Abstract: Improved compilers recognize interception declarations in source code, and emit code that replaces invocations of specified artifacts with invocations of specified interceptors instead. Source generators proactively modify program behavior in arbitrary desired ways without introducing hidden security violations and without requiring edits by the program's developers. Interception declarations are visible in source code and development tools. In some cases, different invocations of a particular method at respective locations are intercepted by different replacement methods. Replacement methods have identical signatures, or are otherwise compatible. Some interceptors specify optional parameters. Method calls, field accesses, and property calls may be intercepted. Work to modify program behavior is moved in the program lifecycle from runtime to compile time, thus improving runtime performance and eliminating JIT compilation security risks.

Abstract: A method for producing a soft magnetic material having both high saturation magnetization and low coercive force, including: preparing an alloy having a composition represented by Compositional Formula 1 or 2 and having an amorphous phase, and heating the alloy at a rate of temperature rise of 10° C./sec or more and holding for 0 to 80 seconds at a temperature equal to or higher than the crystallization starting temperature and lower than the temperature at which Fe—B compounds start to form wherein, Compositional Formula 1 is Fe100-x-yBxMy, M represents at least one element selected from Nb, Mo, Ta, W, Ni, Co and Sn, and x and y are in atomic percent (at %) and satisfy the relational expressions of 10?x?16 and 0?y?8, and Compositional Formula 2 is Fe100-a-b-cBaCubM?c, M? represents at least one element selected from Nb, Mo, Ta, W, Ni and Co, and a, b and c are in atomic percent (at %) and satisfy the relational expressions 10?a?16, 0<b?2 and 0?c?8.

Abstract: An alloy having formula (Fe1-xCox)100-y-z-aByCuzMa, in which x=0.1-0.4, y=10-16, z=0-1, a=0-8, and M=Nb, Mo, Ta, W, Ni, or Sn, wherein the alloy has crystalline grains with an average size of 30 nm or less.

Abstract: A vanity plate assembly includes a plate that has indicia printed thereon. A strip is positionable against the plate. A pair of brackets is provided and each of the brackets releasably engages the strip. A pair of fasteners is each extendable through the plate, the strip and the brackets for coupling the plate, the strip and the brackets together. A pair of couplers is provided and each of the couplers releasably engages a respective one of the brackets. Each of the couplers releasably engages a respective one of a pair of chain supports on a hitch receiver of a vehicle. In this way the plate is suspended beneath the hitch receiver without interfering with using the hitch receiver.

Abstract: A method for producing a soft magnetic material having both high saturation magnetization and low coercive force, including: preparing an alloy having a composition represented by Compositional Formula 1 or 2 and having an amorphous phase, and heating the alloy at a rate of temperature rise of 10° C./sec or more and holding for 0 to 80 seconds at a temperature equal to or higher than the crystallization starting temperature and lower than the temperature at which Fe—B compounds start to form wherein, Compositional Formula 1 is Fe100-x-yBxMy, M represents at least one element selected from Nb, Mo, Ta, W, Ni, Co and Sn, and x and y are in atomic percent (at %) and satisfy the relational expressions of 10?x?16 and 0?y?8, and Compositional Formula 2 is Fe100-a-b-cBaCubM?c, M? represents at least one element selected from Nb, Mo, Ta, W, Ni and Co, and a, b and c are in atomic percent (at %) and satisfy the relational expressions 10?a?16, 0<b?2 and 0?c?8.

Abstract: A heavy duty washing apparatus for cleaning cooking substrates including hotplates and grills comprising: a. a self-contained housing allowing readily movability; b. a plurality of functionally interconnected stations for receiving supply of water, a chemical cleaning agent composition and a pressurised fluid; c. a pressurising station and a temperature conditioning station; d. a foam generator in the housing using controlling feeds from the plurality of interconnected stations and functionally engaging with the pressurising station and the temperature conditioning station for providing an effective chemical cleaning agent composition for conditioning one or more of the supply of water, the chemical cleaning agent composition and the pressurised fluid and e.

Abstract: Disclosed is a process for the preparation of a stabilized and flame retardant polyethylene article, which process comprises adding an effective stabilizing amount of one or more macrocyclic hindered amine light stabilizers and an effective flame retarding amount of one or more brominated flame retardants to a polyethylene substrate and subjecting the resultant polyethylene mixture to a high temperature of 250° C. or above, for instance to a temperature of 280° C. or above. The polyethylene articles are for example prepared by a high temperature rotomolding process or a high temperature film or laminate film extrusion process. The articles are white in color, have a smooth surface and produce little or no odor.

Abstract: A wall film monitoring system includes first and second microwave mirrors in a plasma processing chamber each having a concave surface. The concave surface of the second mirror is oriented opposite the concave surface of the first mirror. A power source is coupled to the first mirror and configured to produce a microwave signal. A detector is coupled to at least one of the first mirror and the second mirror and configured to measure a vacuum resonance voltage of the microwave signal. A control system is connected to the detector that compares a first measured voltage and a second measured voltage and determines whether the second voltage exceeds a threshold value. A method of monitoring wall film in a plasma chamber includes loading a wafer in the chamber, setting a frequency of a microwave signal output to a resonance frequency, and measuring a first vacuum resonance voltage of the microwave signal.

Abstract: An apparatus and a method for monitoring an optical transmission line. An optical pilot signal of a predetermined duration is transmitted along said optical transmission line and a return signal is sent back from a signal returner along the same transmission line corresponding to at least part of said optical pilot signal. The signal returner is positioned at a predetermined point along the optical transmission line. An optical detection apparatus detects said optical pilot signal and also detects said return signal. A monitoring unit receives detection signals from said optical detection apparatus and determins the time relationship between the predetermined duration of the optical pilot signal and the round-trip transit time of the optical pilot signal. A first monitoring signal is generated when the determined time relationship has a predetermined value, and at least one further monitoring signal is generated in other cases.

Abstract: A non-linear test load is provided for calibrating a plasma system. The test load is a substrate for modeling the electrical characteristics of the plasma such that multi frequency testing can be performed in the absence of a plasma reaction. An exemplary substrate includes a first semiconductor junction for providing a non-linear response to the multi-frequency RF source provided from the anode. The first semiconductor junction exhibits a first capacitance for modeling a first plasma sheath of the anode. A plasma component is responsive to the first semiconductor junction and exhibits a resistance for modeling a resistance of the plasma, an inductance for modeling an inductance of the plasma, and a gap capacitance for modeling capacitance of the plasma.

Abstract: A wall film monitoring system includes first and second microwave mirrors in a plasma processing chamber each having a concave surface. The concave surface of the second mirror is oriented opposite the concave surface of the first mirror. A power source is coupled to the first mirror and configured to produce a microwave signal. A detector is coupled to at least one of the first mirror and the second mirror and configured to measure a vacuum resonance voltage of the microwave signal. A control system is connected to the detector that compares a first measured voltage and a second measured voltage and determines whether the second voltage exceeds a threshold value. A method of monitoring wall film in a plasma chamber includes loading a wafer in the chamber, setting a frequency of a microwave signal output to a resonance frequency, and measuring a first vacuum resonance voltage of the microwave signal.

Abstract: The present invention provides a diagnostic system for plasma processing, wherein the diagnostic system comprises a multi-modal resonator, a power source, a detector, and a controller. The controller is coupled to the power source and the detector and it is configured to provide a man-machine interface for performing several monitoring and controlling functions associated with the diagnostic system including: a Gunn diode voltage monitor, a Gunn diode current monitor, a varactor diode voltage monitor, a detector voltage monitor, a varactor voltage control, a varactor voltage sweep control, a resonance lock-on control, a graphical user control, and an electron density monitor. The diagnostic system can further provide a remote controller coupled to the controller and configured to provide a remote man-machine interface. The remote man-machine interface. The remote man-machine interface can provide a graphical user interface in order to permit remote control of the diagnostic system by an operator.

Abstract: A wall film monitoring system includes first and second microwave mirrors in a plasma processing chamber each having a concave surface. The concave surface of the second mirror is oriented opposite the concave surface of the first mirror. A power source is coupled to the first mirror and configured to produce a microwave signal. A detector is coupled to at least one of the first mirror and the second mirror and configured to measure a vacuum resonance voltage of the microwave signal. A control system is connected to the detector that compares a first measured voltage and a second measured voltage and determines whether the second voltage exceeds a threshold value. A method of monitoring wall film in a plasma chamber includes loading a wafer in the chamber, setting a frequency of a microwave signal output to a resonance frequency, and measuring a first vacuum resonance voltage of the microwave signal.

Abstract: A method and apparatus for generating and controlling a plasma (130) formed in a capacitively coupled plasma system (100) having a plasma electrode (140) and a bias electrode in the form of a workpiece support member (170), wherein the plasma electrode is unitary and has multiple regions (Ri) defined by a plurality of RF power feed lines (156) and the RF power delivered thereto. The electrode regions may also be defined as electrode segments (420) separated by insulators (426). A set of process parameters A={n, ?i, ?i, Pi, S; Li} is defined; wherein n is the number of RF feed lines connected to the electrode upper surface at locations Li, ?i is the on-time of the RF power for the ith RF feed line, ?i is the phase of the ith RF feed line relative to a select one of the other RF feed lines, Pi is the RF power delivered to the electrode through the ith RF feed line at location Li, and S is the sequencing of RF power to the electrode through the RF feed lines.

Abstract: A process monitoring system (100) for monitoring a plasma processing system. The process monitoring system (100) includes a plurality of processing subsystems (120), and a control system (110) coupled to the processing subsystems (120). The control system (110) is configured to receive monitor data from the processing subsystems (120) and send control data to the processing subsystems (120). The process monitoring system (100) also includes an external interface (140) coupled to the control system (110), where the external interface (140) includes a paging system. The process monitoring system further includes a man-machine interface (MMI) coupled to the control system (110). The MMI is configured to display the monitor data, display the control data, and access the paging system.

Abstract: Integrated voltage and current (VI) probe (18) for integration inside a transmission line (17) having inner (3) and an outer (4) conductors. Current probes, often implemented as loop antennas, can be coupled to the outer conductor. The probes can either be built onto the same panel or on different panels.

Abstract: A system and method for maintaining a plasma in a plasma region by supplying RF power at a fundamental frequency to the plasma region together with a gas in order to create an RF electromagnetic field which interacts with the gas to create a plasma that contains electromagnetic energy components at frequencies that are harmonics of the fundamental frequency. The components at frequencies that are harmonics of the fundamental frequency are reduced by placing RF energy absorbing resistive loads in energy receiving communication with the plasma, the resistive loads having a frequency dependent attenuation characteristic such that the resistive loads attenuate electrical energy at frequencies higher than the fundamental frequency more strongly than energy at the fundamental frequency.

Abstract: The present invention provides a diagnostic system for plasma processing, wherein the diagnostic system comprises a multi-modal resonator, a power source, a detector, and a controller. The controller is coupled to the power source and the detector and it is configured to provide a man-machine interface for performing several monitoring and controlling functions associated with the diagnostic system including: a Gunn diode voltage monitor, a Gunn diode current monitor, a varactor diode voltage monitor, a detector voltage monitor, a varactor voltage control, a varactor voltage sweep control, a resonance lock-on control, a graphical user control, and an electron density monitor. The diagnostic system can further provide a remote controller coupled to the controller and configured to provide a remote man-machine interface. The remote man-machine interface. The remote man-machine interface can provide a graphical user interface in order to permit remote control of the diagnostic system by an operator.

Abstract: A RF sensor for sensing and analyzing parameters of plasma processing. The RF sensor is provided with a plasma processing tool and an antenna for receiving RF energy radiated from the plasma processing tool. The antenna is located proximate to the plasma processing tool so as to be non-invasive. Additionally, the RF sensor may be configured for wideband reception of multiple harmonics of the RF energy that is radiated from the plasma processing tool. Further, the RF sensor may be coupled to a high pass filter and a processor for processing the received RF energy. Additionally, the antenna may be located within an enclosure with absorbers to reduce the interference experienced by the RF sensor. Additionally, a tool control may be coupled to the processor to provided to adjust and maintain various parameters of plasma processing according to the information provided by the received RF energy.

Abstract: A method and apparatus for encoding a part in a semiconductor tool with a unique radio frequency response to an external radio frequency excitation. The method and apparatus remotely read the identifying radio frequency characteristic of a component of a semiconductor process tool.