Patents by Inventor Rodney Smedt

Rodney Smedt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20040137651
    Abstract: A method for measuring overlay in semiconductor wafers includes obtaining diffraction based and imaging based measurements of the same target. The two separate measurements are then combined in a way that is consistent to both measurements to obtain an overlay measurement that has high precision and large range.
    Type: Application
    Filed: November 14, 2003
    Publication date: July 15, 2004
    Inventors: Rodney Smedt, Abdurrahman Sezginer, Hsu-Ting Huang
  • Patent number: 6738136
    Abstract: The invention is a method and apparatus for determining characteristics of a sample. The system and method provide for detecting a monitor beam reflected off a mirror, where the monitor beam corresponds to the intensity of light incident upon the sample. The system and method also provide for detecting a measurement beam, where the measurement beam has been reflected off the sample being characterized. Both the monitor beam and the measurement beam are transmitted through the same transmission path, and detected by the same detector. Thus, potential sources of variations between the monitor beam and the measurement beam which are not due to the characteristics of the sample are minimized. Reflectivity information for the sample can be determined by comparing data corresponding to the measurement beam relative to data corresponding the monitor beam.
    Type: Grant
    Filed: November 7, 2002
    Date of Patent: May 18, 2004
    Assignee: Therma-Wave, Inc.
    Inventors: Adam Norton, Abdurrahman Sezginer, Fred E. Stanke, Rodney Smedt
  • Patent number: 6721052
    Abstract: A periodic structure is illuminated by polychromatic electromagnetic radiation. Radiation from the structure is collected and divided into two rays having different polarization states. The two rays are detected from which one or more parameters of the periodic structure may be derived. In another embodiment, when the periodic structure is illuminated by a polychromatic electromagnetic radiation, the collected radiation from the structure is passed through a polarization element having a polarization plane. The element and the polychromatic beam are controlled so that the polarization plane of the element are at two or more different orientations with respect to the plane of incidence of the polychromatic beam. Radiation that has passed through the element is detected when the plane of polarization is at the two or more positions so that one or more parameters of the periodic structure may be derived from the detected signals.
    Type: Grant
    Filed: December 20, 2000
    Date of Patent: April 13, 2004
    Assignee: KLA-Technologies Corporation
    Inventors: Guoheng Zhao, Kenneth P. Gross, Rodney Smedt, Mehrdad Nikoonahad
  • Publication number: 20030090655
    Abstract: The invention is a method and apparatus for determining characteristics of a sample. The system and method provide for detecting a monitor beam reflected off a mirror, where the monitor beam corresponds to the intensity of light incident upon the sample. The system and method also provide for detecting a measurement beam, where the measurement beam has been reflected off the sample being characterized. Both the monitor beam and the measurement beam are transmitted through the same transmission path, and detected by the same detector. Thus, potential sources of variations between the monitor beam and the measurement beam which are not due to the characteristics of the sample are minimized. Reflectivity information for the sample can be determined by comparing data corresponding to the measurement beam relative to data corresponding the monitor beam.
    Type: Application
    Filed: November 7, 2002
    Publication date: May 15, 2003
    Inventors: Adam Norton, Abdurrahman Sezginer, Fred E. Stanke, Rodney Smedt
  • Publication number: 20020180985
    Abstract: Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, at least one characteristic of defects on at least two sides of a specimen. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
    Type: Application
    Filed: September 20, 2001
    Publication date: December 5, 2002
    Inventors: Dan Wack, Ady Levy, Kyle A. Brown, Rodney Smedt, Gary Bultman, Mehrdad Nikoonahad, John Fielden
  • Publication number: 20020105646
    Abstract: A periodic structure is illuminated by polychromatic electromagnetic radiation. Radiation from the structure is collected and divided into two rays having different polarization states. The two rays are detected from which one or more parameters of the periodic structure may be derived. In another embodiment, when the periodic structure is illuminated by a polychromatic electromagnetic radiation, the collected radiation from the structure is passed through a polarization element having a polarization plane. The element and the polychromatic beam are controlled so that the polarization plane of the element are at two or more different orientations with respect to the plane of incidence of the polychromatic beam. Radiation that has passed through the element is detected when the plane of polarization is at the two or more positions so that one or more parameters of the periodic structure may be derived from the detected signals.
    Type: Application
    Filed: December 20, 2000
    Publication date: August 8, 2002
    Inventors: Guoheng Zhao, Kenneth P. Gross, Rodney Smedt, Mehrdad Nikoonahad
  • Patent number: 5043589
    Abstract: An improved optical inspection apparatus, especially suited for inspecting semiconductor devices using a single camera. A highly polished mirrored stage is provided with a light source extending upwardly therethrough and providing a pedestal upon which the object to be inspected is centered. A plurality of stationary reflectors are disposed around the stage and function in concert with two separate movable reflectors to provide optical scanning over the appropriate surface portions of the device. A separate movable reflector system is used to maintain a constant focal path length between the device and the camera as the other movable reflectors scan the device, thus ensuring proper focus and measurement accuracy.
    Type: Grant
    Filed: May 18, 1990
    Date of Patent: August 27, 1991
    Assignee: Trigon/Adcotech
    Inventors: Rodney Smedt, Ian Raphael