Patents by Inventor Rene George
Rene George has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20220223383Abstract: Embodiments of the present disclosure generally relate to a process chamber for conformal oxidation of high aspect ratio structures. The process chamber includes a liner assembly that in one embodiment includes a body including a first opening and a second opening opposing the first opening, wherein the opening comprises a first end and a second end opposing the first end, and a flow valve disposed between the first opening and the second opening, the flow valve coupled to the body by a rotatable shaft that provides movement of the flow valve in angles between about 0 degrees and about 90 degrees relative to a central axis of the processing chamber.Type: ApplicationFiled: March 13, 2020Publication date: July 14, 2022Inventors: Eric Kihara SHONO, Vishwas Kumar PANDEY, Hansel LO, Christopher S. OLSEN, Tobin KAUFMAN-OSBORN, Tobin MAN-OSBORN, Rene GEORGE, Lara HAWRYLCHAK
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Publication number: 20220223374Abstract: Embodiments of the present disclosure generally relate to inductively coupled plasma sources and plasma processing apparatus. In at least one embodiment, plasma source includes a first sidewall and a gas injection insert defining a plasma source interior volume. The gas injection insert includes a peripheral gas injection port, a second sidewall disposed concentric with the first sidewall, and a center gas injection port. The plasma source includes a first induction coil disposed proximate the first sidewall and disposed around the first sidewall. The plasma source includes a first radio frequency power generator coupled with the first induction coil. The plasma source includes a second induction coil disposed proximate the second sidewall and disposed around the second sidewall. The plasma source includes a second radio frequency power generator coupled with the second induction coil.Type: ApplicationFiled: January 14, 2021Publication date: July 14, 2022Inventors: Vladimir NAGORNY, Wei LIU, Rene GEORGE
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Publication number: 20220165547Abstract: Provided herein is a gas source comprising a flow conduit having an interior volume and an open end, a remote plasma source fluidly coupled to the flow conduit, a secondary gas source extending inwardly of the interior volume of the flow conduit, the secondary gas source including at least one gas port therein positioned to flow a secondary gas inwardly of the interior volume of the flow conduit.Type: ApplicationFiled: November 24, 2020Publication date: May 26, 2022Inventors: Vishwas Kumar PANDEY, Eric Kihara SHONO, Christopher S. OLSEN, Tobin KAUFMAN-OSBORN, Erika HANSEN, Rene GEORGE, Lara HAWRYLCHAK, Hansel LO, Kartik Bhupendra SHAH
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Patent number: 11308943Abstract: An electronic device receives audio data for a media item. The electronic device generates, from the audio data, a plurality of samples, each sample having a predefined maximum length. The electronic device, using a neural network trained to predict character probabilities, generates a probability matrix of characters for a first portion of a first sample of the plurality of samples. The probability matrix includes character information, timing information, and respective probabilities of respective characters at respective times. The electronic device identifies, for the first portion of the first sample, a first sequence of characters based on the generated probability matrix.Type: GrantFiled: September 12, 2019Date of Patent: April 19, 2022Assignee: Spotify ABInventors: Daniel Stoller, Simon René Georges Durand, Sebastian Ewert
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Publication number: 20210322934Abstract: Gas injectors for providing uniform flow of fluid are provided herein. The gas injector includes a plenum body. The plenum body includes a recess, a protrusion adjacent to the recess and extending laterally away from the plenum body, and a plurality of nozzles extending laterally from an exterior surface of the plenum body. The plenum body has a plurality of holes in an exterior wall of the plenum body. Each nozzle is in fluid communication with an interior volume of the plenum body. By directing the flow of fluid, the gas injector provides for a uniform deposition.Type: ApplicationFiled: July 1, 2021Publication date: October 21, 2021Inventors: Vishwas Kumar PANDEY, Lara HAWRYLCHAK, Eric Kihara SHONO, Kartik SHAH, Christopher S. OLSEN, Sairaju TALLAVARJULA, Kailash PRADHAN, Rene GEORGE, Johanes F. SWENBERG, Stephen MOFFATT
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Patent number: 11124878Abstract: A gas supply member includes a first side opposite a second side and an inner surface defining a first opening extending between the first and second sides. The gas supply member includes a third side orthogonal to the first side, the third side includes a first extension that has a face partially defining the second side, and the first extension includes a first plurality of holes extending through the first extension to the face. The gas supply member includes a fourth side opposite the third side, the fourth side includes a protrusion that has a face partially defining the second side. The gas supply member also includes a baffle disposed adjacent to the inner surface, the baffle includes a first portion extending from the inner surface and a second portion attached to the first portion, and the second portion orthogonal to the first portion and parallel to the third side.Type: GrantFiled: July 30, 2018Date of Patent: September 21, 2021Assignee: Applied Materials, Inc.Inventors: Kartik Shah, Vishwas Kumar Pandey, Kailash Pradhan, Sairaju Tallavarjula, Rene George, Eric Kihara Shono, Philip A. Bottini, Roger Curtis
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Publication number: 20210262093Abstract: A gas supply member includes a first side opposite a second side and an inner surface defining a first opening extending between the first and second sides. The gas supply member includes a third side orthogonal to the first side, the third side includes a first extension that has a face partially defining the second side, and the first extension includes a first plurality of holes extending through the first extension to the face. The gas supply member includes a fourth side opposite the third side, the fourth side includes a protrusion that has a face partially defining the second side. The gas supply member also includes a baffle disposed adjacent to the inner surface, the baffle includes a first portion extending from the inner surface and a second portion attached to the first portion, and the second portion orthogonal to the first portion and parallel to the third side.Type: ApplicationFiled: May 11, 2021Publication date: August 26, 2021Inventors: Kartik SHAH, Vishwas Kumar PANDEY, Kailash PRADHAN, Sairaju TALLAVARJULA, Rene GEORGE, Eric Kihara SHONO, Philip A. BOTTINI, Roger CURTIS
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Patent number: 11077410Abstract: Gas injectors for providing uniform flow of fluid are provided herein. The gas injector includes a plenum body. The plenum body includes a recess, a protrusion adjacent to the recess and extending laterally away from the plenum body, and a plurality of nozzles extending laterally from an exterior surface of the plenum body. The plenum body has a plurality of holes in an exterior wall of the plenum body. Each nozzle is in fluid communication with an interior volume of the plenum body. By directing the flow of fluid, the gas injector provides for a uniform deposition.Type: GrantFiled: August 29, 2018Date of Patent: August 3, 2021Assignee: Applied Materials, Inc.Inventors: Vishwas Kumar Pandey, Lara Hawrylchak, Eric Kihara Shono, Kartik Shah, Christopher S. Olsen, Sairaju Tallavarjula, Kailash Pradhan, Rene George, Johanes F. Swenberg, Stephen Moffatt
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Patent number: 10971357Abstract: A method of modifying a layer in a semiconductor device is provided. The method includes depositing a low quality film on a semiconductor substrate, and exposing a surface of the low quality film to a first process gas comprising helium while the substrate is heated to a first temperature, and exposing a surface of the low quality film to a second process gas comprising oxygen gas while the substrate is heated to a second temperature that is different than the first temperature. The electrical properties of the film are improved by undergoing the aforementioned processes.Type: GrantFiled: October 4, 2018Date of Patent: April 6, 2021Assignee: Applied Materials, Inc.Inventors: Wei Liu, Theresa Kramer Guarini, Linlin Wang, Malcolm Bevan, Johanes S. Swenberg, Vladimir Nagorny, Bernard L. Hwang, Kin Pong Lo, Lara Hawrylchak, Rene George
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Publication number: 20200240014Abstract: A gas injector for processing a substrate includes a body having an inlet connectable to a gas source that is configured to provide a gas flow in a first direction into the inlet when processing a substrate on a substrate support disposed within a processing volume of a processing chamber, and an a gas injection channel formed in the body. The gas injection channel is in fluid communication with the inlet and configured to deliver the gas flow to an inlet of the processing chamber. The gas injection channel has a first interior surface and a second interior surface that are parallel to a second direction and a third direction. The second and third directions do not intersect a center of the substrate, and are at an angle to the first direction towards a first edge of the substrate support.Type: ApplicationFiled: January 29, 2020Publication date: July 30, 2020Inventors: Eric Kihara Shono, Vishwas Kumar Pandey, Christopher S. Olsen, Kartik Shah, Hansel Lo, Tobin Kaufman-Osborn, Rene George, Lara Hawrylchak, Erika Hansen
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Publication number: 20200135176Abstract: An electronic device receives audio data for a media item. The electronic device generates, from the audio data, a plurality of samples, each sample having a predefined maximum length. The electronic device, using a neural network trained to predict character probabilities, generates a probability matrix of characters for a first portion of a first sample of the plurality of samples. The probability matrix includes character information, timing information, and respective probabilities of respective characters at respective times. The electronic device identifies, for the first portion of the first sample, a first sequence of characters based on the generated probability matrix.Type: ApplicationFiled: September 12, 2019Publication date: April 30, 2020Inventors: Daniel Stoller, Simon René Georges Durand, Sebastian Ewert
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Publication number: 20200135185Abstract: An electronic device receives audio data for a media item. The electronic device generates, from the audio data, a plurality of samples, each sample having a predefined maximum length. The electronic device, using a neural network trained to predict textal unit probabilities, generates a probability matrix of textual units for a first portion of a first sample of the plurality of samples. The probability matrix includes information about textual units, timing information, and respective probabilities of respective textual units at respective times. The electronic device identifies, for the first portion of the first sample, a first sequence of textual units based on the generated probability matrix.Type: ApplicationFiled: November 21, 2019Publication date: April 30, 2020Inventors: Daniel STOLLER, Simon René Georges DURAND, Sebastian EWERT
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Publication number: 20200111659Abstract: A method of modifying a layer in a semiconductor device is provided. The method includes depositing a low quality film on a semiconductor substrate, and exposing a surface of the low quality film to a first process gas comprising helium while the substrate is heated to a first temperature, and exposing a surface of the low quality film to a second process gas comprising oxygen gas while the substrate is heated to a second temperature that is different than the first temperature. The electrical properties of the film are improved by undergoing the aforementioned processes.Type: ApplicationFiled: October 4, 2018Publication date: April 9, 2020Inventors: Wei LIU, Theresa Kramer GUARINI, Linlin WANG, Malcolm BEVAN, Johanes S. SWENBERG, Vladimir NAGORNY, Bernard L. HWANG, Kin Pong LO, Lara HAWRYLCHAK, Rene GEORGE
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Patent number: 10504779Abstract: Embodiments described herein generally relate to a sequential hydrogenation and nitridization process for reducing interfacial and bulk O atoms in a conductive structure in a semiconductor device. A hydrogenation and plasma nitridization process is performed on a metal nitride layer in a conductive structure prior to deposition of a second metal layer, thereby reducing interfacial oxygen atoms formed on a surface of the metal nitride and oxygen atoms present in the bulk metal layers of the conductive structure. As a result, adhesion of the second metal layer to the metal nitride layer is improved and the electrical resistance of the contact structure is reduced.Type: GrantFiled: January 28, 2019Date of Patent: December 10, 2019Assignee: APPLIED MATERIALS, INC.Inventors: Johanes S. Swenberg, Wei Liu, Houda Graoui, Shashank Sharma, Shankar Muthukrishnan, Rene George
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Publication number: 20190157143Abstract: Embodiments described herein generally relate to a sequential hydrogenation and nitridization process for reducing interfacial and bulk O atoms in a conductive structure in a semiconductor device. A hydrogenation and plasma nitridization process is performed on a metal nitride layer in a conductive structure prior to deposition of a second metal layer, thereby reducing interfacial oxygen atoms formed on a surface of the metal nitride and oxygen atoms present in the bulk metal layers of the conductive structure. As a result, adhesion of the second metal layer to the metal nitride layer is improved and the electrical resistance of the contact structure is reduced.Type: ApplicationFiled: January 28, 2019Publication date: May 23, 2019Inventors: Johanes S. SWENBERG, Wei LIU, Houda GRAOUI, Shashank SHARMA, Shankar MUTHUKRISHNAN, Rene GEORGE
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Patent number: 10290504Abstract: Embodiments described herein generally relate to a method and apparatus for plasma treating a process chamber. A substrate having a gate stack formed thereon may be placed in a process chamber, and hydrogen containing plasma may be used to treat the gate stack in order to cure the defects in the gate stack. As the result of hydrogen containing plasma treatment, the gate stack has lower leakage and improved reliability. To protect the process chamber from Hx+ ions and H* radicals generated by the hydrogen containing plasma, the process chamber may be treated with a plasma without the substrate placed therein and prior to the hydrogen containing plasma treatment. In addition, components of the process chamber that are made of a dielectric material may be coated with a ceramic coating including an yttrium containing oxide in order to protect the components from the plasma.Type: GrantFiled: November 27, 2017Date of Patent: May 14, 2019Assignee: APPLIED MATERIALS, INC.Inventors: Wei Liu, Theresa Kramer Guarini, Huy Q. Nguyen, Malcolm Bevan, Houda Graoui, Philip A. Bottini, Bernard L. Hwang, Lara Hawrylchak, Rene George
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Publication number: 20190105614Abstract: Gas injectors for providing uniform flow of fluid are provided herein. The gas injector includes a plenum body. The plenum body includes a recess, a protrusion adjacent to the recess and extending laterally away from the plenum body, and a plurality of nozzles extending laterally from an exterior surface of the plenum body. The plenum body has a plurality of holes in an exterior wall of the plenum body. Each nozzle is in fluid communication with an interior volume of the plenum body. By directing the flow of fluid, the gas injector provides for a uniform deposition.Type: ApplicationFiled: August 29, 2018Publication date: April 11, 2019Inventors: Vishwas Kumar PANDEY, Lara HAWRYLCHAK, Eric Kihara SHONO, Kartik SHAH, Christopher S. OLSEN, Sairaju TALLAVARJULA, Kailash PRADHAN, Rene GEORGE, Johanes S. SWENBERG, Stephen MOFFATT
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Patent number: 10236207Abstract: Embodiments described herein generally relate to a sequential hydrogenation and nitridization process for reducing interfacial and bulk O atoms in a conductive structure in a semiconductor device. A hydrogenation and plasma nitridization process is performed on a metal nitride layer in a conductive structure prior to deposition of a second metal layer, thereby reducing interfacial oxygen atoms formed on a surface of the metal nitride and oxygen atoms present in the bulk metal layers of the conductive structure. As a result, adhesion of the second metal layer to the metal nitride layer is improved and the electrical resistance of the contact structure is reduced.Type: GrantFiled: February 21, 2017Date of Patent: March 19, 2019Assignee: APPLIED MATERIALS, INC.Inventors: Johanes S. Swenberg, Wei Liu, Houda Graoui, Shashank Sharma, Shankar Muthukrishnan, Rene George
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Publication number: 20190032216Abstract: A gas supply member includes a first side opposite a second side and an inner surface defining a first opening extending between the first and second sides. The gas supply member includes a third side orthogonal to the first side, the third side includes a first extension that has a face partially defining the second side, and the first extension includes a first plurality of holes extending through the first extension to the face. The gas supply member includes a fourth side opposite the third side, the fourth side includes a protrusion that has a face partially defining the second side. The gas supply member also includes a baffle disposed adjacent to the inner surface, the baffle includes a first portion extending from the inner surface and a second portion attached to the first portion, and the second portion orthogonal to the first portion and parallel to the third side.Type: ApplicationFiled: July 30, 2018Publication date: January 31, 2019Inventors: Kartik SHAH, Vishwas Kumar PANDEY, Kailash PRADHAN, Sairaju TALLAVARJULA, Rene GEORGE, Eric Kihara SHONO, Philip A. BOTTINI, Roger CURTIS
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Patent number: 10166537Abstract: A die is provided for extruding elongate particles suitable for use in catalysis. The die comprises a plurality of channels extending from an inlet to an outlet. From the inlet to the outlet each channel comprises a first section with a helical bore with a non-circular cross-section, and a second section with a cylindrical bore. The cylindrical bore of the second section which has a diameter equal or greater than that of the first section. The second section is at least twice as long as a diameter of the first section.Type: GrantFiled: July 8, 2015Date of Patent: January 1, 2019Assignee: SHELL OIL COMPANYInventors: Rene Georges Ernst Barthel, Maria Johanna Wilhelmina Van Wieringen, Leonardus Maria Van Der Sman, László Domokos