Patents by Inventor Ren Xu
Ren Xu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240152266Abstract: Provided are a terminal control method, system and apparatus, a computer device, and a storage medium. The method comprises: establishing connection with a controlled terminal; acquiring a first interaction interface of the controlled terminal; displaying a second interaction interface, wherein the second interaction interface matches the first interaction interface of the controlled terminal; receiving a touch-control operation of a user on the second interaction interface; according to the touch-control operation, controlling the controlled terminal to perform a touch control response; acquiring a first touch-control response interface of the controlled terminal, wherein the first touch-control response interface is an interface displayed by the controlled terminal after performing a touch control response; and displaying a second touch-control response interface, wherein the second touch-control response interface matches the first touch-control response interface of the controlled terminal.Type: ApplicationFiled: December 25, 2019Publication date: May 9, 2024Inventors: Ren XU, Ning ZHAO, Feng ZHOU, Kefeng LI, Chang WU, Wei WANG
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Publication number: 20230406759Abstract: A paste for coating a glass substrate which, after coating, is subjected to firing and chemical strengthening by ion exchange to form an enamel coated, chemically strengthened glass product, the paste containing an organic carrier fluid; a first inorganic frit having a first softening point; and a second inorganic frit having a second softening point, wherein the softening point of the first inorganic frit is higher than the softening point of the second inorganic frit such that the second inorganic frit can be softened and sintered at a temperature lower than the softening point of the first inorganic frit, and wherein the first inorganic frit includes an exchangeable ion content which can be ion exchanged to chemically strengthen the first inorganic frit.Type: ApplicationFiled: September 28, 2021Publication date: December 21, 2023Inventors: Svetlana EMELIANOVA, Jean Luc LOONTJENS, Maxence VALLA, Kefeng LI, Ren XU
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Publication number: 20230039994Abstract: A network computer system operates to determine one or more transport service parameters for an upcoming scheduled event at a mass egress location. One or more activities associated with the scheduled event are monitored to determine whether to update the one or more transport service parameters. Based at least in part on the one or more transport parameters, a set of relocation parameters is determined, including (i) an intermediate location where the service provider is to be located to provide the user with the transport service, and (ii) an intermediate arrival time when the first service provider is to arrive at the intermediate location before the pickup time. Based at least in part on a current location of a selected service provider and the intermediate arrival time, a relocation time when the service provider is to initiate travel to the intermediate location is determined.Type: ApplicationFiled: August 9, 2022Publication date: February 9, 2023Inventors: Akansha Kumar, Ren Xu, Tushar Agrawal, Scott Lippert, Mark Richmond
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Publication number: 20220175742Abstract: The present invention relates to a methods for modulating Collagen Prolyl 4-hydroxylase (C-P4H1) in a cell. The present invention further relates to methods for inhibiting a cancer cell. The instant invention also relates to methods for identifying modulators of Collagen Prolyl 4-hydroxylase (C-P4H1).Type: ApplicationFiled: February 28, 2022Publication date: June 9, 2022Inventors: Ren Xu, Shike Wang
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Patent number: 11326138Abstract: Provided herein is a tissue culture device and a method of forming a tissue culture device. The tissue culture device includes a microfluidic layer including at least one hydrophobic microchannel and a reservoir portion over the at least one hydrophobic microchannel, the reservoir portion including an opening aligned with the at least one hydrophobic microchannel. The method of forming a tissue culture device includes providing a microfluidic layer mold, a reservoir layer mold, and a removable lid mold, filling each of the molds with a device material, curing the device material within the molds, removing the cured device material from the molds to provide a microfluidic layer, a reservoir layer, and a removable lid, and bonding the microfluidic layer to the reservoir layer. A method of culturing tissue with the tissue culture device is also provided herein.Type: GrantFiled: May 1, 2018Date of Patent: May 10, 2022Assignee: University of Kentucky Research FoundationInventors: Christine Trinkle, Ren Xu, Soroosh Torabi
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Publication number: 20220031668Abstract: A method of inhibiting expression or activity of procollagen-lysine, 2-oxoglutarate 5-dioxygenases 2 (PLOD2) in a cell involves contacting the cell with or introducing into the cell an effective amount of a compound selected from the group consisting of: amiloride, azelastine, bazedoxifene acetate, BIBW2992, DL-carnitine, L-carnitine, cyclosporin A, dopamine, gallic acid, gemcitabine, loperamide, manidipine, marimastat, methacycline, mubritinib, P1015, P1025, P1029, palbociclib, pexidartinib, rosiglitazone, tazemetostat, tebipenem pivoxil, teneligliptin, trospium chloride, and pharmaceutically-acceptable salts thereof.Type: ApplicationFiled: July 27, 2021Publication date: February 3, 2022Inventors: Ren Xu, Shike Wang
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Publication number: 20200397860Abstract: Methods and compositions are described herein that promote bone formation. Such methods and compositions include SLIT3 or SLIT2 agents that can be administered to a subject (e.g., one in need thereof). Methods are also described herein that reduce or prevent unwanted bone formation. Such methods can involve administering an inhibitor of SLIT3 or SLIT2 to a subject.Type: ApplicationFiled: February 14, 2019Publication date: December 24, 2020Inventors: Matthew Greenblatt et al., Ren Xu, Lauri H. Glimcher
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Publication number: 20180312792Abstract: Provided herein is a tissue culture device and a method of forming a tissue culture device. The tissue culture device includes a microfluidic layer including at least one hydrophobic microchannel and a reservoir portion over the at least one hydrophobic microchannel, the reservoir portion including an opening aligned with the at least one hydrophobic microchannel. The method of forming a tissue culture device includes providing a microfluidic layer mold, a reservoir layer mold, and a removable lid mold, filling each of the molds with a device material, curing the device material within the molds, removing the cured device material from the molds to provide a microfluidic layer, a reservoir layer, and a removable lid, and bonding the microfluidic layer to the reservoir layer. A method of culturing tissue with the tissue culture device is also provided herein.Type: ApplicationFiled: May 1, 2018Publication date: November 1, 2018Inventors: Christine Trinkle, Ren Xu, Soroosh Torabi
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Patent number: 9872121Abstract: A down-mixing method of 5.1 audio input channels for two channel replay by DRC processing of the LFE and the LS and RS channel signal before mixing, and by filtering LS and RS channels with BRTFs measured from placing a loud speaker at a corner of a room and measuring head at the diagonal corner of the room.Type: GrantFiled: May 10, 2017Date of Patent: January 16, 2018Assignee: WATA Electronics Co., LTDInventors: Ren Xu, Litang Gu
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Patent number: 8715515Abstract: A sequence of process steps having balanced process times are implemented in sequence of etch chambers coupled linearly and isolated one from the other, resulting in the optimization of island to trench ratio for a patterned media. A biased chemical etching using active etching gas is used to descum and trim the resist patterns. An inert gas sputter etch is performed on the magnetic layers, resulting in the patterned magnetic layer on the disk. A final step of stripping is then performed to remove the residual capping resist and carbon hard mask on top of un-etched magnetic islands. The effective magnetic material remaining on the disk surface can be optimized by adjusting the conditions of chemical etch and sputter etch conditions. Relevant process conditions that may be adjusted include: pressure, bias, time, and the type of gas in each step.Type: GrantFiled: March 23, 2010Date of Patent: May 6, 2014Assignee: Intevac, Inc.Inventors: Houng T. Nguyen, Ren Xu, Michael S. Barnes
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Patent number: 8697189Abstract: A scalable, high-throughput nanoimprint lithography priming tool includes a dual-reactant chemical vapor deposition reactor chamber, a mandrel configured to hold a plurality of hard disks at an inner diameter of the hard disks, and a transport mechanism to move the plurality of hard disks into and out of the chamber. The tool may also include a transfer tool to transfer the plurality of hard disks to additional chambers for processing.Type: GrantFiled: October 1, 2009Date of Patent: April 15, 2014Assignee: Intevac, Inc.Inventors: Ren Xu, Carl T. Petersen, III, Charles Liu
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Patent number: 8349196Abstract: A system is provided for etching patterned media disks for hard drive. The modular system may be tailored to perform specific processes sequences so that a patterned media disk is fabricated without removing the disk from vacuum environment. In some sequence the magnetic stack is etched while in other the etch is performed prior to forming the magnetic stack. In a further sequence ion implantation is used without etching steps. For etching a movable non-contact electrode is utilized to perform sputter etch. The cathode moves to near contact distance to, but not contacting, the substrate so as to couple RF energy to the disk. The substrate is held vertically in a carrier and both sides are etched serially. That is, one side is etched in one chamber and then in the next chamber the second side is etched.Type: GrantFiled: December 5, 2008Date of Patent: January 8, 2013Assignee: Intevac, Inc.Inventors: Kevin P. Fairbairn, Michael S. Barnes, Terry Bluck, Ren Xu, Charles Liu, Ralph Kerns
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Publication number: 20120090992Abstract: A system is provided for etching patterned media disks for hard drive. The modular system may be tailored to perform specific processes sequences so that a patterned media disk is fabricated without removing the disk from vacuum environment. In some sequence the magnetic stack is etched while in other the etch is performed prior to forming the magnetic stack. In a further sequence ion implantation is used without etching steps. For etching a movable non-contact electrode is utilized to perform sputter etch. The cathode moves to near contact distance to, but not contacting, the substrate so as to couple RF energy to the disk. The substrate is held vertically in a carrier and both sides are etched serially. That is, one side is etched in one chamber and then in the next chamber the second side is etched.Type: ApplicationFiled: December 27, 2011Publication date: April 19, 2012Applicant: INTEVAC, INC.Inventors: Kevin P. Fairbairn, Michael S. Barnes, Terry Bluck, Ren Xu, Charles Liu, Ralph Kerns
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Publication number: 20100237042Abstract: A sequence of process steps having balanced process times are implemented in sequence of etch chambers coupled linearly and isolated one from the other, resulting in the optimization of island to trench ratio for a patterned media. A biased chemical etching using active etching gas is used to descum and trim the resist patterns. An inert gas sputter etch is performed on the magnetic layers, resulting in the patterned magnetic layer on the disk. A final step of stripping is then performed to remove the residual capping resist and carbon hard mask on top of un-etched magnetic islands. The effective magnetic material remaining on the disk surface can be optimized by adjusting the conditions of chemical etch and sputter etch conditions. Relevant process conditions that may be adjusted include: pressure, bias, time, and the type of gas in each step.Type: ApplicationFiled: March 23, 2010Publication date: September 23, 2010Applicant: INTEVAC, INC.Inventors: Houng T. Nguyen, Ren Xu, Michael S. Barnes
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Publication number: 20100098862Abstract: A scalable, high-throughput nanoimprint lithography priming tool includes a dual-reactant chemical vapor deposition reactor chamber, a mandrel configured to hold a plurality of hard disks at an inner diameter of the hard disks, and a transport mechanism to move the plurality of hard disks into and out of the chamber. The tool may also include a transfer tool to transfer the plurality of hard disks to additional chambers for processing.Type: ApplicationFiled: October 1, 2009Publication date: April 22, 2010Applicant: INTEVAC, INC.Inventors: Ren XU, Carl T. PETERSEN, III, Charles LIU
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Publication number: 20090145879Abstract: A system is provided for etching patterned media disks for hard drive. The modular system may be tailored to perform specific processes sequences so that a patterned media disk is fabricated without removing the disk from vacuum environment. In some sequence the magnetic stack is etched while in other the etch is performed prior to forming the magnetic stack. In a further sequence ion implantation is used without etching steps. For etching a movable non-contact electrode is utilized to perform sputter etch. The cathode moves to near contact distance to, but not contacting, the substrate so as to couple RF energy to the disk. The substrate is held vertically in a carrier and both sides are etched serially. That is, one side is etched in one chamber and then in the next chamber the second side is etched.Type: ApplicationFiled: December 5, 2008Publication date: June 11, 2009Applicant: INTEVAC, INC.Inventors: Kevin P. Fairbairn, Michael S. Barnes, Terry Bluck, Ren Xu, Charles Liu, Ralph Kerns
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Publication number: 20090047417Abstract: Lubricant coatings are applied as vapor to magnetic disks. The method and apparatus include applying vaporizing heat to a pre-determined amount of liquid to form a vapor. Precision delivery of lubricant vapor allows close-loop lube thickness control. The flow of the liquid to the heater is controlled such that only a pre-determined amount from the reservoir flows to the heater at a time, the pre-determined amount is vaporized. According to an aspect, the pre-determined amount of liquid is transferred from the reservoir for the application of vaporizing heat; isolating the reservoir from the vacuum of the vacuum chamber. The method enables multiple types of lubricants to be applied to the disk. Another heater is included for applying vaporizing heat to a second liquid to form a second vapor to supply to the disk. According to an aspect, pulsed lubricant vapor delivery is provided, conserving lubricant and minimizing thermal decomposition.Type: ApplicationFiled: March 31, 2008Publication date: February 19, 2009Inventors: Michael S. Barnes, Charles Liu, Ren Xu
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Patent number: 7207811Abstract: An electrical connector having an electrically non-conductive carrier, the carrier having a plurality of contact pin mounting holes extending there through. Each hole has a square cross-section. An electrically conductive contact pin is passed through each hole. A retainer is provided on the pin separating a leading pin section from a trailing pin section. The trailing pin section has a length slightly longer than the length of the hole and a diameter slightly less than the width of the hole. The retainer and the contact head both have a diameter at least slightly greater than the width of the hole to retain the pin in the hole. An electrical contact pin for use with such a multi-pin electrical connector, a method of inserting such contact pin may be provided.Type: GrantFiled: October 29, 2004Date of Patent: April 24, 2007Assignee: Weco Electrical Connectors Inc.Inventor: Pei Ren Xu
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Patent number: 6966795Abstract: An electrical component having an insulating housing with the housing having a bottom mounting surface and at least one anchor element receiving aperture extending up into the housing from the bottom surface of the housing. An anchor element, having a bottom end, is shaped and sized to be inserted into the aperture from the bottom of the housing, the element frictionally held by the housing in the aperture with the element projecting slightly from the aperture to have its bottom end spaced slightly from the bottom surface of the housing. A method of assembling the electrical component having a housing with a bottom surface and an aperture for receiving an anchor element extending up into the housing from the bottom surface. The anchor element has at least a portion that is sized and shaped to frictionally engage the housing while in the aperture.Type: GrantFiled: May 14, 2003Date of Patent: November 22, 2005Assignee: Weco Electrical Connectors, Inc.Inventor: Pei Ren Xu
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Patent number: 6928723Abstract: An exchange-coupled magnetic structure of a cobalt-ferrite layer adjacent a magnetic metal layer is used in magnetorestive sensors, such as spin valves or tunnel junction valves. The exchange-coupled magnetic structure is used in a pinning structure pinning the magnetization of a ferromagnetic pinned layer, or in an AP pinned layer. A low coercivity ferrite may be used in an AP free layer. Cobalt-ferrite layers may be formed by co-sputtering of Co and Fe in an oxygen/argon gas mixture, or by sputtering of a CoFe2 composition target in an oxygen/argon gas mixture. Alternatively, the cobalt-ferrite layer may be formed by evaporation of Co and Fe from an alloy source or separate sources along with a flux of oxygen atoms from a RF oxygen atom beam source. Magnetoresistive sensors including cobalt-ferrite layers have small read gaps and produce large signals with high efficiency.Type: GrantFiled: December 23, 2003Date of Patent: August 16, 2005Assignee: International Business Machines CorporationInventors: Matthew Joseph Carey, Hoa Van Do, Robin Frederick Charles Farrow, Bruce Alvin Gurney, David Thomas Margulies, Ronald Franklin Marks, Philip Milton Rice, Ren Xu