Patents by Inventor Robert George Syvret

Robert George Syvret has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10717707
    Abstract: A method of making CF3CH2SH, comprising a step of reacting CF3CH2X, wherein X is halide or tosylate, with MSH, where M is an alkali metal such as Na or K, to yield CF3CH2SH.
    Type: Grant
    Filed: January 3, 2019
    Date of Patent: July 21, 2020
    Assignee: Arkema Inc.
    Inventors: Robert George Syvret, Craig Alan Polsz, Dana Lee Swan, Vijay R. Srinivas
  • Patent number: 10590150
    Abstract: Methods of synthesizing fluorosilanes containing cyano-substituted alkyl groups are provided. For example, 3-cyanopropyldimethylfluorosilane may be produced by reacting tetramethyldisiloxane and boron trifluoride to obtain fluorodimethylsilane and then reacting the fluorodimethylsilane with allyl cyanide, in the presence of a hydrosilylation catalyst.
    Type: Grant
    Filed: August 8, 2018
    Date of Patent: March 17, 2020
    Assignee: Arkema Inc.
    Inventors: Robert George Syvret, Craig Alan Polsz
  • Patent number: 10590149
    Abstract: Novel fluorosilicon nitrile compounds, and methods of preparing them, are described. The fluorosilicon nitrile compounds are characterized by having a total of four substituents attached to a silicon atom, wherein one or two of the substituents are fluorine atoms, one or two of the substituents are cyanoalkyl groups, which are the same as or different from each other, and the remainder of the substituents, if any, are alkyl groups, which are the same as or different from each other.
    Type: Grant
    Filed: July 17, 2018
    Date of Patent: March 17, 2020
    Assignee: Arkema Inc.
    Inventors: Robert George Syvret, Craig Alan Polsz
  • Publication number: 20190135740
    Abstract: A method of making CF3CH2SH, comprising a step of reacting CF3CH2X, wherein X is halide or tosylate, with MSH, where M is an alkali metal such as Na or K, to yield CF3CH2SH.
    Type: Application
    Filed: January 3, 2019
    Publication date: May 9, 2019
    Inventors: Robert George Syvret, Craig Alan Polsz, Dana Lee Swan, Vijay R. Srinivas
  • Publication number: 20180370995
    Abstract: Novel fluorosilicon nitrile compounds, and methods of preparing them, are described. The fluorosilicon nitrile compounds are characterized by having a total of four substituents attached to a silicon atom, wherein one or two of the substituents are fluorine atoms, one or two of the substituents are cyanoalkyl groups, which are the same as or different from each other, and the remainder of the substituents, if any, are alkyl groups, which are the same as or different from each other.
    Type: Application
    Filed: July 17, 2018
    Publication date: December 27, 2018
    Inventors: Robert George Syvret, Craig Alan Polsz
  • Patent number: 10155778
    Abstract: Novel fluorosilicon nitrile compounds, and methods of preparing them, are described. The fluorosilicon nitrile compounds are characterized by having a total of four substituents attached to a silicon atom, wherein one or two of the substituents are fluorine atoms, one or two of the substituents are cyanoalkyl groups, which are the same as or different from each other, and the remainder of the substituents, if any, are alkyl groups, which are the same as or different from each other.
    Type: Grant
    Filed: August 18, 2015
    Date of Patent: December 18, 2018
    Assignee: Arkema Inc.
    Inventors: Robert George Syvret, Craig Alan Polsz
  • Publication number: 20180346492
    Abstract: Methods of synthesizing fluorosilanes containing cyano-substituted alkyl groups are provided. For example, 3-cyanopropyldimethylfluorosilane may be produced by reacting tetramethyldisiloxane and boron trifluoride to obtain fluorodimethylsilane and then reacting the fluorodimethylsilane with allyl cyanide, in the presence of a hydrosilylation catalyst.
    Type: Application
    Filed: August 8, 2018
    Publication date: December 6, 2018
    Inventors: Robert George Syvret, Craig Alan Polsz
  • Publication number: 20170283443
    Abstract: Novel fluorosilicon nitrile compounds, and methods of preparing them, are described. The fluorosilicon nitrile compounds are characterized by having a total of four substituents attached to a silicon atom, wherein one or two of the substituents are fluorine atoms, one or two of the substituents are cyanoalkyl groups, which are the same as or different from each other, and the remainder of the substituents, if any, are alkyl groups, which are the same as or different from each other.
    Type: Application
    Filed: August 18, 2015
    Publication date: October 5, 2017
    Inventors: Robert George Syvret, Craig Alan Polsz
  • Publication number: 20170275307
    Abstract: Methods of synthesizing fluorosilanes containing cyano-substituted alkyl groups are provided.
    Type: Application
    Filed: August 14, 2015
    Publication date: September 28, 2017
    Inventors: Robert George Syvret, Craig Alan Polsz
  • Publication number: 20170210706
    Abstract: A method of making CF3CH2SH, comprising a step of reacting CF3CH2X, wherein X is halide or tosylate, with MSH, where M is an alkali metal such as Na or K, to yield CF3CH2SH. More specifically, a method of making CF3CH2SH, a step of reacting CF3CH2CI with a molar excess of NaSH in a reaction medium of one or more polar organic solvents at a temperature of from about 70 C to about 110 C for a time of from about 1 to about 5 hours.
    Type: Application
    Filed: July 31, 2015
    Publication date: July 27, 2017
    Inventors: Robert George Syvret, Craig Alan Polsz, Dana Lee Swan, Vijay R. Srinivas
  • Patent number: 7771611
    Abstract: Novel compositions are provided containing a compound represented by the formula YOSF5 or ZOSF5, where: (a) Y is: (i) an organic cation other than (Me2N)3S+ or (ii) an inorganic cation, provided that when Y is the inorganic cation, the composition further includes a complexing agent; and (b) Z is C1-20 alkyl, aryl, cycloalkyl, combinations thereof, or analogues thereof containing at least one heteroatom, provided that the compound represented by the formula ZOSF5 is a molecular compound. Processes of making the cationic compounds are disclosed as are processes for using the compositions containing cationic compounds in nucleophilic replacement reactions to prepare the compositions containing molecular compounds including the OSF5 group.
    Type: Grant
    Filed: July 10, 2006
    Date of Patent: August 10, 2010
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Robert George Syvret, Gauri Sankar Lal, Kristen Elaine Minnich
  • Publication number: 20080312464
    Abstract: A compound comprising at least one alicyclic or heteroalicyclic ring structure, the ring structure comprising a ring of about four to about eight atoms, wherein at least two adjacent atoms of the ring are carbon atoms and at least one of said carbon atoms is covalently bonded to an —OSF5 functional group and either is bonded to a moiety selected from hydrogen; halogen; C1-C6 substituted or unsubstituted, branched or straight alkyl; C5-C7 substituted or unsubstituted aryl or heteroaryl; C3-C8 aliphatic cyclic; OSF5; or is a member of a fused, bridged, fused-bridged, or spirocyclic ring system; provided that if the moiety is fluorine, then at least one of the other ring atoms are bonded to an atom or functional group other than fluorine; as well as methods for making the same.
    Type: Application
    Filed: June 12, 2007
    Publication date: December 18, 2008
    Applicant: AIR PRODUCTS AND CHEMICALS, INC.
    Inventors: Robert George Syvret, Gauri Sankar Lal
  • Patent number: 7416717
    Abstract: Provided are methods for producing pentahalosulfur peroxides and monoxides, such as bis-(pentafluorosulfur) peroxide, that involve exposing a composition comprising a pentahalosulfur hypohalite, and optionally a sulfur hexahalide or trihalomethyl hypohalite, to a halogen free radical scavenger.
    Type: Grant
    Filed: March 20, 2007
    Date of Patent: August 26, 2008
    Assignee: Air Products and Chemicals, Inc.
    Inventor: Robert George Syvret
  • Patent number: 7339081
    Abstract: A process for preparing bromo-1-oxypentafluorosulfanylbenzene is provided, the process including the step of brominating pentafluorosulfanyloxybenzene with a bromination agent to provide the bromo-1-oxypentafluorosulfanylbenzene. The process is more effective than prior art processes for preparing such compounds.
    Type: Grant
    Filed: July 10, 2006
    Date of Patent: March 4, 2008
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Robert George Syvret, Gauri Sankar Lal
  • Publication number: 20080033164
    Abstract: Novel compositions are provided containing a compound represented by the formula YOSF5 or ZOSF5, where: (a) Y is: (i) an organic cation other than (Me2N)3S+ or (ii) an inorganic cation, provided that when Y is the inorganic cation, the composition further includes a complexing agent; and (b) Z is C1-20 alkyl, aryl, cycloalkyl, combinations thereof, or analogues thereof containing at least one heteroatom, provided that the compound represented by the formula ZOSF5 is a molecular compound. Processes of making the cationic compounds are disclosed as are processes for using the compositions containing cationic compounds in nucleophilic replacement reactions to prepare the compositions containing molecular compounds including the OSF5 group.
    Type: Application
    Filed: July 10, 2006
    Publication date: February 7, 2008
    Inventors: Robert George Syvret, Gauri Sankar Lal, Kristen Elaine Minnich
  • Publication number: 20080009653
    Abstract: A process for preparing bromo-1-oxypentafluorosulfanylbenzene is provided, the process including the step of brominating pentafluorosulfanyloxybenzene with a bromination agent to provide the bromo-1-oxypentafluorosulfanylbenzene. The process is more effective than prior art processes for preparing such compounds.
    Type: Application
    Filed: July 10, 2006
    Publication date: January 10, 2008
    Inventors: Robert George Syvret, Gauri Sankar Lal
  • Patent number: 7300995
    Abstract: The present invention is; (a) a process for stabilizing a cyclotetrasiloxane, such as 1,3,5,7-tetramethylcyclotetrasiloxane, against polymerization used in a chemical vapor deposition process for silicon oxides in electronic material fabrication comprising providing an effective amount of a free radical scavenger polymerization inhibitor to such cyclotetrasiloxane; and (b) a composition of a cyclotetrasiloxane, such as 1,3,5,7-tetramethylcyclotetrasiloxane, stabilized against polymerization used in a chemical vapor deposition process as a precursor for silicon oxides in electronic material fabrication, comprising; such cyclotetrasiloxane and a free radical scavenger polymerization inhibitor.
    Type: Grant
    Filed: July 11, 2006
    Date of Patent: November 27, 2007
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Steven Gerard Mayorga, Manchao Xiao, Thomas Richard Gaffney, Robert George Syvret
  • Patent number: 7101948
    Abstract: The present invention is; (a) a process for stabilizing a cyclotetrasiloxane, such as 1,3,5,7-tetramethylcyclotetrasiloxane, against polymerization used in a chemical vapor deposition process for silicon oxides in electronic material fabrication comprising providing an effective amount of a free radical scavenger polymerization inhibitor to such cyclotetrasiloxane; and (b) a composition of a cyclotetrasiloxane, such as 1,3,5,7-tetramethylcyclotetrasiloxane, stabilized against polymerization used in a chemical vapor deposition process as a precursor for silicon oxides in electronic material fabrication, comprising; such cyclotetrasiloxane and a free radical scavenger polymerization inhibitor.
    Type: Grant
    Filed: June 23, 2003
    Date of Patent: September 5, 2006
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Steven Gerard Mayorga, Manchao Xiao, Thomas Richard Gaffney, Robert George Syvret
  • Patent number: 7002040
    Abstract: This invention relates generally to a improvement in a process for the purification of fluoroxy compounds, such as bis(fluoroxy)difluoromethane and fluoroxytrifluoromethane produced by the fluorination of carbon oxides. The improvement in effecting purification of the fluoroxy compounds is effected by initially selectively removing the fluorine by contacting with a crystalline zeolite and then removing the carbon oxide by selective adsorption.
    Type: Grant
    Filed: January 28, 2003
    Date of Patent: February 21, 2006
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Robert George Syvret, Philip Bruce Henderson, Donald Elson Fowler, Beth Ann Campion
  • Patent number: 6984366
    Abstract: A method for the production of nitrogen trifluoride from a fluorine reactant and an ammonium ion source that is dispersed within a liquid phase reaction mixture containing one or more perfluorocarbon fluids is disclosed herein. In one embodiment, the fluorine reactant is introduced to the reaction mixture at a temperature that ranges from 90° C. to 120° C. In this embodiment, the percentage yield of nitrogen trifluoride may be about 80% or greater.
    Type: Grant
    Filed: October 16, 2003
    Date of Patent: January 10, 2006
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Robert George Syvret, Beth Ann Campion, Gregory Alan Cooper, Joan Marie Schork