Patents by Inventor Robbert Edgar Van Leeuwen
Robbert Edgar Van Leeuwen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20210387892Abstract: An optical fiber, manufacturing intermediate for forming an optical fiber and a method for forming an optical fiber. The method includes providing a manufacturing intermediate having an elongate body and having an aperture extending through the elongate body along an axial dimension of the elongate body, a boundary of the aperture defining an internal surface of the manufacturing intermediate. The method further includes etching the internal surface of the manufacturing intermediate using an etching substance, and drawing the manufacturing intermediate along the axial dimension so as to form the optical fiber.Type: ApplicationFiled: October 3, 2019Publication date: December 16, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Robbert Edgar VAN LEEUWEN, Amir ABDOLVAND
-
Patent number: 10338483Abstract: An actuator system configured to position an object, the actuator system includes a piezo actuator having an actuator contact surface. The piezo actuator is configured to exert a force via the actuator contact surface onto the object. The piezo actuator includes a transparent piezo material. The actuator system further has an optical position sensor configured to measure a position of the actuator contact surface. The optical position sensor is configured to transmit an optical beam through the transparent piezo material to the actuator contact surface. The optical position sensor may form an interferometer.Type: GrantFiled: January 30, 2017Date of Patent: July 2, 2019Assignee: ASML Netherlands B.V.Inventors: Robbert Edgar Van Leeuwen, Hans Butler
-
Patent number: 10331045Abstract: A position measurement system to measure a position of an object relative to a reference, the position measurement system including two interferometers, wherein each interferometer is configured to form a reference beam and a measurement beam from input radiation and to combine the reference beam and the measurement beam to provide output radiation to be delivered to a detector, wherein each interferometer is configured such that the reference beam is formed by reflection of input radiation from a reflective element, and such that the measurement beam is formed by diffraction of input radiation from a grating on the object, and wherein the reference beam and the measurement beam are parallel to each other.Type: GrantFiled: May 26, 2016Date of Patent: June 25, 2019Assignee: ASML Netherlands B.V.Inventors: Engelbertus Antonius Fransiscus Van Der Pasch, Emiel Jozef Melanie Eussen, Robbert Edgar Van Leeuwen
-
Patent number: 10289011Abstract: A position measurement system includes an interferometer to determine a position of an object. The interferometer is arranged to generate a first, second and third signals representative of the position by irradiating respective first, second and third areas of a reflective surface of the object. Along a line, the first and second areas are at a first distance relative to each other, the second and third areas are at a second distance relative to each other, and the first and third areas are at a third distance relative to each other. The interferometer is arranged to provide a rotation signal representative of a rotation of the object along an axis based on the first, second and third signals. The axis is parallel to the reflective surface and perpendicular to the line.Type: GrantFiled: July 29, 2016Date of Patent: May 14, 2019Assignee: ASML Netherlands B.V.Inventors: Engelbertus Antonius Fransiscus Van Der Pasch, Robbert Edgar Van Leeuwen
-
Publication number: 20190079416Abstract: An actuator system configured to position an object, the actuator system includes a piezo actuator having an actuator contact surface. The piezo actuator is configured to exert a force via the actuator contact surface onto the object. The piezo actuator includes a transparent piezo material. The actuator system further has an optical position sensor configured to measure a position of the actuator contact surface. The optical position sensor is configured to transmit an optical beam through the transparent piezo material to the actuator contact surface. The optical position sensor may form an interferometer.Type: ApplicationFiled: January 30, 2017Publication date: March 14, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Robbert Edgar VAN LEEUWEN, Hans BUTLER
-
Patent number: 9915880Abstract: A measurement system configured to measure a position dependent signal of an object table, the measurement system including at least one sensor mountable on the object table and a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame, wherein the measurement system further includes a compensator configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensator may include a passive or an active damper and/or a feedback position controller. In an alternative embodiment, the compensator includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object.Type: GrantFiled: March 22, 2016Date of Patent: March 13, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Engelbertus Antonius Fransiscus Van Der Pasch, Andre Bernardus Jeunink, Robbert Edgar Van Leeuwen, Emiel Jozef Melanie Eussen
-
Publication number: 20160223917Abstract: A measurement system configured to measure a position dependent signal of an object table, the measurement system including at least one sensor mountable on the object table and a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame, wherein the measurement system further includes a compensator configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensator may include a passive or an active damper and/or a feedback position controller. In an alternative embodiment, the compensator includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object.Type: ApplicationFiled: March 22, 2016Publication date: August 4, 2016Applicant: ASML NETHERLANDS B.VInventors: Engelbertus Antonius Fransiscus VAN DER PASCH, Andre Bernardus JEUNINK, Robbert Edgar VAN LEEUWEN, Emiel Jozef Melanie EUSSEN
-
Patent number: 9329501Abstract: A lithographic apparatus includes a projection system, a substrate table, a plurality of sensors, an actuator and a controller. The projection system is configured to project a patterned beam of radiation onto a substrate. The substrate table is configured to support the substrate and to move relative to the projection system. The plurality of sensors is configured to measure a deformation of the substrate table. The actuator is configured to deform the substrate table. The controller is configured to control the actuator to deform the substrate table based on measurements made by the sensors. The plurality of sensors is located on a first side of the substrate table opposite to a second side of the substrate table facing the projection system. The plurality of sensors is substantially stationary relative to the projection system.Type: GrantFiled: June 12, 2012Date of Patent: May 3, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Yang-Shan Huang, Hans Butler, Jan Van Eijk, Sven Antoin Johan Hol, Engelbertus Antonius Fransiscus Van Der Pasch, Bastiaan Lambertus Wilhelmus Marinus Van De Ven, Johannes Petrus Martinus Bernardus Vermeulen, Theodorus Petrus Maria Cadee, Robbert Edgar Van Leeuwen
-
Patent number: 9316928Abstract: A measurement system configured to measure a position dependent signal of an object table, the measurement system including at least one sensor mountable on the object table and a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame, wherein the measurement system further includes a compensator configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensator may include a passive or an active damper and/or a feedback position controller. In an alternative embodiment, the compensator includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object.Type: GrantFiled: July 29, 2011Date of Patent: April 19, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Engelbertus Antonius Fransiscus Van Der Pasch, Emiel Jozef Melanie Eussen, Andre Bernardus Jeunink, Robbert Edgar Van Leeuwen
-
Patent number: 8922756Abstract: A position measurement system includes a first part and a second part for determining a position of a first member relative to a second member by providing a position signal representing a position of the first part relative to the second part, and a computational unit comprising an input terminal for receiving the position signal. The computational unit is configured to, in use, apply a conversion to the position signal to obtain a signal representing a position of the first member relative to the second member; and apply an adjustment to the conversion to at least partly compensate for a drift of the first part or the second part or both. The adjustment is based on a predetermined drift characteristic of the first part or the second part or both respectively. The predetermined drift characteristic includes one or more base shapes of the first part and/or the second part.Type: GrantFiled: August 20, 2012Date of Patent: December 30, 2014Assignee: ASML Netherlands B.V.Inventors: Willem Herman Gertruda Anna Koenen, Emiel Jozef Melanie Eussen, Engelbertus Antonius Fransiscus Van Der Pasch, Robbert Edgar Van Leeuwen, Adrianus Hendrik Koevoets
-
Patent number: 8675175Abstract: A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam.Type: GrantFiled: March 8, 2013Date of Patent: March 18, 2014Assignee: ASML Netherlands B.V.Inventors: Richard Alexander George, Cheng-Qun Gui, Pieter Willem Herman De Jager, Robbert Edgar Van Leeuwen, Jacobus Burghoorn
-
Patent number: 8614783Abstract: An encoder-type measurement system is configured to measure a position dependent signal of a movable object. The measurement system includes a light source and a sensor. The light source and the sensor are mounted on one of the movable object or a substantially stationary frame. The measurement system also includes a reference object that includes a grating or grid mounted on the other of the movable object or the substantially stationary frame. The light source is configured to emit a light beam towards the reference object. The sensor is configured to detect light of the light source reflected by the reference object. The measurement system also includes an error detector capable of detecting errors in or on the grating or grid of the sensor target object during a continuous production process.Type: GrantFiled: February 25, 2009Date of Patent: December 24, 2013Assignee: ASML Netherlands B.V.Inventors: Emiel Jozef Melanie Eussen, Engelbertus Antonius Fransiscus Van Der Pasch, Robbert Edgar Van Leeuwen, Renatus Gerardus Klaver, Martijn Robert Hamers
-
Patent number: 8395755Abstract: A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam.Type: GrantFiled: July 21, 2009Date of Patent: March 12, 2013Assignee: ASML Netherlands B.V.Inventors: Richard Alexander George, Cheng-Qun Gui, Pieter Willem Herman De Jager, Robbert Edgar Van Leeuwen, Jacobus Burghoorn
-
Publication number: 20130050670Abstract: A position measurement system includes a first part and a second part for determining a position of a first member relative to a second member by providing a position signal representing a position of the first part relative to the second part, and a computational unit comprising an input terminal for receiving the position signal. The computational unit is configured to, in use, apply a conversion to the position signal to obtain a signal representing a position of the first member relative to the second member; and apply an adjustment to the conversion to at least partly compensate for a drift of the first part or the second part or both. The adjustment is based on a predetermined drift characteristic of the first part or the second part or both respectively. The predetermined drift characteristic includes one or more base shapes of the first part and/or the second part.Type: ApplicationFiled: August 20, 2012Publication date: February 28, 2013Applicant: ASML NETHERLANDS B.V.Inventors: Willem Herman Gertruda Anna Koenen, Emiel Jozef Melanie Eussen, Engelbertus Antonius Fransiscus Van Der Pasch, Robbert Edgar Van Leeuwen, Adrianus Hendrik Koevoets
-
Publication number: 20120327386Abstract: A lithographic apparatus includes a projection system, a substrate table, a plurality of sensors, an actuator and a controller. The projection system is configured to project a patterned beam of radiation onto a substrate. The substrate table is configured to support the substrate and to move relative to the projection system. The plurality of sensors is configured to measure a deformation of the substrate table. The actuator is configured to deform the substrate table. The controller is configured to control the actuator to deform the substrate table based on measurements made by the sensors. The plurality of sensors is located on a first side of the substrate table opposite to a second side of the substrate table facing the projection system. The plurality of sensors is substantially stationary relative to the projection system.Type: ApplicationFiled: June 12, 2012Publication date: December 27, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Yang-Shan Huang, Hans Butler, Jan Van Eijk, Sven Antoin Johan Hol, Engelbertus Antonius Fransiscus Van Der Pasch, Bastiaan Lambertus Wilhelmus Marinus Van De Ven, Johannes Petrus Martinus Bernardus Vermeulen, Theodorus Petrus Maria Cadee, Robbert Edgar Van Leeuwen
-
Publication number: 20120050709Abstract: A measurement system configured to measure a position dependent signal of an object table, the measurement system including at least one sensor mountable on the object table and a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame, wherein the measurement system further includes a compensator configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensator may include a passive or an active damper and/or a feedback position controller. In an alternative embodiment, the compensator includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object.Type: ApplicationFiled: July 29, 2011Publication date: March 1, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Engelbertus Antonius Fransiscus VAN DER PASCH, Emiel Jozef Melanie Eussen, Andre Bernardus Jeunink, Robbert Edgar Van Leeuwen
-
Publication number: 20090284720Abstract: A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam.Type: ApplicationFiled: July 21, 2009Publication date: November 19, 2009Applicant: ASML Netherlands B.V.Inventors: Richard Alexander George, Cheng-Qun Gui, Pieter Willem Herman De Jager, Robbert Edgar Van Leeuwen, Jacobus Burghoorn
-
Publication number: 20090237634Abstract: An encoder-type measurement system is configured to measure a position dependent signal of a movable object. The measurement system includes a light source and a sensor. The light source and the sensor are mounted on one of the movable object or a substantially stationary frame. The measurement system also includes a reference object that includes a grating or grid mounted on the other of the movable object or the substantially stationary frame. The light source is configured to emit a light beam towards the reference object. The sensor is configured to detect light of the light source reflected by the reference object. The measurement system also includes an error detector capable of detecting errors in or on the grating or grid of the sensor target object during a continuous production process.Type: ApplicationFiled: February 25, 2009Publication date: September 24, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Emiel Jozef Melanie EUSSEN, Engelbertus Antonius Fransiscus VAN DER PASCH, Robbert Edgar VAN LEEUWEN, Renatus Gerardus KLAVER, Martijn Robert HAMERS
-
Patent number: 7576834Abstract: A lithographic apparatus is provided. The lithographic apparatus includes a radiation source configured to provide radiation, an array of optical light engines, and a substrate table that supports a substrate. Each of the optical light engines includes an array of individually controllable elements arranged and constructed to receive and to pattern the radiation and projection optics configured to receive the patterned radiation and to project the patterned radiation onto the substrate. The substrate table is arranged and constructed to move relative to the array of optical light engines during exposure of the substrate to the patterned radiation.Type: GrantFiled: May 1, 2008Date of Patent: August 18, 2009Assignee: ASML Netherlands B.V.Inventors: Richard Alexander George, Cheng-Qun Gui, Pieter Willem Herman de Jager, Robbert Edgar Van Leeuwen, Jacobus Burghoorn
-
Publication number: 20080218718Abstract: A lithographic apparatus is provided. The lithographic apparatus includes a radiation source configured to provide radiation, an array of optical light engines, and a substrate table that supports a substrate. Each of the optical light engines includes an array of individually controllable elements arranged and constructed to receive and to pattern the radiation and projection optics configured to receive the patterned radiation and to project the patterned radiation onto the substrate. The substrate table is arranged and constructed to move relative to the array of optical light engines during exposure of the substrate to the patterned radiation.Type: ApplicationFiled: May 1, 2008Publication date: September 11, 2008Applicant: ASML Netherlands B.V.Inventors: Richard Alexander George, Cheng-Qun Gui, Pieter Willem Herman de Jager, Robbert Edgar Van Leeuwen, Jacobus Burghoorn