Abstract: A method for manufacturing a patterned magnetic media. The method allows both a data region and a servo region to be patterned without the patterning of one region adversely affecting the patterning of the other region. The method results in a patterned data region a patterned servo region and intermediate regions between the servo and data regions. The intermediate regions, which are most likely, but not necessarily, asymmetrical with one another indicate that the method has been used to pattern the media.

Abstract: A system, method, and apparatus for forming a high quality master pattern for patterned media, including features to support servo patterns, is disclosed. Block copolymer self-assembly is used to facilitate the formation of a track pattern with narrower tracks. E-beam lithography forms a chemical contrast pattern of concentric rings, where the spacing of the rings is equal to an integral multiple of the target track pitch. The rings include regions within each servo sector header where the rings are offset radially by a fraction of a track pitch. Self-assembly is performed to form a new ring pattern at the target track pitch on top of the chemical contrast pattern, including the radial offsets in the servo sector headers. When this pattern is transferred to disks via nanoimprinting and etching, it creates tracks separated by nonmagnetic grooves, with the grooves and tracks including the radial offset regions.

Abstract: An integrated circuit has a doped silicon semiconductor with regions of insulators and bare silicon. The bare silicon regions are isolated from other bare silicon regions. A semiconductor device on the doped silicon semiconductor has at least two electrical connections to form regions of patterned metal. A metal is electroplated directly on each of the regions of patterned metal to form plated connections without a seed layer. A self-aligned silicide is located under each plated connection, formed by annealing, for the regions of plated metal on bare silicon.

Abstract: A method using directed self-assembly of BCPs enables the making of a master disk for nanoimprinting magnetic recording disks that have patterned data islands and patterned binary encoded nondata marks. The method uses guided self-assembly of a BCP to form patterns of sets of radial lines and circumferential gaps of one of the BCP components, which can be used as an etch mask to make the master disk. The sets of radial lines and circumferential gaps can be patterned so as to encode binary numbers. The pattern is replicated as binary encoded nondata marks into the nanoimprinted disks, with the marks functioning as binary numbers for data sector numbers and/or servo sector numbers. If the disks also use a chevron servo pattern, the binary numbers can function to identify groups of tracks associated with the chevron servo pattern.

Abstract: A method for making a master disk for nanoimprinting patterned-media magnetic recording disks has patterns for both the data islands and the nondata regions. The method uses guided self-assembly of a block copolymer (BCP) to form patterns of generally radial lines and/or generally concentric rings as well as patterns of gap regions of one of the BCP components. The pattern of lines and/or rings have the BCP components aligned as lamellae perpendicular to the substrate, while the pattern of gap regions has the BCP components aligned as lamellae parallel to the substrate. One of the BCP components is removed, leaving the other BCP component as an etch mask to fabricate either the final master disk or two separate molds that are then used to fabricate the master disk.

Abstract: A disk drive with patterned-media disks has information recorded in the servo sectors that identifies misplacement of the data islands in the data regions between the servo sectors. This misplacement information is read from the servo sectors prior to writing to correct either or both the radial position of the write head and the timing of the write pulses to the data islands. The misplacement information may include radial deviation of the data tracks, circumferential or along-the-track misplacement of the data islands, or the location of defective data islands.

Abstract: A method for making a master disk to be used in the nanoimprinting process to make patterned-media disks uses an electrically conductive substrate and guided self-assembly of a block copolymer to form patterns of generally radial lines and/or generally concentric rings of one of the block copolymer components. A metal is electroplated onto the substrate in the regions not protected by the lines and/or rings. After removal of the block copolymer component, the remaining metal pattern is used as an etch mask to fabricate either the final master disk or two separate molds that are then used to fabricate the master disk.

Abstract: A method for manufacturing a patterned magnetic media. The method allows both a data region and a servo region to be patterned without the patterning of one region adversely affecting the patterning of the other region. The method results in a patterned data region a patterned servo region and intermediate regions between the servo and data regions. The intermediate regions, which are most likely, but not necessarily, asymmetrical with one another indicate that the method has been used to pattern the media.

Abstract: Block copolymer lithography has emerged as an alternative lithographic method to achieve large-area, high-density patterns at resolutions near or beyond the limit of conventional lithographic techniques for the formation of bit patterned media and discrete track media. In one embodiment, a structure includes a plurality of nanostructures extending upwardly from a substrate and a porous membrane extending across upper ends of the plurality of nanostructures. Other systems and methods are disclosed as well.

Abstract: The invention is a method for making a master mold to be used for nanoimprinting patterned-media magnetic recording disks. The method uses conventional optical or e-beam lithography to form a pattern of generally radial stripes on a substrate, with the stripes being grouped into annular zones or bands. A block copolymer material is deposited on the pattern, resulting in guided self-assembly of the block copolymer into its components to multiply the generally radial stripes into generally radial lines of alternating block copolymer components. The radial lines of one of the components are removed and the radial lines of the remaining component are used as an etch mask to etch the substrate. Conventional lithography is used to form concentric rings over the generally radial lines. After etching and resist removal, the master mold has pillars arranged in circular rings, with the rings grouped into annular bands.

Abstract: A method for making a master mold used to nanoimprint patterned magnetic recording disks that have chevron servo patterns with minimal defects uses directed self-assembly of block copolymers. A pattern of chemically modified polymer brush material is formed on the master mold substrate. The pattern includes sets of slanted stripes and interface strips between the sets of slanted stripes. A block copolymer material is deposited on the pattern, which results in directed self-assembly of the block copolymer as lamellae perpendicular to the substrate that are formed into alternating slanted stripes of alternating first and second components of the block copolymer. This component also forms on the interface strips, but as a lamella parallel to the substrate. One of the components is then removed, leaving the remaining component as a grid that acts as a mask for etching the substrate to form the master mold.

Abstract: Block copolymer lithography has emerged as an alternative lithographic method to achieve large-area, high-density patterns at resolutions near or beyond the limit of conventional lithographic techniques for the formation of bit patterned media and discrete track media. In one embodiment, a structure comprises a plurality of nanostructures extending upwardly from a substrate and a porous membrane extending across upper ends of the plurality of nanostructures. A method, according to another embodiment, comprises forming a block copolymer layer on a substrate, inducing self assembly of the block copolymer layer, selectively degrading a block polymer from the block copolymer layer, forming a porous membrane over the block copolymer layer, and removing a portion of the block copolymer layer for defining a plurality of nanostructures extending upwardly from the substrate after forming the porous membrane over the block copolymer layer. Other systems and methods are disclosed as well.

Abstract: The invention is a method for making a master mold to be used for nanoimprinting patterned-media magnetic recording disks. The method uses conventional optical or e-beam lithography to form a pattern of generally radial stripes on a substrate, with the stripes being grouped into annular zones or bands. A block copolymer material is deposited on the pattern, resulting in guided self-assembly of the block copolymer into its components to multiply the generally radial stripes into generally radial lines of alternating block copolymer components. The radial lines of one of the components are removed and the radial lines of the remaining component are used as an etch mask to etch the substrate. Conventional lithography is used to form concentric rings over the generally radial lines. After etching and resist removal, the master mold has pillars arranged in circular rings, with the rings grouped into annular bands.

Abstract: The invention is a method for making a master mold to be used for nanoimprinting patterned-media magnetic recording disks. The method uses conventional optical or e-beam lithography to form a pattern of generally radial stripes on a substrate, with the stripes being grouped into annular zones or bands. A block copolymer material is deposited on the pattern, resulting in guided self-assembly of the block copolymer into its components to multiply the generally radial stripes into generally radial lines of alternating block copolymer components. The radial lines of one of the components are removed and the radial lines of the remaining component are used as an etch mask to etch the substrate. Conventional lithography is used to form concentric rings over the generally radial lines. After etching and resist removal, the master mold has pillars arranged in circular rings, with the rings grouped into annular bands.

Abstract: A pad for polishing media disks has an elastomeric body with a Shore A hardness of not greater than 20, and a coating of polystyrene (PS) and a flexible polymer. The elastomeric pad may comprise styrene-isoprene-styrene block copolymers, or a styrene-ethylene-butylene-styrene block copolymer. The pad may be viscoleastic with a particulate composite coating. The pad may be a styrenic block copolymer and the coating is a different type of styrenic block copolymer containing solid particles. The coating may have a binder with a mixture of PS and flexible styrenic block copolymers, and filler particles comprising cross-linked PS/divinylbenzene polymer microspheres.

Abstract: A disk drive with patterned-media disks has information recorded in the servo sectors that identifies misplacement of the data islands in the data regions between the servo sectors. This misplacement information is read from the servo sectors prior to writing to correct either or both the radial position of the write head and the timing of the write pulses to the data islands. The misplacement information may include radial deviation of the data tracks, circumferential or along-the-track misplacement of the data islands, or the location of defective data islands.

Abstract: A patterned-media perpendicular magnetic recording disk has patterned servo regions and is nanoimprinted from a master mold made using directed self-assembly of block copolymers. The disk has patterned concentric circular data tracks of discrete data islands, with the tracks having a track pitch in the radial or cross-track direction. The disk also has patterned servo sectors extending generally radially across the patterned data tracks. The servo pattern is a chevron pattern of slanted or non-radial stripes that have a stripe pitch in the cross-stripe direction substantially equal to the track pitch. As a result of the method of making the master mold, the nanoimprinted disk has a chevron servo pattern with non-radial stripes that are magnetized segments of radial lines separated by nonmagnetic spaces.

Abstract: A continuous-media perpendicular magnetic recording disk with an oxide-containing granular Co alloy recording layer (RL) having minimal grain size dispersion has an ordered nucleation layer (ONL) formed below RL. The ONL has ordered nucleation sites arranged in a generally repetitive pattern. The nucleation sites are generally surrounded by non-nucleation regions of a different material than the nucleation sites. The Co-alloy grains of the subsequently deposited RL grow on the nucleation sites and the oxide of the RL become generally segregated on the non-nucleation regions. The ordered nucleation sites may be formed of a Ru-containing material and the non-nucleation regions may be formed of an oxide. The ONL is formed by nanoimprint lithography, preferably by a master mold fabricated with a method using self-assembling block copolymers for creating periodic nanometer scale features.

Abstract: A method for making a master mold that is used in the nanoimprinting process to make patterned-media disks with patterned data islands uses guided self-assembly of a block copolymer into its components. Conventional or e-beam lithography is used to first form a pattern of generally radial stripes on a substrate, with the stripes being grouped into annular zones or bands. A block copolymer material is then deposited on the pattern, resulting in guided self-assembly of the block copolymer into its components to multiply the generally radial stripes into generally radial lines. Various methods, including conventional lithography, guided self-assembly of a second block copolymer, and e-beam lithography, are then used to form concentric rings over the generally radial lines. After etching and resist removal, the master mold has a pattern of either pillars or holes, depending on the method used.

Abstract: The present invention relates to a semiconductor structure such as a field effect transistors (FETs) in which the channel region of each of the FETs is composed of an array of more than one electrically isolated channel. In accordance with the present invention, the distance between each of the channels present in the channel region is within a distance of no more than twice their width from each other. The FETs of the present invention are fabricated using methods in which self-assembled block copolymers are employed in forming the channel.