carrier injection. The program operation is based on metering a flow of carriers between a first semiconductor body region on a first side of the selected cell in the NAND string and a second semiconductor body region on a second side of the selected cell. A program potential higher than a hot carrier injection barrier level is applied to the selected cell, and then the drain to source voltage across the selected cell and the flow of carriers in the selected cell reach a level sufficient to support hot carrier injection, which is controlled by a combination of a switch cell adjacent the selected cell and modulation of a source side voltage applied to the NAND string.

Abstract: A method for erasing a memory array is provided. The memory array comprises a plurality of memory cell strings, and each of the memory cell strings comprises a plurality of memory cells connected to a plurality of word lines. The method for erasing the memory array includes the following steps. A first voltage is applied to a substrate of the memory array. A second voltage is applied to a word line of a selected memory cell, and a plurality of passing voltages are applied to other word lines. And, a third voltage and a fourth voltage are respectively applied to a first source/drain region and a second source/drain region of the selected memory cell, so that a band to band (BTB) hot hole injecting method is induced to erase the specific memory cell, wherein the third voltage is not equal to the fourth voltage.

Abstract: A method of programming a memory is provided. The memory has a first cell, having a first S/D region and a second S/D region shared with a second cell. The second cell has a third S/D region opposite to the second S/D region. When programming the first cell, a first voltage is applied to a control gate of the first cell, a second voltage is applied to a control gate of the second cell to slightly turn on a channel of the second cell, a third and a fourth voltage are respectively applied to the first and the third S/D regions, and the second S/D region is floating. A carrier flows from the third S/D region to the first S/D region, and is injected into a charge storage layer of the first cell by source-side injection.