Patents by Inventor Robert Wong

Robert Wong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250036386
    Abstract: Aspects of the subject disclosure may include, for example, obtaining an update to a feature present within a fleet of assets, based on the obtaining of the update, analyzing data to identify first assets included within the fleet of assets for receiving the update, the first assets being less than an entirety of the fleet of assets, and transmitting the update to the first assets in accordance with the analyzing. Other embodiments are disclosed.
    Type: Application
    Filed: July 28, 2023
    Publication date: January 30, 2025
    Applicants: AT&T Intellectual Property l, L.P., AT&T Mobility ll LLC
    Inventors: Rashmi Palamadai, Peter Wong, Robert Holden
  • Publication number: 20250025629
    Abstract: A treatment delivery system includes a fluid delivery system connected to a first fluid reservoir and a second fluid reservoir. The system directs a first fluid from the first fluid reservoir to a treatment site and directs a second fluid from the second fluid reservoir to the treatment site and a control unit to control the fluid delivery system according to a treatment process comprising a flow of the first fluid and the second fluid, the treatment process including multiple phases. A first phase includes a controlled delivery of the first fluid from the first fluid reservoir to the treatment site. A second phase of the plurality of phases includes a controlled delivery of the second fluid from the second fluid reservoir to the treatment site, the control unit automatically activating a transition from at least the first phase to the second phase.
    Type: Application
    Filed: October 8, 2024
    Publication date: January 23, 2025
    Inventors: Robert C. Hutton, Brian C. de Beaubien, Matthew Gill, Douglas Lorang, James McCrea, Jude Paganelli, Andrew Sauter, Michael Wong
  • Publication number: 20250023928
    Abstract: Systems and methods for managing network communication are disclosed. Methods and systems can comprise receiving a telephony message having a source address and determining routing information using the source address. A telephony call may be routed using the determined routing information. Such processing may be implemented to route telephony calls to certain services such as accessibility services based on at least the source address of a telephony message.
    Type: Application
    Filed: August 9, 2024
    Publication date: January 16, 2025
    Inventors: Chia-Chang LI, Eric WONG, Satish SAMPANGIRAMIAH, Robert LAMBARDIA, Amarendar SIRIKONDA
  • Patent number: 11972360
    Abstract: A device may receive input data associated with a legal regulation, and may process the input data to generate a record that includes: the input data in a knowledge representation format and a semantic representation format, data identifying a feature, data identifying an industry classification, or data identifying an entity of interest. The device may process the record, with machine learning models, to determine output data that includes: data indicating that the legal regulation is inconsistent, data indicating that the legal regulation is outdated, data indicating a sentiment for the legal regulation, data indicating a prescriptive nature of the legal regulation, data indicating a complexity of the legal regulation, data indicating a misrepresentation in the legal regulation, data indicating a compliance burden associated with the legal regulation, or data indicating an industry performance impact of the legal regulation. The device may perform actions based on the output data.
    Type: Grant
    Filed: August 8, 2019
    Date of Patent: April 30, 2024
    Assignee: Accenture Global Solutions Limited
    Inventors: Thomas Kim, Sungwon Youn, Hesoo Heo, Alex Robert Wong, Lisa Dickson, Christopher Snow, Carl Sharpe, Jodie K. Wallis, Natalie Heisler
  • Publication number: 20230017894
    Abstract: A flood column for charged particle flooding of a sample, the flood column comprising a charged particle source configured to emit a charged particle beam along a beam path; a source lens arranged down-beam of the charged particle source; a condenser lens arranged down-beam of the source lens; and an aperture body arranged down-beam of the condenser lens, wherein the aperture body is for passing a portion of the charged particle beam; and wherein the source lens is controllable so as to variably set the beam angle of the charged particle beam down-beam of the source lens.
    Type: Application
    Filed: September 23, 2022
    Publication date: January 19, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Jurgen VAN SOEST, Gun Sara Mari BERGLUND, Robert Wong Joek Meu HUANG FOEN CHUNG, Diego MARTINEZ NEGRETE GASQUE, Laura DINU GURTLER
  • Publication number: 20220280673
    Abstract: Disclosed is a malodor control system that includes use of a malodor scavenger to sequester a malodor molecule to reduce and/or eliminate the noxious odor the malodor molecule generates. Some embodiments can include use of a substrate as a non-woven fabric sheet as a delivery system for the malodor scavenger. The substrate can include a polymer complexed with active ingredient to lock the active ingredient in place at a surface of the substrate via a binder so that the active ingredient is present at a predetermined activity level. After interacting with malodor molecules, at least some of the active ingredient migrates via passive diffusion to the substrate surface to maintain the predetermined activity level. Embodiments of the substrate are made from a blend of polyester and rayon, wherein rayon is made using viscose, allowing the substrate to be biodegradable and to handle an increased load of active ingredient.
    Type: Application
    Filed: March 2, 2022
    Publication date: September 8, 2022
    Inventors: Steven Semoff, Dov Kesten, Robert Wong
  • Patent number: 11295995
    Abstract: A technique relates probing a pass gate transistor in a static random access memory (SRAM) circuit. A gate probe is connected to a gate metal layer of the SRAM circuit, the gate metal layer being coupled to a gate of the pass gate transistor. A source probe is connected to a source metal layer of the SRAM circuit, the source metal layer being coupled to a source of the pass gate transistor. A drain probe is connected to a drain metal layer of the SRAM circuit, the drain metal layer being coupled to a drain of the pass gate transistor, the SRAM circuit comprising other transistors along with the pass gate transistor. The other transistors are free from connections for the probing so as not to cause the other transistors to have an unwanted effect on the pass gate transistor being probed.
    Type: Grant
    Filed: September 17, 2019
    Date of Patent: April 5, 2022
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Robert Wong, Alfred Bruno
  • Publication number: 20220062144
    Abstract: Formulations for promoting hair growth, preventing or mitigating hair loss, or enhancing skincare include a GHK peptide and a fullerene, such as C60, that has been processed to be safe for human consumption. In examples, the fullerene includes ESS60. In examples, the GHK peptide includes a GHK-Cu peptide, such as UTH29. Such therapeutic formulations may be applied to a person's skin or hair. In some embodiments, the peptide is dissolved in a polar solvent. In some embodiments, the fullerene is dissolved in a lipid solution. The formulations, when administered topically or introduced into the top layers of the epidermis, are effective in preventing or mitigating hair loss and graying that arises from age or elevated DHT levels. The formulations are also effective for use in the lightening of skin blemishes and prevention or mitigation of certain skin cancers that arise from age and UV damage.
    Type: Application
    Filed: April 15, 2021
    Publication date: March 3, 2022
    Inventors: Christopher V. Burres, Robert Wong, Fabio Rumbao Pedreira
  • Patent number: 11145023
    Abstract: Systems and methods for providing a transportation marketplace are provided. A transportation server receives, from a client device of a user, a request for a transportation service. The transportation server determines a set of drivers in response to the request, the set of drivers further being available to provide the transportation service when the request is received. The transportation server provides the set of drivers to the client device, wherein each driver within the set of drivers is selectable by the user of the client device.
    Type: Grant
    Filed: September 4, 2018
    Date of Patent: October 12, 2021
    Assignee: SC INNOVATIONS, INC.
    Inventors: Jahan Khanna, Robert Wong, Sunil Paul, Thomas Gellatly, Gregory Boutte, Cesar Torres, Lee Fastenau, Yik Kit (Nelson) To, Robert Moran
  • Publication number: 20210227843
    Abstract: A tempering composition for tempering grain in a tempering step and controlling pathogens susceptible to be present in and/or on said grain during the tempering step of the grain, said tempering step being eventually carried out before subjecting the tempered grain to a milling step; wherein said tempering composition comprises tempering-water and an oxidizing composition comprising at least one oxidizing agent and/or a precursor thereof, and eventually at least one an agriculturally acceptable excipient and/or at least one additive; and wherein the at least one oxidizing agent represents from 0.01 to 50% by weight of the oxidizing composition. A use and a method for tempering grain and controlling pathogens susceptible to be present on grain. An oxidizing composition for preparing the tempering composition. A use of the tempering composition for sanitizing mill systems. A method for sanitizing mill systems.
    Type: Application
    Filed: October 18, 2018
    Publication date: July 29, 2021
    Applicant: AGRI-NEO INC.
    Inventors: Fadi DAGHER, Nicholas DILLON, Robert WONG, Rebecca HYLTON, Amir HAMIDI
  • Patent number: 11062911
    Abstract: First lithography and etching are carried out on a semiconductor structure to provide a first intermediate semiconductor structure having a first set of surface features corresponding to a first portion of desired fin formation mandrels. Second lithography and etching are carried out on the first intermediate structure, using a second mask, to provide a second intermediate semiconductor structure having a second set of surface features corresponding to a second portion of the mandrels. The second set of surface features are unequally spaced from the first set of surface features and/or the features have different pitch. The fin formation mandrels are formed in the second intermediate semiconductor structure using the first and second sets of surface features; spacer material is deposited over the mandrels and is etched back to form a third intermediate semiconductor structure having a fin pattern. Etching is carried out on same to produce the fin pattern.
    Type: Grant
    Filed: February 20, 2020
    Date of Patent: July 13, 2021
    Assignee: Tessera, Inc.
    Inventors: Fee Li Lie, Dongbing Shao, Robert Wong, Yongan Xu
  • Publication number: 20210082776
    Abstract: A technique relates probing a pass gate transistor in a static random access memory (SRAM) circuit. A gate probe is connected to a gate metal layer of the SRAM circuit, the gate metal layer being coupled to a gate of the pass gate transistor. A source probe is connected to a source metal layer of the SRAM circuit, the source metal layer being coupled to a source of the pass gate transistor. A drain probe is connected to a drain metal layer of the SRAM circuit, the drain metal layer being coupled to a drain of the pass gate transistor, the SRAM circuit comprising other transistors along with the pass gate transistor. The other transistors are free from connections for the probing so as not to cause the other transistors to have an unwanted effect on the pass gate transistor being probed.
    Type: Application
    Filed: September 17, 2019
    Publication date: March 18, 2021
    Inventors: Robert Wong, Alfred Bruno
  • Patent number: 10828140
    Abstract: An artificial urinary sphincter device is configured to be implanted in a relationship with a patient's urethra for the treatment of urinary incontinence. The size and shape of the device can vary for implantation on any of a wide variety of locations relative to the urethra such that it can exert a force onto the urethra for inhibiting or preventing involuntary leakage of urine.
    Type: Grant
    Filed: October 12, 2018
    Date of Patent: November 10, 2020
    Assignee: City of Hope
    Inventors: Cassandra Rose Joung Meyer, Sophia Rose Williams, Jonathan Robert Wong, Meijing Maggie Liu, Risa Tom Egerter, Kevin Chan, Lori C. Bassman
  • Publication number: 20200266072
    Abstract: First lithography and etching are carried out on a semiconductor structure to provide a first intermediate semiconductor structure having a first set of surface features corresponding to a first portion of desired fin formation mandrels. Second lithography and etching are carried out on the first intermediate structure, using a second mask, to provide a second intermediate semiconductor structure having a second set of surface features corresponding to a second portion of the mandrels. The second set of surface features are unequally spaced from the first set of surface features and/or the features have different pitch. The fin formation mandrels are formed in the second intermediate semiconductor structure using the first and second sets of surface features; spacer material is deposited over the mandrels and is etched back to form a third intermediate semiconductor structure having a fin pattern. Etching is carried out on same to produce the fin pattern.
    Type: Application
    Filed: February 20, 2020
    Publication date: August 20, 2020
    Applicant: Tessera, Inc.
    Inventors: Fee Li Lie, Dongbing Shao, Robert Wong, Yongan Xu
  • Patent number: 10621295
    Abstract: A system and method to perform risk assessment or design rule determination for an integrated circuit involves generating two or more process variation contours based on corresponding two or more combinations of two or more factors that affect manufacturability of the integrated circuit. Each of the two or more process variation contours is associated with a probability. The method also includes generating a random number to select from among the two or more process variation contours based on a cumulative probability value associated with each of the two or more process variation contours. The cumulative probability values are determined from the probabilities. The risk assessment or the design rule determination is performed using selected ones of the two or more process variation contours. Fabrication yield is increased based on finalizing the physical layout using the process variation contours.
    Type: Grant
    Filed: April 10, 2018
    Date of Patent: April 14, 2020
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Jinning Liu, Jing Sha, Robert Wong, Dongbing Shao
  • Patent number: 10614877
    Abstract: A technique relates to a circuit. At least one 4 transistor (4T) static random access memory (SRAM) bitcell is included. Each of the 4T SRAM bitcells includes a first PFET, a first NFET, a second PFET, and a second NFET, the first PFET and the first NFET being coupled to form a first output node, and the second PFET and the second NFET being coupled to form a second output node. A pulldown circuit is coupled to the first NFET, the pulldown circuit operable to pull down a voltage at the first output node. A feedback circuit is operable to monitor the first output node, the feedback circuit operable to control the pulldown circuit.
    Type: Grant
    Filed: January 10, 2019
    Date of Patent: April 7, 2020
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Albert Chu, Myung-Hee Na, Robert Wong, Sean Burns, Jens Haetty
  • Publication number: 20200090059
    Abstract: A device may receive input data associated with a legal regulation, and may process the input data to generate a record that includes: the input data in a knowledge representation format and a semantic representation format, data identifying a feature, data identifying an industry classification, or data identifying an entity of interest. The device may process the record, with machine learning models, to determine output data that includes: data indicating that the legal regulation is inconsistent, data indicating that the legal regulation is outdated, data indicating a sentiment for the legal regulation, data indicating a prescriptive nature of the legal regulation, data indicating a complexity of the legal regulation, data indicating a misrepresentation in the legal regulation, data indicating a compliance burden associated with the legal regulation, or data indicating an industry performance impact of the legal regulation. The device may perform actions based on the output data.
    Type: Application
    Filed: August 8, 2019
    Publication date: March 19, 2020
    Inventors: Thomas KIM, Sungwon YOUN, Hesoo HEO, Alex Robert WONG, Lisa DICKSON, Christopher SNOW, Carl SHARPE, Jodie K. WALLIS, Natalie HEISLER
  • Patent number: 10573528
    Abstract: First lithography and etching are carried out on a semiconductor structure to provide a first intermediate semiconductor structure having a first set of surface features corresponding to a first portion of desired fin formation mandrels. Second lithography and etching are carried out on the first intermediate structure, using a second mask, to provide a second intermediate semiconductor structure having a second set of surface features corresponding to a second portion of the mandrels. The second set of surface features are unequally spaced from the first set of surface features and/or the features have different pitch. The fin formation mandrels are formed in the second intermediate semiconductor structure using the first and second sets of surface features; spacer material is deposited over the mandrels and is etched back to form a third intermediate semiconductor structure having a fin pattern. Etching is carried out on same to produce the fin pattern.
    Type: Grant
    Filed: December 14, 2017
    Date of Patent: February 25, 2020
    Assignee: Tessera, Inc.
    Inventors: Fee Li Lie, Dongbing Shao, Robert Wong, Yongan Xu
  • Publication number: 20190311071
    Abstract: A system and method to perform risk assessment or design rule determination for an integrated circuit involves generating two or more process variation contours based on corresponding two or more combinations of two or more factors that affect manufacturability of the integrated circuit. Each of the two or more process variation contours is associated with a probability. The method also includes generating a random number to select from among the two or more process variation contours based on a cumulative probability value associated with each of the two or more process variation contours. The cumulative probability values are determined from the probabilities. The risk assessment or the design rule determination is performed using selected ones of the two or more process variation contours. Fabrication yield is increased based on finalizing the physical layout using the process variation contours.
    Type: Application
    Filed: April 10, 2018
    Publication date: October 10, 2019
    Inventors: Jinning Liu, Jing Sha, Robert Wong, Dongbing Shao
  • Patent number: D880365
    Type: Grant
    Filed: July 30, 2018
    Date of Patent: April 7, 2020
    Assignee: Harley-Davidson Motor Company Group, LLC
    Inventors: Ben McGinley, Frank Savage, Brad Richards, Alexander John Bozmoski, Jeffrey Smith, Terry Rumpel, Brendon Smith, Timothy McChesney, Joseph Dennert, Michael Case, Kyle Wick, Matthew Paradise, Jeremy Lenzendorf, Carl Hoy, Richard Bradatsch, Michael Carlin, Matthew Mueller, Scott Matthews, Robert Wong