Patents by Inventor Rajesh Sathiyanarayanan

Rajesh Sathiyanarayanan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9735250
    Abstract: A work function setting metal stack includes a configuration of layers including a high dielectric constant layer and a diffusion prevention layer formed on the high dielectric constant layer. An aluminum doped TiC layer has a thickness greater than 5 nm wherein the configuration of layers is employed between two regions as a diffusion barrier to prevent mass diffusion between the two regions.
    Type: Grant
    Filed: October 31, 2016
    Date of Patent: August 15, 2017
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Takashi Ando, Mohit Bajaj, Terence B. Hook, Rajan K. Pandey, Rajesh Sathiyanarayanan
  • Patent number: 9705021
    Abstract: A solar pod system, comprising of an oval transparent enclosure. The oval transparent enclosure encapsulates a circular paraboloidal reflector mounted on solar cell. The solar cell extends over the circular parabolic reflector to place the focus of the paraboloidal reflector on the solar cell, whereby the solar cell receives light reflected by the circular parabolic reflector.
    Type: Grant
    Filed: October 30, 2014
    Date of Patent: July 11, 2017
    Assignee: International Business Machines Corporation
    Inventors: Aveek N. Chatterjee, Kota V. R. M. Murali, Ninad D. Sathaye, Rajesh Sathiyanarayanan
  • Publication number: 20170148892
    Abstract: A work function setting metal stack includes a configuration of layers including a high dielectric constant layer and a diffusion prevention layer formed on the high dielectric constant layer. An aluminum doped TiC layer has a thickness greater than 5 nm wherein the configuration of layers is employed between two regions as a diffusion barrier to prevent mass diffusion between the two regions.
    Type: Application
    Filed: October 31, 2016
    Publication date: May 25, 2017
    Inventors: Takashi Ando, Mohit Bajaj, Terence B. Hook, Rajan K. Pandey, Rajesh Sathiyanarayanan
  • Publication number: 20170148890
    Abstract: A work function setting metal stack includes a configuration of layers including a high dielectric constant layer and a diffusion prevention layer formed on the high dielectric constant layer. An aluminum doped TiC layer has a thickness greater than 5 nm wherein the configuration of layers is employed between two regions as a diffusion barrier to prevent mass diffusion between the two regions.
    Type: Application
    Filed: July 28, 2016
    Publication date: May 25, 2017
    Inventors: Takashi Ando, Mohit Bajaj, Terence B. Hook, Rajan K. Pandey, Rajesh Sathiyanarayanan
  • Patent number: 9627484
    Abstract: A method for adjusting a threshold voltage includes depositing a strained liner on a gate structure to strain a gate dielectric. A threshold voltage of a transistor is adjusted by controlling an amount of strain in the liner to control an amount of work function (WF) modulating species that diffuse into the gate dielectric in a channel region. The liner is removed.
    Type: Grant
    Filed: October 12, 2015
    Date of Patent: April 18, 2017
    Assignee: International Business Machines Corporation
    Inventors: Takashi Ando, Mohit Bajaj, Terence B. Hook, Rajan K. Pandey, Rajesh Sathiyanarayanan
  • Publication number: 20170104066
    Abstract: A method for adjusting a threshold voltage includes depositing a strained liner on a gate structure to strain a gate dielectric. A threshold voltage of a transistor is adjusted by controlling an amount of strain in the liner to control an amount of work function (WF) modulating species that diffuse into the gate dielectric in a channel region. The liner is removed.
    Type: Application
    Filed: October 12, 2015
    Publication date: April 13, 2017
    Inventors: Takashi Ando, Mohit Bajaj, Terence B. Hook, Rajan K. Pandey, Rajesh Sathiyanarayanan
  • Publication number: 20170103897
    Abstract: A method for adjusting a threshold voltage includes depositing a strained liner on a gate structure to strain a gate dielectric. A threshold voltage of a transistor is adjusted by controlling an amount of strain in the liner to control an amount of work function (WF) modulating species that diffuse into the gate dielectric in a channel region. The liner is removed.
    Type: Application
    Filed: August 2, 2016
    Publication date: April 13, 2017
    Inventors: Takashi Ando, Mohit Bajaj, Terence B. Hook, Rajan K. Pandey, Rajesh Sathiyanarayanan
  • Publication number: 20170103982
    Abstract: A method for adjusting a threshold voltage includes depositing a strained liner on a gate structure to strain a gate dielectric. A threshold voltage of a transistor is adjusted by controlling an amount of strain in the liner to control an amount of work function (WF) modulating species that diffuse into the gate dielectric in a channel region. The liner is removed.
    Type: Application
    Filed: May 18, 2016
    Publication date: April 13, 2017
    Inventors: Takashi Ando, Mohit Bajaj, Terence B. Hook, Rajan K. Pandey, Rajesh Sathiyanarayanan
  • Patent number: 9589635
    Abstract: A device that includes a semiconductor device and a contact electrode with a first side that is opposite a second side. The first side abuts the semiconductor device. The contact electrode has a stoichiometry that varies from the first side to the second side. The stoichiometry of the first side inhibits the diffusion of metal from the semiconductor device into the first contact electrode.
    Type: Grant
    Filed: December 11, 2014
    Date of Patent: March 7, 2017
    Assignee: International Business Machines Corporation
    Inventors: Mohit Bajaj, Geoffrey W. Burr, Kota V. R. M. Murali, Rajan K. Pandey, Rajesh Sathiyanarayanan, Kumar R. Virwani
  • Patent number: 9583486
    Abstract: A work function setting metal stack includes a configuration of layers including a high dielectric constant layer and a diffusion prevention layer formed on the high dielectric constant layer. An aluminum doped TiC layer has a thickness greater than 5 nm wherein the configuration of layers is employed between two regions as a diffusion barrier to prevent mass diffusion between the two regions.
    Type: Grant
    Filed: November 19, 2015
    Date of Patent: February 28, 2017
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Takashi Ando, Mohit Bajaj, Terence B. Hook, Rajan K. Pandey, Rajesh Sathiyanarayanan
  • Patent number: 9549044
    Abstract: A method and associated system. A user interest rating for a downloadable item stored outside a user device is computed, which includes: maintaining a user profile of a user's preference for types of items that include the downloadable item, identifying one or more characteristics of the downloadable item, and predicting a likely level of user interest for the downloadable item based on the identified characteristics of the downloadable item and the user profile. A data impact rating for the downloadable item is computed, which includes identifying parameters. A download decision, of whether to download the downloadable item, is computed in dependence on the user interest rating for the downloadable item and the data impact rating for the downloadable item.
    Type: Grant
    Filed: November 23, 2015
    Date of Patent: January 17, 2017
    Assignee: International Business Machines Corporation
    Inventors: Mark Bell, Rick A. Hamilton, II, Ninad D. Sathaye, Rajesh Sathiyanarayanan
  • Publication number: 20160172420
    Abstract: A device that includes a semiconductor device and a contact electrode with a first side that is opposite a second side. The first side abuts the semiconductor device. The contact electrode has a stoichiometry that varies from the first side to the second side. The stoichiometry of the first side inhibits the diffusion of metal from the semiconductor device into the first contact electrode.
    Type: Application
    Filed: December 11, 2014
    Publication date: June 16, 2016
    Inventors: Mohit Bajaj, Geoffrey W. Burr, Kota V.R.M. Murali, Rajan K. Pandey, Rajesh Sathiyanarayanan, Kumar R. Virwani
  • Publication number: 20160126393
    Abstract: A solar pod system, comprising of an oval transparent enclosure. The oval transparent enclosure encapsulates a circular paraboloidal reflector mounted on solar cell. The solar cell extends over the circular parabolic reflector to place the focus of the paraboloidal reflector on the solar cell, whereby the solar cell receives light reflected by the circular parabolic reflector.
    Type: Application
    Filed: October 30, 2014
    Publication date: May 5, 2016
    Inventors: Aveek N. Chatterjee, Kota V. R. M. Murali, Ninad D. Sathaye, Rajesh Sathiyanarayanan
  • Patent number: 9170165
    Abstract: A workfunction modulation-based sensor comprising a field-effect transistor (FET). The FET comprises a substrate, a gate dielectric, a metal gate, a source, a drain, and a layer of sensing material that is electrically connected to the metal gate. An electrical connection that connects to the source of the FET. An electrical connection that connects to the drain of the FET. An electrical connection that connects to the layer of sensing material. An environment that includes an adsorbate gas surrounding, at least a portion of, the layer of sensing material. Wherein the sensing material is adapted to adsorb, at least in part, the adsorbate gas. The amount of adsorbate gas adsorbed on the layer of sensing material modulates the workfunction of the FET such that the degree of adsorbate gas adsorption corresponds to one of the temperature or pressure associated with the environment of the FET.
    Type: Grant
    Filed: March 25, 2013
    Date of Patent: October 27, 2015
    Assignee: GLOBALFOUNDRIES U.S. 2 LLC
    Inventors: Balaji Jayaraman, Kota V. R. M. Murali, Edward J. Nowak, Ninad D. Sathaye, Rajesh Sathiyanarayanan
  • Publication number: 20140283616
    Abstract: A workfunction modulation-based sensor comprising a field-effect transistor (FET). The FET comprises a substrate, a gate dielectric, a metal gate, a source, a drain, and a layer of sensing material that is electrically connected to the metal gate. An electrical connection that connects to the source of the FET. An electrical connection that connects to the drain of the FET. An electrical connection that connects to the layer of sensing material. An environment that includes an adsorbate gas surrounding, at least a portion of, the layer of sensing material. Wherein the sensing material is adapted to adsorb, at least in part, the adsorbate gas. The amount of adsorbate gas adsorbed on the layer of sensing material modulates the workfunction of the FET such that the degree of adsorbate gas adsorption corresponds to one of the temperature or pressure associated with the environment of the FET.
    Type: Application
    Filed: March 25, 2013
    Publication date: September 25, 2014
    Applicant: International Business Machines Corporation
    Inventors: Balaji Jayaraman, Kota V. R. M. Murali, Edward J. Nowak, Ninad D. Sathaye, Rajesh Sathiyanarayanan