Abstract: Pumping apparatus of the invention using thermal transpiration micropumps comprises a plurality of individual thermal transpiration micropumps distributed over a substrate (5) as a plurality of rows (A, B, C, . . . , D) each made up of a plurality of micropumps (1, 6, . . . , 7, 8, 9), thereby building up a plurality of columns (a, b, . . . , c, d). Respective heater elements (4) in each of the thermal transpiration micropumps are controlled by suitably controlling a row control conductor (10A) and a column control conductor (11a). This greatly simplifies multiplexed control of a large number of individual micropumps, thus enabling pumping capacity to be adapted.

Abstract: A gas pumping system of the invention enables gas to be pumped from a process chamber (1) in order to regulate its pressure as a function of process steps. The system comprises a primary pump (2), a secondary pump (8), an inert gas injection device (6), and a regulator valve (4). The primary and/or secondary pump (2 and/or 8) is controlled in speed in order to regulate variations of greater amplitude. The regulator valve (4) is controlled in opening in order to regulate variations that are small amplitude and fast. The inert gas injection (6) is controlled in flow rate in order to regulate medium amplitude variations. This provides great reaction stability and a wide range of possible variation for the conditions in the process chamber (1).

Abstract: In the invention, the atmosphere in a vacuum chamber (1) is conditioned using a primary pump (3), a secondary pump (2), speed control means (6, 7) for controlling the speed of the primary pump, and at least first gas treatment means (5) adapted for treating the extracted gases downstream from the primary pump (3). The vacuum chamber (1) is contained in a room (130) having a false floor (36) covering a space (37). The primary pump (3) and the gas treatment means (5) are housed in the available space (37) under the false floor (36), so that the secondary pump (2) can be placed in the immediate vicinity of the vacuum chamber (1), and the primary pump (3) is in the proximity of the vacuum chamber (1).

Abstract: According to the invention, a semiconductor component manufacturing plant is constructed in a building having an upper storey and a lower storey separated from one another by a support slab and a false floor. The support slab has passageway openings, whilst the false floor consists of plates themselves having through passages. Vacuum generation means are disposed in an intermediate space situated between the support slab and the false floor which itself carries a process chamber situated in the upper space constituting a clean room. Suction means situated in the lower storey create a gaseous flow directed downwards from the clean room through the intermediate space to the lower storey. In this way, the false floor acts as a non-return mechanism for noise, thermal or chemical pollution coming from the vacuum generation means.

Abstract: The invention relates to a gas analysis system for analyzing gases in an enclosure under controlled pressure, which system comprises apparatus for ionizing the gases to be analyzed, and apparatus for analyzing the ionized gases. According to the invention the apparatus for ionizing the gases to be analyzed comprises a dedicated plasma source in contact with the gases contained in the enclosure and combined with a generator for generating a plasma from the gases to be analyzed; and the apparatus for analyzing the ionized gases comprises a radiation sensor situated in the vicinity of the zone in which the plasma is generated, and connected to an optical spectrometer for analyzing the variation of the radiation spectrum emitted by the generated plasma.

Abstract: The invention relates to a gas analysis system for analyzing gases in an enclosure under controlled pressure, which system comprises apparatus for ionizing the gases to be analyzed, and apparatus for analyzing the ionized gases.

Abstract: In the invention, the atmosphere in a vacuum chamber (1) is conditioned using a primary pump (3), a secondary pump (2), speed control means (6, 7) for controlling the speed of the primary pump, and at least first gas treatment means (5) adapted for treating the extracted gases downstream from the primary pump (3). The vacuum chamber (1) is contained in a room (130) having a false floor (36) covering a space (37). The primary pump (3) and the gas treatment means (5) are housed in the available space (37) under the false floor (36), so that the secondary pump (2) can be placed in the immediate vicinity of the vacuum chamber (1), and the primary pump (3) is in the proximity of the vacuum chamber (1).

Abstract: A mini-environment control device includes an individual enclosure to contain a sample and to isolate it from the external environment. An array of micropumps attached to the individual enclosure generates and maintains a controlled vacuum in the individual enclosure. Transfer means introduce the sample into the individual enclosure and extract it therefrom. The micropumps of the array of micropumps can be of a type employing the thermal transpiration effect. Temperature and pressure microsensors and a gas analyzer enable the operation of the array of micropumps to be controlled by an onboard microcomputer. The atmosphere surrounding a sample is therefore controlled.

Abstract: In the invention, the gases present in a transfer chamber are pumped out by means of a primary pump that is driven by variable-speed drive means, that is connected in series with a turbomolecular secondary pump, and that is associated with gas monitoring means for monitoring one or more appropriate characteristic parameters of the pumped gases and for producing control signals acting on the drive means of the primary pump so as to adapt its pumping speed in order to avoid any condensation or solidification of the gases in the airlock or transfer chamber. It is thus possible to optimize the speed at which the pressure is lowered, and to reduce the pollution brought into the process chamber.

Abstract: In the invention, the atmosphere in a process chamber is conditioned using a primary pump, a secondary pump, speed control means for controlling the speed of the primary pump, and at least first gas analyzer means adapted for analyzing the extracted gases upstream from the primary pump and for producing first analysis signals. First signal processing means control the pumping speed as a function of the first analysis signals, so as to determine the variation in the pressure inside the process chamber during the transient stages of the treatment. In this way, deposits and turbulence are avoided in the process chamber, as are deposits in the pumping line, so that the secondary pump can be placed in the immediate vicinity of the process chamber.

Abstract: In the invention, the atmosphere in a process chamber is conditioned using a primary pump, a secondary pump, speed control means for controlling the speed of the primary pump, and at least first gas analyzer means adapted for analyzing the extracted gases upstream from the primary pump and for producing first analysis signals. First signal processing means control the pumping speed as a function of the first analysis signals, so as to determine the variation in the pressure inside the process chamber during the transient stages of the treatment. In this way, deposits and turbulence are avoided in the process chamber, as are deposits in the pumping line, so that the secondary pump can be placed in the immediate vicinity of the process chamber.

Abstract: A mini-environment control device includes an individual enclosure to contain a sample and to isolate it from the external environment. An array of micropumps attached to the individual enclosure generates and maintains a controlled vacuum in the individual enclosure. Transfer means introduce the sample into the individual enclosure and extract it therefrom. The micropumps of the array of micropumps can be of a type employing the thermal transpiration effect. Temperature and pressure microsensors and a gas analyzer enable the operation of the array of micropumps to be controlled by an onboard microcomputer. The atmosphere surrounding a sample is therefore controlled.

Abstract: An apparatus for producing gas hydrates includes a reactor vessel having a fluidized or expanded bed reaction zone. The reactor vessel has an upper portion and a lower portion, wherein a cross-sectional area of the upper portion is larger than a cross-sectional area of the lower portion. Water is introduced into the reactor vessel, and hydrate-forming gas is introduced, under an elevated pressure, into the lower portion of the reactor vessel. Preferably, the water and gas flow in a countercurrent manner through the reactor and into the fluidized or expanded bed reaction zone. The apparatus can include a mechanism for withdrawing unreacted hydrate-forming gas from the upper portion of the reactor vessel and recycling it back into the fluidized or expanded reaction bed. A defrosting device can be included with the reactor so that at least a portion of at least one wall of the reactor vessel can be defrosted.

Abstract: A method and apparatus for safely, conveniently, and inexpensively liberating gas from gas hydrates includes the use of a device, provided adjacent to or in the bulk gas hydrates, for exposing the gas hydrates to heat from a gas or liquid (preferably steam). The gas hydrates can be directly exposed to the gas or liquid or indirectly exposed through a thermally conductive coil or channel. The heat from the gas or liquid dissociates the gas hydrates into the corresponding gas component and water component. After liberation, the gas component can be collected for further storage, transport, or use. The apparatus further includes a mechanism for moving at least a portion of the gas or liquid through the device for exposing the gas hydrates to heat. The device for exposing the gas hydrates to heat also can be movable, so it can be maintained in close proximity to or in contact with the gas hydrates for continued efficient gasification of the hydrates.

Abstract: The present invention provides a process for continuously producing clathrate hydrate. This process includes comprising the steps of:(a) pressurizing a hydrate-forming gas to an elevated pressure and cooling the hydrate-forming gas below the gas-water-hydrate equilibrium point at the elevated pressure;(b) cooling liquid water below the gas-water-hydrate equilibrium temperature for the elevated pressure;(c) charging hydrate-forming gas at the elevated pressure into a reaction zone which contains a movable surface;(d) atomizing water in the reaction zone in contact with the hydrate-forming gas to form gas hydrates in the reaction;(e) depositing the gas hydrates on the movable surface; and(f) collecting the gas hydrates from the movable surface.

Abstract: A gas hydrate storage reservoir includes at least one insulated wall defining an opening and a sunlight permeable top covering the opening. A gas-tight, gas hydrate storage cavity is defined within the top and the wall(s). A cover element is provided to cover at least a portion of the top to prevent sunlight from passing through that portion of the top. The gas storage reservoir also includes devices for removing gas and water from the storage cavity. In use, when gas is desired by the user, the cover element is removed from at least a portion of the sunlight permeable top so that sunlight will pass through the top and into the storage reservoir. Heat energy from the sun warms the exposed gas hydrates, thereby forcing the hydrates to dissociate into gas and water. The gas is removed from the tank and transported to an appropriate location for use. When sunlight is unavailable or when additional gas is needed than that produced by dissociation via the sun, an external, auxiliary heater (e.g.