Patents by Inventor Roland Gesche

Roland Gesche has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160093475
    Abstract: A method and apparatus generates pulses that can be used for high-precision three-dimensional plasma treatment. At least two sources are furnished with at least one time function, wherein each of the at least two sources radiates an electromagnetic field generated by one of the time functions, and the at least one time function. In a method, the at least two sources cooperate in such a manner that at least one predetermined field strength is realized sequentially in a temporal succession in at least two predetermined space-time points. An alternative method uses at least one source and at least one reflection element. An apparatus with at least two sources and at least one data processing device or at least one source, at least one reflection element and at least one data processing device is configured such that one of the methods can be executed.
    Type: Application
    Filed: December 8, 2015
    Publication date: March 31, 2016
    Applicant: Forschungsverbund Berlin E.V.
    Inventor: Roland GESCHE
  • Patent number: 9210792
    Abstract: A method and apparatus generates pulses that can be used for high-precision three-dimensional plasma treatment. At least two sources are furnished with at least one time function, wherein each of the at least two sources radiates an electromagnetic field generated by one of the time functions, and the at least one time function. In a method, the at least two sources cooperate in such a manner that at least one predetermined field strength is realized sequentially in a temporal succession in at least two predetermined space-time points. An alternative method uses at least one source and at least one reflection element. An apparatus with at least two sources and at least one data processing device or at least one source, at least one reflection element and at least one data processing device is configured such that one of the methods can be executed.
    Type: Grant
    Filed: January 22, 2013
    Date of Patent: December 8, 2015
    Assignee: Forschungsverbund Berlin E.V.
    Inventor: Roland Gesche
  • Patent number: 9210789
    Abstract: A device for generating a plasma, comprises an alternating voltage source, a travelling wave resonator and coupling means that are designed to couple the alternating voltage generated by the alternating voltage source into the travelling wave resonator in such a manner that travelling electromagnetic waves are produced, wherein the travelling wave resonator is designed to increase the electric field strength of the travelling electromagnetic waves in such a manner that a plasma is ignited in a gas. The invention further relates to a method for generating a plasma, comprising the steps of: generating an alternating voltage; generating travelling electromagnetic waves in a travelling wave resonator by coupling said alternating voltage into the travelling wave resonator; and increasing the electric field strength of the travelling electromagnetic waves in the travelling wave resonator in order to ignite a plasma in a gas.
    Type: Grant
    Filed: November 19, 2010
    Date of Patent: December 8, 2015
    Assignee: Forschungsverbund Berlin E.V.
    Inventors: Horia-Eugen Porteanu, Roland Gesche, Silvio Kuehn
  • Patent number: 9100113
    Abstract: A receiver with a local oscillator, a quadrature modulator, a first mixer and a second mixer, wherein a first input of the quadrature modulator is connected to a second signal input of the receiver circuit and a second input of the quadrature modulator is connected to the local oscillator. Further, a first input of the first mixer is connected to a first signal input of the receiver circuit, a second input of the first mixer is connected to an output of the quadrature modulator, and an output of the first mixer is connected to a first signal output of the receiver circuit. A first input of the second mixer is connected to the second signal input, a second input of the second mixer is connected to the output of the quadrature modulator, and an output of the second mixer is connected to a second signal output of the receiver circuit.
    Type: Grant
    Filed: April 25, 2012
    Date of Patent: August 4, 2015
    Assignee: FORSCHUNGSVERBUND BERLIN E.V.
    Inventors: Silvio Kühn, Roland Gesche
  • Patent number: 8796934
    Abstract: The invention relates to a plasma source with an oscillator having an active element and a resonator connected to the active element. The resonator has a hollow body, a gas inlet, a gas outlet arranged at a distal end of the hollow body about a longitudinal axis of the hollow body, and a coil arranged along the longitudinal axis of the hollow body, said coil having an effective length of one quarter of a wavelength at a resonant frequency of the resonator. A distal end of the coil is arranged relative to the gas outlet such that a plasma section can form between the distal end of the coil serving as a first plasma electrode and the gas outlet of the hollow body serving as a second plasma electrode. At a proximal end of the hollow body, the coil is lead out of the interior of the hollow body through an electrically contact-free feed-through, and a proximal end of the coil contacts the hollow body at its external side.
    Type: Grant
    Filed: January 28, 2011
    Date of Patent: August 5, 2014
    Assignee: Forschungsverbund Berlin E.V.
    Inventors: Silvio Kuehn, Roland Gesche, Horia-Eugen Porteanu
  • Publication number: 20140120855
    Abstract: A receiver with a local oscillator, a quadrature modulator, a first mixer and a second mixer, wherein a first input of the quadrature modulator is connected to a second signal input of the receiver circuit and a second input of the quadrature modulator is connected to the local oscillator. Further, a first input of the first mixer is connected to a first signal input of the receiver circuit, a second input of the first mixer is connected to an output of the quadrature modulator, and an output of the first mixer is connected to a first signal output of the receiver circuit. A first input of the second mixer is connected to the second signal input, a second input of the second mixer is connected to the output of the quadrature modulator, and an output of the second mixer is connected to a second signal output of the receiver circuit.
    Type: Application
    Filed: April 25, 2012
    Publication date: May 1, 2014
    Applicant: Forschungsverbund Berlin e.V.
    Inventors: Silvio Kühn, Roland Gesche
  • Publication number: 20130328483
    Abstract: A microwave resonator for inductively generating a plasma (5) is introduced. The microwave resonator comprises a first tube (4) and a conductive, preferably metal, plate (1). The tube (4) is designed for connection to a supply device for a process gas and for conveying the process gas and comprises a dielectric material. The conductive plate (1) has a first, preferably cylindrical, hole (2), which extends from a first opening on a first side of the conductive plate (1) to a second opening on a second side, opposite the first side, of the conductive plate (1). The first tube (4) is arranged in the first hole (2). The conductive plate (1) also has a first slit (3), which is open towards the first and the second side of the conductive plate (1) and towards the first hole (2). The invention also introduces a plasma generator with such a microwave resonator.
    Type: Application
    Filed: November 15, 2011
    Publication date: December 12, 2013
    Applicant: Forschungsverbund Berlin E.V.
    Inventors: Roland Gesche, Horia-Eugen Porteanu, Silvio Kühn
  • Patent number: 8545764
    Abstract: A microplasma array for the production of low-temperature plasmas at or near atmospheric pressures is described. The walls of holes made in a substrate at regular intervals with respect to one another form hollow electrodes and are coated with metal. The hollow electrodes are supplied individually or as a group from one side of the substrate with an electrical excitation in the GHz-region.
    Type: Grant
    Filed: January 11, 2006
    Date of Patent: October 1, 2013
    Assignee: Forschungsverbund Berlin E.V.
    Inventor: Roland Gesche
  • Publication number: 20130213576
    Abstract: The invention relates to an apparatus for the treatment of surfaces of a substrate by means of plasma. Said apparatus comprises a plasma source designed to generate plasma and to eject it into a plasma space with a longitudinal plasma extent, said extent extending along a main motion component of the plasma, an at least partially conductive first holding apparatus designed to hold a first workpiece, and a voltage source connected to the first holding apparatus, said voltage source being designed to generate a first acceleration voltage and to apply it to the first holding apparatus. The first holding apparatus is arranged and designed relative to the plasma source in such a manner that it places the first workpiece in such a manner that the plasma reaches the first workpiece when the first acceleration voltage is applied.
    Type: Application
    Filed: August 16, 2011
    Publication date: August 22, 2013
    Applicant: Forschungsverbund Berlin E.V.
    Inventors: Roland Gesche, Horia-Eugen Porteanu, Silvio Kühn
  • Patent number: 8339047
    Abstract: The invention relates to an electrode for a plasma generator for generating plasmas at atmospheric pressure or near-atmospheric pressures by means of excitation using microwaves. The invention provides an electrode made of a sheet metal strip (1), in the longitudinal direction of which at least one slot (2) is introduced at a length that is one time or multiple times that of a quarter of the wavelength of the open-circuit voltage of the microwave such that at least two partial electrodes (3) are formed, wherein the voltage supply line is provided on the partial electrodes (3) in the region of the closed slot end or ends.
    Type: Grant
    Filed: March 25, 2008
    Date of Patent: December 25, 2012
    Assignee: Forschungsverbund Berlin E.V.
    Inventors: Roland Gesche, Andreea Cristina Andrei, Stephan Buchholz, Silvio Kuehn
  • Publication number: 20120313524
    Abstract: The invention relates to a plasma source with an oscillator having an active element and a resonator connected to the active element. The resonator has a hollow body, a gas inlet, a gas outlet arranged at a distal end of the hollow body about a longitudinal axis of the hollow body, and a coil arranged along the longitudinal axis of the hollow body, said coil having an effective length of one quarter of a wavelength at a resonant frequency of the resonator. A distal end of the coil is arranged relative to the gas outlet such that a plasma section can form between the distal end of the coil serving as a first plasma electrode and the gas outlet of the hollow body serving as a second plasma electrode. At a proximal end of the hollow body, the coil is lead out of the interior of the hollow body through an electrically contact-free feed-through, and a proximal end of the coil contacts the hollow body at its external side.
    Type: Application
    Filed: January 28, 2011
    Publication date: December 13, 2012
    Applicant: Forschungsverbund Berlin E.V.
    Inventors: Silvio Kuehn, Roland Gesche, Horia-Eugen Porteanu
  • Patent number: 8324971
    Abstract: The present invention is directed to a self-adjusting gate bias network for field effect transistors in radio frequency applications. A bias network for field effect transistors is provided comprising a field effect transistor having a source electrode connected to ground and a drain electrode connected to a load; a radio frequency network connected to the gate electrode; a gate bias network connected to the gate electrode; wherein a device having a non-linear characteristic is provided in series between the gate electrode and the gate bias network such that a forward bias current at the gate electrode of the field effect transistor is reduced or prevented. The reduction or prevention of a forward bias current leads in overdrive conditions to a self-adjustment of the bias point of the field-effect transistor improving the reduction of distortions of an amplifier or changing the class of oscillators connected to the gate electrode.
    Type: Grant
    Filed: September 15, 2009
    Date of Patent: December 4, 2012
    Assignee: Forschungsverbund Berlin E.V.
    Inventors: Roland Gesche, Ibrahim M. Khalil, Silvio Kuehn, Armin Liero
  • Publication number: 20120285934
    Abstract: A device for generating a plasma, comprises an alternating voltage source, a travelling wave resonator and coupling means that are designed to couple the alternating voltage generated by the alternating voltage source into the travelling wave resonator in such a manner that travelling electromagnetic waves are produced, wherein the travelling wave resonator is designed to increase the electric field strength of the travelling electromagnetic waves in such a manner that a plasma is ignited in a gas. The invention further relates to a method for generating a plasma, comprising the steps of: generating an alternating voltage; generating travelling electromagnetic waves in a travelling wave resonator by coupling said alternating voltage into the travelling wave resonator; and increasing the electric field strength of the travelling electromagnetic waves in the travelling wave resonator in order to ignite a plasma in a gas.
    Type: Application
    Filed: November 19, 2010
    Publication date: November 15, 2012
    Applicant: FORSCHUNGSVERBUND BERLIN E.V.
    Inventors: Horia-Eugen Porteanu, Roland Gesche, Silvio Kuehn
  • Publication number: 20120018096
    Abstract: The invention relates to a plasma chamber (10, 20, 30) having a first receiving device for a substrate (14, 24, 34) fastened to a first side and having a plasma generation unit for generating a plasma in the plasma chamber, wherein the plasma generation unit is connected or can be connected to a high frequency voltage supply (11, 21, 31). The high frequency voltage supply is designed to generate a modulated, high-frequency alternating voltage and to output said voltage to the plasma generation unit. The plasma generation unit is designed to generate the plasma using the modulated, high-frequency alternating voltage.
    Type: Application
    Filed: March 31, 2010
    Publication date: January 26, 2012
    Inventor: Roland Gesche
  • Publication number: 20110181324
    Abstract: The present invention is directed to a self-adjusting gate bias network for field effect transistors in radio frequency applications. A bias network for field effect transistors is provided comprising a field effect transistor having a source electrode connected to ground and a drain electrode connected to a load; a radio frequency network connected to the gate electrode; a gate bias network connected to the gate electrode; wherein a device having a non-linear characteristic is provided in series between the gate electrode and the gate bias network such that a forward bias current at the gate electrode of the field effect transistor is reduced or prevented. The reduction or prevention of a forward bias current leads in overdrive conditions to a self-adjustment of the bias point of the field-effect transistor improving the reduction of distortions of an amplifier or changing the class of oscillators connected to the gate electrode.
    Type: Application
    Filed: September 15, 2008
    Publication date: July 28, 2011
    Inventors: Roland Gesche, Ibrahim M. Khalil, Silvio Kuehn, Armin Liero
  • Publication number: 20110006687
    Abstract: Method and generator circuit for generating plasmas by means of radiofrequency excitation In order to provide a voltage that maintains the plasma, according to the method, a high-frequency voltage having a defined operating frequency and at least one further high-frequency voltage having in each case a multiple of said operating frequency and in each case an adjustable amplitude and phase are superposed in a phase-locked manner. For a corresponding generator circuit, at least two radiofrequency power generators (1 to 4) are provided, of which one (1) operates at a defined operating frequency (f) and the other(s) (2 to 4) operate(s) at in each case a multiple of said operating frequency (f). All the radiofrequency power generators (1 to 4) are coupled to one another in a phase-locked manner and the relative phase angle and also the respective amplitude of each radiofrequency power generator (1 to 4) can be individually regulated by means of a dedicated matching circuit (5 to 8).
    Type: Application
    Filed: October 28, 2008
    Publication date: January 13, 2011
    Applicant: AURION ANLAGENTECHNIK GMBH
    Inventor: Roland Gesche
  • Publication number: 20100171425
    Abstract: The invention relates to an electrode for a plasma generator for generating plasmas at atmospheric pressure or near-atmospheric pressures by means of excitation using microwaves. The invention provides an electrode made of a sheet metal strip (1), in the longitudinal direction of which at least one slot (2) is introduced at a length that is one time or multiple times that of a quarter of the wavelength of the open-circuit voltage of the microwave such that at least two partial electrodes (3) are formed, wherein the voltage supply line is provided on the partial electrodes (3) in the region of the closed slot end or ends.
    Type: Application
    Filed: March 25, 2008
    Publication date: July 8, 2010
    Inventors: Roland Gesche, Andreea Cristina Andrei, Stephan Buchholz, Silvio Kuehn
  • Publication number: 20090214402
    Abstract: The invention relates to a microplasma array for producing low-temperature plasmas at or close to atmospheric pressure. According to the invention, the walls of holes which are introduced into a substrate (1) at regular intervals from each other and form hollow electrodes (2) are metal-coated, and said hollow electrodes (2) are supplied individually or in groups with electrical excitation in the GHz range from one side of the substrate (1).
    Type: Application
    Filed: January 11, 2006
    Publication date: August 27, 2009
    Applicant: FORSCHUNGSVERBUND BERLIN E.V.
    Inventor: Roland Gesche
  • Patent number: 5558751
    Abstract: In a coating apparatus, a sputter cathode (1) has, directly side by side, two electrodes (2, 3) connected in common to a high-frequency generator and having each a target (9, 10). The targets (9, 10) of both electrodes (2, 3) abut one another each with a straight edge (11, 12). A dark space shield surrounds both electrodes (2, 3) and targets (9, 10) together.
    Type: Grant
    Filed: February 8, 1995
    Date of Patent: September 24, 1996
    Assignee: Leybold Aktiengesellschaft
    Inventors: Peter Mahler, Wolfgang Stang, Michael Scherer, Roland Gesche
  • Patent number: 5538609
    Abstract: An evacuable chamber serving as a cathode contains a rotatable magnet system and is connected to a high frequency power supply for sputtering a target. The chamber is electrically isolated from an evacuable housing containing the substrate to be coated, the chamber being covered by a cup-like shield fixed to the housing to define an interior space. A pipe for evacuating the chamber includes first and second sections separated by a gap and connected by an electrically insulating collar in which parallel metal grids are installed in the gap and respectively connected to the power source and to ground in order to prevent the formation of secondary plasma.
    Type: Grant
    Filed: May 24, 1995
    Date of Patent: July 23, 1996
    Assignee: Leybold Aktiengesellschaft
    Inventors: Reiner Hinterschuster, Berthold Ocker, Roland Gesche, Mark Saunders