Abstract: Disclosed is a light that includes a light emitting device having at least one downlight and at least one sidelight. The light also includes a power source configured to provide power to the at least one downlight and the at least one sidelight. In example embodiments, a power system utilizing the power source may include a controller configured to control power flowing from the power source to the at least one downlight and the at least one sidelight and using a timer configured to control how long power will be provided. The light may further include at least one solar cell configured to recharge the power source, and a switch operably connected to the power system so then when the switch is operated the power system routes power to at least at least one downlight and the at least one sidelight.

Abstract: A protective covering and method for enclosing a pier and a post mounted to the pier and their connection that includes a body having perimeter wall defining a top end and a bottom end, an upper aperture disposed around the top end, a lower aperture disposed around the bottom end, and a cavity and a seal disposed proximate the upper aperture for compressively engaging an outer surface of the post.

Abstract: Methods and apparatuses of for detecting lint are disclosed. In one embodiment, a light is directed to a plate. The light can be being emitted by a light source. A reflectometer is calibrated to a specific thermal emissivity of the plate. The thermal emission resulting from the light directed to the plate is received at the reflectometer. Lint is permitted to deposit on the plate. A change in thermal emission is detected if lint deposits on the plate. The change in thermal emission can be detected by the reflectometer. An indication that lint is present within the clothes dryer is provided if a change in thermal emission is detected by the reflectometer.

Abstract: A protective covering and method for enclosing a pier and a post mounted to the pier and their connection that includes a body having perimeter wall defining a top end and a bottom end, an upper aperture disposed around the top end, a lower aperture disposed around the bottom end, and a cavity and a seal disposed proximate the upper aperture for compressively engaging an outer surface of the post.

Abstract: Methods and apparatuses of for detecting lint are disclosed. In one embodiment, a light is directed to a plate. The light can be being emitted by a light source. A reflectometer is calibrated to a specific thermal emissivity of the plate. The thermal emission resulting from the light directed the plate is received at the reflectometer. Lint is permitted to deposit on the plate. A change in thermal emission is detected if lint deposits on the plate. The change in thermal emission can be detected by the reflectometer. An indication that lint is present within the clothes dryer is provided if a change in thermal emission is detected by the reflectometer.

Abstract: There is provided by this invention an apparatus for sputter deposition of an insulating material in a continuous mode of operation that utilizes at least two sputtering anodes and a cathode connected to a center tapped conductor to maintain the target cathode at a negative potential with respect to the plasma wherein an ac power supply drives each anode alternately to an ion collecting state to attract ions in the half cycle that a sputtering anode is at a negative potential relative to the plasma, and an electron collecting state to attract electrons in the half cycle that a sputtering anode is at a small potential relative to the plasma or is near the plasma potential.

Abstract: A method of detecting lint in a clothes dryer is disclosed. Light is directed through a surface within the clothes dryer, the light being emitted by a light source. The light is received at a photocell if the light is reflected off the surface when lint covers the surface. An indication is provided that lint is present within the clothes dryer if light is received at the photocell. Furthermore, a voltage level detector is positioned within the lint detector and determined if a threshold amount of light is received. In another aspect, if the threshold amount of light is received a warning light, an audio speaker, or an electrical output can be activated. Likewise, the clothes dryer can be automatically shut down. In another aspect, the photocell is a phototransistor. In another aspect, the photocell is a photoresistor.

Abstract: A method of detecting lint in a clothes dryer is disclosed. Light is directed through a surface within the clothes dryer, the light being emitted by a light source. The light is received at a photocell if the light is reflected off the surface when lint covers the surface. An indication is provided that lint is present within the clothes dryer if light is received at the photocell. Furthermore, a voltage level detector is positioned within the lint detector and determined if a threshold amount of light is received. In another aspect, if the threshold amount of light is received a warning light, an audio speaker, or an electrical output can be activated. Likewise, the clothes dryer can be automatically shut down. In another aspect, the photocell is a phototransistor. In another aspect, the photocell is a photoresistor.

Abstract: There is provided by this invention an apparatus for sputter deposition of an insulating material in a continuous mode of operation that utilizes at least two sputtering anodes and a cathode connected to a center tapped conductor to maintain the target cathode at a negative potential with respect to the plasma wherein an ac power supply drives each anode alternately to an ion collecting state to attract ions in the half cycle that a sputtering anode is at a negative potential relative to the plasma, and an electron collecting state to attract electrons in the half cycle that a sputtering anode is at a small potential relative to the plasma or is near the plasma potential.

Abstract: A device and method for detecting lint in a clothes dryer are disclosed. A lint detector is positioned within the clothes dryer. A light source is also positioned within the clothes dryer. The lint detector has a surface that receives light emitted by the light source. Further, the lint detector has a photocell that receives light reflected from the surface if lint covers the surface. A determination is made as to whether a threshold amount of light has been received. An indication such as the activation of a warning light can be provided if the threshold amount of light is received. Another response is shutting the clothes dryer down.

Abstract: Methods and apparatus are provided for generating an inductively coupled plasma using induced eddy currents. An inductively coupled plasma source of the invention generally comprises a body constructed substantially of a conductive material interrupted by at least one dielectric gap. Radio frequency power is coupled from a current carrier into the conductive body. The one or more dielectric interruptions in the conductive body are disposed so as to cause eddy currents to circulate about portions of the body and thereby couple RF power into a plasma in proximity to the conductive body. By utilizing induced eddy currents to couple power into a plasma, the invention allows for substantial bodies of conductive materials, such as structural metals, to be interposed between the induction coils that receive power from a power generator and the plasma.

Abstract: A method and an apparatus are disclosed for causing ion bombardment of the substrate during sputter deposition of an insulating or conducting material on a substrate (3) when using dual cathode or dual anode sputtering approaches. A novel electrical circuit including a center-tapped transformer is disclosed to permit a controllable potential to be applied to the substrate relative to the plasma potential, without the necessity of an additional power supply. Also disclosed are approaches which permit the use of an auxiliary biasing supply (8), either dc or high frequency ac, and which can permit continuous discharging of the surface through alternate ion and electron bombardment.

Abstract: An improved system of igniting a plasma using a rapid voltage rise and thus causing ions that may be pre-existing to create secondary electron emission or the like is provided. In one embodiment, the voltage rise can be timed to be comparable to the transit time of the electrons across the plasma. It can also be arranged to achieve a voltage rise in less than 1000 microseconds, to result in a transition time that is less than one hundred times the transit time, to maximize the emission of secondary electrons, or even to merely result in collision energies ranging from 5 to 500 electron volts. The transition time can be controlled through an ignition control that may be programmable, may involve charging output storage devices, or may involve delayed switching to supply the increased voltage to the plasma after the storage elements have been more fully charged.

Abstract: An enhanced DC plasma processing system which acts to immediately stop current from flowing through the plasma allows a variety of alternative embodiments for varying applications. In one embodiment, a tapped inductor is switched to ground to achieve substantial voltage reversal of about 10% upon detection of an arc condition through voltage and/or rate of voltage change techniques. This reversal of voltage is maintained long enough to allow restoration of uniform charge density within the plasma prior to restoration of the initial driving condition. A technique for preventing arc discharges involving periodically applying a reverse voltage is effected through a timer system in the power supply.

Abstract: A thin film plasma processing system which includes multiple power environments and circuitry is described so as to encompass a variety of configurations. The environments may establish an energy quantum which may be interactively adjusted such as for conditioning or processing when new targets or materials are inserted. The energy quantum can be increased from the traditionally low energy storage of a switch-mode power supply to a higher energy to allow more intense arc occurrences and, thus, the more rapid conditioning of a target. Switching between environments can be achieved manually or automatically through timing or through arc or plasma electrical characteristics sensing. Energy quantum may be adjusted through the inclusion of energy storage elements, hardwired elements, or through software configurations such as are possible with the utilization of a programmable processor. Applications for DC switch-mode thin film processing systems are specifically shown.

Abstract: Current controlled power sources are disclosed that are capable of generating currents in low resistance, high temperature plasmas that are regulated to prevent the generation of excessive currents in the plasma. Current reversing switches are provided that control the flow of a direct current in a plasma chamber between various electrodes. Multiple power sources are provided in association with shunt switches for delivering a plurality of sources of direct current in various directions between electrodes in a plasma chamber. Inductive impedance can be provided in switch paths to cause a source of direct current to flow through a plasma chamber in various directions between electrodes.

Abstract: An enhanced DC plasma processing system which acts to immediately stop current from flowing through the plasma allows a variety of alternative embodiments for varying applications. In one embodiment, a tapped inductor is switched to ground to achieve substantial voltage reversal of about 10% upon detection of an arc condition through voltage and/or rate of voltage change techniques. This reversal of voltage is maintained long enough to allow restoration of uniform charge density within the plasma prior to restoration of the initial driving condition. A technique for preventing arc discharges involving periodically applying a reverse voltage is effected through a timer system in the power supply.

Abstract: A method and an apparatus are disclosed for sputter deposition of an insulating material on a substrate in a continuous mode of operation. A novel design for an anode assembly and driving power supply is disclosed to permit this. Single or multiple anodes are used, which at any given time may be biased negatively with respect to the plasma, so that any insulating material which may have been deposited thereupon may be sputtered away so as to provide a clean positive anode to the system, and at least for some period of time is biased positively so that it acts as an anode. The removal of any insulating material which may have formed on the anode structure permits its continuing effective use in collecting electrons from the plasma when it is biased positively, and therefore its continuing effective use as an anode for the system, permitting continuous operation of the system.

Abstract: An enhanced reactive plasma processing method and system useful for deposition of highly insulating films. A variety of alternative embodiments are allowed for varying applications. In one embodiment, a tapped inductor is switched to ground or some common level to achieve substantial voltage reversal of about 10% upon detection of an arc condition. This reversal of voltage is maintained long enough to either afford processing advantages or to allow restoration of uniform charge density within the plasma prior to restoration of the initial driving condition. A technique for preventing arc discharges involving periodically either interrupting the supply of power or reversing voltage is effected through a timer system in the power source.

Abstract: A method of thin film plasma processing which includes multiple power environments and circuitry is described so as to encompass a variety of configurations. The environments may establish an energy quantum which may be interactively adjusted such as for conditioning or processing when new targets or materials are inserted. The energy quantum can be increased from the traditionally low energy storage of a switch-mode power supply to a higher energy to allow more intense arc occurrences and, thus, the more rapid conditioning of a target. Switching between environments can be achieved manually or automatically through timing or through arc or plasma electrical characteristics sensing. Energy quantum may be adjusted through the inclusion of energy storage elements, hardwired elements, or through software configurations such as are possible with the utilization of a programmable processor. Applications for DC switch-mode thin film processing systems are specifically shown.