Abstract: A substrate processing apparatus including a transport chamber having an end and defining more than one substantially linear substrate transport zone where each transport zone extends longitudinally along the transport chamber between opposing walls of the transport chamber and at least one of the more than one substantially linear substrate transport zones is configured as a supply zone for enabling transport of substrates from the end and at least one of the more than one substantially linear substrate transport zones is configured as a return zone for enabling transport of substrates to the end, and at least one substrate transport located in and movably mounted to the transport chamber for transporting substrates along the more than one substantially linear substrate transport zone, where each substrate transport zone is configured to allow the at least one substrate transport to move from one transport zone to another transport zone.

Abstract: A substrate transport apparatus including a frame, at least one arm link rotatably connected to the frame and a shaftless drive section. The shaftless drive section including stacked drive motors for rotating the at least one arm link relative to the frame through a shaftless interface, each of the stacked drive motors including a stator having stator coils disposed on a fixed post fixed relative to the frame and a rotor substantially peripherally surrounding the stator such that the rotor is connected to a respective one of the at least one arm link for rotating the one of the at least one arm link relative to the frame causing an extension or retraction of the one of the at least one arm link, where the stacked drive motors are disposed in the at least one arm link so that part of each stator is within a common arm link.

Abstract: A substrate transport apparatus including a first shaftless rotary motor including a first stator and a first rotor, the first stator being linearly distributed and the first rotor being coupled to a first arm, a second shaftless rotary motor including a second stator and second rotor, the second stator being linearly distributed and the second rotor being coupled to a second arm, the second arm being connected to the first arm and a first substrate support being coupled to at least one of the first and second arms, wherein the first stator and second stator are configured so that the first and second arms and the first substrate support are inside the stators and a motor output at a connection between the first and second shaftless rotary motors and a respective one of the first and second arms is a resultant force disposed peripheral to the first and second arms.

Abstract: A substrate processing apparatus including a frame, a first SCARA arm connected to the frame, including an end effector, configured to extend and retract along a first radial axis; a second SCARA arm connected to the frame, including an end effector, configured to extend and retract along a second radial axis, the SCARA arms having a common shoulder axis of rotation; and a drive section coupled to the SCARA arms is configured to independently extend each SCARA arm along a respective radial axis and rotate each SCARA arm about the common shoulder axis of rotation where the first radial axis is angled relative to the second radial axis and the end effector of a respective arm is aligned with a respective radial axis, wherein each end effector is configured to hold at least one substrate and the end effectors are located on a common transfer plane.

Abstract: A substrate processing apparatus including a frame, a first arm coupled to the frame at a shoulder axis having a first upper arm, a first forearm and at least one substrate holder serially and rotatably coupled to each other, a second arm coupled to the frame at the shoulder axis where shoulder axes of rotation of the arms are substantially coincident, the second arm having a second upper arm, a second forearm and at least one substrate holder serially and rotatably coupled to each other, and a drive section connected to the frame and coupled to the arms, the drive section being configured to independently extend and rotate each arm where an axis of extension of the first arm is angled relative to an axis of extension of the second arm substantially at each angular position of at least one of the first arm or the second arm.

Abstract: A robotic transport apparatus including a drive system including at least one harmonic motor assembly, at least one drive shaft coupled to the at least one harmonic motor assembly, at least one robotic arm mounted to the at least one drive shaft, where the robotic arm is located inside a sealed environment, and at least one atmospheric isolation seal seated on an output surface of the drive system and forming an atmospheric barrier disposed so that the at least one drive shaft extends through the atmospheric barrier into the sealed environment and the at least one harmonic motor assembly is located outside the sealed environment, wherein the robotic transport apparatus is a high capacity payload transport apparatus.

Abstract: A substrate processing apparatus including a transport chamber having an end and defining more than one substantially linear substrate transport zone where each transport zone extends longitudinally along the transport chamber between opposing walls of the transport chamber and at least one of the more than one substantially linear substrate transport zones is configured as a supply zone for enabling transport of substrates from the end and at least one of the more than one substantially linear substrate transport zones is configured as a return zone for enabling transport of substrates to the end, and at least one substrate transport located in and movably mounted to the transport chamber for transporting substrates along the more than one substantially linear substrate transport zone, where each substrate transport zone is configured to allow the at least one substrate transport to move from one transport zone to another transport zone.

Abstract: A substrate processing apparatus is presented having a transport chamber defining substantially linear substrate transport paths, a linear array of substrate holding modules, each communicably connected to the chamber. The substrate transport has at least one transporter capable of holding and moving the substrate on more than one substantially linear substrate transport paths. The transport chamber having different transport tubes at least one of which is sealable at both ends of the transport tube and configured to hold an isolated atmosphere different from that of the transport tubes, each of the different transport tubes having one of the substrate transport paths located therein different from another of the transport paths located in another of the transport tubes, and being communicably connected to each other, where at least one of the transport tubes is configured to provide uninterrupted transit of the substrate transport through the transport tubes.

Abstract: Substrate processing apparatus having a chamber, a generally linear array of process modules, a substrate transport, and a drive system. The chamber is capable of being isolated from the outside atmosphere. Each process module of the array is communicably connected to the chamber to allow a substrate to be transferred between the chamber and process module. The substrate transport is located in and is movably supported from the chamber. The transport is capable of moving along a linear path defined by the chamber for transporting the substrate between process modules. The drive system is connected to the chamber for driving and moving the transport along the linear path. The chamber comprises a selectable number of chamber modules serially abutted to defined the chamber. Each module has an integral portion of the drive system.

Abstract: Substrate processing apparatus having a transport chamber, a linear array of substrate holding modules alongside the transport chamber, and a substrate transport located in the chamber. The chamber can hold an isolated atmosphere, and defines more than one substantially linear transport paths extending longitudinally along the transport chamber. The transport in the chamber is capable of transporting the substrate along the linear transport paths. The transport has a transporter capable of holding and moving the substrate. The transporter interfaces a wall of the transport chamber for moving along at least one of linear paths. The transport chamber has interfaces for mating with other substrate holding modules at opposite ends of the transport chamber. Each interface has an opening through which at least one of the more than one linear transport paths extends, and the transport chamber has a selectably variable longitudinal length between the interfaces.

Abstract: A semiconductor workpiece processing apparatus having a first chamber, a transport vehicle, and another chamber. The first chamber is capable of being isolated from an outside atmosphere. The transport vehicle is located in the first chamber and is movably supported from the first chamber for moving linearly relative to the first chamber. The transport vehicle includes a base, and an integral semiconductor workpiece transfer arm movably mounted to the base and capable of multi-access movement relative to the base. The other chamber is communicably connected to the first chamber via a closable opening of the first chamber. The opening is sized to allow the transport vehicle to transit between the first chamber and the other chamber through the opening.

Abstract: A substrate processing apparatus having a frame, a housing, an access system and at least a substrate transport apparatus or a substrate processing device. The housing is connected to the frame. The access system is connected to the frame and forms an access through which substrates are moved in and out of the housing. The substrate transport apparatus or substrate processing device are connected to the frame and are at least partially positioned in the housing. The frame comprises a movable portion. The movable portion is movable relative to the frame so that movement of the movable portion causes separation of the access system and at least one of the substrate transport apparatus or substrate processing device from an installed position. The substrate transport apparatus is selectable from a number of different interchangeable substrate transport apparatus.

Abstract: A substrate transport apparatus comprising a drive section, an upper arm, a first forearm, and a second forearm. The upper arm is rotatably connected to the drive section at a first end of the upper arm. The upper arm is rotatably connected to the drive section for rotating the upper arm about an axis of rotation of the drive section. The first forearm is pivotably connected to the upper arm for pivoting relative to the upper arm. The first forearm has a first end effector depending therefrom. The second forearm is pivotably connected to the upper arm for pivoting relative to the upper arm. The second forearm has a second end effector depending therefrom.

Abstract: A semiconductor workpiece processing apparatus having a first chamber, a transport vehicle, and another chamber. The first chamber is capable of being isolated from an outside atmosphere. The transport vehicle is located in the first chamber and is movably supported from the first chamber for moving linearly relative to the first chamber. The transport vehicle includes a base, and an integral semiconductor workpiece transfer arm movably mounted to the base and capable of multi-access movement relative to the base. The other chamber is communicably connected to the first chamber via a closable opening of the first chamber. The opening is sized to allow the transport vehicle to transit between the first chamber and the other chamber through the opening.

Abstract: A substrate transport apparatus including a first shaftless rotary motor including a first stator and a first rotor, the first stator being linearly distributed and the first rotor being coupled to a first arm, a second shaftless rotary motor including a second stator and second rotor, the second stator being linearly distributed and the second rotor being coupled to a second arm, the second arm being connected to the first arm and a first substrate support being coupled to at least one of the first and second arms, wherein the first stator and second stator are configured so that the first and second arms and the first substrate support are inside the stators and a motor output at a connection between the first and second shaftless rotary motors and a respective one of the first and second arms is a resultant force disposed peripheral to the first and second arms.

Abstract: A semiconductor workpiece processing apparatus having a first chamber, a transport vehicle, and another chamber. The first chamber is capable of being isolated from an outside atmosphere. The transport vehicle is located in the first chamber and is movably supported from the first chamber for moving linearly relative to the first chamber. The transport vehicle includes a base, and an integral semiconductor workpiece transfer arm movably mounted to the base and capable of multi-access movement relative to the base. The other chamber is communicably connected to the first chamber via a closable opening of the first chamber. The opening is sized to allow the transport vehicle to transit between the first chamber and the other chamber through the opening.

Abstract: The effector of a robot is constructed with positioning pads at its distal end. The pads provide an accurate registration surface for engagement of the substrate. A pair of idler rollers, which slide along the longitudinal axis of the effector, is moved by an actuator into engagement with the substrate and the assembly urges the substrate against the positioning pads. A pair of wheels is mounted on a platform independent of the effector with one of the wheels driven by a motor. An optical sensor mounted with the wheels detects an orientation mark on the edge of the substrate and allows the driven wheel to rotate the substrate to its specified angular position.

Abstract: The effector of a robot is constructed with positioning pads at its distal end. The pads provide an accurate registration surface for engagement of the substrate. A pair of idler rollers, which slide along the longitudinal axis of the effector, is moved by an actuator into engagement with the substrate and the assembly urges the substrate against the positioning pads. A pair of wheels is mounted on a platform independent of the effector with one of the wheels driven by a motor. An optical sensor mounted with the wheels detects an orientation mark on the edge of the substrate and allows the driven wheel to rotate the substrate to its specified angular position.

Abstract: A substrate transport apparatus comprising a drive section, an upper arm, a first forearm, and a second forearm. The upper arm is rotatably connected to the drive section at a first end of the upper arm. The upper arm is rotatably connected to the drive section for rotating the upper arm about an axis of rotation of the drive section. The first forearm is pivotably connected to the upper arm for pivoting relative to the upper arm. The first forearm has a first end effector depending therefrom. The second forearm is pivotably connected to the upper arm for pivoting relative to the upper arm. The second forearm has a second end effector depending therefrom.

Abstract: A system for shielding a robot arm against being splashed with fluids comprises a protective shell-like cover of thin-walled plastic material impervious to fluids which is removably attached to the robot arm. The protective cover has a contoured shape generally conforming to the configuration of the robot arm and includes an upper member overlying the upwardly facing surfaces of the robot arm and an integral continuous side member proximally overlying the sidewall of the robot arm and extending to a lower rim generally coplanar with the downwardly facing surfaces of the robot arm. The upper member of the protective cover generally overlies the upwardly facing surface of the robot arm while the peripherally extending sidewall generally overlies the outwardly facing surface of the peripherally extending sidewall.