Patents by Inventor Richard Matz

Richard Matz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6067312
    Abstract: Use of the method allows MRCW high-temperature laser diodes with a coupled optical waveguide to be produced in four epitaxial steps. The advantage is that, of the four epitaxial processes the first two and the last two are carried out virtually immediately successively after one another and an interruption is necessary only to produce a grating. Other components, such as photodiodes for example, can also be produced using the method.
    Type: Grant
    Filed: November 18, 1997
    Date of Patent: May 23, 2000
    Assignee: Siemens Aktiengesellschaft
    Inventors: Richard Matz, Bernhard Stegmuller
  • Patent number: 5821539
    Abstract: A directly converting radiation detector with a diode structure having first and second operating electrodes on opposite sides of a semiconductor body has an additional injector electrode, which injects charge carriers for the compensating charged traps in the semiconductor body. The secondary dark current generated in this way does not flow via the electrode used for measurement purposes and therefore does not influence the measured signal. The injection is facilitated by suitable doping under the injector electrode.
    Type: Grant
    Filed: April 23, 1997
    Date of Patent: October 13, 1998
    Assignee: Siemens Aktiengesellschaft
    Inventors: Richard Matz, Andreas Jahnke
  • Patent number: 5037507
    Abstract: An isolating arrangement for isolating a portion of a substrate from the remaining portions of the substrate, characterized by the arrangement comprising a pair of obliquely extending slots which merge with each other in the interior of the substrate to isolate a portion or region of the substrate from the remaining portion, except at least at one end of the portion extending between the slots. The slots are preferably formed by a laser-induced, wet-chemical etching and, subsequent to forming the slots, they can be filled with a material, such as metal or a ternary absorber material, to increase the isolation of the substrate region or portion.
    Type: Grant
    Filed: February 9, 1990
    Date of Patent: August 6, 1991
    Assignee: Siemens Aktiengesellschaft
    Inventors: Richard Matz, Jutta Zirrgiebel
  • Patent number: 4973133
    Abstract: A coupling arrangement for coupling an optical fiber to a planar integrated optical component characterized by a V-shaped groove being formed in a surface of the substrate, at least one end of the groove being closed by a vertical substrate wall containing an optical window formed by an end of an integrated optical component in said substrate, and an end of an optical fiber being secured in said groove with an end face being positioned adjacent said optical window. The arrangement is preferably made by etching oblique channels into a substrate containing the optical component to form a bridge extending parallel with the optical component, the bridge is then removed to expose an optical window in a substantially vertically extending wall, and then the optical fiber is positioned and secured in the groove with the end face of the fiber being positioned adjacent the optical window.
    Type: Grant
    Filed: September 13, 1989
    Date of Patent: November 27, 1990
    Assignee: Siemens Aktiengesellschaft
    Inventors: Richard Matz, Gerhard Winzer
  • Patent number: 4929515
    Abstract: An isolating arrangement for isolating a portion of a substrate from the remaining portions of the substrate, characterized by the arrangement comprising a pair of obliquely extending slots which merge with each other in the interior of the substrate to isolate a portion or region of the substrate from the remaining portion, except at least one end of the portion extending between the slots. The slots are preferably formed by a laser-induced, wet-chemical etching and, subsequent to forming the slots, they can be filled with a material, such as metal or a ternary absorber material, to increase the isolation of the substrate region or portion.
    Type: Grant
    Filed: January 27, 1989
    Date of Patent: May 29, 1990
    Assignee: Siemens Aktiengesellschaft
    Inventors: Richard Matz, Jutta Zirrgiebel
  • Patent number: 4859548
    Abstract: A method for generating a lattice structure with a phase shift on a surface of a substrate characterized by the steps of exposing of a photo-sensitive surface in an optical interference field and then subsequently exposing the same surface to a second interference field with the spatial frequencies of the two interference fields being changed a small amount between the two exposures. The photo-sensitive surface can be a photoresist layer applied on the substrate. After developing of the layer, this lattice structure is produced by etching. Another embodiment of the method is produced by means of a laser-active etching wherein the photo-sensitive surface is compound of a substrate surface in contact with an etchant and the etchant reaction is activated by the exposure.
    Type: Grant
    Filed: October 27, 1986
    Date of Patent: August 22, 1989
    Inventors: Gerhard Heise, Ulrich Wolff, Richard Matz