Abstract: A bonding pad is described. A substrate having integrated circuits formed therein is provided. A dielectric layer having several trench structure formed therein is formed over the substrate, and each trench structure has several trenches radially arranged in the dielectric layer. A conductive layer is formed on the dielectric layer and fills the trenches, and the conductive layer is electrically coupled to the integrated circuits in the substrate through the trenches, respectively. By using the invention, the adhesion of the dielectric layers and the metal layers can be greatly improved and the compressive mechanical stress can be uniformly released to the substrate even if the wire width of the integrated circuit is reduced to the sub-micron level.

Abstract: A method of preparing a hearth roll with a coating, including: plating a metal on a ceramic powder by using electroless plating; mixing the metal-plated ceramic powder and a metal powder to form a cement powder; and thermally spraying the cement powder onto a hearth roll. Another method is: plating a metal on a ceramic powder by using electroless plating; mixing the metal-plated ceramic powder, a metal powder, and a binder to form a slurry, and subjecting the slurry to granulating and sintering to obtain a sintered powder; and thermally spraying the sintered powder onto a hearth roll.

Abstract: A new method is provided for the creation of spacers for the CMOS gate electrode. A layer of a spacer material is deposited over the gate structure; a layer of photoresist is deposited over the layer of spacer material. The layer of photoresist of the invention is partially stripped removing the photoresist from above the gate structure and providing a thinner layer of photoresist over the surrounding layer of spacer material. The layer of spacer material is partially etched whereby the layer of photoresist serves as a partial etch stop layer. The remainder of the photoresist is removed, the spacer material is further etched using a dry etch whereby a thin layer of spacer material (oxide) remains deposited over the surface of the substrate. As a final step the thin layer of spacer material (oxide) is removed from the surface of the substrate using a wet etch.

Abstract: A method of manufacturing mask read-only-memory. The method includes forming a plurality of first and second active regions in designated locations on a substrate. Each first and second active region has a channel region and a source/drain region on both side of the channel. Subsequently, shallow trench oxide are formed within the channel regions of the first active regions, and then source/drain terminals are formed in the respective source/drain regions of first and second active regions. Finally, a gate terminal is formed over the channel region.

Abstract: The invention describes a method of fabricating an integrated circuit used to prevent undercutting of an oxide layer due to wet etching. A semiconductor substrate has a gate formed thereon. A conformal oxide layer is formed to cover the gate. Then, a nitrogen ion implantation process is performed to introduce nitrogen ions into the surface of the conformal oxide layer. A high temperature thermal oxidation is performed in order to form Si--N bonds, that is, the nitrogen ions bonding with the silicon atoms of the conformal oxide layer, or to form Si--ON bonds, that is, the nitrogen ions bonding with the oxygen atoms of the conformal oxide layer. A dielectric layer, which covers the conformal oxide layer, is formed. Thereafter, the dielectric layer is etched back to form spacers on the sidewalls of the gate. A wet etching process is performed to remove a part of the conformal oxide layer exposed by the spacers.

Abstract: Detergent compositions, essentially free of chlorine bleach compounds, containing a surfactant, builder, enzyme, peroxygen bleach and from about 0.001% to about 5% by weight polyethyleneimine (PEI) or salts thereof are disclosed. These compositions exhibit controlled and improved bleaching action on stains as well as improved storage stability, fabric safety and whitening/brightening characteristics.

Abstract: Detergent compositions, essentially free of peroxygen or chlorine bleach compounds, containing a surfactant, builder, enzyme and from about 0.001% to about 5% by weight polyethyleneimine (PEI) or salts thereof are disclosed. These compositions provide enhanced removal of organic stains, particularly on polyphenolic stains such as morello juice (cherry juice), blueberry juice, red wine, tea and coffee. Improvement was also demonstrated on certain non-polyphenolic stains such as grass.

Abstract: Laundry detergent compositions containing a detergent surfactant, a detergent builder, and from about 0.1% to about 50% by weight ethylene aspartate cysteate sequestrants or its acid form are disclosed. These compositions provide enhanced removal of organic stains, such as food and beverage stains particularly polyphenolic stains such as wine, blueberry, tea, coffee, morello juice and the like.

Abstract: A process for improving the flowability of compositions containing SCMOS is disclosed which includes employing the salt of SCMOS in intimate admixture with a nonionic glycolipid surfactant as the major SCMOS containing constituent of the composition.

Abstract: A process for improving the flowability of compositions containing ODS is disclosed which includes employing the salt of ODS in intimate admixture with a nonionic glycolipid surfactant as the major ODS containing constituent of the composition.

Abstract: A process for the preparation of 2,2'-oxydisuccinate from undissolved solid, powdered or comminuted maleate and malate species added to a slurry of alkaline earth metal hydroxide is disclosed which cooperatively controls pH, temperature, time and ratio of reactants to effectively avoid substantial phase separation.

Abstract: Novel compounds useful as sequestrants as well as builders for detergent compositions and methods for their preparation are disclosed.

Abstract: Novel compounds useful as sequestrants as well as builders for detergent compositions and methods for their preparation are disclosed.

Abstract: Laundry detergent compositions containing a detergent surfactant, a detergent builder, and from about 0.1% to about 50% by weight ethylene dicysteate or its acid form are disclosed. These compositions provide enhanced removal of organic stains, such as food and beverage stains particularly polyphenolic stains such as wine, blueberry, tea, coffee, morello juice and the like.

Abstract: Laundry detergent compositions containing a detergent surfactant, a detergent builder, and from about 0.1% to about 50% by weight ethylene aspartate cysteate sequestrants or its acid form are disclosed. These compositions provide enhanced removal of organic stains, such as food and beverage stains particularly polyphenolic stains such as wine, blueberry, tea, coffee, morello juice and the like.

Abstract: A new compound is disclosed which can be used as a builder. The compound is cysteic monosuccinic acid (CMS) and its salts as well as methods of making CMS.

Abstract: The present invention relating to novel oxazolidine and tetrahydrooxazine amide surfactants and to processes for making the surfactants. These are cyclic surfactants having good solubility and which are readily biodegradable.

Abstract: The present invention relating to compositions comprising novel oxazolidine and tetrahydrooxazine amide surfactants and to processes for making the surfactants. These are cyclic surfactants having good solubility and which are readily biodegradable.

Abstract: Biodegradable compounds which are effective fabric conditioning molecules are described as having Formula I ##STR1## wherein R.sub.1 is a C.sub.1-4 alkyl or alkenyl, R.sub.2 and R.sub.3 are each independently a C.sub.7 -C.sub.30 straight or branched alkyl or alkenyl, R.sub.4 is a C.sub.1-4 alkyl or alkenyl or hydroxyalkyl and X is a water soluble anion.

Abstract: Novel fabric conditioners based on pyridine carboxylic acid esters or amides are described. The compounds are effective fabric conditioners and are biodegradable. Compositions including the compounds and a method of using the compositions are also described.