Patents by Inventor Robbert Edgar Van Leeuwen

Robbert Edgar Van Leeuwen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 7385675
    Abstract: A lithographic apparatus in which alignment marks on the substrate are inspected during the exposure of the substrate to optimize the exposure conditions.
    Type: Grant
    Filed: May 26, 2004
    Date of Patent: June 10, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Richard Alexander George, Cheng-Qun Gui, Pieter Willem Herman de Jager, Robbert Edgar Van Leeuwen, Jacobus Burghoom
  • System and method of measurement, system and method of alignment, lithographic apparatus and method
    Patent number: 7280228
    Abstract: A lithographic apparatus includes a measurement system including at least one optical component and at least one electrical component. The electrical component is configured to dissipate heat. The optical component is mounted on a first frame of the apparatus, and the electrical component is mounted on a second frame of the apparatus that is thermally and mechanically decoupled from the first frame. An optical coupling is provided between the first frame and the second frame.
    Type: Grant
    Filed: July 2, 2004
    Date of Patent: October 9, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Gerrit Johannes Nijmeijer, Anastasius Jacobus Anicetus Bruinsma, Christiaan Alexander Hoogendam, Jeroen Thomas Broekhuijse, Sigurd Dressler, Edwin Eduard Nicolaas Josephus Krijnen, Robbert Edgar Van Leeuwen, Roeland Nicolaas Maria Vanneer, Cornelis Christiaan Ottens