Patents by Inventor Robin Richards

Robin Richards has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060162261
    Abstract: A low solids-content slurry for polishing (e.g., chemical mechanical planarization) of substrates comprising a dielectric and an associated method using the slurry are described. The slurry and associated method afford high removal rates of dielectric during polishing even though the slurry has low solids-content. The slurry comprises a bicarbonate salt, which acts as a catalyst for increasing removal rates of dielectric films during polishing of these substrates.
    Type: Application
    Filed: September 22, 2005
    Publication date: July 27, 2006
    Inventors: Junaid Siddiqui, Daniel Castillo, Robin Richards, Timothy Compton
  • Publication number: 20050194563
    Abstract: A composition and associated method for chemical mechanical planarization (or other polishing) are described. The composition comprises an abrasive and a tricine-type or bicine-type compound. The composition possesses high selectivities for removal of copper in relation to tantalum and dielectric materials whilst minimizing local dishing and erosion effects in CMP. The composition may further comprise an oxidizing agent in which case the composition is particularly useful in conjunction with the associated method for metal CMP applications (e.g., copper CMP).
    Type: Application
    Filed: January 10, 2005
    Publication date: September 8, 2005
    Inventors: Junaid Siddiqui, Timothy Compton, Bin Hu, Robin Richards, Saifi Usmani
  • Publication number: 20050076579
    Abstract: A composition and associated method for chemical mechanical planarization (or other polishing) are described. The composition comprises an abrasive and a tricine-type or bicine-type compound. The composition possesses high selectivities for removal of copper in relation to tantalum and dielectric materials whilst minimizing local dishing and erosion effects in CMP. The composition may further comprise an oxidizing agent in which case the composition is particularly useful in conjunction with the associated method for metal CMP applications (e.g., copper CMP).
    Type: Application
    Filed: October 10, 2003
    Publication date: April 14, 2005
    Inventors: Junaid Siddiqui, Timothy Compton, Bin Hu, Robin Richards, Saifi Usmani
  • Publication number: 20050076578
    Abstract: A composition and associated method for chemical mechanical planarization (or other polishing) are described which afford high tantalum to copper selectivity in copper CMP and which are tunable (in relation to polishing performance). The composition comprises an abrasive and an N-acyl-N-hydrocarbonoxyalkyl aspartic acid compound and/or a tolyltriazole derivative.
    Type: Application
    Filed: October 10, 2003
    Publication date: April 14, 2005
    Inventors: Junaid Siddiqui, Timothy Compton, Bin Hu, Robin Richards
  • Patent number: 6728696
    Abstract: A computer-implemented method is described, for searching for items in an electronic catalog, e.g. an on-line catalog accessible over the Internet. A hierarchy of category names is defined, each item in the electronic catalog being associated with one of those category names. When a search page is accessed, the category names are scanned, to generate a list of words that appear in the category names at any level of the hierarchy. The list of words is displayed in the search page, allowing a user to select one. When the user selects a word from the list, a list of items whose category names contain the selected word is displayed.
    Type: Grant
    Filed: August 29, 2000
    Date of Patent: April 27, 2004
    Assignee: Fujitsu Services Limited
    Inventor: Robin Richard Walton