Patents by Inventor PO-WEI WANG

PO-WEI WANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12237398
    Abstract: A method for fabricating semiconductor device includes the steps of: forming a gate structure on a substrate; forming a first spacer adjacent to the gate structure, wherein the first spacer comprises silicon carbon nitride (SiCN); forming a second spacer adjacent to the first spacer, wherein the second spacer comprises silicon oxycarbonitride (SiOCN); and forming a source/drain region adjacent to two sides of the second spacer.
    Type: Grant
    Filed: June 4, 2021
    Date of Patent: February 25, 2025
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Chia-Ming Kuo, Po-Jen Chuang, Yu-Ren Wang, Ying-Wei Yen, Fu-Jung Chuang, Ya-Yin Hsiao, Nan-Yuan Huang
  • Patent number: 12237400
    Abstract: A method of forming a semiconductor device includes: forming a semiconductor structure having source/drain regions, a fin disposed between the source/drain regions, and a dummy gate disposed on the fin and surrounded by a spacer; removing the dummy gate to form a gate trench which is defined by a trench-defining wall; forming a gate dielectric layer on the trench-defining wall; forming a work function structure on the gate dielectric layer; forming a resist layer to fill the gate trench; removing a top portion of the resist layer; removing the work function structure exposed from the resist layer using a wet chemical etchant; removing the resist layer; and forming a conductive gate in the gate trench.
    Type: Grant
    Filed: April 6, 2022
    Date of Patent: February 25, 2025
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chieh-Wei Chen, Jian-Jou Lian, Tzu-Ang Chiang, Po-Yuan Wang, Yu-Shih Wang, Chun-Neng Lin, Ming-Hsi Yeh
  • Patent number: 12232425
    Abstract: A magnetoresistive random access memory (MRAM) device includes a first array region and a second array region on a substrate, a first magnetic tunneling junction (MTJ) on the first array region, a first top electrode on the first MTJ, a second MTJ on the second array region, and a second top electrode on the second MTJ. Preferably, the first top electrode and the second top electrode include different nitrogen to titanium (N/Ti) ratios.
    Type: Grant
    Filed: November 21, 2023
    Date of Patent: February 18, 2025
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Hui-Lin Wang, Si-Han Tsai, Dong-Ming Wu, Chen-Yi Weng, Ching-Hua Hsu, Ju-Chun Fan, Yi-Yu Lin, Che-Wei Chang, Po-Kai Hsu, Jing-Yin Jhang
  • Publication number: 20250054119
    Abstract: A HDR tone mapping system includes several modules. A semantic segmentation module is used to extract semantic information from the input image. An image decomposition module is used to decompose the input image to a high-bit base layer and a detail layer. A statistics module is used to generate statistics of pixels of the input image according to the semantic information. A curve computation module is used to generate a tone curve from the statistics. A compression module is used to compress the high-bit base layer to a low-bit base layer according to the tone curve, the statistics and the semantic information. A detail adjustment module is used to tune the detail layer according to the semantic information and the statistics to generate an adjusted detail layer. An image reconstruction module is used to combine the adjusted detail layer and the low-bit base layer to generate an output image.
    Type: Application
    Filed: August 10, 2023
    Publication date: February 13, 2025
    Applicant: MEDIATEK INC.
    Inventors: Huei-Han Jhuang, Jan-Wei Wang, Po-Yu Huang, Ying-Jui Chen, Chi-Cheng Ju
  • Publication number: 20250048649
    Abstract: A semiconductor device includes a sense amplifier, a first magnetic tunneling junction (MTJ) connected to the sense amplifier at a first distance, a second MTJ connected to the sense amplifier at a second distance, and a third MTJ connected to the sense amplifier at a third distance. Preferably, the first distance is less than the second distance, the second distance is less than the third distance, a critical dimension of the first MTJ is less than a critical dimension of the second MTJ, and the critical dimension of the second MTJ is less than a critical dimension of the third MTJ.
    Type: Application
    Filed: October 17, 2024
    Publication date: February 6, 2025
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Po-Wei Wang, Yi-An Shih, Huan-Chi Ma
  • Patent number: 12215872
    Abstract: There is provided an auto detection system including a thermal detection device and a host. The host controls an indication device to indicate a prompt message or detection results according to a slope variation of voltage values or 2D distribution of temperature values detected by the thermal detection device, wherein the voltage values include the detected voltage of a single pixel or the sum of detected voltages of multiple pixels of a thermal sensor.
    Type: Grant
    Filed: July 20, 2023
    Date of Patent: February 4, 2025
    Assignee: PIXART IMAGING INC.
    Inventors: Chih-Ming Sun, Ming-Han Tsai, Chiung-Wen Lin, Po-Wei Yu, Wei-Ming Wang, Sen-Huang Huang
  • Publication number: 20250021005
    Abstract: A method for extreme ultraviolet (EUV) lithography includes generating target droplets and using a first laser source to generate laser pulses to heat the target droplets to generate extreme ultraviolet (EUV) light and a plurality of particles. The method also includes using a supplemental laser source to generate laser pulses to ionize the plurality of particles, applying a magnetic field to direct ionized particles to debris collection device, and capturing the ionized particles by the debris collection device.
    Type: Application
    Filed: July 12, 2023
    Publication date: January 16, 2025
    Inventors: Chia-Wei Wang, Po-Ming Shih
  • Publication number: 20240413233
    Abstract: A GaN-based semiconductor device includes a substrate; a GaN channel layer disposed on the substrate; a AlGaN layer disposed on the GaN channel layer; a p-GaN gate layer disposed on the AlGaN layer; and a nitrogen-rich TiN hard mask layer disposed on the p-GaN gate layer. The nitrogen-rich TiN hard mask layer has a nitrogen-to-titanium (N/Ti) ratio that is greater than 1.0. A gate electrode layer is disposed on the nitrogen-rich TiN hard mask layer.
    Type: Application
    Filed: July 13, 2023
    Publication date: December 12, 2024
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Yi-Chuan Chen, Po-Wei Wang, Huan-Chi Ma, Chien-Wen Yu
  • Patent number: 12156408
    Abstract: A semiconductor device includes a sense amplifier, a first magnetic tunneling junction (MTJ) connected to the sense amplifier at a first distance, a second MTJ connected to the sense amplifier at a second distance, and a third MTJ connected to the sense amplifier at a third distance. Preferably, the first distance is less than the second distance, the second distance is less than the third distance, a critical dimension of the first MTJ is less than a critical dimension of the second MTJ, and the critical dimension of the second MTJ is less than a critical dimension of the third MTJ.
    Type: Grant
    Filed: November 21, 2023
    Date of Patent: November 26, 2024
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Po-Wei Wang, Yi-An Shih, Huan-Chi Ma
  • Publication number: 20240376592
    Abstract: A physical vapor deposition (PVD) system is provided. The PVD system includes a PVD chamber defining a PVD volume within which a target material of a target is deposited onto a wafer. The PVD system includes the target in the PVD chamber. The target is configured to overlie the wafer. An edge of the target extends from a first surface of the target to a second surface of the target, opposite the first surface of the target. A first portion of the edge of the target has a first surface roughness. The first portion of the edge of the target extends at most about 6 millimeters from the first surface of the target to a second portion of the edge of the target. The second portion of the edge of the target has a second surface roughness less than the first surface roughness.
    Type: Application
    Filed: July 25, 2024
    Publication date: November 14, 2024
    Inventors: Sheng-Ying WU, Ming-Hsien LIN, Po-Wei WANG, Hsiao-Feng LU
  • Publication number: 20240371626
    Abstract: A method, comprising: providing an adjustable distributor assembly disposed within a showerhead configured to provide selectively adjustable openings through which a cleaning material passes; determining an initial value of a configurable parameter of an adjustable distributor assembly; performing an amount/thickness measurement of a layer including polymeric residues and metal oxide deposits at a cleaning surface of a wafer by a monitoring device; determining whether a variation in the amount/thickness measurement is within an acceptable range; and in response to the variation in the amount/thickness measurement that is not within the acceptable range, automatically adjusting the configurable parameter of the adjustable distributor assembly to set the variation in the amount/thickness measurement within the acceptable range so that the cleaning material that passes through the selectively adjustable openings of the adjustable distributor assembly reduces metal oxide deposits.
    Type: Application
    Filed: July 15, 2024
    Publication date: November 7, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Po-Wei WANG, Chao-Hsing LAI, Hsiao-Feng LU
  • Patent number: 12080545
    Abstract: A method, comprising: providing an adjustable distributor assembly disposed within a showerhead configured to provide selectively adjustable openings through which a cleaning material passes; determining an initial value of a configurable parameter of an adjustable distributor assembly; performing an amount/thickness measurement of a layer including polymeric residues and metal oxide deposits at a cleaning surface of a wafer by a monitoring device; determining whether a variation in the amount/thickness measurement is within an acceptable range; and in response to the variation in the amount/thickness measurement that is not within the acceptable range, automatically adjusting the configurable parameter of the adjustable distributor assembly to set the variation in the amount/thickness measurement within the acceptable range so that the cleaning material that passes through the selectively adjustable openings of the adjustable distributor assembly reduces metal oxide deposits.
    Type: Grant
    Filed: July 31, 2023
    Date of Patent: September 3, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Po-Wei Wang, Chao-Hsing Lai, Hsiao-Feng Lu
  • Publication number: 20240183025
    Abstract: Embodiments of the present disclosure provide a substrate processing system. In one embodiment, the system includes a chamber, a target disposed within the chamber, a magnetron disposed proximate the target, a pedestal disposed within the chamber, and a first gas injector disposed at a sidewall of the chamber. The first gas injector includes a first gas channel extending through a body of the first gas injector, the first gas channel has a first gas outlet. The first gas injector also includes a second gas channel extending through the body of the first gas injector, wherein the second gas channel has a second gas outlet. The second gas channel includes a first portion, and a second portion branching off from an end of the first portion, wherein the second portion is disposed at an angle with respect to the first portion, and the first gas injector is operable to rotate about a longitudinal center axis of the body of the first gas injector.
    Type: Application
    Filed: January 5, 2024
    Publication date: June 6, 2024
    Inventors: Po-Wei WANG, Chao-Hsing LAI
  • Publication number: 20240090233
    Abstract: A semiconductor device includes a sense amplifier, a first magnetic tunneling junction (MTJ) connected to the sense amplifier at a first distance, a second MTJ connected to the sense amplifier at a second distance, and a third MTJ connected to the sense amplifier at a third distance. Preferably, the first distance is less than the second distance, the second distance is less than the third distance, a critical dimension of the first MTJ is less than a critical dimension of the second MTJ, and the critical dimension of the second MTJ is less than a critical dimension of the third MTJ.
    Type: Application
    Filed: November 21, 2023
    Publication date: March 14, 2024
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Po-Wei Wang, Yi-An Shih, Huan-Chi Ma
  • Patent number: 11885008
    Abstract: Embodiments of the present disclosure provide a substrate processing system. In one embodiment, the system includes a chamber, a target disposed within the chamber, a magnetron disposed proximate the target, a pedestal disposed within the chamber, and a first gas injector disposed at a sidewall of the chamber. The first gas injector includes a first gas channel extending through a body of the first gas injector, the first gas channel has a first gas outlet. The first gas injector also includes a second gas channel extending through the body of the first gas injector, wherein the second gas channel has a second gas outlet. The second gas channel includes a first portion, and a second portion branching off from an end of the first portion, wherein the second portion is disposed at an angle with respect to the first portion, and the first gas injector is operable to rotate about a longitudinal center axis of the body of the first gas injector.
    Type: Grant
    Filed: February 13, 2023
    Date of Patent: January 30, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Po-Wei Wang, Chao-Hsing Lai
  • Patent number: 11871585
    Abstract: A semiconductor device includes a sense amplifier, a first magnetic tunneling junction (MTJ) connected to the sense amplifier at a first distance, a second MTJ connected to the sense amplifier at a second distance, and a third MTJ connected to the sense amplifier at a third distance. Preferably, the first distance is less than the second distance, the second distance is less than the third distance, a critical dimension of the first MTJ is less than a critical dimension of the second MTJ, and the critical dimension of the second MTJ is less than a critical dimension of the third MTJ.
    Type: Grant
    Filed: July 29, 2021
    Date of Patent: January 9, 2024
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Po-Wei Wang, Yi-An Shih, Huan-Chi Ma
  • Publication number: 20230377871
    Abstract: A method, comprising: providing an adjustable distributor assembly disposed within a showerhead configured to provide selectively adjustable openings through which a cleaning material passes; determining an initial value of a configurable parameter of an adjustable distributor assembly; performing an amount/thickness measurement of a layer including polymeric residues and metal oxide deposits at a cleaning surface of a wafer by a monitoring device; determining whether a variation in the amount/thickness measurement is within an acceptable range; and in response to the variation in the amount/thickness measurement that is not within the acceptable range, automatically adjusting the configurable parameter of the adjustable distributor assembly to set the variation in the amount/thickness measurement within the acceptable range so that the cleaning material that passes through the selectively adjustable openings of the adjustable distributor assembly reduces metal oxide deposits.
    Type: Application
    Filed: July 31, 2023
    Publication date: November 23, 2023
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Po-Wei WANG, Chao-Hsing LAI, Hsiao-Feng LU
  • Patent number: 11769659
    Abstract: A device for cleaning a wafer in a semiconductor manufacturing apparatus includes a showerhead and an adjustable distributor assembly. The showerhead is disposed over a wafer stage within a cleaning chamber and configured to eject cleaning material through the showerhead towards a cleaning surface of a wafer. The adjustable distributor assembly is disposed within the showerhead through which the cleaning material passes. The adjustable distributor assembly includes a base sheet and a plurality of control sheets. The base sheet includes base openings, and the plurality of control sheets include control openings and are configured to slidably mate with the base sheet to provide selectively adjustable openings.
    Type: Grant
    Filed: August 27, 2021
    Date of Patent: September 26, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Po-Wei Wang, Chao-Hsing Lai, Hsiao-Feng Lu
  • Patent number: 11748627
    Abstract: A system for applying a neural network to an input instance. The neural network includes an optimization layer for determining values of one or more output neurons from values of one or more input neurons by a joint optimization parametrized by one or more parameters. An input instance is obtained. The values of the one or more input neurons to the optimization layer are obtained and input vectors for the one or more input neurons are determined therefrom. Output vectors for the one or more output neurons are computed from the determined input vectors by jointly optimizing at least the output vectors with respect to the input vectors to solve a semidefinite program defined by the one or more parameters. The values of the one or more output neurons are determined from the respective computed output vectors.
    Type: Grant
    Filed: May 12, 2020
    Date of Patent: September 5, 2023
    Assignees: ROBERT BOSCH GMBH, CARNEGIE MELLON UNIVERSITY
    Inventors: Csaba Domokos, Jeremy Zieg Kolter, Po-Wei Wang, Priya L. Donti
  • Patent number: 11699076
    Abstract: A system and computer implemented method for learning rules from a data base including entities and relations between the entities, wherein an entity is either a constant or a numerical value, and a relation between a constant and a numerical value is a numerical relation and a relation between two constants is a non-numerical relation. The method includes: deriving aggregate values from said numerical and/or non-numerical relations; deriving non-numerical relations from said aggregate values; adding said derived non-numerical relations to the data base; constructing differentiable operators, wherein a differentiable operator refers to a non-numerical or a derived non-numerical relation of the data base, and extracting rules from said differentiable operators.
    Type: Grant
    Filed: August 14, 2020
    Date of Patent: July 11, 2023
    Assignees: ROBERT BOSCH GMBH, CARNEGIE MELLON UNIVERSITY
    Inventors: Csaba Domokos, Daria Stepanova, Jeremy Zieg Kolter, Po-Wei Wang