Abstract: According to one embodiment, a defect inspection device includes a first beam splitter configured to branch light into a first optical path and a second optical path, a first optical system on the first optical path, a second optical system on the second optical path, a first aperture configured to form an illumination field of an inspection sample by light from the first optical system, a second aperture configured to form an illumination field of the inspection sample by light from the second optical system, and a third optical system configured to illuminate, with a first illumination, an image of the first aperture on a first area of the inspection sample, and to illuminate, with a second illumination, an image of the second aperture on a second area of the inspection sample.

Abstract: An inspection apparatus includes a tone correction unit, a dimensional error acquisition unit, and a map generating unit. The correction unit acquires a transmissivity distribution for transmission of light from a light source through an incident surface of an inspection target based on the optical image data to correct a tone of the optical image data so as to eliminate variations in contrast of the optical image data which correspond to the transmissivity distribution. The acquisition unit determines a dimension of the pattern based on the corrected optical image data to acquire a dimensional error that is a difference between the dimension of the pattern and a design value for the pattern. The generating unit generates a map in which the dimensional error is associated with the position coordinates of the table on the inspection target based on the position coordinates and the dimensional error.

Abstract: A pattern width deviation measurement method includes measuring width dimensions of a plurality of figure patterns in an optical image from data of gray-scale value profiles of the optical image, using a threshold of a gray-scale value level variably set depending on design dimension information including design width dimension of a corresponding figure pattern of a plurality of figure patterns, and at which influence of a focus position on width dimension becomes smaller, measuring width dimensions of a plurality of corresponding figure patterns in a reference image from data of gray-scale value profiles of the reference image, respectively using the threshold for the corresponding figure pattern of a plurality of figure patterns, and calculating, for each of measured width dimensions of a plurality of figure patterns in the optical image, an amount deviated from a measured width dimension of a corresponding figure pattern in the reference image.

Abstract: An inspection object is supported by a table. Light is emitted from a light source to illuminate the inspection object. An optical unit illuminates the inspection object with light, wherein the light is transmitted through the inspection object. Another optical unit illuminates the inspection object with light, wherein the light is reflected by the inspection object. Light transmitted through the inspection object is incident to a first sensor. Light reflected by the inspection object is incident to a second sensor. A defect of a pattern of the inspection object is detected using optical image data output from at least one of the sensors. A line width error is obtained by comparing line widths obtained from design data and optical image data of the pattern. A polarized beam splitter is disposed, movable between the inspection object and the first sensor, and between the inspection object and the second sensor.

Abstract: A pattern inspection apparatus includes a transmitted illumination optical system to illuminate change the shape of a first inspection light, a reflected illumination optical system to illuminate a mask substrate with a second inspection light by using an objective lens and a polarizing element, and let a reflected light from the mask substrate pass therethrough, a drive mechanism to enable the polarizing element to be moved from/to outside/inside an optical path, a sensor to receive a transmitted light from the mask substrate illuminated with the first inspection light during stage moving, and an aperture stop, between the mask substrate and the sensor, to adjust a light flux diameter of the transmitted light so that the transmitted light reaching the sensor can be switched between high and low numerical aperture (NA) states with which the transmitted light from the mask substrate can enter the objective lens.

Abstract: An inspection apparatus comprising, a focal position detector that detects a reference focal position of an image plane of a sample from a variation of an output value in optical image data of the sample, the output value being acquired by changing a distance between a first lens and the sample, and detects an optimum focal position of an inspection from the reference focal position, an image processor that obtains at least one of either an average gradation value in each predetermined unit region or a variation of a gradation value in the unit region with respect to the optical image data obtained at the optimum focal position, and a defect detector that detects a defect of the sample based on at least one of either the average gradation value or the variation of the gradation value.

Abstract: An inspection object is supported by a table. Light is emitted from a light source to illuminate the inspection object. An optical unit illuminates the inspection object with light, wherein the light is transmitted through the inspection object. Another optical unit illuminates the inspection object with light, wherein the light is reflected by the inspection object. Light transmitted through the inspection object is incident to a first sensor. Light reflected by the inspection object is incident to a second sensor. A defect of a pattern of the inspection object is detected using optical image data output from at least one of the sensors. A line width error is obtained by comparing line widths obtained from design data and optical image data of the pattern. A polarized beam splitter is disposed, movable between the inspection object and the first sensor, and between the inspection object and the second sensor.

Abstract: An inspection target is illuminated by an illumination optical unit using a light source. Optical image data of a pattern disposed in the inspection target is acquired by an imaging unit by causing light transmitted or reflected to be incident to a first and second area of a sensor. Reference image data is generated, corresponding to the optical image data, from design data of the pattern. The optical image data is corrected by obtaining a fluctuation of a gradation value of optical image data acquired using light incident to the second area, and correcting a gradation value of optical image data acquired using the light incident to the first area. A line width of the pattern of the corrected data, and a line width error which is a difference between the line widths of corrected data and reference image data are obtained by the line width error obtaining unit.

Abstract: An illumination apparatus comprising, a light source that emits a laser beam, a lens array on which the laser beam is illuminated, a plurality of element lenses having a diameter greater than or equal to the laser beam are arranged in the lens array, the lens array being rotatable around an optical axis of the laser beam, wherein the two lens arrays are arrayed in an optical axis direction of the laser beam, and the element lenses in each lens array are arranged such that a boundary between the element lenses adjacent to each other radiates from a rotation center of the lens array and a direction in which the element lens of one of the lens arrays traverses the optical axis of the laser beam is orthogonal to a direction in which the element lens of the other lens array traverses the optical axis of the laser beam.

Abstract: An illumination apparatus according to embodiments includes: a light source generating laser light; a rotational phase plate having a plurality of randomly arranged stepped regions, the rotational phase plate transmitting the laser light to give a phase change to the laser light; and an integrator including a plurality of lenses arranged in an array, the laser light transmitted through the rotational phase plate being incident on the integrator, an allowable angle of incidence for the laser light of the lenses being set at a maximum value of or larger than an angle of diffraction of a first order of the laser light at the rotational phase plate.

Abstract: According to one embodiment, a defect inspection device includes a first beam splitter configured to branch light into a first optical path and a second optical path, a first optical system on the first optical path, a second optical system on the second optical path, a first aperture configured to form an illumination field of an inspection sample by light from the first optical system, a second aperture configured to form an illumination field of the inspection sample by light from the second optical system, and a third optical system configured to illuminate, with a first illumination, an image of the first aperture on a first area of the inspection sample, and to illuminate, with a second illumination, an image of the second aperture on a second area of the inspection sample.

Abstract: According to one embodiment, a pattern test apparatus includes a light source configured to apply test light to a test sample, a polarizing beam splitter which reflects or transmits the test light, an imaging device which receives light which has been reflected by the test sample and transmitted through or reflected by the polarizing beam splitter, an optical system which forms a Fourier transform plane of the test sample between the test sample and the polarizing beam splitter, and a polarizing controller disposed in the Fourier transform plane. The polarizing controller includes a first region which lets the test light through, and a second region which is greater than the first region and lets the light reflected by the test sample through, and the each regions have different retardation quantities.

Abstract: In a focal position adjusting method for an inspection apparatus, the inspection apparatus includes an illumination optical system and an imaging optical system configured to perform a defect inspection of a pattern formed in a sample using an image imaged on a first sensor. The focal position adjusting method includes illuminating the light from the first light source on the sample after transmitting the light through a first slit disposed in the illumination optical system. The light from the first light source is condensed into a second sensor disposed in the imaging optical system. A light intensity distribution of a pupil of the illumination optical system is observed. The focal position of the illumination optical system is adjusted by obtaining each light quantity of the front focus and the rear focus of the image of the first slit projected on the sample based on the light intensity distribution.

Abstract: A sample support apparatus is provided in which a XY-table and a Z-table moving along a height direction are disposed in a Z-reference surface as a height reference, and in which a sample is disposed at a predetermined height position while supported by the Z-table, the sample support apparatus comprising, a height correction unit that controls movement of the Z-table, and a Z-sensor that is provided on the Z-reference surface to measure the height from the Z-reference surface, wherein a measuring surface is aligned along the same axis with respect to a measuring position of the sample, the height of the measuring surface from the Z-reference surface is measured by the Z-sensor, the height correction unit moves the Z-table according to the measured value of the height so that the sample is disposed at the predetermined height position.

Abstract: A defect detection method comprising, irradiating light from a light source in an optical system and obtaining a plurality of optical images of a sample having a repeated pattern of a size smaller than a resolution of the optical system; while changing the conditions of the optical system, performing correction processing for the optical images with the use of at least one of a noise filter and a convolution filter; shifting a position of the other optical images based on any of the plurality of optical images, obtaining a relationship between shift amounts of the other optical images and a change of correlation of a gray scale value between the plurality of optical images, and performing positional alignment of the optical images based on the shift amount obtained when the correlation is highest, performing defect detection of the sample with the use of the optical images after the positional alignment.

Abstract: A substrate to be inspected includes a first pattern constructed with a repetitive pattern that is not resolved by a wavelength of a light source, and at least one alignment mark that is arranged on the same plane as the first pattern. The alignment mark includes a second pattern constructed with a repetitive pattern that is not resolved by the wavelength of the light source, and a programmed defect that is provided in the second pattern and not resolved by the wavelength of the light source. A focus offset is adjusted such that the strongest signal of the programmed defect is obtained with respect to a base value of a gradation value in an optical image of the programmed defect by capturing the optical image while changing a focal distance between the surface in which the first pattern is provided and an optical system.

Abstract: According to one embodiment, a pattern test apparatus includes a light source configured to apply test light to a test sample, a polarizing beam splitter which reflects or transmits the test light, an imaging device which receives light which has been reflected by the test sample and transmitted through or reflected by the polarizing beam splitter, an optical system which forms a Fourier transform plane of the test sample between the test sample and the polarizing beam splitter, and a polarizing controller disposed in the Fourier transform plane. The polarizing controller includes a first region which lets the test light through, and a second region which is greater than the first region and lets the light reflected by the test sample through, and the each regions have different retardation quantities.

Abstract: An imaging capturing apparatus comprising, a light source, a polarizing beam splitter configured to illuminate a target with light from the light source, a sensor configured to capture an image of the inspection target by incidence of light reflected from the target through the polarizing beam splitter, and a Faraday rotator provided between the polarizing beam splitter and the target and disposed away from the polarizing beam splitter such that a Faraday rotation angle in the polarizing beam splitter is within a range of an angle equal to or larger than ?0.5 degrees and an angle equal to or smaller than 0.5 degrees.

Abstract: An illumination apparatus according to embodiments includes: a light source generating laser light; a rotational phase plate having a plurality of randomly arranged stepped regions, the rotational phase plate transmitting the laser light to give a phase change to the laser light; and an integrator including a plurality of lenses arranged in an array, the laser light transmitted through the rotational phase plate being incident on the integrator, an allowable angle of incidence for the laser light of the lenses being set at a maximum value of or larger than an angle of diffraction of a first order of the laser light at the rotational phase plate.

Abstract: In a focal position adjusting method for an inspection apparatus, the inspection apparatus includes an illumination optical system and an imaging optical system configured to perform a defect inspection of a pattern formed in a sample using an image imaged on a first sensor. The focal position adjusting method includes illuminating the light from the first light source on the sample after transmitting the light through a first slit disposed in the illumination optical system. The light from the first light source is condensed into a second sensor disposed in the imaging optical system. A light intensity distribution of a pupil of the illumination optical system is observed. The focal position of the illumination optical system is adjusted by obtaining each light quantity of the front focus and the rear focus of the image of the first slit projected on the sample based on the light intensity distribution.