Abstract: A method of forming a semiconductor structure includes forming a fin cut mask over a region in a fin field-effect transistor (finFET) structure. The finFET structure includes one or more fins and one or more gates and source/drain regions formed over the one or more fins in active regions of the finFET structure. The method also includes performing a fin cut by removing a portion of at least one fin. The portion of the at least one fin is determined by an exposed area of the fin cut mask. The exposed area of the fin cut mask includes at least a portion of the at least one fin between a first dummy gate and a second dummy gate formed over the at least one fin. The method further includes removing the fin cut mask and depositing an oxide to replace the portion of the at least one fin removed during the fin cut.

Abstract: A method of fabricating a vertical field effect transistor comprising that includes forming openings through a spacer material to provide fin structure openings to a first semiconductor material, and forming an inner spacer liner on sidewalls of the fin structure openings. A channel semiconductor material is epitaxially formed on a surface of the first semiconductor material filling at least a portion of the fin structure openings. The spacer material is recessed with an etch that is selective to the inner spacer liner to form a first spacer. The inner spacer liner is removed selectively to the channel semiconductor material. A gate structure on the channel semiconductor material, and a second semiconductor material is formed in contact with the channel semiconductor material.

Abstract: A structure comprises a first channel region forming an n-channel device; a second channel region forming a p-channel device, the p-channel device being stacked with the n-channel device in a vertical orientation; a gate positioned around the stacked n-channel device and p-channel device; and at least one source region and at least one drain region extending from each of the n-channel device and the p-channel device. Each of the at least one source region and the at least one drain region within the stacked n-channel device and p-channel device are independently contacted.

Abstract: A method of forming a power rail to semiconductor devices comprising removing a portion of the gate structure forming a gate cut trench separating a first active region of fin structures from a second active region of fin structures. A conformal etch stop layer is formed in the gate cut trench. A fill material is formed on the conformal etch stop layer filling at least a portion of the gate cut trench. The fill material has a composition that is etched selectively to the conformal etch stop layer. A power rail is formed in the gate cut trench. The conformal etch stop layer obstructs lateral etching during forming the power rail to substantially eliminate power rail to gate structure shorting.

Abstract: An additive core subtractive liner method is described for forming electrically conductive contacts. The method can include forming a first trench in an first dielectric layer to expose a first portion of a metal liner, and filling said first trench with a second dielectric layer. A metal cut trench is formed in the second dielectric layer. A portion of the metal liner exposed by the metal cut trench is removed with a subtractive method.

Abstract: An additive core subtractive liner method is described for forming electrically conductive contacts. The method can include forming a first trench in an first dielectric layer to expose a first portion of a metal liner, and filling said first trench with a second dielectric layer. A metal cut trench is formed in the second dielectric layer. A portion of the metal liner exposed by the metal cut trench is removed with a subtractive method.

Abstract: A method for fabricating a semiconductor device includes accessing source/drain regions (S/D) in an n-type field effect transistor (NFET) region and in a p-type field effect transistor (PFET) region. First alloy elements are implanted in the S/D regions in the NFET region, and second alloy elements are implanted in the PFET region with the NFET region blocked. The first and second alloy elements form respective amorphized layers on the S/D regions in respective NFET and PFET regions. The amorphized layers are recrystallized to form metastable recrystallized interfaces using an epitaxy process wherein the metastable recrystallized interfaces formed in respective NFET and PFET regions exceed solubility of the first and second alloy elements in respective materials of the S/D regions in the NFET and PFET regions. Contacts to the metastable recrystallized layers of the S/D regions in the NFET and PFET regions are concurrently formed.

Abstract: A method for fabricating a semiconductor device includes accessing source/drain regions (S/D) in an n-type field effect transistor (NFET) region and in a p-type field effect transistor (PFET) region. First alloy elements are implanted in the S/D regions in the NFET region, and second alloy elements are implanted in the PFET region with the NFET region blocked. The first and second alloy elements form respective amorphized layers on the S/D regions in respective NFET and PFET regions. The amorphized layers are recrystallized to form metastable recrystallized interfaces using an epitaxy process wherein the metastable recrystallized interfaces formed in respective NFET and PFET regions exceed solubility of the first and second alloy elements in respective materials of the S/D regions in the NFET and PFET regions. Contacts to the metastable recrystallized layers of the S/D regions in the NFET and PFET regions are concurrently formed.

Abstract: Embodiments are directed to a method and resulting structures for smoothing the sidewall roughness of a post-etched film. A sacrificial layer is formed on a substrate. A patterned mask is formed by removing portions of the sacrificial layer to expose a surface of the substrate. The sidewalls of the patterned mask are smoothed and a target layer is formed over the patterned mask and the substrate. Portions of the target layer are removed to expose a surface of the patterned mask and the patterned mask is removed.

Abstract: Embodiments are directed to a method and resulting structures for smoothing the sidewall roughness of a post-etched film. A sacrificial layer is formed on a substrate. A patterned mask is formed by removing portions of the sacrificial layer to expose a surface of the substrate. The sidewalls of the patterned mask are smoothed and a target layer is formed over the patterned mask and the substrate. Portions of the target layer are removed to expose a surface of the patterned mask and the patterned mask is removed.

Abstract: Embodiments are directed to a method and resulting structures for smoothing the sidewall roughness of a post-etched film. A sacrificial layer is formed on a substrate. A patterned mask is formed by removing portions of the sacrificial layer to expose a surface of the substrate. The sidewalls of the patterned mask are smoothed and a target layer is formed over the patterned mask and the substrate. Portions of the target layer are removed to expose a surface of the patterned mask and the patterned mask is removed.

Abstract: A method of fabricating a vertical field effect transistor including forming a first recess in a substrate; epitaxially growing a first drain from the first bottom surface of the first recess; epitaxially growing a second drain from the second bottom surface of a second recess formed in the substrate; growing a channel material epitaxially on the first drain and the second drain; forming troughs in the channel material to form one or more fin channels on the first drain and one or more fin channels on the second drain, wherein the troughs over the first drain extend to the surface of the first drain, and the troughs over the second drain extend to the surface of the second drain; forming a gate structure on each of the one or more fin channels; and growing sources on each of the fin channels associated with the first and second drains.

Abstract: A dual layer shallow isolation trench region for semiconductor structures including field effect transistors (FETs) and methods for making the same. The first layer of the shallow trench isolation region includes a dielectric material disposed between adjacent FETs. The second layer is an etch resistant material disposed on the dielectric material and has an increased etch resistance relative to the dielectric material. The etch resistant material overlays the shallow trench region to provide the dual layer shallow trench isolation region, which permits self-alignment of contacts to the source and/or drain of FETs.

Abstract: A dual layer shallow isolation trench region for semiconductor structures including field effect transistors (FETs) and methods for making the same. The first layer of the shallow trench isolation region includes a dielectric material disposed between adjacent FETs. The second layer is an etch resistant material disposed on the dielectric material and has an increased etch resistance relative to the dielectric material. The etch resistant material overlays the shallow trench region to provide the dual layer shallow trench isolation region, which permits self-alignment of contacts to the source and/or drain of FETs.

Abstract: A method of forming a nanosheet device, including forming a channel stack on a substrate, where the channel stack includes at least one nanosheet channel layer and at least one sacrificial release layer, forming a stack cover layer on at least a portion of the channel stack, forming a dummy gate on at least a portion of the stack cover layer, wherein at least a portion of the at least one nanosheet channel layer and at least one sacrificial release layer is exposed on opposite sides of the dummy gate, removing at least a portion of the at least one sacrificial release layer on each side of the dummy gate to form a sacrificial supporting rib, and forming an inner spacer layer on exposed portions of the at least one nanosheet channel layer and at least one sacrificial supporting rib.

Abstract: A method of forming a nanosheet device, including forming a channel stack on a substrate, where the channel stack includes at least one nanosheet channel layer and at least one sacrificial release layer, forming a stack cover layer on at least a portion of the channel stack, forming a dummy gate on at least a portion of the stack cover layer, wherein at least a portion of the at least one nanosheet channel layer and at least one sacrificial release layer is exposed on opposite sides of the dummy gate, removing at least a portion of the at least one sacrificial release layer on each side of the dummy gate to form a sacrificial supporting rib, and forming an inner spacer layer on exposed portions of the at least one nanosheet channel layer and at least one sacrificial supporting rib.

Abstract: A method of fabricating a vertical field effect transistor including forming a first recess in a substrate; epitaxially growing a first drain from the first bottom surface of the first recess; epitaxially growing a second drain from the second bottom surface of a second recess formed in the substrate; growing a channel material epitaxially on the first drain and the second drain; forming troughs in the channel material to form one or more fin channels on the first drain and one or more fin channels on the second drain, wherein the troughs over the first drain extend to the surface of the first drain, and the troughs over the second drain extend to the surface of the second drain; forming a gate structure on each of the one or more fin channels; and growing sources on each of the fin channels associated with the first and second drains.

Abstract: A method for fabricating a semiconductor device includes accessing source/drain regions (S/D) in an n-type field effect transistor (NFET) region and in a p-type field effect transistor (PFET) region. First alloy elements are implanted in the S/D regions in the NFET region, and second alloy elements are implanted in the PFET region with the NFET region blocked. The first and second alloy elements form respective amorphized layers on the S/D regions in respective NFET and PFET regions. The amorphized layers are recrystallized to form metastable recrystallized interfaces using an epitaxy process wherein the metastable recrystallized interfaces formed in respective NFET and PFET regions exceed solubility of the first and second alloy elements in respective materials of the S/D regions in the NFET and PFET regions. Contacts to the metastable recrystallized layers of the S/D regions in the NFET and PFET regions are concurrently formed.

Abstract: A method of forming a variable spacer in a vertical transistor device includes forming a first source/drain of a first transistor on a substrate; forming a second source/drain of a second transistor on the substrate adjacent to the first source/drain, an isolation region arranged in the substrate between the first source/drain and the second source/drain; depositing a spacer material on the first source/drain; depositing the spacer material on the second source/drain; forming a first channel extending from the first source drain and through the spacer material; forming a second channel extending from the second source/drain and through the spacer material; wherein the spacer material on the first source/drain forms a first spacer and the spacer material on the second source/drain forms a second spacer, the first spacer being different in thickness than the second spacer.

Abstract: A method of forming a semiconductor structure includes forming a fin cut mask over a region in a fin field-effect transistor (finFET) structure. The finFET structure includes one or more fins and one or more gates and source/drain regions formed over the one or more fins in active regions of the finFET structure. The method also includes performing a fin cut by removing a portion of at least one fin. The portion of the at least one fin is determined by an exposed area of the fin cut mask. The exposed area of the fin cut mask includes at least a portion of the at least one fin between a first dummy gate and a second dummy gate formed over the at least one fin. The method further includes removing the fin cut mask and depositing an oxide to replace the portion of the at least one fin removed during the fin cut.