Patents by Inventor Rajesh V.

Rajesh V. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20020101782
    Abstract: An apparatus and method for mixing at least two reactants is taught wherein a first reactant is delivered to a reaction zone through a first annular flow path and a second reactant is delivered to the reaction zone through a second annular flow path. The first and second annular flow paths are concentric with one another and the two reactants intermix with one another in the reaction zone. There is a rotating disc having a surface, defining one boundary of the reaction zone. The flow of the first and second reactants across the rotating disc and through the reaction zone is generally radial and has a residence time in the reaction zone of not more than about 100 msec, and preferably not more than about 50 msec. The reaction zone resides in a main reactor vessel and there is a driven agitator residing in the main reactor vessel to stir the contents thereof.
    Type: Application
    Filed: November 6, 2001
    Publication date: August 1, 2002
    Inventors: Dirk J. Hasberg, Rajesh V. Mehta, Michael Bryan, Ramesh Jagannathan
  • Publication number: 20020101783
    Abstract: An apparatus and method for mixing at least two reactants is taught wherein a first reactant is delivered to a reaction zone through a first annular flow path and a second reactant is delivered to the reaction zone through a second annular flow path. The first and second annular flow paths are concentric with one another and the two reactants intermix with one another in the reaction zone. There is a rotating disc having a surface, defining one boundary of the reaction zone. The flow of the first and second reactants across the rotating disc and through the reaction zone is generally radial and has a residence time in the reaction zone of not more than about 100 msec, and preferably not more than about 50 msec. The reaction zone resides in a main reactor vessel and there is a driven agitator residing in the main reactor vessel to stir the contents thereof.
    Type: Application
    Filed: December 15, 2000
    Publication date: August 1, 2002
    Inventors: Dirk J. Hasberg, Rajesh V. Mehta, Michael Bryan, Ramesh Jagannathan
  • Patent number: 6265145
    Abstract: A process for the preparation of a radiation-sensitive silver halide emulsion comprised of high chloride cubical silver halide grains containing from 0.05 to 3 mole percent iodide, based on total silver, where the iodide is incorporated in the grains in a controlled, non-uniform distribution forming a core containing at least 50 percent of total silver, an iodide free surface shell having a thickness of greater than 50 Å, and a sub-surface shell that contains a maximum iodide concentration is disclosed, the process comprising: (a) providing in a stirred reaction vessel a dispersing medium and host high chloride silver halide cubical grains comprising a speed enhancing amount of iodide, and (b) precipitating silver halide onto the host grains by introducing at least a silver salt solution into the dispersing medium at a rate such that the normalized molar addition rate, Rn, is above 3.
    Type: Grant
    Filed: December 30, 1999
    Date of Patent: July 24, 2001
    Assignee: Eastman Kodak Company
    Inventors: Rajesh V. Mehta, Jerzy A. Budz, Jess B. Hendricks, III, Heinz E. Stapelfeldt, Seshadri Jagannathan, Ramesh Jagannathan
  • Patent number: 6242172
    Abstract: A radiation-sensitive emulsion is disclosed comprised of cubical silver halide grains containing from 0.05 to 3 mole percent iodide, based on total silver, and an iridium coordination complex dopant, wherein (i) the iodide is incorporated in the grains in a controlled, non-uniform distribution forming a core containing at least 50 percent of total silver, an iodide free surface shell having a thickness of greater than 50 Å, and a sub-surface shell that contains a maximum iodide concentration, and (ii) the iridium coordination complex dopant is incorporated into the sub-surface shell or into a region of the core extending up to 60% of the total silver into the grain from the sub-surface shell. Speed and reciprocity of iodochloride emulsions can be improved by localized addition of known in the art reciprocity-controlling iridium dopants in relation to high iodide region of the grain.
    Type: Grant
    Filed: December 30, 1999
    Date of Patent: June 5, 2001
    Assignee: Eastman Kodak Company
    Inventors: Jerzy A. Budz, Eric L. Bell, Rajesh V. Mehta
  • Patent number: 6048683
    Abstract: A method is disclosed of manufacturing radiation-sensitive emulsions by a pulsed flow double-jet process in which high chloride silver halide grains are grown in the presence of a thioether ripening agent in the dispersing medium in the reaction vessel the silver halide grains exhibiting an average grain roundness coefficient n in the range of from 2 to less than 15.
    Type: Grant
    Filed: December 22, 1998
    Date of Patent: April 11, 2000
    Assignee: Eastman Kodak Company
    Inventors: Rajesh V. Mehta, Ramesh Jagannathan, Y. Chea Chang
  • Patent number: 6043019
    Abstract: A method is disclosed of manufacturing a radiation-sensitive tabular grain emulsion comprised of (a) providing in a stirred reaction vessel a host tabular grain emulsion containing greater than 50 mole percent bromide, based on silver, and a speed enhancing amount of iodide and (b) then introducing a silver salt solution into the stirred reaction vessel, wherein (1) the silver salt solution is introduced into the stirred reaction vessel at a rate sufficient to create a new grain population, (2) halting introduction of the silver salt solution for a time sufficient to allow the new grain population to be ripened out, and (3) repeating steps (1) and (2) from 3 to 20 times until silver introduced in steps (1) and (2) amounts to from 5 to 50 percent of total silver forming the radiation-sensitive tabular grain emulsion.
    Type: Grant
    Filed: December 22, 1998
    Date of Patent: March 28, 2000
    Assignee: Eastman Kodak Company
    Inventors: Ramesh Jagannathan, Rajesh V. Mehta, Steven P. Szatynski, Wai K. Lam
  • Patent number: 5744297
    Abstract: A radiation-sensitive emulsion is disclosed in which at least 70 percent of total grain projected area is accounted for by tabular grains (a) having {100} major faces, (b) containing greater than 50 mole percent chloride, based on silver, (c) having a mean equivalent circular diameter in the range of from 2.0 to 5.0 .mu.m, and (d) exhibiting a mean thickness of 0.1 .mu.m or less.The emulsion is prepared by (a) precipitating up to 10 percent of the total silver forming the high chloride {100} tabular grains to create a first grain population under conditions that form a crystal lattice structure that favors the growth of high chloride {100} tabular grains, (b) thereafter rapidly introducing silver and halide ions to create a second grain population, and (c) growing the first grain population to create the high chloride {100} tabular grains by ripening out the second grain population.
    Type: Grant
    Filed: March 11, 1997
    Date of Patent: April 28, 1998
    Assignee: Eastman Kodak Company
    Inventors: Yun C. Chang, Rajesh V. Mehta, Lois A. Buitano