Patents by Inventor Raj Sakamuri

Raj Sakamuri has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof
    Publication number: 20050202351
    Abstract: The present invention relates to a process for imaging deep ultraviolet (uv) photoresists with a topcoat using deep uv immersion lithography. The invention further relates to a topcoat composition comprising a polymer with at least one ionizable group having a pKa ranging from about ?9 to about 11.
    Type: Application
    Filed: March 9, 2004
    Publication date: September 15, 2005
    Inventors: Francis Houlihan, Ralph Dammel, Andrew Romano, Raj Sakamuri
  • Photoresist composition for deep ultraviolet lithography
    Publication number: 20040166434
    Abstract: The present invention relates to a photoresist composition comprising a photoacid generator and at least one novel polymer comprising at least one unit as described by structure 1, 1
    Type: Application
    Filed: February 21, 2003
    Publication date: August 26, 2004
    Inventors: Ralph R. Dammel, Raj Sakamuri, Frank Houlihan
  • Photoresist composition for deep ultraviolet lithography
    Publication number: 20040166433
    Abstract: The present invention relates to a photoresist composition comprising a photoacid generator and at least one polymer comprising at least one unit as described by structure 1, 1
    Type: Application
    Filed: December 17, 2003
    Publication date: August 26, 2004
    Inventors: Ralph R. Dammel, Raj Sakamuri
  • Photoresist composition for deep ultraviolet lithography
    Patent number: 6737215
    Abstract: The present invention relates to a photoresist composition sensitive in the deep ultraviolet region and a method of processing the photoresist, where the photoresist comprises a novel copolymer, a photoactive component, and a solvent. The novel copolymer comprises a unit derived from an ethylenically unsaturated compound containing at least one cyano functionality and a unit derived from an unsaturated cyclic non aromatic compound.
    Type: Grant
    Filed: May 11, 2001
    Date of Patent: May 18, 2004
    Assignee: Clariant Finance (BVI) Ltd
    Inventors: Ralph R. Dammel, Raj Sakamuri
  • Polymer suitable for photoresist compositions
    Patent number: 6686429
    Abstract: The present invention relates to a novel polymer comprising at least one unit derived from an ethylenically unsaturated compound containing at least one cyano functionality and at least one nonaromatic cyclic unit. The novel polymer is particularly useful when used in a photoresist composition sensitive in the deep ultraviolet region.
    Type: Grant
    Filed: May 11, 2001
    Date of Patent: February 3, 2004
    Assignee: Clariant Finance (BVI) Limited
    Inventors: Ralph R. Dammel, Raj Sakamuri
  • Process for producing an image using a first minimum bottom antireflective coating composition
    Publication number: 20030129547
    Abstract: Disclosed is a process for forming an image on a substrate, comprising the steps of: (a) coating on the substrate a first layer of a radiation sensitive, antireflective composition; (b) coating a second layer of a photoresist composition onto the first layer of the antireflective composition; (c) selectively exposing the coated substrate from step (b) to actinic radiation; and (d) developing the exposed coated substrate from step (c) to form an image; wherein both the photoresist composition and the antireflective composition are exposed in step (c); both are developed in step (d) using a single developer; wherein the antireflective composition of step (a) is a first minimum bottom antireflective coating (B.A.R.C.
    Type: Application
    Filed: January 9, 2002
    Publication date: July 10, 2003
    Inventors: Mark O. Neisser, Joseph E. Oberlander, Medhat A. Toukhy, Raj Sakamuri, Shuji Ding-Lee
  • NOVEL POLYMER SUITABLE FOR PHOTORESIST COMPOSITIONS
    Publication number: 20030013831
    Abstract: The present invention relates to a novel polymer comprising at least one unit derived from an ethylenically unsaturated compound containing at least one cyano functionality and at least one nonaromatic cyclic unit. The novel polymer is particularly useful when used in a photoresist composition sensitive in the deep ultraviolet region.
    Type: Application
    Filed: May 11, 2001
    Publication date: January 16, 2003
    Inventors: Ralph R. Dammel, Raj Sakamuri
  • Photoresist composition for deep ultraviolet lithography
    Publication number: 20020187419
    Abstract: The present invention relates to a novel photoresist composition sensitive in the deep ultraviolet region and a method of processing the novel photoresist, where the photoresist comprises a novel copolymer, a photoactive component, and a solvent. The novel copolymer comprises a unit derived from an ethylenically unsaturated compound containing at least one cyano functionality and a unit derived from an unsaturated cyclic non aromatic compound.
    Type: Application
    Filed: May 11, 2001
    Publication date: December 12, 2002
    Inventors: Ralph R. Dammel, Raj Sakamuri
  • Polymer suitable for photoresist compositions
    Patent number: 6486282
    Abstract: The present invention relates to a novel polymer comprising at least one unit derived from an ethylenically unsaturated compound containing at least one cyano functionality and at least one nonaromatic cyclic unit. The novel polymer is particularly useful when used in a photoresist composition sensitive in the deep ultraviolet region.
    Type: Grant
    Filed: May 11, 2001
    Date of Patent: November 26, 2002
    Assignee: Clariant Finance (BVI) Limited
    Inventors: Ralph R. Dammel, Raj Sakamuri