Patents by Inventor Robert L. Wright
Robert L. Wright has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11932935Abstract: Provided is a process for the rapid deposition of highly conformal molybdenum- or tungsten-containing films onto microelectronic device substrates under vapor deposition conditions. In the practice of the invention, a first nucleation step is conducted, while utilizing a generally lower concentration of metal precursor than would ordinarily be utilized in the reaction zone. This utilization of lower metal precursor concentrations can be achieved by way of regulating the temperature of the ampoule (housing the precursor), the concentration of the precursor, pressure in the reaction zone, and the duration of the pulse. In this fashion, a generally lower concentration is utilized to form a nucleation layer of greater than or equal to about 3 ?, or up to about 9, 15, or 25 ?, at which time, the conditions for introducing the precursor are advantageously changed and the concentration of the precursor in the reaction zone is increased for the purpose of bulk deposition.Type: GrantFiled: May 6, 2022Date of Patent: March 19, 2024Assignee: ENTEGRIS, INC.Inventor: Robert L. Wright, Jr.
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Patent number: 11919780Abstract: The invention provides a process for preparing molybdenum and tungsten oxyhalide compounds which are useful in the deposition of molybdenum and tungsten containing films on various surfaces of microelectronic devices. In the process of the invention, a molybdenum or tungsten trioxide is heated in either a solid state medium or in a melt-phase reaction comprising a eutectic blend comprising alkaline and/or alkaline earth metal salts. The molybdenum or tungsten oxyhalides thus formed may be isolated as a vapor and crystallized to provide highly pure precursor compounds such as MoO2Cl2.Type: GrantFiled: July 8, 2020Date of Patent: March 5, 2024Assignee: ENTEGRIS, INC.Inventors: David M. Ermert, Robert L. Wright, Jr., Thomas H. Baum, Bryan C. Hendrix
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Patent number: 11624111Abstract: A methodology for (a) the etching of films of Al2O3, HfO2, ZrO2, W, Mo, Co, Ru, SiN, or TiN, or (b) the deposition of tungsten onto the surface of a film chosen from Al2O3, HfO2, ZrO2, W, Mo, Co, Ru, Ir, SiN, TiN, TaN, WN, and SiO2, or (c) the selective deposition of tungsten onto metallic substrates, such as W, Mo, Co, Ru, Ir and Cu, but not metal nitrides or dielectric oxide films, which comprises exposing said films to WOCl4 in the presence of a reducing gas under process conditions.Type: GrantFiled: January 15, 2021Date of Patent: April 11, 2023Assignee: ENTEGRIS, INC.Inventors: Robert L. Wright, Jr., Thomas H. Baum, David M. Ermert
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Publication number: 20230034168Abstract: A data processing system is for producing a weather report. The data processing system may include external weather event databases, each external weather event database having a different weather event data set, and a server in communication with the external weather event databases. The server may be configured to import the different weather event data sets from the external weather event databases, perform a filtering process on the different weather event data sets from the external weather event databases, and generate the weather report based upon the filtered different weather event data sets from the external weather event databases and a geolocation.Type: ApplicationFiled: October 7, 2022Publication date: February 2, 2023Inventor: ROBERT L. WRIGHT
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Publication number: 20220356563Abstract: Provided is a process for the rapid deposition of highly conformal molybdenum- or tungsten-containing films onto microelectronic device substrates under vapor deposition conditions. In the practice of the invention, a first nucleation step is conducted, while utilizing a generally lower concentration of metal precursor than would ordinarily be utilized in the reaction zone. This utilization of lower metal precursor concentrations can be achieved by way of regulating the temperature of the ampoule (housing the precursor), the concentration of the precursor, pressure in the reaction zone, and the duration of the pulse. In this fashion, a generally lower concentration is utilized to form a nucleation layer of greater than or equal to about 3 ?, or up to about 9, 15, or 25 ?, at which time, the conditions for introducing the precursor are advantageously changed and the concentration of the precursor in the reaction zone is increased for the purpose of bulk deposition.Type: ApplicationFiled: May 6, 2022Publication date: November 10, 2022Inventor: Robert L. Wright, JR.
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Patent number: 11487048Abstract: A data processing system is for producing a weather report. The data processing system may include external weather event databases, each external weather event database having a different weather event data set, and a server in communication with the external weather event databases. The server may be configured to import the different weather event data sets from the external weather event databases, perform a filtering process on the different weather event data sets from the external weather event databases, and generate the weather report based upon the filtered different weather event data sets from the external weather event databases and a geolocation.Type: GrantFiled: December 14, 2021Date of Patent: November 1, 2022Assignee: Weather Strike, LLCInventor: Robert L. Wright
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Publication number: 20220099860Abstract: A data processing system is for producing a weather report. The data processing system may include external weather event databases, each external weather event database having a different weather event data set, and a server in communication with the external weather event databases. The server may be configured to import the different weather event data sets from the external weather event databases, perform a filtering process on the different weather event data sets from the external weather event databases, and generate the weather report based upon the filtered different weather event data sets from the external weather event databases and a geolocation.Type: ApplicationFiled: December 14, 2021Publication date: March 31, 2022Inventor: ROBERT L. WRIGHT
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Publication number: 20220068094Abstract: Embodiments of the invention are directed to systems, methods, and computer program products for resource dispensing at a computer terminal using pre-stage capabilities for a completely contactless experience for physical resource distribution. The system identifying one or more tokens within a user application at a pre-stage event, where the user is able to pre-stage a resource dispensing at a computer terminal in the future. The system may review the token selected for confidence and transmit a resource distribution request amount and a security token tied to the identified user application. Upon contactless communication with a computer terminal, the system extracts the resource distribution request information and security token. The system may confirm the resource distribution request information and security token received at pre-stage with a user current token selection and authorize the pre-staged resource distribution at the computer terminal without additional authentication.Type: ApplicationFiled: August 28, 2020Publication date: March 3, 2022Applicant: BANK OF AMERICA CORPORATIONInventors: Tony England, Harold Joseph Kennedy, Robert L. Wright, JR.
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Publication number: 20220058906Abstract: Contactless dispensing of objects from object-dispensing machines. A digital token is wirelessly communicated to the machine via short-range wireless communication, such as Near Field Communication (NFC) or the like. In response, a push notification is communicated to the user's wireless device, which includes an activatable link for launching a mobile application. In response to launching the mobile application and authenticating the user, the mobile application provides object-dispensing machine-like user interfaces that are configured to allow the user to input object requesting parameters and submit a request for objects to be dispensed from the object-dispensing machine. The request is communicated to the object-dispensing machines (or corresponding backend processing systems) and, once the request is verified, the object-dispensing machine dispenses the requested objects.Type: ApplicationFiled: August 21, 2020Publication date: February 24, 2022Applicant: BANK OF AMERICA CORPORATIONInventors: Srinivas Dundigalla, Mohan Rao Balan, Pavan Kumar Chayanam, Varsha Devadas, Tony England, Hari Gopalkrishnan, Brandon Kozlowski, Kurt A. Loth, Navdeep Mahajan, Carl Parziale, Rupal V. Shah, Manoj Shankar, David Smiddy, Cory Scott Turco, Robert L. Wright, JR., Xianhong Zhang, Pavan Singaraju
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Patent number: 11107675Abstract: A method of forming a molybdenum-containing material on a substrate is described, in which the substrate is contacted with molybdenum oxytetrachloride (MoOCl4) vapor under vapor deposition conditions, to deposit the molybdenum-containing material on the substrate. In various implementations, a diborane contact of the substrate may be employed to establish favorable nucleation conditions for the subsequent bulk deposition of molybdenum, e.g., by chemical vapor deposition (CVD) techniques such as pulsed CVD.Type: GrantFiled: April 26, 2018Date of Patent: August 31, 2021Assignee: ENTEGRIS, INC.Inventors: Thomas H. Baum, Philip S. H. Chen, Robert L. Wright, Bryan Hendrix, Shuang Meng, Richard Assion
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Publication number: 20210222292Abstract: Provided is methodology for (a) the etching of films of Al2O3, HfO2, ZrO2, W, Mo, Co, Ru, SiN, or TiN, or (b) the deposition of tungsten onto the surface of a film chosen from Al2O3, HfO2, ZrO2, W, Mo, Co, Ru, Ir, SiN, TiN, TaN, WN, and SiO2, or (c) the selective deposition of tungsten onto metallic substrates, such as W, Mo, Co, Ru, Ir and Cu, but not metal nitrides or dielectric oxide films, which comprises exposing said films to WOCl4 in the presence of a reducing gas under process conditions.Type: ApplicationFiled: January 15, 2021Publication date: July 22, 2021Inventors: Robert L. WRIGHT, JR., Thomas H. BAUM, David M. ERMERT
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Patent number: 11035038Abstract: A solid delivery precursor is described, which is useful for volatilization to generate precursor vapor for a vapor deposition process. The solid delivery precursor comprises solid bodies of compacted particulate precursor, e.g., in a form such as pellets, platelets, tablets, beads, discs, or monoliths. When utilized in a vapor deposition process such as chemical vapor deposition, pulsed chemical vapor deposition, or atomic layer deposition, the solid delivery precursor in the form of solid bodies of compacted particulate precursor provide substantially increased flux of precursor vapor when subjected to volatilization conditions, in relation to the particulate precursor. As a result, vapor deposition process operation can be carried out in shorter periods of time, thereby achieving increased manufacturing rates of products such as semiconductor products, flat-panel displays, solar panels, LEDs, optical coatings, and the like.Type: GrantFiled: October 6, 2016Date of Patent: June 15, 2021Assignee: Entegris, Inc.Inventors: Thomas H. Baum, Yuqi Li, David James Eldridge, Robert L. Wright
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Publication number: 20210147977Abstract: Solid preforms include a solid sublimation material surrounding a support phase. The preforms combine a solid to be sublimated for use in vapor deposition with a compatible support phase allowing the preform to maintain a shape as the solid sublimates. The preforms may be included in ampules for use in vapor deposition systems. The ampules may include one or more of the preforms, and the preforms may be oriented with respect to one another to control flow within the ampule. The preforms may be made via pressing a powder of the solid sublimation material onto the support phase, or by removing a solvent from a solution of the solid sublimation material.Type: ApplicationFiled: November 13, 2020Publication date: May 20, 2021Inventors: Bryan C. HENDRIX, Robert L. WRIGHT, JR.
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Publication number: 20210149928Abstract: A data processing system is for producing a weather report. The data processing system may include external weather event databases, each external weather event database having a different weather event data set. The data processing system may include a local database, and a server in communication with the local database and the external weather event databases. The server may be configured to import the different weather event data sets from the external weather event databases, perform a filtering process on the different weather event data sets from the external weather event databases, receive a geolocation from a user, and generate the weather report based upon the filtered different weather event data sets from the external weather event databases.Type: ApplicationFiled: November 19, 2020Publication date: May 20, 2021Inventor: Robert L. Wright
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Publication number: 20210009437Abstract: The invention provides a process for preparing molybdenum and tungsten oxyhalide compounds which are useful in the deposition of molybdenum and tungsten containing films on various surfaces of microelectronic devices. In the process of the invention, a molybdenum or tungsten trioxide is heated in either a solid state medium or in a melt-phase reaction comprising a eutectic blend comprising alkaline and/or alkaline earth metal salts. The molybdenum or tungsten oxyhalides thus formed may be isolated as a vapor and crystallized to provide highly pure precursor compounds such as MoO2Cl2.Type: ApplicationFiled: July 8, 2020Publication date: January 14, 2021Inventors: David M. ERMERT, Robert L. WRIGHT, JR., Thomas H. BAUM, Bryan C. HENDRIX
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Patent number: 10526697Abstract: A solid source material is described for forming a tungsten-containing film. The solid source material is tungsten hexacarbonyl, wherein content of molybdenum is less than 1000 ppm. Such solid source material may be formed by a process including provision of particulate tungsten hexacarbonyl raw material of particles of size less than 5 mm, wherein particles of size greater than 1.4 mm are less than 15% of the particles, and wherein content of molybdenum is less than 1000 ppm, and sintering the particulate tungsten hexacarbonyl raw material at temperature below 100° C. to produce the solid source material as a sintered solid.Type: GrantFiled: February 28, 2016Date of Patent: January 7, 2020Assignee: ENTEGRIS, INC.Inventors: Thomas H. Baum, Robert L. Wright, Jr., Scott L. Battle, John M. Cleary
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Patent number: 10451540Abstract: A multipass cell assembly for monitoring of fluid is described, as well as fluid processing systems utilizing same, and associated methods of use of such multipass cell assembly for fluid monitoring. The multipass cell assembly is usefully employed in fluid processing operations such as monitoring of vapor deposition process reactants, e.g., reactants used for vapor deposition metallization of tungsten from a tungsten carbonyl precursor.Type: GrantFiled: January 16, 2016Date of Patent: October 22, 2019Assignee: ENTEGRIS, INC.Inventors: Thomas H. Baum, John P. Coates, Robert L. Wright, Jr.
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Patent number: 10392700Abstract: Vaporizers are described, suited for vaporizing a vaporizable solid source materials to form vapor for subsequent use, e.g., a deposition of metal from organometallic source material vapor on a substrate for manufacture of integrated circuitry, LEDs, photovoltaic panels, and the like. Methods are described of fabricating such vaporizers, including methods of reconfiguring up-flow vaporizers for down-flow operation to accommodate higher flow rate solid delivery of source material vapor in applications requiring same.Type: GrantFiled: March 28, 2015Date of Patent: August 27, 2019Assignee: ENTEGRIS, INC.Inventors: Thomas H. Baum, Robert L. Wright, Jr., Bryan C. Hendrix, Scott L. Battle, John M. Cleary
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Publication number: 20180286668Abstract: A method of forming a molybdenum-containing material on a substrate is described, in which the substrate is contacted with molybdenum oxytetrachloride (MoOCl4) vapor under vapor deposition conditions, to deposit the molybdenum-containing material on the substrate. In various implementations, a diborane contact of the substrate may be employed to establish favorable nucleation conditions for the subsequent bulk deposition of molybdenum, e.g., by chemical vapor deposition (CVD) techniques such as pulsed CVD.Type: ApplicationFiled: April 26, 2018Publication date: October 4, 2018Inventors: Thomas H. Baum, Philip S.H. Chen, Robert L. Wright, Bryan Hendrix, Shuang Meng, Richard Assion
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Publication number: 20180282863Abstract: A solid delivery precursor is described, which is useful for volatilization to generate precursor vapor for a vapor deposition process. The solid delivery precursor comprises solid bodies of compacted particulate precursor, e.g., in a form such as pellets, platelets, tablets, beads, discs, or monoliths. When utilized in a vapor deposition process such as chemical vapor deposition, pulsed chemical vapor deposition, or atomic layer deposition, the solid delivery precursor in the form of solid bodies of compacted particulate precursor provide substantially increased flux of precursor vapor when subjected to volatilization conditions, in relation to the particulate precursor. As a result, vapor deposition process operation can be carried out in shorter periods of time, thereby achieving increased manufacturing rates of plays, solar panels, LEDs, optical coatings, and the like.Type: ApplicationFiled: October 6, 2016Publication date: October 4, 2018Inventors: Thomas H. Baum, Yuqi Li, David James Eldridge, Robert L. Wright