Patents by Inventor Robert J. Baseman

Robert J. Baseman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180292812
    Abstract: Controlling product production in multi-stage manufacturing process automatically generates by machine learning causal relationships between the processing conditions and the product quality based on product genealogy data and product quality data. Real time sensor data from sensors coupled to processing units in a manufacturing facility implementing the multi-stage manufacturing process are received, and control rules are instantiated based on the real time sensor data. An instantiated control rule firing causes an actuator to automatically set a processing variable to a set point specified in the control rule.
    Type: Application
    Filed: November 8, 2017
    Publication date: October 11, 2018
    Inventors: Robert J. Baseman, Jayant R. Kalagnanam, Young M. Lee, Jie Ma, Jian Wang, Guan Qun Zhang
  • Publication number: 20180292811
    Abstract: Controlling product production in multi-stage manufacturing process automatically generates by machine learning causal relationships between the processing conditions and the product quality based on product genealogy data and product quality data. Real time sensor data from sensors coupled to processing units in a manufacturing facility implementing the multi-stage manufacturing process are received, and control rules are instantiated based on the real time sensor data. An instantiated control rule firing causes an actuator to automatically set a processing variable to a set point specified in the control rule.
    Type: Application
    Filed: April 11, 2017
    Publication date: October 11, 2018
    Inventors: Robert J. Baseman, Jayant R. Kalagnanam, Young M. Lee, Jie Ma, Jian Wang, Guan Qun Zhang
  • Patent number: 9915942
    Abstract: A method, a computer program product, and a computer system for identifying significant and consumable-insensitive trace features. A computer computes a residual in a first regression of one or more secondary factors on a target. The computer computes residuals in a second regression of the one or more secondary factors on each of one or more trace features in one or more trace feature sets. The computer computes, for the one or more trace feature sets, coefficients of determination in a third regression of the residuals in the second regression on the residual in the first regression. The computer ranks the one or more trace feature sets by sorting the coefficient of determination. The computer determines, based on rankings of the one or more trace feature sets, significant trace feature sets.
    Type: Grant
    Filed: March 20, 2015
    Date of Patent: March 13, 2018
    Assignee: International Business Machines Corporation
    Inventors: Robert J. Baseman, Amit Dhurandhar, Fateh A. Tipu
  • Publication number: 20160274177
    Abstract: A method, a computer program product, and a computer system for identifying significant and consumable-insensitive trace features. A computer computes a residual in a first regression of one or more secondary factors on a target. The computer computes residuals in a second regression of the one or more secondary factors on each of one or more trace features in one or more trace feature sets. The computer computes, for the one or more trace feature sets, coefficients of determination in a third regression of the residuals in the second regression on the residual in the first regression. The computer ranks the one or more trace feature sets by sorting the coefficient of determination. The computer determines, based on rankings of the one or more trace feature sets, significant trace feature sets.
    Type: Application
    Filed: March 20, 2015
    Publication date: September 22, 2016
    Inventors: Robert J. Baseman, Amit Dhurandhar, Fateh A. Tipu
  • Patent number: 9299623
    Abstract: An apparatus for performing run-to-run control and sampling optimization in a semiconductor manufacturing process includes at least one control module. The control module is operative: to determine a process output and corresponding metrology error associated with an actual metrology for a current processing run in the semiconductor manufacturing process; to determine a predicted process output and corresponding prediction error associated with a virtual metrology for the current processing run; and to control at least one parameter corresponding to a subsequent processing run as a function of the metrology error and the prediction error.
    Type: Grant
    Filed: November 8, 2012
    Date of Patent: March 29, 2016
    Assignee: International Business Machines Corporation
    Inventors: Robert J. Baseman, Jingrui He, Emmanuel Yashchin, Yada Zhu
  • Patent number: 8793106
    Abstract: A system, method and computer program product for predicting at least one feature of at least one product being manufactured. The system receives, from at least one sensor installed in equipment performing one or more manufacturing process steps, at least one measurement of the feature of the product being manufactured. The system selects one or more of the received measurement of the feature of the product. The system estimates additional measurements of the feature of the product at a current manufacturing process step. The system creates a computational model for predicting future measurements of the feature of the product, based on the selected measurement and the estimated additional measurements. The system predicts the future measurements of the feature of the product based on the created computational model. The system outputs the predicted future measurements of the feature of the product.
    Type: Grant
    Filed: September 23, 2011
    Date of Patent: July 29, 2014
    Assignee: International Business Machines Corporation
    Inventors: Robert J. Baseman, Amit Dhurandhar, Sholom M. Weiss, Brian F. White
  • Patent number: 8732627
    Abstract: A method for performing enhanced wafer quality prediction in a semiconductor manufacturing process includes the steps of: obtaining data including at least one of tensor format wafer processing conditions, historical wafer quality measurements and prior knowledge relating to at least one of the semiconductor manufacturing process and wafer quality; building a hierarchical prediction model including at least the tensor format wafer processing conditions; and predicting wafer quality for a newly fabricated wafer based at least on the hierarchical prediction model and corresponding tensor format wafer processing conditions.
    Type: Grant
    Filed: June 18, 2012
    Date of Patent: May 20, 2014
    Assignee: International Business Machines Corporation
    Inventors: Robert J. Baseman, Jingrui He, Yada Zhu
  • Patent number: 8718809
    Abstract: A system for determining a group of semiconductor manufacturing process steps with a similar influence on individual semiconductor products. The system generates a first table including time stamps for the individual semiconductor products. The system creates a second table including Q-times based on the first table. The Q-times refers to time differences between every pair of the time stamps. The system forms a dependency table by grouping the Q-times with similar dependencies together. The system identifies groups of the similar dependencies. The system extracts semiconductor process steps belonging to the groups.
    Type: Grant
    Filed: May 12, 2010
    Date of Patent: May 6, 2014
    Assignee: International Business Machines Corporation
    Inventors: Robert J. Baseman, Tomasz J. Nowicki
  • Publication number: 20140031969
    Abstract: An apparatus for performing run-to-run control and sampling optimization in a semiconductor manufacturing process includes at least one control module. The control module is operative: to determine a process output and corresponding metrology error associated with an actual metrology for a current processing run in the semiconductor manufacturing process; to determine a predicted process output and corresponding prediction error associated with a virtual metrology for the current processing run; and to control at least one parameter corresponding to a subsequent processing run as a function of the metrology error and the prediction error.
    Type: Application
    Filed: November 8, 2012
    Publication date: January 30, 2014
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Robert J. Baseman, Jingrui He, Emmanuel Yashchin, Yada Zhu
  • Patent number: 8639375
    Abstract: A system, method and/or computer program product for analyzing a functionality of at least two manufactured products obtain a first characteristic of a first manufactured product. The system acquires a second characteristic of a second manufactured product. The system identifies a common feature between the first characteristic and the second characteristic. The system identifies a distinguishable feature between the first characteristic and the second characteristic. The system determines a cause of a deviation of a functionality in the first manufactured product or the second manufactured product or both manufactured products based on the identified common feature or the identified distinguishable feature or both features.
    Type: Grant
    Filed: November 20, 2012
    Date of Patent: January 28, 2014
    Assignee: International Business Machines Corporation
    Inventors: Robert J. Baseman, Tomasz J. Nowicki, Fateh A. Tipu
  • Publication number: 20130339919
    Abstract: A method for performing enhanced wafer quality prediction in a semiconductor manufacturing process includes the steps of: obtaining data including at least one of tensor format wafer processing conditions, historical wafer quality measurements and prior knowledge relating to at least one of the semiconductor manufacturing process and wafer quality; building a hierarchical prediction model including at least the tensor format wafer processing conditions; and predicting wafer quality for a newly fabricated wafer based at least on the hierarchical prediction model and corresponding tensor format wafer processing conditions.
    Type: Application
    Filed: June 18, 2012
    Publication date: December 19, 2013
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Robert J. Baseman, Jingrui He, Yada Zhu
  • Publication number: 20130338808
    Abstract: An apparatus for performing enhanced wafer quality prediction in a semiconductor manufacturing process includes memory, for storing historical data relating to the semiconductor manufacturing process, and at least one processor in operative communication with the memory. The processor is operative: to obtain data including tensor format wafer processing conditions, historical wafer quality measurements and/or prior knowledge relating to at least one of the semiconductor manufacturing process and wafer quality; to build a hierarchical prediction model including at least the tensor format wafer processing conditions; and to predict wafer quality for a newly fabricated wafer based at least on the hierarchical prediction model and corresponding tensor format wafer processing conditions.
    Type: Application
    Filed: July 26, 2012
    Publication date: December 19, 2013
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Robert J. Baseman, Jingrui He, Yada Zhu
  • Patent number: 8594821
    Abstract: A system, a method and a computer program product for identifying incompatible manufacturing tools. The system receives measurements of products that were subject to a manufacturing process involving a plurality of manufacturing tools. The measurements pertain to a performance characteristic of each product. The system evaluates whether each manufacturing tool implemented in a sequential manufacturing process individually performs normally based on the received measurements. In response to evaluating each manufacturing tool implemented in said manufacturing process individually performs normally, the system evaluates whether a first combination of the manufacturing tools together in sequential manufacturing process perform normally based on the received measurements.
    Type: Grant
    Filed: February 18, 2011
    Date of Patent: November 26, 2013
    Assignee: International Business Machines Corporation
    Inventors: Robert J. Baseman, Fateh A. Tipu, Sholom M. Weiss
  • Patent number: 8594826
    Abstract: A method, a system and a computer program product suitable for use in a manufacturing environment comprising a multiplicity of nominally identical independent tools. A computing device generates a multi dimensional array of process trace data derived from at least one of the independent tools, wherein, the array includes data representing a first dimension comprising a list of steps in a manufacturing recipe and data representing a second dimension comprising a list of a set of sensors generating measurements from at least one of the independent tools. The computing device conducts an analysis on at least one preselected subset of the multi dimensional array for the purpose of evaluating at least one operating characteristic of at least one of the independent tools. The computing device presents results of the analysis via a set of hierarchically linked and browseable graphics.
    Type: Grant
    Filed: September 10, 2012
    Date of Patent: November 26, 2013
    Assignee: International Business Machines Corporation
    Inventors: Ehud Aharoni, Robert J. Baseman, Ramona Kei, Oded Margalit, Kevin Mackey, Michal Rosen-Zvi, Raminderpal Singh, Noam Slonim, Hong Lin, Fateh A. Tipu, Adam D. Ticknor, Timothy M. McCormack
  • Patent number: 8533635
    Abstract: The present invention includes a computing system determining a best alias rule in a semiconductor manufacturing process. The computing system obtains an original rule and candidate alias rules based on sampled data from the semiconductor manufacturing process. The computing system compares the original rule to the candidate alias rules. The computing system ranks the candidate alias rules according to the comparison. The computing system filters the ranked candidate alias rules. A user selects one rule among the filtered candidate alias rules based on knowledge of the semiconductor manufacturing process.
    Type: Grant
    Filed: January 20, 2010
    Date of Patent: September 10, 2013
    Assignee: International Business Machines Corporation
    Inventors: Robert J. Baseman, Fateh A. Tipu, Sholom M. Weiss
  • Publication number: 20130080125
    Abstract: A system, method and computer program product for predicting at least one feature of at least one product being manufactured. The system receives, from at least one sensor installed in equipment performing one or more manufacturing process steps, at least one measurement of the feature of the product being manufactured. The system selects one or more of the received measurement of the feature of the product. The system estimates additional measurements of the feature of the product at a current manufacturing process step. The system creates a computational model for predicting future measurements of the feature of the product, based on the selected measurement and the estimated additional measurements. The system predicts the future measurements of the feature of the product based on the created computational model. The system outputs the predicted future measurements of the feature of the product.
    Type: Application
    Filed: September 23, 2011
    Publication date: March 28, 2013
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Robert J. Baseman, Amit Dhurandhar, Sholom M. Weiss, Brian F. White
  • Publication number: 20130006406
    Abstract: A method, a system and a computer program product suitable for use in a manufacturing environment comprising a multiplicity of nominally identical independent tools. A computing device generates a multi dimensional array of process trace data derived from at least one of the independent tools, wherein, the array includes data representing a first dimension comprising a list of steps in a manufacturing recipe and data representing a second dimension comprising a list of a set of sensors generating measurements from at least one of the independent tools. The computing device conducts an analysis on at least one preselected subset of the multi dimensional array for the purpose of evaluating at least one operating characteristic of at least one of the independent tools. The computing device presents results of the analysis via a set of hierarchically linked and browseable graphics.
    Type: Application
    Filed: September 10, 2012
    Publication date: January 3, 2013
    Applicant: International Business Machines Corporation
    Inventors: Ehud Aharoni, Robert J. Baseman, Ramona Kei, Oded Margalit, Kevin Mackey, Michal Rosen-Zvi, Raminderpal Singh, Noam Slomin, Hong Lin, Fateh Ali Tipu, Adam Daniel Ticknor, Timothy M. McCormack
  • Publication number: 20120330450
    Abstract: A system for determining a group of semiconductor manufacturing process steps with a similar influence on individual semiconductor products. The system generates a first table including time stamps for the individual semiconductor products. The system creates a second table including Q-times based on the first table. The Q-times refers to time differences between every pair of the time stamps. The system forms a dependency table by grouping the Q-times with similar dependencies together. The system identifies groups of the similar dependencies. The system extracts semiconductor process steps belonging to the groups.
    Type: Application
    Filed: September 6, 2012
    Publication date: December 27, 2012
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Robert J. Baseman, Tomasz J. Nowicki
  • Publication number: 20120316818
    Abstract: A computer-based measurement monitoring system and method for monitoring multi-stage processes capable of producing multi-orderable data and identifying, at any stage in the monitored process, unacceptable deviations from an expected value at particular stages of the process, and communicating same detected deviation to facilitate corrective action in the process. The system and method consolidate data obtained at various stages of the process, arrange the measurement data in a multi-orderable data framework, compare the multi-orderable framework data with expected parameter values corresponding to the various stages, and detects-unacceptable deviations from the expected values. The unacceptable deviations are communicated to responsible personnel, and the system and method provides same personnel with supplemental information useful in diagnosing the root cause of the problem leading to the detected deviations.
    Type: Application
    Filed: August 17, 2012
    Publication date: December 13, 2012
    Applicant: International Business Machines Corporation
    Inventors: Robert J. Baseman, William K. Hoffman, Steven Ruegsegger, Emmanuel Yashchin
  • Patent number: 8328950
    Abstract: There are provided a system, method and computer program product for detecting foreign materials in a semiconductor manufacturing process. The manufacturing process uses a plurality of semiconductor manufacturing tools. The system categorizes at least one monitoring wafer according to one or more categories. The system supplies the categorized monitoring wafer to a semiconductor manufacturing tool. The system observes a level of contamination on the categorized monitoring wafer. The system compares the level of contamination to a threshold. The system cleans the tool in a response to determining that the level of contamination is larger than the threshold. The system determines which category of the wafer leaves a highest level of contamination on the tool. The system identifies a root cause of the highest level of contamination on the tool.
    Type: Grant
    Filed: May 20, 2010
    Date of Patent: December 11, 2012
    Assignee: International Business Machines Corporation
    Inventors: Robert J. Baseman, Tomasz J. Nowicki