Abstract: Window units, for example insulating glass units (IGU's), that have at least two panes, each pane having an electrochromic device thereon, are described. Two optical state devices on each pane of a dual-pane window unit provide window units having four optical states. Window units described allow the end user a greater choice of how much light is transmitted through the electrochromic window. Also, by using two or more window panes, each with its own electrochromic device, registered in a window unit, visual defects in any of the individual devices are negated by virtue of the extremely small likelihood that any of the visual defects will align perfectly and thus be observable to the user.

Abstract: A method for filling a recessed feature of a substrate includes a) at least partially filling a recessed feature of a substrate with tungsten-containing film using at least one of chemical vapor deposition (CVD) and atomic layer deposition (ALD); b) at a predetermined temperature, using an etchant including activated fluorine species to selectively etch the tungsten-containing film more than an underlying material of the recessed feature without removing all of the tungsten-containing film at a bottom of the recessed feature; and c) filling the recessed feature using at least one of CVD and ALD.

Abstract: Novel slick water fracturing fluid compositions are disclosed, where the compositions including with slick water fracturing compositions including a partially hydrolyzed polyacrylamide polymer system within invert emulsion and an effective amount of a friction reducer booster system, where the effective amount is sufficient to reduce a drag friction of the composition by an additional amount of at least 5% in the first 30 seconds of evaluation in high salinity and low temperature environments.

Abstract: Certain embodiments pertain to local interconnects formed by subtractive patterning of blanket layer of tungsten or other conductive material. The grain sizes of tungsten or other deposited metal can be grown to relatively large dimensions, which results in increased electrical conductivity due to, e.g., reduced electron scattering at grain boundaries as electrons travel from one grain to the next during conduction.

Abstract: A gas expansion module for use with semiconductor wafer loadlocks and other regulated-pressure components of semiconductor processing tools is provided. The gas expansion module may be barometrically isolated from the loadlock or other component and pumped down to a vacuum condition while the loadlock is performing operations at a higher pressure, such as ambient atmospheric conditions. After an initial pump-down of the loadlock is performed, the gas expansion module may be fluidly joined to the loadlock volume and the gases within each allowed to reach equilibrium. A further pump-down of the combined volume may be used to bring the loadlock pressure to a desired vacuum condition.

Abstract: A method for filling a recessed feature of a substrate includes a) at least partially filling a recessed feature of a substrate with tungsten-containing film using at least one of chemical vapor deposition (CVD) and atomic layer deposition (ALD); b) at a predetermined temperature, using an etchant including activated fluorine species to selectively etch the tungsten-containing film more than an underlying material of the recessed feature without removing all of the tungsten-containing film at a bottom of the recessed feature; and c) filling the recessed feature using at least one of CVD and ALD.

Abstract: A substrate handling robot includes an arm section and a wrist portion connected to the arm section. An end effector is connected to the wrist portion and is configured to support a substrate. A housing is arranged adjacent to the end effector and includes a gas outlet that directs gas onto an exposed surface of the substrate during transport.

Abstract: Novel slick water fracturing fluid compositions are disclosed, where the compositions including with slick water fracturing compositions including a partially hydrolyzed polyacrylamide polymer system within invert emulsion and an effective amount of a friction reducer booster system, where the effective amount is sufficient to reduce a drag friction of the composition by an additional amount of at least 5% in the first 30 seconds of evaluation in high salinity and low temperature environments.

Abstract: Certain embodiments pertain to local interconnects formed by subtractive patterning of blanket layer of tungsten or other conductive material. The grain sizes of tungsten or other deposited metal can be grown to relatively large dimensions, which results in increased electrical conductivity due to, e.g., reduced electron scattering at grain boundaries as electrons travel from one grain to the next during conduction.

Abstract: Provided are methods and apparatuses for depositing barrier layers for blocking diffusion of conductive materials from conductive lines into dielectric materials in integrated circuits. The barrier layer may contain copper. In some embodiments, the layers have conductivity sufficient for direct electroplating of conductive materials without needing intermediate seed layers. Such barrier layers may be used with circuits lines that are less than 65 nm wide and, in certain embodiments, less than 40 nm wide. The barrier layer may be passivated to form easily removable layers including sulfides, selenides, and/or tellurides of the materials in the layer.

Abstract: Provided are methods and apparatuses for depositing barrier layers for blocking diffusion of conductive materials from conductive lines into dielectric materials in integrated circuits. The barrier layer may contain copper. In some embodiments, the layers have conductivity sufficient for direct electroplating of conductive materials without needing intermediate seed layers. Such barrier layers may be used with circuits lines that are less than 65 nm wide and, in certain embodiments, less than 40 nm wide. The barrier layer may be passivated to form easily removable layers including sulfides, selenides, and/or tellurides of the materials in the layer.

Abstract: Of the many methods and compositions provided herein, one method includes placing a cement composition in a subterranean formation, wherein the cement composition includes cement, rock-forming mineral materials, and water; and permitting the cement composition to set therein. Another method provided herein includes introducing a settable drilling fluid into a subterranean formation, wherein the settable drilling fluid includes cement, rock-forming mineral materials, water, and a set retarder; and permitting the settable drilling fluid to set in therein. A composition provided herein includes cement, rock-forming mineral materials and water. Another composition provided herein includes cement, rock-forming mineral materials, water, and a set retarder.

Abstract: The present disclosure addressed apparatus and methods for forming an annular isolator in a borehole after installation of production tubing. Annular seal means are carried in or on production tubing as it is run into a borehole. In conjunction with expansion of the tubing, the seal is deployed to form an annular isolator. An inflatable element carried on the tubing may be inflated with a fluid carried in the tubing and forced into the inflatable element during expansion of the tubing. Reactive chemicals may be carried in the tubing and injected into the annulus to react with each other and ambient fluids to increase in volume and harden into an annular seal. An elastomeric sleeve, ring or band carried on the tubing may be expanded into contact with a borehole wall and may have its radial dimension increased in conjunction with tubing expansion to form an annular isolator.

Abstract: The present disclosure addressed apparatus and methods for forming an annular isolator in a borehole after installation of production tubing. Annular seal means are carried in or on production tubing as it is run into a borehole. In conjunction with expansion of the tubing, the seal is deployed to form an annular isolator. An inflatable element carried on the tubing may be inflated with a fluid carried in the tubing and forced into the inflatable element during expansion of the tubing. Reactive chemicals may be carried in the tubing and injected into the annulus to react with each other and ambient fluids to increase in volume and harden into an annular seal. An elastomeric sleeve, ring or band carried on the tubing may be expanded into contact with a borehole wall and may have its radial dimension increased in conjunction with tubing expansion to form an annular isolator.

Abstract: The present disclosure addressed apparatus and methods for forming an annular isolator in a borehole after installation of production tubing. Annular seal means are carried in or on production tubing as it is run into a borehole. In conjunction with expansion of the tubing, the seal is deployed to form an annular isolator. An inflatable element carried on the tubing may be inflated with a fluid carried in the tubing and forced into the inflatable element during expansion of the tubing. Reactive chemicals may be carried in the tubing and injected into the annulus to react with each other and ambient fluids to increase in volume and harden into an annular seal. An elastomeric sleeve, ring or band carried on the tubing may be expanded into contact with a borehole wall and may have its radial dimension increased in conjunction with tubing expansion to form an annular isolator.

Abstract: Methods are described for removing a material from a substrate by dissolving an etchant into a solvent to form a solution; and exposing the substrate to the solution so that the etchant in the solution removes material from the substrate; wherein during the exposure the solution is maintained in a supercritical or near-supercritical phase. The described methods can include additional steps, such as exposing a precursor of the material to a reagent to form the material, and depositing a second material onto the substrate after removing the material from the substrate.

Abstract: This invention relates to subterranean treatment operations. More particularly, this invention provides methods that may be useful in providing void-free barriers between a subterranean formation and a portion of a well bore. A nonlimiting example of a method is a method of degrading a filter cake in a subterranean formation. Another nonlimiting example of a method is a method of producing hydrocarbons from a subterranean formation.

Abstract: A wafer, and a tungsten filament radiation heating source comprising at least one lamp arranged in a ring substantially surrounding the wafer edge. The radiation heating source irradiates the semiconductor wafer with radiation directed at the edge of the wafer, so that the radiation is adapted to penetrate the wafer edge and travel between the upper and lower surfaces into a central portion of the wafer sufficient to heat the wafer. The radiation-heating source may also have a reflector for reflecting radiation into the wafer edge, and at least one radiation and/or convection heating source mounted above or below the stage for directly heating one or both of the wafer upper and lower surfaces simultaneously with the radiation heating source surrounding the wafer.

Abstract: The present invention provides methods and compositions for treating a subterranean formation penetrated by a well. The method comprising the steps of: (a) forming a treatment fluid, and (b) introducing the treatment fluid into the well and into contact with the formation.

Abstract: The present disclosure addressed apparatus and methods for forming an annular isolator in a borehole after installation of production tubing. Annular seal means are carried in or on production tubing as it is run into a borehole. In conjunction with expansion of the tubing, the seal is deployed to form an annular isolator. An inflatable element carried on the tubing may be inflated with a fluid carried in the tubing and forced into the inflatable element during expansion of the tubing. Reactive chemicals may be carried in the tubing and injected into the annulus to react with each other and ambient fluids to increase in volume and harden into an annular seal. An elastomeric sleeve, ring or band carried on the tubing may be expanded into contact with a borehole wall and may have its radial dimension increased in conjunction with tubing expansion to form an annular isolator.