Abstract: A semiconductor device emitting light about a predetermined wavelength comprising a structure comprising a plurality of layers, sometimes referred to as a stack, providing low resistance, high reflectivity and ohmic contacts to at least one semiconductor material.

Abstract: An etching step is performed on an LED/substrate wafer to etch through the LED epitaxial layers entirely around each LED on the substrate wafer to form a gap between each LED on the wafer. The substrate is not etched. When the LEDs/substrates are singulated, edges of each substrate extend beyond edges of the LED die. The LEDs are flip-chips and are mounted on a submount with the LED die between the submount and the substrate. An insulating underfill material is injected under the LED die and also covers the sides of the LED die and “enlarged” substrate. The substrate is then removed by laser lift-off. The raised walls of the underfill that were along the edges of the enlarged substrate are laterally spaced from the edges of the LED die so that a phosphor plate can be easily positioned on top to the LED die with a relaxed positioning tolerance.

Abstract: An optical microscanning system for selectively emitting a highly coherent, collimated, and monochromatic beam of light (122) in a desired trajectory and selectively redirecting the trajectory within a scan field. The system includes a fixed light source (112) of substantially coherent, collimated, and monochromatic light (118) and an optically pumped light source (120) of highly coherent, collimated, and monochromatic light (122). The optically pumped light source (120) is optically pumped by the fixed light source (112). The optically pumped light source (120) can selectively redirect its light output (122). Also, a method of manufacturing such an optical microscanning system. A cavity is etched (156) in a base substrate. Two electrodes are provided (158) at the cavity floor. A second layer is provided (160) over the mouth of the cavity. A mirror layer is bonded (162) onto the second layer. Spacers are etched (164) through the mirror layer and second layer to define a substrate section (165).