Patents by Inventor Ronald D. Voisin
Ronald D. Voisin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7270533Abstract: The present invention is directed toward a system for introducing a flow of a fluid between a mold, disposed on a template, and a substrate, the system including, a fluid supply system; and a chuck body having a baffle and first and second apertures, the first and second apertures disposed between the baffle and the template, with the first and second apertures in fluid communication with the fluid supply system to produce a turbulent flow of the fluid between the mold and said substrate.Type: GrantFiled: July 23, 2004Date of Patent: September 18, 2007Assignees: University of Texas System, Board of Regents, Molecular Imprints, Inc.Inventors: Ian M. McMackin, Nicholas A. Stacey, Daniel A. Babbs, Duane J. Voth, Mathew P. C. Watts, Van N. Truskett, Frank Y. Xu, Ronald D. Voisin, Pankaj B. Lad
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Patent number: 7224443Abstract: The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate. The chucking system includes a chuck body having first and second opposed sides. A side surface extends therebetween. The first side includes first and second spaced-apart recesses defining first and second spaced-apart support regions. The first support region cinctures the second support region and the first and second recesses. The second support region cinctures the second recess, with a portion of the body in superimposition with the second recess being transparent to radiation having a predetermined wavelength. The second side and the side surface define exterior surfaces. The body includes throughways placing the first and second recesses in fluid communication with one of the exterior surfaces.Type: GrantFiled: March 27, 2006Date of Patent: May 29, 2007Assignee: Molecular Imprints, Inc.Inventors: Byung-Jin Choi, Ronald D. Voisin, Sidlgata V. Sreenivasan, Michael P. C. Watts, Daniel A. Babbs, Mario J. Meissl, Hillman L. Bailey, Norman E. Schumaker
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Patent number: 7179079Abstract: The present invention includes a conforming template for patterning liquids disposed on substrates. The template includes a body having opposed first and second surfaces. The first surface includes a plurality of recessed regions with a patterning region being disposed between adjacent recessed regions. Specifically, the recessed regions define flexure regions about which each patterning region may move independent of the remaining patterning regions of the template. In one embodiment the template is mounted to a fluid chamber having an inlet and a throughway. The template is connected to the throughway and the inlet is connected to a fluid source to facilitate deformation of the template to conform to a profile of a surface adjacent thereto.Type: GrantFiled: July 7, 2003Date of Patent: February 20, 2007Assignee: Molecular Imprints, Inc.Inventors: Sidlgata V Sreenivasan, Byung J. Choi, Ronald D. Voisin
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Patent number: 7140861Abstract: A compliant UV imprint lithography template, which may also act as a thermal implant template, and methods for manufacturing it. The template essentially comprises a relief image and an elastomer adapted to adjust the relief image. In an embodiment, the relief image is arranged in a compliant imprinting layer where the elastomer is arranged between the imprinting layer and a rigid transparent substrate. In an embodiment, the template is compliant to a wafer surface. In an embodiment, layering an elastomer and an imprinting layer on a substrate and patterning a relief image into the imprinting layer, form the template.Type: GrantFiled: April 27, 2004Date of Patent: November 28, 2006Assignee: Molecular Imprints, Inc.Inventors: Michael P. C. Watts, Ronald D. Voisin, Sidlgata V. Sreenivasan
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Patent number: 7132225Abstract: A method for forming imprint lithography templates is described herein. The method includes forming a masking layer and a conductive layer on a substrate surface. The use of a conductive layer allows patterning of the masking layer using electron beam pattern generators. The substrate is etched using the patterned masking layer to produce a template.Type: GrantFiled: November 13, 2002Date of Patent: November 7, 2006Assignee: Molecular Imprints, Inc.Inventor: Ronald D. Voisin
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Patent number: 7090716Abstract: The present invention is directed toward a method for reducing pattern distortions in imprinting layers by reducing gas pockets present in a layer of viscous liquid deposited on a substrate. To that end, the method includes varying a transport of the gases disposed proximate to the viscous liquid. Specifically, the atmosphere proximate to the substrate wherein a pattern is to be recorded is saturated with gases that are either highly soluble, highly diffusive, or both with respect to the viscous liquid being deposited. Additionally, or in lieu of saturating the atmosphere, the pressure of the atmosphere may be reduced.Type: GrantFiled: October 2, 2003Date of Patent: August 15, 2006Assignees: Molecular Imprints, Inc., Board of Regents, The University of Texas SystemInventors: Ian M. McMackin, Nicholas A. Stacey, Daniel A. Babbs, Duane J. Voth, Michael P. C. Watts, Van N. Truskett, Frank Y. Xu, Ronald D. Voisin, Pankaj B. Lad
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Patent number: 7077992Abstract: The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.Type: GrantFiled: July 11, 2002Date of Patent: July 18, 2006Assignee: Molecular Imprints, Inc.Inventors: Sidlgata V. Sreenivasan, Byung J. Choi, Norman E. Schumaker, Ronald D. Voisin, Michael P. C. Watts, Mario J. Meissl
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Patent number: 7070405Abstract: Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid. Multiple optical imaging devices are used to align the template with the substrate.Type: GrantFiled: August 1, 2002Date of Patent: July 4, 2006Assignee: Molecular Imprints, Inc.Inventors: Sidlgata V Sreenivasan, Michael P. C. Watts, Byung Jin Choi, Ronald D. Voisin, Norman E. Schumaker
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Patent number: 7037639Abstract: A method for forming imprint lithography templates is described herein. The method includes forming a masking layer and a conductive layer on a substrate surface. The use of a conductive layer allows patterning of the masking layer using electron beam pattern generators. The substrate is etched using the patterned masking layer to produce a template.Type: GrantFiled: May 1, 2002Date of Patent: May 2, 2006Assignee: Molecular Imprints, Inc.Inventor: Ronald D. Voisin
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Patent number: 7019819Abstract: The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate. The chucking system includes a chuck body having first and second opposed sides. A side surface extends therebetween. The first side includes first and second spaced-apart recesses defining first and second spaced-apart support regions. The first support region cinctures the second support region and the first and second recesses. The second support region cinctures the second recess, with a portion of the body in superimposition with the second recess being transparent to radiation having a predetermined wavelength. The second side and the side surface define exterior surfaces. The body includes throughways placing the first and second recesses in fluid communication with one of the exterior surfaces.Type: GrantFiled: November 13, 2002Date of Patent: March 28, 2006Assignee: Molecular Imprints, Inc.Inventors: Byung J. Choi, Ronald D. Voisin, Sidlgata V. Sreenivasan, Michael P. C. Watts, Daniel Babbs, Mario J. Meissl, Hillman Bailey, Norman E. Schumaker
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Patent number: 6982783Abstract: The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate.Type: GrantFiled: June 9, 2004Date of Patent: January 3, 2006Assignee: Molecular Imprints, Inc.Inventors: Byung J. Choi, Ronald D. Voisin, Sidlgata V. Sreenivasan, Michael P. C. Watts, Daniel Babbs, Mario J. Meissl, Hillman Bailey, Norman E. Schumaker
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Patent number: 6980282Abstract: The present invention is directed to a method for modulating shapes of a substrate, having first and second opposed surfaces. This is achieved by creating a pressure differential between differing regions of the first opposed surface to attenuate structural distortions in the second opposed surface that results from external forces bearing on the substrate.Type: GrantFiled: December 11, 2002Date of Patent: December 27, 2005Assignee: Molecular Imprints, Inc.Inventors: Byung J. Choi, Ronald D. Voisin, Sidlgata V. Sreenivasan, Michael P. C. Watts, C. Grant Willson, Norman E. Schumaker, Mario J. Meissl
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Patent number: 6916584Abstract: Described are methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. Alignment of the template with the substrate is performed prior to curing the liquid. Alignment of the template with the substrate includes rotational alignment of the template with respect to the substrate.Type: GrantFiled: August 1, 2002Date of Patent: July 12, 2005Assignee: Molecular Imprints, Inc.Inventors: Sidlgata V Sreenivasan, Michael P. C. Watts, Byung J. Choi, Ronald D. Voisin
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Patent number: 6900881Abstract: Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid.Type: GrantFiled: July 11, 2002Date of Patent: May 31, 2005Assignee: Molecular Imprints, Inc.Inventors: Sidlgata V. Sreenivasan, Michael P. C. Watts, Byung Jin Choi, Mario J. Meissl, Norman E. Schumaker, Ronald D. Voisin
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Publication number: 20040223131Abstract: The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate.Type: ApplicationFiled: June 9, 2004Publication date: November 11, 2004Applicant: MOLECULAR IMPRINTS, INC.Inventors: Byung J. Choi, Ronald D. Voisin, Sidlgata V. Sreenivasan, Michael P.C. Watts, Daniel Babbs, Mario J. Meissl, Hillman Bailey, Norman E. Schumaker
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Publication number: 20040124566Abstract: Described are methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.Type: ApplicationFiled: July 11, 2002Publication date: July 1, 2004Inventors: Sidlgata V. Sreenivasan, Byung J. Choi, Norman E. Shumaker, Ronald D. Voisin, Michael P.C. Watts
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Publication number: 20040112861Abstract: The present invention is directed to a method for modulating shapes of a substrate, having first and second opposed surfaces. This is achieved by creating a pressure differential between differing regions of the first opposed surface to attenuate structural distortions in the second opposed surface that results from external forces bearing on the substrate.Type: ApplicationFiled: December 11, 2002Publication date: June 17, 2004Applicant: MOLECULAR IMPRINTS, INC.Inventors: Byung J. Choi, Ronald D. Voisin, Sidlgata V. Sreenivasan, Michael P.C. Watts, C. Grant Willson, Norman E. Schumaker
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Publication number: 20040090611Abstract: The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate. The chucking system includes a chuck body having first and second opposed sides. A side surface extends therebetween. The first side includes first and second spaced-apart recesses defining first and second spaced-apart support regions. The first support region cinctures the second support region and the first and second recesses. The second support region cinctures the second recess, with a portion of the body in superimposition with the second recess being transparent to radiation having a predetermined wavelength. The second side and the side surface define exterior surfaces. The body includes throughways placing the first and second recesses in fluid communication with one of the exterior surfaces.Type: ApplicationFiled: November 13, 2002Publication date: May 13, 2004Applicant: MOLECULAR IMPRINTS, INC.Inventors: Byung J. Choi, Ronald D. Voisin, Sidlgata V. Sreenivasan, Michael P.C. Watts, Daniel Babbs, Mario J. Meissl, Hillman Bailey, Norman E. Schumaker
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Publication number: 20040022888Abstract: Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid. Multiple optical imaging devices are used to align the template with the substrate.Type: ApplicationFiled: August 1, 2002Publication date: February 5, 2004Inventors: Sidlgata V. Sreenivasan, Michael P.C. Watts, Byung Jin Choi, Ronald D. Voisin, Norman E. Schumaker
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Publication number: 20040021254Abstract: Described are methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. Alignment of the template with the substrate is performed prior to curing the liquid. Alignment of the template with the substrate includes rotational alignment of the template with respect to the substrate.Type: ApplicationFiled: August 1, 2002Publication date: February 5, 2004Inventors: Sidlgata V. Sreenivasan, Michael P.C. Watts, Byung J. Choi, Ronald D. Voisin