Patents by Inventor Ronald L. DiCarlo
Ronald L. DiCarlo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11680318Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a liquid precursor compound. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream after emanating from the delivery device and the second stream are combined to form a third stream, such that the dew point of the vapor of the liquid precursor compound in the third stream is lower than the temperature of the plumbing that transports the vapor to a CVD reactor or a plurality of CVD reactors. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.Type: GrantFiled: May 31, 2022Date of Patent: June 20, 2023Assignee: Edwards Semiconductor Solutions LLCInventors: Egbert Woelk, Ronald L. Dicarlo, Jr.
-
Publication number: 20220290299Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a liquid precursor compound. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream after emanating from the delivery device and the second stream are combined to form a third stream, such that the dew point of the vapor of the liquid precursor compound in the third stream is lower than the temperature of the plumbing that transports the vapor to a CVD reactor or a plurality of CVD reactors. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.Type: ApplicationFiled: May 31, 2022Publication date: September 15, 2022Applicant: Ceres Technologies, Inc.Inventors: Egbert WOELK, Ronald L. DICARLO, Jr.
-
Patent number: 11345997Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a liquid precursor compound. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream after emanating from the delivery device and the second stream are combined to form a third stream, such that the dew point of the vapor of the liquid precursor compound in the third stream is lower than the temperature of the plumbing that transports the vapor to a CVD reactor or a plurality of CVD reactors. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.Type: GrantFiled: June 8, 2020Date of Patent: May 31, 2022Assignee: Ceres Technologies, Inc.Inventors: Egbert Woelk, Ronald L. DiCarlo, Jr.
-
Publication number: 20200299837Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a liquid precursor compound. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream after emanating from the delivery device and the second stream are combined to form a third stream, such that the dew point of the vapor of the liquid precursor compound in the third stream is lower than the temperature of the plumbing that transports the vapor to a CVD reactor or a plurality of CVD reactors. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.Type: ApplicationFiled: June 8, 2020Publication date: September 24, 2020Applicant: Ceres Technologies, Inc.Inventors: Egbert WOELK, Ronald L. DICARLO, JR.
-
Patent number: 10676821Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a liquid precursor compound. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream after emanating from the delivery device and the second stream are combined to form a third stream, such that the dew point of the vapor of the liquid precursor compound in the third stream is lower than the temperature of the plumbing that transports the vapor to a CVD reactor or a plurality of CVD reactors. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.Type: GrantFiled: July 31, 2018Date of Patent: June 9, 2020Assignee: Ceres Technologies, Inc.Inventors: Egbert Woelk, Ronald L. Dicarlo, Jr.
-
Publication number: 20190032207Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a liquid precursor compound. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream after emanating from the delivery device and the second stream are combined to form a third stream, such that the dew point of the vapor of the liquid precursor compound in the third stream is lower than the temperature of the plumbing that transports the vapor to a CVD reactor or a plurality of CVD reactors. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.Type: ApplicationFiled: July 31, 2018Publication date: January 31, 2019Applicant: Ceres Technologies, Inc.Inventors: Egbert WOELK, Ronald L. DICARLO, JR.
-
Publication number: 20180334744Abstract: Disclosed is a method of providing a constant concentration of a metal-containing precursor compound in the vapor phase in a carrier gas. Such method is particularly useful in supplying a constant concentration of a gaseous metal-containing compound to a plurality of vapor deposition reactors.Type: ApplicationFiled: July 30, 2018Publication date: November 22, 2018Applicant: Ceres Technologies, Inc.Inventors: Egbert WOELK, Ronald L. DICARLO
-
Patent number: 10066296Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a liquid precursor compound. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream after emanating from the delivery device and the second stream are combined to form a third stream, such that the dew point of the vapor of the liquid precursor compound in the third stream is lower than the temperature of the plumbing that transports the vapor to a CVD reactor or a plurality of CVD reactors. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.Type: GrantFiled: January 8, 2016Date of Patent: September 4, 2018Assignee: Ceres Technologies, Inc.Inventors: Egbert Woelk, Ronald L. DiCarlo, Jr.
-
Patent number: 10060030Abstract: Disclosed is a method of providing a constant concentration of a metal-containing precursor compound in the vapor phase in a carrier gas. Such method is particularly useful in supplying a constant concentration of a gaseous metal-containing compound to a plurality of vapor deposition reactors.Type: GrantFiled: May 20, 2016Date of Patent: August 28, 2018Assignee: Ceres Technologies, Inc.Inventors: Egbert Woelk, Ronald L. DiCarlo
-
Patent number: 9957612Abstract: Disclosed herein is a delivery device comprising a chamber; a gas inlet; a gas outlet; and a dip tube contained within the chamber and having an upper portion and a lower portion, the upper portion of the dip tube being in fluid communication with the gas inlet and being operative to permit the entry of a carrier gas; the lower portion of the dip tube extending into the chamber, the lower portion of the dip tube terminating in an outlet end; and a sleeve; where the sleeve has a first end and a second end; the first end being in an interference fit with the lower portion of the dip tube; and where the sleeve vibrates upon being subjected to a disturbance.Type: GrantFiled: December 11, 2014Date of Patent: May 1, 2018Assignee: CERES TECHNOLOGIES, INC.Inventors: Egbert Woelk, Ronald L. DiCarlo, Deodatta Vinayak Shenai-Khatkhate
-
Publication number: 20160265113Abstract: Disclosed is a method of providing a constant concentration of a metal-containing precursor compound in the vapor phase in a carrier gas. Such method is particularly useful in supplying a constant concentration of a gaseous metal-containing compound to a plurality of vapor deposition reactors.Type: ApplicationFiled: May 20, 2016Publication date: September 15, 2016Inventors: Egbert WOELK, Ronald L. DiCARLO
-
Patent number: 9416452Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a solid precursor compound. The first stream of carrier gas is at a temperature greater than or equal to 20° C. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream and the second stream are combined to form a third stream, such that the dewpoint of the vapor of the solid precursor compound in the third stream is lower than the ambient temperature. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.Type: GrantFiled: February 27, 2015Date of Patent: August 16, 2016Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLCInventors: Egbert Woelk, Ronald L. DiCarlo
-
Publication number: 20160122870Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a liquid precursor compound. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream after emanating from the delivery device and the second stream are combined to form a third stream, such that the dew point of the vapor of the liquid precursor compound in the third stream is lower than the temperature of the plumbing that transports the vapor to a CVD reactor or a plurality of CVD reactors. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.Type: ApplicationFiled: January 8, 2016Publication date: May 5, 2016Inventors: Egbert Woelk, Ronald L. DiCarlo
-
Patent number: 9243325Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a liquid precursor compound. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream after emanating from the delivery device and the second stream are combined to form a third stream, such that the dew point of the vapor of the liquid precursor compound in the third stream is lower than the temperature of the plumbing that transports the vapor to a CVD reactor or a plurality of CVD reactors. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.Type: GrantFiled: July 18, 2012Date of Patent: January 26, 2016Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLCInventors: Egbert Woelk, Ronald L. DiCarlo, Jr.
-
Publication number: 20150203962Abstract: Disclosed herein is a delivery device comprising a chamber; a gas inlet; a gas outlet; and a dip tube contained within the chamber and having an upper portion and a lower portion, the upper portion of the dip tube being in fluid communication with the gas inlet and being operative to permit the entry of a carrier gas; the lower portion of the dip tube extending into the chamber, the lower portion of the dip tube terminating in an outlet end; and a sleeve; where the sleeve has a first end and a second end; the first end being in an interference fit with the lower portion of the dip tube; and where the sleeve vibrates upon being subjected to a disturbance.Type: ApplicationFiled: December 11, 2014Publication date: July 23, 2015Inventors: Egbert Woelk, Ronald L. DiCarlo, Deodatta Vinayak Shenai-Khatkhate
-
Publication number: 20150167172Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a solid precursor compound. The first stream of carrier gas is at a temperature greater than or equal to 20° C. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream and the second stream are combined to form a third stream, such that the dewpoint of the vapor of the solid precursor compound in the third stream is lower than the ambient temperature. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.Type: ApplicationFiled: February 27, 2015Publication date: June 18, 2015Inventors: Egbert Woelk, Ronald L. DiCarlo
-
Patent number: 8997775Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a solid precursor compound. The first stream of carrier gas is at a temperature greater than or equal to 20° C. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream and the second stream are combined to form a third stream, such that the dewpoint of the vapor of the solid precursor compound in the third stream is lower than the ambient temperature. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.Type: GrantFiled: May 24, 2011Date of Patent: April 7, 2015Assignee: Rohm and Haas Electronic Materials LLCInventors: Egbert Woelk, Ronald L. DiCarlo, Jr.
-
Publication number: 20140283917Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a solid precursor compound. The first stream of carrier gas is at a temperature greater than or equal to 20° C. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream and the second stream are combined to form a third stream, such that the dewpoint of the vapor of the solid precursor compound in the third stream is lower than the ambient temperature. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.Type: ApplicationFiled: June 9, 2014Publication date: September 25, 2014Inventors: Egbert Woelk, Ronald L. DiCarlo, JR.
-
Patent number: 8776821Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a solid precursor compound. The first stream of carrier gas is at a temperature greater than or equal to 20° C. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream and the second stream are combined to form a third stream, such that the dewpoint of the vapor of the solid precursor compound in the third stream is lower than the ambient temperature. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.Type: GrantFiled: May 24, 2011Date of Patent: July 15, 2014Assignee: Rohm and Haas Electronic Materials LLCInventors: Egbert Woelk, Ronald L. DiCarlo, Jr.
-
Patent number: 8758515Abstract: A delivery device comprises an inlet port and an outlet port. The delivery device comprises an inlet chamber and an outlet chamber, with the outlet chamber being opposedly disposed to the inlet chamber and in fluid communication with the inlet chamber via a conical section. The outlet chamber comprises a labyrinth that is operative to prevent solid particles of a solid precursor compound contained in the delivery device from leaving the delivery device while at the same time permitting vapors of the solid precursor compound to leave the delivery device via the outlet port.Type: GrantFiled: August 9, 2010Date of Patent: June 24, 2014Assignee: Rohm and Haas Electronic Materials LLCInventors: Egbert Woelk, Ronald L. DiCarlo