Abstract: An electric motor as well as a manufacturing method for the electric motor and a manufacturing tool are provided, the electric motor being for a deep well vertical turbine pump and having a stator assembly that has a stator bore to hold a rotor and slots that are radially open to the inside, respectively separated from each other by a stator tooth, and in which electrical conductors made of round wire of coils of a coil assembly lie, with the distributed windings on one axial end of the coil assembly forming a winding head in which the coils are encapsulated. The winding head only extends between an inner diameter and an outer diameter which is smaller than the diameter of the stator bore in which the coil assembly is inserted axially into the slots of the stator assembly.

Abstract: Provided are a method and a tool for manufacturing a coil assembly of an electric motor for a deep well vertical turbine pump with a stator assembly that has a stator bore to receive a rotor and slots radially open to the inside which are respectively separated from each other by a stator tooth and in which electrical conductors of coils of the coil assembly lie, forming distributed windings and, at one axial end of the coil assembly, a winding head. The coil assembly is manufactured by shaping and encapsulating the coils within the tool so that the winding head extends only between an inner diameter and an outer diameter that is smaller than the diameter of the stator bore in order to enable axial insertion of the coil assembly into the stator assembly leading with the winding head in which the coils are respectively wound individually, drawn into the tool as wire bundles and encapsulated within it.

Abstract: A sensor device includes a sensor unit sensitive for a property of a gaseous medium. The sensor unit is formed on a first surface of a sensor substrate. A frame structure on the first surface includes a first loop portion laterally surrounding a first area that includes the sensor unit. A communicating channel accesses the first area through at least one of a lateral port in the first loop portion and a base port in the sensor substrate. A lid structure completely covers the frame structure and the first area.

Abstract: A sensor device includes a sensor unit sensitive for a property of a gaseous medium. The sensor unit is formed on a first surface of a sensor substrate. A frame structure on the first surface includes a first loop portion laterally surrounding a first area that includes the sensor unit. A communicating channel accesses the first area through at least one of a lateral port in the first loop portion and a base port in the sensor substrate. A lid structure completely covers the frame structure and the first area.

Abstract: A universal phantom includes a first phantom and a second phantom. The first phantom comprises a plurality of radiation markers. The second phantom comprises a plurality of optical markers. The second phantom is fixedly attachable to the first phantom in a predetermined position. A calibration method employs a universal phantom to consolidate the tasks of determining the isocenter of a radiation machine, calibrating optical devices, and registering the optical devices in a radiation coordinate system with origin at the isocenter.

Abstract: The present invention relates to a process for the preparation of 7-(4,7-diazaspiro[2.5]octan-7-yl)-2-(2,8-dimethylimidazo[1,2-b]pyridazin-6-yl)pyrido[1,2-a]pyrimidin-4-one useful as pharmaceutically active compounds.

Abstract: The present invention relates to a process for synthesizing a compound of formula (I), R1 is H or C1-6alkyl; R2 is H or hydroxy; or pharmaceutically acceptable salt or diastereomer thereof, which is useful for prophylaxis and treatment of a viral disease in a patient relating to hepatitis B infection or a disease caused by hepatitis B infection.

Abstract: A sensor device includes a sensor unit sensitive for a property of a gaseous medium. The sensor unit is formed on a first surface of a sensor substrate. A frame structure on the first surface includes a first loop portion laterally surrounding a first area that includes the sensor unit. A communicating channel accesses the first area through at least one of a lateral port in the first loop portion and a base port in the sensor substrate. A lid structure completely covers the frame structure and the first area.

Abstract: A sensor device includes a sensor unit sensitive for a property of a gaseous medium. The sensor unit is formed on a first surface of a sensor substrate. A frame structure on the first surface includes a first loop portion laterally surrounding a first area that includes the sensor unit. A communicating channel accesses the first area through at least one of a lateral port in the first loop portion and a base port in the sensor substrate. A lid structure completely covers the frame structure and the first area.

Abstract: A semiconductor device and a method of manufacturing the same are provided. The semiconductor device includes a semiconductor chip including a substrate having a first surface and a second surface arranged opposite to the first surface; at least one stress-decoupling trench that extends from the first surface into the substrate, where the at least one stress-decoupling trench extends partially into the substrate towards the second surface although not completely to the second surface; a microelectromechanical systems (MEMS) element, including a sensitive area, disposed at the first surface of the substrate and laterally spaced from the at least one stress-decoupling trench; and a stress-decoupling material that fills the at least one stress-decoupling trench and covers the sensitive area of the MEMS element.

Abstract: A semiconductor device and a method of manufacturing the same are provided. The semiconductor device includes a semiconductor chip including a substrate having a first surface and a second surface arranged opposite to the first surface; at least one stress-decoupling trench that extends from the first surface into the substrate, where the at least one stress-decoupling trench extends partially into the substrate towards the second surface although not completely to the second surface; a microelectromechanical systems (MEMS) element, including a sensitive area, disposed at the first surface of the substrate and laterally spaced from the at least one stress-decoupling trench; and a stress-decoupling material that fills the at least one stress-decoupling trench and covers the sensitive area of the MEMS element.

Abstract: Collision free regions are predetermined for one or more class solutions. Each class solution has defined limits for allowed field geometry variations. Collision free regions in planning can be defined as a set of allowed isocenter positions relative to a fixation device. The collision free regions may be visualized by a user to plan for field geometry and isocenter position tradeoffs. Collision free regions in delivery can be defined as a set of allowed couch support coordinates. The treatment fields in a radiation treatment plan can be checked against the collision free regions in delivery to determine whether they will pose any collision risks.

Abstract: Embodiments relate to microelectromechanical systems (MEMS) and more particularly to membrane structures comprising pixels for use in, e.g., display devices. In embodiments, a membrane structure comprises a monocrystalline silicon membrane above a cavity formed over a silicon substrate. The membrane structure can comprise a light interference structure that, depending upon a variable distance between the membrane and the substrate, transmits or reflects different wavelengths of light. Related devices, systems and methods are also disclosed.

Abstract: The present invention relates to a process for synthesizing a compound of formula (I), R1 is H or C1-6alkyl; R2 is H or hydroxy; or pharmaceutically acceptable salt or diastereomer thereof, which is useful for prophylaxis and treatment of a viral disease in a patient relating to hepatitis B infection or a disease caused by hepatitis B infection.

Abstract: The present invention relates to a process for the preparation of 2-pyrazolo[1,5-a]pyrazin-2-ylpyrido[1,2-a]pyrimidin-4-one derivatives useful as pharmaceutically active compounds.

Abstract: The present invention relates to a process for the preparation of 2-pyrazolo[1,5-a]pyrazin-2-ylpyrido[1,2-a]pyrimidin-4-one derivatives useful as pharmaceutically active compounds.

Abstract: An apparatus includes: a structure for coupling to a patient; a plurality of reflective markers coupled to the structure, wherein the reflective markers are configured to reflect non-visible light; and a securing mechanism configured to secure the structure relative to the patient. An apparatus includes: a first light source configured to project a first structured light onto an object, wherein the first structured light is non-visible; a first camera configured to obtain a first image of the first structured light as projected onto the object; a second camera configured to obtain a second image of the first structured light as projected onto the object; and a processing unit configured to process the first and second images from the first camera and the second camera; wherein the first camera and the second camera are configured for non-visible light detection.

Abstract: Collision free regions are predetermined for one or more class solutions. Each class solution has defined limits for allowed field geometry variations. Collision free regions in planning can be defined as a set of allowed isocenter positions relative to a fixation device. The collision free regions may be visualized by a user to plan for field geometry and isocenter position tradeoffs. Collision free regions in delivery can be defined as a set of allowed couch support coordinates. The treatment fields in a radiation treatment plan can be checked against the collision free regions in delivery to determine whether they will pose any collision risks.

Abstract: Collision free regions are predetermined for one or more class solutions. Each class solution has defined limits for allowed field geometry variations. Collision free regions in planning can be defined as a set of allowed isocenter positions relative to a fixation device. The collision free regions may be visualized by a user to plan for field geometry and isocenter position tradeoffs. Collision free regions in delivery can be defined as a set of allowed couch support coordinates. The treatment fields in a radiation treatment plan can be checked against the collision free regions in delivery to determine whether they will pose any collision risks.

Abstract: Collision free regions are predetermined for one or more class solutions. Each class solution has defined limits for allowed field geometry variations. Collision free regions in planning can be defined as a set of allowed isocenter positions relative to a fixation device. The collision free regions may be visualized by a user to plan for field geometry and isocenter position tradeoffs. Collision free regions in delivery can be defined as a set of allowed couch support coordinates. The treatment fields in a radiation treatment plan can be checked against the collision free regions in delivery to determine whether they will pose any collision risks.