Abstract: A light polarization control apparatus includes a linear polarized light generation device for generating a linearly polarized light ray; and a pair of first and second four-division type half-wave plate located at front and back positions of a light axis, each said half-wave plate having a surface divided into four regions by a couple of boundary lines crossing together at right angles, wherein the linearly polarized light ray is guided to pass through said pair of first and second four-division type half-wave plate to thereby divide this light ray into eight areas each having its polarization state as converted to any one of a azimuthally polarized state and a radially polarized state.

Abstract: This pattern inspection apparatus includes an inspection region information storage unit that stores an inspection region specified in a pattern region, a pattern surface height detection unit that detects a pattern surface height signal corresponding to a pattern surface height measurement position on the inspection sample, an autofocus mechanism that focuses on the inspection sample using the pattern surface height signal detected by the pattern surface height detection unit, a determination unit, and an autofocus mechanism control unit. When the determination unit determines that the pattern surface height measurement position is located within the inspection region, the autofocus mechanism control unit drives the autofocus mechanism, and the determination unit determines that the pattern surface height measurement position is not located within the inspection region, the autofocus mechanism control unit stops the autofocus mechanism.

Abstract: A reticle defect inspection apparatus that can carry out a defect inspection with high detection sensitivity are provided. The apparatus includes an optical system of transmitted illumination for irradiating one surface of a sample with a first inspection light, an optical system of reflected illumination for irradiating another surface of the sample with a second inspection light, and a detecting optical system that can simultaneously detect a transmitted light obtained by the first inspection light being passed through the sample and a reflected light obtained by the second inspection light being reflected by the sample. And the optical system of transmitted illumination includes a focusing lens driving mechanism for correcting a focal point shift of the transmitted light resulting from thickness of the sample.

Abstract: A reticle defect inspection apparatus that suppresses deterioration of optical components resulting from luminescent spots generated by an integrator and can sustain a defect inspection with high precision for a long time is provided. The reticle defect inspection apparatus is a reticle defect inspection apparatus for inspecting for defects on a reticle using a pattern image obtained by irradiating the reticle on which a pattern is formed with light. And the apparatus includes an illuminating optical system for irradiating the reticle with an inspection light and a detecting optical system for detecting a pattern image of the reticle irradiated with the inspection light, wherein the illuminating optical system comprises an integrator for equalizing illumination distribution of the inspection light and a moving mechanism for enabling the integrator to slightly move in a direction perpendicular to an optical axis of the integrator.

Abstract: In an automatic focus adjusting mechanism, a test sample having a patterned surface is mounted on a mount table, and an light beam passing through a slit formed in a field stop is applied to the patterned surface of the test sample. The light beam reflected from the test sample is split into two segment light beams. Focus adjusting aperture stops having respective apertures formed rhomboid are provided across the optical paths of the segment light beams. The amounts of the segment light beams passing through the rhomboid apertures are detected by light receiving units. Based on the difference between the detected light amounts, the position of the mount table is controlled by the focus adjusting unit.

Abstract: A reticle defect inspection apparatus that can carry out a defect inspection with high detection sensitivity are provided. The apparatus includes an optical system of transmitted illumination for irradiating one surface of a sample with a first inspection light, an optical system of reflected illumination for irradiating another surface of the sample with a second inspection light, and a detecting optical system that can simultaneously detect a transmitted light obtained by the first inspection light being passed through the sample and a reflected light obtained by the second inspection light being reflected by the sample. And the optical system of transmitted illumination includes a focusing lens driving mechanism for correcting a focal point shift of the transmitted light resulting from thickness of the sample.

Abstract: A reticle defect inspection apparatus that can carry out a defect inspection with high detection sensitivity are provided. The apparatus includes an optical system of transmitted illumination for irradiating one surface of a sample with a first inspection light, an optical system of reflected illumination for irradiating another surface of the sample with a second inspection light, and a detecting optical system that can simultaneously detect a transmitted light obtained by the first inspection light being passed through the sample and a reflected light obtained by the second inspection light being reflected by the sample. And the optical system of transmitted illumination includes a focusing lens driving mechanism for correcting a focal point shift of the transmitted light resulting from thickness of the sample.

Abstract: A reticle defect inspection apparatus that controls damage of a reticle by irradiation with an inspection light when the reticle is caused to be at rest is provided. The reticle defect inspection apparatus is a reticle defect inspection apparatus for inspecting for defects on a reticle using a pattern image obtained by irradiating the reticle on which a pattern is formed with light. The reticle defect inspection apparatus has a dose monitoring part for measuring a dose of the light to the reticle, a comparing part for comparing, after calculating accumulated irradiation from the dose measured by the dose monitoring part, the accumulated irradiation with a preset threshold, and a stop mechanism for stopping irradiation of the reticle with the light when, as a result of the comparison, the accumulated irradiation exceeds the threshold.

Abstract: In an automatic focus adjusting mechanism, a test sample having a patterned surface is mounted on a mount table, and an light beam passing through a slit formed in a field stop is applied to the patterned surface of the test sample. The light beam reflected from the test sample is split into two segment light beams. Focus adjusting aperture stops having respective apertures formed rhomboid are provided across the optical paths of the segment light beams. The amounts of the segment light beams passing through the rhomboid apertures are detected by light receiving units. Based on the difference between the detected light amounts, the position of the mount table is controlled by the focus adjusting unit.

Abstract: A mask-defect inspection apparatus including a plurality of illumination optical systems (2) for illuminating different areas (14a, 14b) on a mask (4) on which a pattern (6) is formed, an objective lens (OL) disposed to face the mask, and at least a pair of detection optical systems (15, 16) each having a detection sensor (17, 19) to form an image of the pattern and for receiving illumination light from each of the different areas through the objective lens, each of the detection optical systems having a mechanism (18a, 20a) for adjusting an angle of an aperture.

Abstract: A light polarization control apparatus includes a linear polarized light generation device for generating a linearly polarized light ray; and a pair of first and second four-division type half-wave plate located at front and back positions of a light axis, each said half-wave plate having a surface divided into four regions by a couple of boundary lines crossing together at right angles, wherein the linearly polarized light ray is guided to pass through said pair of first and second four-division type half-wave plate to thereby divide this light ray into eight areas each having its polarization state as converted to any one of a azimuthally polarized state and a radially polarized state.

Abstract: The mask defect inspection apparatus including an illumination optical system for illuminating a mask on which a pattern is formed; an objective lens facing the mask; at least a pair of detection optical systems having a detection sensor for obtaining an image of the pattern, respectively, and which receive illumination light from illumination areas different from each other through the objective lens, respectively; and focusing changing means for changing a position of focusing between sites of the pattern in a film-thickness direction of the mask and the pattern images obtained by the detection sensors, such that the pattern images obtained by the detection sensors are changed corresponding to the film-thickness direction of the mask.

Abstract: In a defect inspecting apparatus, a differential interference optical system forms a differential interference image which is produced from an optical interference of images in a predetermined direction, the images corresponding to inspecting parts of a pattern formed on a mask. A control part varies the predetermined direction so as to cause the differential interference optical system to produce another differential interference image. An image pickup sensor picks up the differential interference images in accordance with the variation of the predetermined direction. A defect detecting unit detects a defect in the pattern formed on the mask from comparing the differential interference images with reference images, respectively.

Abstract: A level detection apparatus includes an illumination slit in which a rectangular first opening which causes illumination light to pass is formed, an optical system configured to illuminate a target object surface by illumination light passing through the illumination slit and focuses reflected light from the target object surface, first and second detection slits which are arranged in front of and in back of a focal point and in each of which a second opening is formed such that a short side of a rectangle is shorter than a short side of a illumination slit image formed by the illumination slit and a long side of the rectangle is larger than a long side of the illumination slit image, first and second light amount sensors configured to detect amounts of light of the reflected lights passing through the first and second detection slits, and a calculating unit configured to calculate a level of the target object surface based on outputs from the first and second light amount sensors.

Abstract: A defect inspection apparatus includes an illumination optical system which sets a transmission illumination region and a reflection illumination region on an inspection target surface of a mask, first and second imaging units having first and second visual fields which are set on the inspection target surface, an imaging optical system that provides images, which are present on the first and second visual fields, on the first and second imaging units, a defect detection unit which detects a defect of the mask on the basis of the images provided on the first and second imaging units, and a control unit which controls a positional relationship between setting positions of the transmission illumination region and the reflection illumination region and setting positions of the first and second visual fields.

Abstract: A reticle defect inspection apparatus that suppresses deterioration of optical components resulting from luminescent spots generated by an integrator and can sustain a defect inspection with high precision for a long time is provided. The reticle defect inspection apparatus is a reticle defect inspection apparatus for inspecting for defects on a reticle using a pattern image obtained by irradiating the reticle on which a pattern is formed with light. And the apparatus includes an illuminating optical system for irradiating the reticle with an inspection light and a detecting optical system for detecting a pattern image of the reticle irradiated with the inspection light, wherein the illuminating optical system comprises an integrator for equalizing illumination distribution of the inspection light and a moving mechanism for enabling the integrator to slightly move in a direction perpendicular to an optical axis of the integrator.

Abstract: A reticle defect inspection apparatus that controls damage of a reticle by irradiation with an inspection light when the reticle is caused to be at rest is provided. The reticle defect inspection apparatus is a reticle defect inspection apparatus for inspecting for defects on a reticle using a pattern image obtained by irradiating the reticle on which a pattern is formed with light. The reticle defect inspection apparatus has a dose monitoring part for measuring a dose of the light to the reticle, a comparing part for comparing, after calculating accumulated irradiation from the dose measured by the dose monitoring part, the accumulated irradiation with a preset threshold, and a stop mechanism for stopping irradiation of the reticle with the light when, as a result of the comparison, the accumulated irradiation exceeds the threshold.

Abstract: A reticle defect inspection apparatus that can carry out a defect inspection with high detection sensitivity are provided. The apparatus includes an optical system of transmitted illumination for irradiating one surface of a sample with a first inspection light, an optical system of reflected illumination for irradiating another surface of the sample with a second inspection light, and a detecting optical system that can simultaneously detect a transmitted light obtained by the first inspection light being passed through the sample and a reflected light obtained by the second inspection light being reflected by the sample. And the optical system of transmitted illumination includes a focusing lens driving mechanism for correcting a focal point shift of the transmitted light resulting from thickness of the sample.

Abstract: A level detection apparatus includes an illumination slit in which a rectangular first opening which causes illumination light to pass is formed, an optical system configured to illuminate a target object surface by illumination light passing through the illumination slit and focuses reflected light from the target object surface, first and second detection slits which are arranged in front of and in back of a focal point and in each of which a second opening is formed such that a short side of a rectangle is shorter than a short side of a illumination slit image formed by the illumination slit and a long side of the rectangle is larger than a long side of the illumination slit image, first and second light amount sensors configured to detect amounts of light of the reflected lights passing through the first and second detection slits, and a calculating unit configured to calculate a level of the target object surface based on outputs from the first and second light amount sensors.

Abstract: The mask defect inspection apparatus including an illumination optical system for illuminating a mask on which a pattern is formed; an objective lens facing the mask; at least a pair of detection optical systems having a detection sensor for obtaining an image of the pattern, respectively, and which receive illumination light from illumination areas different from each other through the objective lens, respectively; and focusing changing means for changing a position of focusing between sites of the pattern in a film-thickness direction of the mask and the pattern images obtained by the detection sensors, such that the pattern images obtained by the detection sensors are changed corresponding to the film-thickness direction of the mask.