Abstract: Compounds, or pharmaceutically acceptable salts and esters thereof, of the formula: wherein A, B, D and E, R1, R2, and Z are specifically defined, having antibacterial activity, pharmaceutical compositions containing said compounds, treatment of bacterial infections with such compositions, and processes for the preparation of the compounds.

Abstract: The present invention relates to integrated circuits (ICs) fabrication. Particularly, there is a CMP process which incorporates small quantities of two chemicals. The first chemical is the standard slurry mixtures, like water, aluminum-oxide and hydrogen-peroxide mixed into a slurry. The second chemical is a strong base chemical, like KOH, or potassium hydroxide. Moreover, the CMP process utilizes a system of closely regulating the timing of the two chemical processes. Specifically, during a first time period, both chemicals are applied; thus providing a given speed of the chemical removal of tungsten material. During a second time period, the KOH is removed, so as to slow down the chemical action and facilitate a greater degree of planarization.

Abstract: Novel heterocyclic ether compounds having the formula: ##STR1## wherein A, m, R, X, Y.sup.1, Y.sup.2 and Y.sup.3 are specifically defined, which are useful in selectively controlling chemical synaptic transmission; therapeutically-effective pharmaceutical compositions thereof; and use of said compositions to selectively control synaptic transmission in mammals.

Abstract: The present invention relates to integrated circuits (ICs) fabrication. Particularly, there is a cmp process which incorporates small quantities of two chemicals. The first chemical is the standard slurry mixtures, like water, aluminum-oxide and hydrogen-peroxide mixed into a slurry. The second chemical is a strong base chemical, like KOH, or potassium hydroxide. Moreover, the cmp process utilizes a system of closely regulating the timing of the two chemical process. Specifically, during a first time period, both chemicals are applied; thus increasing speed of the chemical removal of tungsten material. During a second time period, the KOH is removed, thus slowing down the chemical action and importantly achieving a greater degree of planerization than is capable by the two chemical first time period.

Abstract: A method is disclosed for improved side wall and bottom coverage of high aspect ratio space situated upon a substrate in two (2) steps. A lining is formed on a side wall surface of the space that terminated at a bottom surface. An opening then remains to a void defined by the lining and the bottom surface. The void is filled with a material passing through the opening to the space. When sputtered, the lining can be formed by a less-collimated sputtered particle flux, and the void can be filled by a collimated sputtered particle flux. The lining can be formed by flux in a plasma formed from a first gas having a neutral to ion ratio, and the void can be filled by a flux in a plasma formed from a second gas having a neutral to ion ratio lower than that of the first. Also, the lining can be formed by a flux in a plasma formed from a first gas having an atomic mass, and the void can be filled by a flux in a plasma formed from a second gas having an atomic mass lower than that of the first.

Abstract: A contact space filled with conductive material having good step coverage is disclosed. The contact space is formed in a dielectric layer with an upper surface. The contact space has sidewalls comprised of the dielectric layer and a bottom comprised of an underlying layer. The contact space is filled by first depositing a layer of an amorphous material such as TiAl.sub.3 over the bottom and sidewalls of the contact space, then filling the contact space with a metallic fill material such as an aluminum-containing fill material. The amorphous material is chosen particularly to have low reactivity with the metallic fill material, so that mobility of the metallic fill material over the surface upon which it is deposited is facilitated.

Abstract: Novel heterocyclic ether compounds of the formula: ##STR1## wherein *, A,B, n, R.sup.1, R.sup.2 and X are specifically defined, or pharmaceutically-acceptable salts or prodrugs thereof, which are useful in selectively activating or inhibiting neurotransmitter release; to therapeutically-effective pharmaceutical compositions of these compounds; and to the use of said compositions to activate or inhibit neurotransmitter release in mammals.

Abstract: Novel 3-descladinose-2,3-anhydroerythromycin compounds and pharmaceutically acceptable salts and esters thereof having antibacterial activity.

Abstract: A compound selected from the group: ##STR1## wherein A, B, V, W, X and R.sup.8 are specifically defined; pharmaceutical compositions thereof; a method of treating or preventing bacterial infections by administering therapeutically effective pharmaceutical compositions thereof; and a process for the preparation thereof.

Abstract: The present invention is a polishing pad for use in chemical-mechanical planarization of semiconductor wafers by placing a wafer against a polishing surface of the polishing pad while rotating the polishing pad about its center in the presence of a polishing slurry. The polishing surface has formed therein one or more grooves extending in a spiral inwardly from the periphery to the center of the polishing pad. As a result, slurry is transported inwardly toward the center or toward the periphery of the polishing pad depending upon the circumferential direction of the spiral relative to the direction of rotation of the polishing pad.

Abstract: A method of sputter deposition for improved side wall and bottom coverage of high aspect ratio features on a substrate includes alternatingly exposing the substrate having high aspect ratio features to a collimated sputtered particle flux and a less-collimated sputtered particle flux until a desired deposition thickness is reached. A confining magnetic field may be used to reduce electron losses at process chamber walls, allowing for improved collimation of the collimated flux. The substrate may also be heated or biased during exposure to the less-collimated flux to increase the good side wall and step coverage of the less-collimated flux, and cooled or reverse-biased during exposure to the collimated flux to increase the good bottom coverage of the collimated flux. Alternatively, the substrate may be exposed to only a collimated flux, but good sidewall coverage by be achieved by alternating the temperature and/or bias of the substrate to provide the desired side wall and step coverage.

Abstract: Compound of formula (I) or salts thereof wherein R.sup.1 is hydrogen, methoxy or formamido; R.sup.2 is an acyl group; CO.sub.2 R.sup.3 is a carboxy group or a carboxylate anion, or R.sup.3 is a readily removable carboxy protecting group or a pharmaceutically acceptable salt-forming group or in vivo hydrolysable ester group; R.sup.4 represents hydrogen or up to four substituents; X is S, SO, SO.sub.2 or CH.sub.2 ; Y is O, S, SO or SO.sub.2 ; n is 0 or 1; m is 1 or 2; and wherein in the (a) ring system the dotted line indicates that one pair of adjacent ring carbon atoms is joined by a C.dbd.C double bond. These compounds have antibacterial activity.

Abstract: Compounds of formula (I) or salts thereof: wherein R.sup.1 is hydrogen, methoxy or formamido; R.sup.2 is an acyl group; CO.sub.2 R.sup.3 is a carboxy group or a carboxylate anion, or R.sup.3 is a readily removable carboxy protecting group or a pharmaceutically acceptable salt-forming group or in vivo hydrolysable ester group; R.sup.4, R.sup.5, R.sup.6 and R.sup.7 independently represent hydrogen or a bond or a substituent group or may form a cyclic system. These compounds have antibacterial activity.

Abstract: The present invention relates to integrated circuits (ICs) fabrication. Particularly, there is a cmp process which incorporates small quantities of two chemicals. The first chemical is the standard slurry mixtures, like water, aluminum-oxide and hydrogen-peroxide mixed into a slurry. The second chemical is a strong base chemical, like KOH, or potassium hydroxide. Moreover, the cmp process utilizes a system of closely regulating the timing of the two chemical process. Specifically, during a first time period, both chemicals are applied; thus increasing speed of the chemical removal of tungsten material. During a second time period, the KOH is removed, thus slowing down the chemical action and importantly achieving a greater degree of planerization than is capable by the two chemical first time period.

Abstract: Selective and potent cholinergic ligands selective for neuronal nicotinic cholinergic channel receptors, which ligands have the formula: ##STR1## as well as pharmaceutically-acceptable salts or prodrugs thereof, which are useful in the treatment of dementias, attentional hyperactivity disorder, or substance abuse withdrawal characterized by decreased cholinergic function, one of which is also an analgesic agent, and one of which is an agent useful for treating anxiety associated with cognitive impairment.

Abstract: A novel process for preparing enantiomerically-pure 3-methyl-5-(1-(C.sub.1 -C.sub.3 -alkyl)-2-pyrrolidinyl)isoxazole in high yield, wherein a protected pyrrolidine or 2-oxo-pyrrolidine starting material is reacted with a suitable organic anion and a resulting beta-keto oxime intermediate is cyclized and dehydrated, as well as intermediates useful in the preparation thereof.

Abstract: The present invention relates to a method of producing corticotropin-releasing factor (CRF) antagonist activity and thus provides a method of treating a wide range of stress-related disorders, including affective illnesses, such as depression and anxiety, as well as irritable bowel syndrome, anorexia nervosa, cardiovascular abnormalities and stress-induced immune suppression. The invention also relates to compounds (4-substituted thio-5-oxo-3-pyrazolines) and to pharmaceutical compositions suitable for use in such a method.

Abstract: A compound of formula (I): ##STR1## in which R is optionally substituted phenyl; C.sub.3-8 cycloalkyl; C.sub.5-8 cycloalkenyl; C.sub.1-8 alkyl which may be straight or branched; C.sub.2-8 alkenyl which may be straight or branched; 5- or 6-membered heterocyclyl; or optionally substituted phenyl C.sub.1-4 alkyl, each of Y and Z, which may be the same or different, is oxygen or sulphur; and X is --CH.sub.2 -- or oxygen, a process for the preparation of such compounds and their use in human and veterinary medicine.

Abstract: A compound of formula I ##STR1## in which formula: D represents hydrogen or a cyano group;X represents halogen;A represents an alkyl group (typically a C.sub.1 -C.sub.6 alkyl group);n is 0 to 4;RCOO. represents a residue of an acid RCO.sub.2 H, which acid, or an ester-forming derivative of which acid, on reaction with .alpha.-cyano-3-phenoxybenzyl alcohol or an ester-forming derivative thereof, give rise to an .alpha.-cyano-3-phenoxybenzyl ester having pesticidal properties.

Abstract: Pesticidal compounds have the formula: ##STR1## wherein D represents hydrogen or a cyano groupX represents chlorine or bromineA represents an alkyl groupn is 0 or an integer of 1-4 andRCOO is the residue of an acid RCOOH whose .alpha.-cyano-3-phenoxybenzyl ester has pesticidal properties. They are prepared by esterification methods.