Patents by Inventor Ravi M. Todi

Ravi M. Todi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090230508
    Abstract: An SOI layer has an initial trench extending therethrough, prior to deep trench etch. An oxidation step, such as thermal oxidation is performed to form a band of oxide on an inner periphery of the SOI layer to protect it during a subsequent RIE step for forming a deep trench. The initial trench may stop on BOX underlying the SOI. The band of oxide may also protect the SOI during buried plate implant or gas phase doping.
    Type: Application
    Filed: March 14, 2008
    Publication date: September 17, 2009
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Thomas W. Dyer, Herbert L. Ho, Ravi M. Todi