Abstract: A spray nozzle for spraying material includes an outlet, a mixing section, an inlet for the material, and a buffer space for pressurized gas. The mixing section is in fluid communication with the outlet. The inlet is in fluid communication with the mixing section. The buffer space is in fluid communication with the mixing section via two or more separate gas supply channels. The inlet comprises a separating wall configured to divide a flow of material to be sprayed into two separate flow passages prior to entry into the mixing section.

Abstract: Embodiments of the invention include methods of forming a textile patterned hardmask. In an embodiment, a first hardmask and a second hardmask are formed over a top surface of an interconnect layer in an alternating pattern. A sacrificial cross-grating may then be formed over the first and second hardmasks. In an embodiment, portions of the first hardmask that are not covered by the sacrificial cross-grating are removed to form first openings and a third hardmask is disposed into the first openings. Embodiments may then include etching through portions of the second hardmask that are not covered by the sacrificial cross-grating to form second openings. The second openings may be filled with a fourth hardmask. According to an embodiment, the first, second, third, and fourth hardmasks are etch selective to each other. In an embodiment the sacrificial cross-grating may then be removed.

Abstract: Embodiments of the invention include methods of forming a textile patterned hardmask. In an embodiment, a first hardmask and a second hardmask are formed over a top surface of an interconnect layer in an alternating pattern. A sacrificial cross-grating may then be formed over the first and second hardmasks. In an embodiment, portions of the first hardmask that are not covered by the sacrificial cross-grating are removed to form first openings and a third hardmask is disposed into the first openings. Embodiments may then include etching through portions of the second hardmask that are not covered by the sacrificial cross-grating to form second openings. The second openings may be filled with a fourth hardmask. According to an embodiment, the first, second, third, and fourth hardmasks are etch selective to each other. In an embodiment the sacrificial cross-grating may then be removed.

Abstract: A spray nozzle for spraying material includes an outlet, a mixing section, an inlet for the material, and a buffer space for pressurized gas. The mixing section is in fluid communication with the outlet. The inlet is in fluid communication with the mixing section. The buffer space is in fluid communication with the mixing section via two or more separate gas supply channels. The inlet comprises a separating wall configured to divide a flow of material to be sprayed into two separate flow passages prior to entry into the mixing section.

Abstract: Embodiments of the invention include photoresist materials and methods of patterning photoresist materials. In an embodiment a photoresist material comprises a plurality of molecular glasses (MGs). In an embodiment, a glass transition temperature Tg of the photoresist material is less than an activation temperature needed to deblock blocking groups from the MGs. Embodiments include a method of patterning a photoresist material that comprises exposing the photoresist material with ultraviolet radiation. The method may also comprise, performing a first post exposure bake at a first temperature, that is less than the activation temperature needed to deblock blocking groups from the MGs, and performing a second post exposure bake at a second temperature that is approximately equal to or greater than the activation temperature needed to deblock blocking groups from the MGs.

Abstract: A canister for a silencer assembly including one or more fins is disclosed. The one or more fins can define one or more channels. The fins and the channels together can increase the surface area of the silencer assembly, thereby increasing the rate of heat dissipation from the silencer assembly.

Abstract: Embodiments of the invention include interconnect layers with floating interconnect lines and methods of forming such interconnect layers. In an embodiment, a plurality of openings are formed in a first sacrificial material layer. Conductive vias and dielectric pillars may be formed in the openings. A second sacrificial material layer may then be formed over the pillars, the vias, and the first sacrificial material layer. In an embodiment, a permeable etchstop layer is formed over a top surface of the second sacrificial layer. Embodiments then include forming an interconnect line in the second sacrificial material layer. In an embodiment, the first and second sacrificial material layers are removed through the permeable etchstop layer after the interconnect line has been formed. According to an embodiment, the permeable etchstop layer may then be stuffed with a fill material in order to harden the permeable etchstop layer.

Abstract: Embodiments of the invention include methods of forming a textile patterned hardmask. In an embodiment, a first hardmask and a second hardmask are formed over a top surface of an interconnect layer in an alternating pattern. A sacrificial cross-grating may then be formed over the first and second hardmasks. In an embodiment, portions of the first hardmask that are not covered by the sacrificial cross-grating are removed to form first openings and a third hardmask is disposed into the first openings. Embodiments may then include etching through portions of the second hardmask that are not covered by the sacrificial cross-grating to form second openings. The second openings may be filled with a fourth hardmask. According to an embodiment, the first, second, third, and fourth hardmasks are etch selective to each other. In an embodiment the sacrificial cross-grating may then be removed.

Abstract: Embodiments of the invention include an interconnect structure with a via and methods of forming such structures. In an embodiment, the interconnect structure comprises a first interlayer dielectric (ILD). A first interconnect line and a second interconnect line extend into the first ILD. According to an embodiment, a second ILD is positioned over the first interconnect line and the second interconnect line. A via may extend through the second ILD and electrically coupled to the first interconnect line. Additionally, embodiments of the invention include a portion of a bottom surface of the via being positioned over the second interconnect line. However, an isolation layer may be positioned between the bottom surface of the via and a top surface of the second interconnect line, according to an embodiment of the invention.

Abstract: Embodiments of the invention include methods of forming a textile patterned hardmask. In an embodiment, a first hardmask and a second hardmask are formed over a top surface of an interconnect layer in an alternating pattern. A sacrificial cross-grating may then be formed over the first and second hardmasks. In an embodiment, portions of the first hardmask that are not covered by the sacrificial cross-grating are removed to form first openings and a third hardmask is disposed into the first openings. Embodiments may then include etching through portions of the second hardmask that are not covered by the sacrificial cross-grating to form second openings. The second openings may be filled with a fourth hardmask. According to an embodiment, the first, second, third, and fourth hardmasks are etch selective to each other. In an embodiment the sacrificial cross-grating may then be removed.

Abstract: A dispensing device includes a drive unit, a detector and a controller. The drive unit is configured to operate a material dispenser. The detector is configured to detect a velocity of the material sensor. The controller is programmed to maintain the material dispenser at a constant velocity based on the velocity detected by the detector.

Abstract: A modular silencer includes an outer tube and a plurality of chamber separators suspended through a tensile force within a bore of the outer tube and defining chambers between each pair of chamber separators in the silencer. An outer edge of the chamber separators is spaced apart from an inner surface of the tube to allow gas equalization between the chambers. A plurality of tube portions separate the chamber separators from each other and from the proximal and distal ends of the silencer assembly. The tube portions define a continuous center tube suspended in tension within the outer tube and through which the projectile travels. The tube portions have can have angled openings through which gas discharge exits into the chambers. Rotatable sleeves can be disposed over the tube portions to further disrupt gas flow and dissipate heat and sound. A carbon fiber sleeve can be disposed over the outer tube to inhibit burn injuries from contacting the silencer.

Abstract: Embodiments of the invention include an interconnect structure with a via and methods of forming such structures. In an embodiment, the interconnect structure comprises a first interlayer dielectric (ILD). A first interconnect line and a second interconnect line extend into the first ILD. According to an embodiment, a second ILD is positioned over the first interconnect line and the second interconnect line. A via may extend through the second ILD and electrically coupled to the first interconnect line. Additionally, embodiments of the invention include a portion of a bottom surface of the via being positioned over the second interconnect line. However, an isolation layer may be positioned between the bottom surface of the via and a top surface of the second interconnect line, according to an embodiment of the invention.

Abstract: Embodiments of the invention include methods of forming a textile patterned hardmask. In an embodiment, a first hardmask and a second hardmask are formed over a top surface of an interconnect layer in an alternating pattern. A sacrificial cross-grating may then be formed over the first and second hardmasks. In an embodiment, portions of the first hardmask that are not covered by the sacrificial cross-grating are removed to form first openings and a third hardmask is disposed into the first openings. Embodiments may then include etching through portions of the second hardmask that are not covered by the sacrificial cross-grating to form second openings. The second openings may be filled with a fourth hardmask. According to an embodiment, the first, second, third, and fourth hardmasks are etch selective to each other. In an embodiment the sacrificial cross-grating may then be removed.

Abstract: Embodiments of the invention include interconnect layers with floating interconnect lines and methods of forming such interconnect layers. In an embodiment, a plurality of openings are formed in a first sacrificial material layer. Conductive vias and dielectric pillars may be formed in the openings. A second sacrificial material layer may then be formed over the pillars, the vias, and the first sacrificial material layer. In an embodiment, a permeable etchstop layer is formed over a top surface of the second sacrificial layer. Embodiments then include forming an interconnect line in the second sacrificial material layer. In an embodiment, the first and second sacrificial material layers are removed through the permeable etchstop layer after the interconnect line has been formed. According to an embodiment, the permeable etchstop layer may then be stuffed with a fill material in order to harden the permeable etchstop layer.

Abstract: Embodiments of the invention include photoresist materials and methods of patterning photoresist materials. In an embodiment a photoresist material comprises a plurality of molecular glasses (MGs). In an embodiment, a glass transition temperature Tg of the photoresist material is less than an activation temperature needed to deblock blocking groups from the MGs. Embodiments include a method of patterning a photoresist material that comprises exposing the photoresist material with ultraviolet radiation. The method may also comprise, performing a first post exposure bake at a first temperature, that is less than the activation temperature needed to deblock blocking groups from the MGs, and performing a second post exposure bake at a second temperature that is approximately equal to or greater than the activation temperature needed to deblock blocking groups from the MGs.

Abstract: A modular silencer includes an outer tube and a plurality of chamber separators suspended through a tensile force within a bore of the outer tube and defining chambers between each pair of chamber separators in the silencer. An outer edge of the chamber separators is spaced apart from an inner surface of the tube to allow gas equalization between the chambers. A plurality of tube portions separate the chamber separators from each other and from the proximal and distal ends of the silencer assembly. The tube portions define a continuous center tube suspended in tension within the outer tube and through which the projectile travels. The tube portions have can have angled openings through which gas discharge exits into the chambers. Rotatable sleeves can be disposed over the tube portions to further disrupt gas flow and dissipate heat and sound. A carbon fiber sleeve can be disposed over the outer tube to inhibit burn injuries from contacting the silencer.

Abstract: A dispensing device includes a drive unit, a detector and a controller. The drive unit is configured to operate a material dispenser. The detector is configured to detect a velocity of the material sensor. The controller is programmed to maintain the material dispenser at a constant velocity based on the velocity detected by the detector.

Abstract: A modular silencer includes an outer tube and a plurality of chamber separators suspended through a tensile force within a bore of the outer tube and defining chambers between each pair of chamber separators in the silencer. An outer edge of the chamber separators is spaced apart from an inner surface of the tube to allow gas equalization between the chambers. A plurality of tube portions separate the chamber separators from each other and from the proximal and distal ends of the silencer assembly. The tube portions define a continuous center tube suspended in tension within the outer tube and through which the projectile travels. The tube portions have can have angled openings through which gas discharge exits into the chambers. Rotatable sleeves can be disposed over the tube portions to further disrupt gas flow and dissipate heat and sound. A carbon fiber sleeve can be disposed over the outer tube to inhibit burn injuries from contacting the silencer.

Abstract: A dispensing device includes a drive unit, a detector and a controller. The drive unit is configured to operate a material dispenser. The detector is configured to detect a velocity of the material sensor. The controller is programmed to maintain the material dispenser at a constant velocity based on the velocity detected by the detector.