Abstract: A driver metal-oxide-semiconductor field-effect transistor DrMOS, an integrated circuit, an electronic device, and a preparation method are provided. The DrMOS mainly includes a first die and a second die. The first die includes a drive circuit and a first switching transistor, and the drive circuit is connected to a gate of the first switching transistor. The second die includes a second switching transistor, and the drive circuit is connected to a gate of the second switching transistor through a first conductor. The drive circuit and the first switching transistor are prepared in a same die. This helps to reduce an area, loss, and costs of the DrMOS. The first switching transistor and the second switching transistor are prepared in different dies that reduces type selection limitation.

Abstract: Methods, systems, and computer software are disclosed for determining a mask pattern for use with a lithographic process. One method includes assigning locations of two-dimensional elements based on a target pattern, associating the two-dimensional elements based on association criteria to form a cluster that represents a mask feature, and adjusting the two-dimensional elements of the cluster to vary the mask feature.

Abstract: Vehicles and related systems and methods are provided for controlling a vehicle in an autonomous operating mode. One method involves obtaining navigation information for a route for the vehicle from a navigation system, transforming the navigation information into data points defining an upcoming trajectory of the route, mapping the data points to a corresponding mapped set of lane segments encompassing one or more of the data points, assigning lane preference indicia to the mapped set of lane segments, and autonomously operating one or more actuators onboard the vehicle to laterally maneuver the vehicle into one or more lanes at respective longitudinal positions along the route corresponding to one or more lane segments of the mapped set of lane segments in a manner that is influenced by the lane preference indicia assigned to the lane segments.

Abstract: Substrate processing systems and methods include selectively activatable remote computer access having lockout and/or tagout controls and/or features. Such substrate processing systems may include: (a) a first network switch including an input port and an output port; (b) a second network switch including an input/output port directly or indirectly connected with the first switch output port; (c) a lockable key switch provided in a power supply line and movable between OFF and ON positions; and (d) a key for moving the key switch between ON and OFF. When ON, an electrical circuit for supplying power to the first network switch and/or second network switch is completed, enabling remote computer control of the substrate processing system. When OFF, an electrical circuit for supplying power to the first network switch and/or second network switch is interrupted, thereby disabling remote computer control. The key can only be removed when in the OFF position.

Abstract: A system and a method is provided for assessing motion of a biological tissue of a subject including one or more superficial biological layers and a targeted biological layer. A perturbation unit provide an optical perturbation to the one or more superficial biological layers. An optical signal generator transmits optical signals at one or more near-infrared wavelengths. An optical signal receiver acquires a set of optical signal data preceding, during, or following the optical perturbation at a first acquisition time relative to the optical perturbation. A signal processor determines, using the set of optical signal data, a set of optical characteristics and separates, using the set of optical characteristics, a target optical signal. The signal processor generates a report indicative of a movement of the targeted biological tissue within the subject. The movement of the targeted biological layer is calculated using the target optical signal.

Abstract: The present disclosure provides a semiconductor device and a manufacturing method thereof, as well as a memory system. The semiconductor device includes a first semiconductor structure comprising a first well region and transistors in the first well region, and a second semiconductor structure bonded with the first semiconductor structure and including a second well region, and fin field effect transistors in the second well region. Each fin field effect transistor includes a fin structure, a gate oxide layer in contact with a top surface and side surfaces of the fin structure, and a gate layer covering the gate oxide layer.

Abstract: A multi-focus histotripsy method based on a pulsed ultrasound phased array with hundred elements is provided. Excitation amplitude and phase of individual elements are regulated to control a phased array to produce multiple focus modes. A two-stage histotripsy is performed based on these focus modes. In a first stage, a first pulsed ultrasound is applied to an experimental sample in a target area to induce generation of cavitation microbubbles and boiling bubbles to preliminarily homogenize the experimental sample to form a loose product; and in a second stage, the experimental sample is mechanically disrupted and homogenized using a second pulsed ultrasound. The first pulsed ultrasound and the second pulsed ultrasound each are a hundred micro-second pulse or a milli-second pulse. Duty cycles of the first pulsed ultrasound and the second pulsed ultrasound are 3-10% and less than 2%, respectively. A multi-focus histotripsy system is further provided.

Abstract: A distributed storage system includes table controllers collectively storing partitions of a logical table having multiple rows. For each of the partitions, a corresponding table controller stores a subset of the rows of the logical table across individual pages. A management controller updates a schema of the logical table from a first to a second schema definition by, for each of the partitions, sending an update command indicating the second schema definition to the corresponding table controller. The first table controller corresponds to a first partition that includes a first subset of the rows. The first table controller, prior to receiving the update command, includes an identifier of the first schema definition within each page of data for the first subset. Subsequent to receiving the update command, the first table controller, when writing each new page of data for the first subset, includes an identifier of the second schema definition.

Abstract: Examples of the present application provide a semiconductor device, a fabrication method thereof, a 3D memory and a memory device, wherein the semiconductor device includes: a substrate including first fins and second fins; a first gate oxide layer disposed on the first fins; a second gate oxide layer disposed on the second fins, wherein the sum of the thicknesses of the first fin and the first gate oxide layer is less than or equal to the sum of the thicknesses of the second fin and the second gate oxide layer; and a gate layer disposed on the first gate oxide layer and the second gate oxide layer. In the way described above, difficulty of etching process is reduced and yield and performance of products are improved.

Abstract: An alloy composed of two types of elements, wherein all the standard deviation of distribution in the alloy of each element constituting the alloy are 18 atomic % or less provides a novel alloy composed of three or more types of elements and having a high solid solution uniformity.

Abstract: The present disclosure provides a collagen and sodium hyaluronate cross-linked composite filler for injection and a preparation method thereof. The collagen and sodium hyaluronate cross-linked composite filler is obtained by a cross-linking reaction of collagen and sodium hyaluronate with a 1-(3-dimethylaminopropyl)-3-ethylcarbodiimide hydrochloride/N-hydroxysuccinimide (EDC/NHS) cross-linking system. As the EDC/NHS is used as a cross-linking agent in the present disclosure, the resulting product has no biological toxicity, so that the injury caused by a final product to an injection site and the human body is reduced. Meanwhile, due to intramolecular and intermolecular cross-linking, the degradation rate of the collagen and the sodium hyaluronate is reduced, and the retention time of the two in the body is prolonged. Therefore, the collagen and sodium hyaluronate cross-linked composite filler for injection in the present disclosure can be used in plastic surgery in the medical industry.

Abstract: A semiconductor device fabrication method includes providing a processing wafer including a plurality of semiconductor mesas at least partially surrounded by a dielectric layer, performing a first etching to remove a first portion of the dielectric layer in a first region to form a first recess and a second portion of the dielectric layer in a second region to form a second recess, and performing a second etching to deepen the first recess. A first mesa of the plurality of semiconductor mesas is in the first region, and a second mesa of the plurality of semiconductor mesas is in the second region.

Abstract: Vehicles and related systems and methods are provided for controlling a vehicle in an autonomous operating mode. One method involves obtaining navigation information for a route for the vehicle from a navigation system, transforming the navigation information into data points defining an upcoming trajectory of the route, mapping the data points to a corresponding mapped set of lane segments encompassing one or more of the data points, assigning lane preference indicia to the mapped set of lane segments, and autonomously operating one or more actuators onboard the vehicle to laterally maneuver the vehicle into one or more lanes at respective longitudinal positions along the route corresponding to one or more lane segments of the mapped set of lane segments in a manner that is influenced by the lane preference indicia assigned to the lane segments.

Abstract: The present disclosure provides an example semiconductor devices and fabrication methods thereof, and memory systems. In one example, the semiconductor device includes: a first chip including a first type of transistor that is planar transistor and a second chip bound on the first chip in the first direction. The second chip includes a second type of transistor that is fin transistor. The semiconductor device and the fabrication method thereof, and the memory system provided in the present disclosure can mitigate the bulk effect between transistors in adjacent two chips. Other examples are disclosed.

Abstract: An information handling system may include at least one processor and a memory. The information handling system may be configured to maintain a plurality of folders in a central management system, wherein each folder is a data structure having one or more hosts associated therewith; and in response to an instruction to move a particular host from a first folder to a second folder: un-associate the particular host from the first folder; associate the particular host with the second folder; and transmit a notification regarding the movement to a local management system of a satellite information handling system; wherein the local management system is configured to update a local data structure regarding the movement.

Abstract: A method for determining a patterning device pattern. The method includes obtaining (i) an initial patterning device pattern having at least one feature, and (ii) a desired feature size of the at least one feature, obtaining, based on a patterning process model, the initial patterning device pattern and a target pattern for a substrate, a difference value between a predicted pattern of the substrate image by the initial patterning device and the target pattern for the substrate, determining a penalty value related the manufacturability of the at least one feature, wherein the penalty value varies as a function of the size of the at least one feature, and determining the patterning device pattern based on the initial patterning device pattern and the desired feature size such that a sum of the difference value and the penalty value is reduced.

Abstract: Described are embodiments for generating a post-optical proximity correction (OPC) result for a mask using a target pattern and reference layer patterns. Images of the target pattern and reference layers are provided as an input to a machine learning (ML) model to generate a post-OPC image. The images may be input separately or combined into a composite image (e.g., using a linear function) and input to the ML model. The images are rendered from pattern data. For example, a target pattern image is rendered from a target pattern to be printed on a substrate, and a reference layer image such as dummy pattern image is rendered from dummy pattern. The ML model is trained to generate the post-OPC image using multiple images associated with target patterns and reference layers, and using a reference post-OPC image of the target pattern. The post-OPC image may be used to generate a post-OPC mask.

Abstract: A system and a method is provided for assessing motion of a biological tissue of a subject including one or more superficial biological layers and a targeted biological layer. A perturbation unit provide an optical perturbation to the one or more superficial biological layers. An optical signal generator transmits optical signals at one or more near-infrared wavelengths. An optical signal receiver acquires a set of optical signal data preceding, during, or following the optical perturbation at a first acquisition time relative to the optical perturbation. A signal processor determines, using the set of optical signal data, a set of optical characteristics and separates, using the set of optical characteristics, a target optical signal. The signal processor generates a report indicative of a movement of the targeted biological tissue within the subject. The movement of the targeted biological layer is calculated using the target optical signal.

Abstract: A method for generating a mask pattern to be employed in a patterning process. The method including obtaining (i) a first feature patch including a first polygon portion of an initial mask pattern, and (ii) a second feature patch including a second polygon portion of the initial mask pattern; adjusting the second polygon portion at a patch boundary between the first feature patch and the second feature patch such that a difference between the first polygon portion and the second polygon portion at the patch boundary is reduced; and combining the first polygon portion and the adjusted second polygon portion at the patch boundary to form the mask pattern.