Abstract: The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a low molecular weight anthracene dye compounds. It has been found that these dye compounds can significantly reduce or even eliminate undesired reflections of exposure radiation, particularly deep U.V. exposure radiation such as 248 nm, as well as function as effective sensitizer compounds, enabling effective imaging at higher wavelengths, particularly I-line exposures.

Abstract: Methods are provided to prepare photoresists without isolation of various components, i.e. in a "one-pot" procedure. Preferred one-pot preparation methods of the invention include preparing a photoresist resin binder in a selected photoresist solvent and, without isolation of the resin binder from the solvent, adding a photoactive component and any other desired photoresist materials to the resin binder in solution to thereby provide a liquid photoresist composition in the solvent in which the resin binder was prepared. The invention also provides novel methods for synthesizing resist resin binders, particularly phenolic polymers that contain phenolic OH groups covalently bonded to another moiety such as acid labile groups or inert blocking groups.

Abstract: A photoresist composition comprising an alkali soluble resin and the reaction product of an ortho-naphthoquinone diazide sulfonic acid ester and a vinyl ether. In use, the photoresist is characterized by having at least a portion of the hydroxyl groups on the alkali soluble resin reacted with the photoactive compound and then deblocked by acid generation.

Abstract: The present invention relates to novel compositions that contain an activator system that comprises a photoactivator, acid generator and chain extender. Methods and articles of manufacture that comprise such compositions are also provided. In a preferred aspect, the compositions are photoimageable.

Abstract: The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition (ARC), particularly for deep UV applications. The ARCs of the invention in general comprise a crosslinker and novel ARC resin binders that effectively absorb reflected deep UV exposure radiation.

Abstract: A photoresist composition comprising an alkali soluble resin and the reaction product of an ortho-naphthoquinone diazide sulfonic acid ester and a vinyl ether. In use, the photoresist is characterized by having at least a portion of the hydroxyl groups on the alkali soluble resin reacted with the photoactive compound and then deblocked by acid generation.

Abstract: The invention comprises an acid hardened resist system consisting of a resin binder having acid labile blocking groups and inert blocking groups and a photoacid generator. The inclusion of inert blocking groups on the resin improves shelf life without deleteriously affecting photolithographic properties of the resist.

Abstract: The invention comprises a polymer formulated for an acid hardened resist system. The polymer is one having acid labile blocking groups and inert blocking groups. The photoresist comprises the polymer and a photoacid generator. The inclusion of inert blocking groups on the resin improves shelf life without deleteriously affecting photolithographic properties of the resist.

Abstract: The invention comprises a polymer formulated for an acid hardened resist system. The polymer is one having acid labile blocking groups and inert blocking groups. The photoresist comprises the polymer and a photoacid generator. The inclusion of inert blocking groups on the resin improves shelf life without deleteriously affecting photolithographic properties of the resist.

Abstract: The invention provides positive- and negative-acting a photoresist compositions that contain a photoacid generator component that includes multiple aryl sulfonium compounds. Specifically, the photoactive component contains at least one multiple cation aryl sulfonium compound, preferably a di-cation compound. The photoactive component of the resists of the invention can be conveniently prepared and provide a deep UV sensitive resist with excellent microlithographic properties.

Abstract: A photoresist composition comprising an alkali soluble resin and an ortho-naphthoquinone diazide sulfonic acid ester of a polyhydroxy alcohol. The photoresist is characterized by having at least a portion of its free hydroxyl groups on the photoactive compound blocked with an acid labile blocking group that generates a hydroxide upon cleavage.

Abstract: The invention comprises an acid hardened resist system consisting of a resin binder having acid labile blocking groups and inert blocking groups and a photoacid generator. The inclusion of inert blocking groups on the resin improves shelf life without deleteriously affecting photolithographic properties of the resist.

Abstract: A photoresist composition comprising an alkali soluble resin and an ortho-naphthoquinone diazide sulfonic acid ester of a polyhydroxy alcohol. The photoresist is characterized by having at least a portion of its free hydroxyl groups on the photoactive compound blocked with an acid labile blocking group that generates a hydroxide upon cleavage.

Abstract: A radiation sensitive composition, process for using said composition, and substrates coated with said composition. The photoimageable composition comprises a photobase generator compound, a resin binder and a material capable of crosslinking in the presence of base. In preferred aspects, the invention provides a negative-acting, aqueous developable photoimageable composition comprising a photobase generator compound, a resin binder which preferably is a phenolic polymer, a crosslinking agent that comprises one or more active groups that will undergo base-initiated crosslinking, and a curing agent.

Abstract: The present invention provides photoimageable compositions, processes and articles of manufacture. In particular, the invention provides a process comprising electrophoretically applying a coating layer of a photoimageable composition onto a conductive surface, the composition comprising a material that contains one or more photoacid labile groups. The photoimageable compositions of the invention preferably comprise a photoacid generator, a material that contains one or more acid-clearable functional groups, and a carrier resin that contains one or more functional groups that are, or can be treated to be, at least partially ionized.

Abstract: The present invention comprises certain benzyl-substituted photoactive compounds and photoresist compositions comprising such photoactive compounds. The benzyl-substituted photoactive compounds of the invention are particularly suitable as the photoactive component in chemically amplified positive-acting and negative-acting compositions.

Abstract: Mixtures of liquid crystal compounds from among different classes of liquid crystal ester compounds are disclosed. The mixtures exhibit freezing points substantially lower than the freezing point of either ester compound alone, so as to provide a substantially improved (widened) smectic C mesomorphic temperature range and protection against freezing or crystallization of liquid crystal material over a range of temperatures at which an electrooptic display device would typically be operated.

Abstract: Melt-processable polyesteramides capable of exhibiting melt-phase anisotropy at temperatures of approximately 360.degree. C. and lower are disclosed. The polyesteramides contain certain essential 2,2'-substituted biphenylene radicals and repeating units which provide ester and amide linkages. The polyesteramides exhibit melt processability suitable for processing into films and fibers.

Abstract: Aromatic polyesteramides exhibiting melt processability are disclosed. The polyesteramides comprise certain essential repeating units of the formulas ##STR1## wherein X is alkyl, alkoxy, trifluoromethyl, halogen or nitro. The polyesteramides exhibit melt anisotropy. Films and fibers combining a balance of properties suited to high strength service can be provided from the melt-processable polyesteramides.

Abstract: A class of aromatic polyesters exhibiting melt processability is disclosed. A portion of repeating 2,2'-substituted-biphenylene radicals in an aromatic polyester is replaced by certain other aromatic radicals to provide an aromatic polyester which exhibits low-melting properties, melt processability and melt anisotropy. The aromatic polyesters can be melt processed to films and fibers.