Patents by Inventor Ronald van der Wilk
Ronald van der Wilk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11908656Abstract: A stage apparatus for a particle-beam apparatus is disclosed. A particle beam apparatus may comprise a conductive object and an object table, the object table being configured to support an object. The object table comprises a table body and a conductive coating, the conductive coating being provided on at least a portion of a surface of the table body. The conductive object is disposed proximate to the conductive coating and the table body is provided with a feature proximate to an edge portion of the conductive coating. Said feature is arranged so as to reduce an electric field strength in the vicinity of the edge portion of the conductive coating when a voltage is applied to both the conductive object and the conductive coating.Type: GrantFiled: October 8, 2021Date of Patent: February 20, 2024Assignee: ASML Netherlands B.V.Inventors: Han Willem Hendrik Severt, Jan-Gerard Cornelis Van Der Toorn, Ronald Van Der Wilk, Allard Eelco Kooiker
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Publication number: 20230008915Abstract: A clamp assembly is disclose, the clamp assembly comprising a clamp (50) configurable to clamp a support member (110) to a lower base surface (49) of the clamp by electrostatic adhesion, and an arrangement configurable to direct a gas to the lower base surface (49) of the clamp. The arrangement is configurable to humidify the gas by exposing the gas to a liquid. Also disclosed is a method of discharging a lower base surface of a clamp, The method comprises the steps of humidifying a gas by exposing the gas to a liquid, and directing the humidified gas to a lower base surface of the clamp.Type: ApplicationFiled: November 2, 2020Publication date: January 12, 2023Inventors: Ronald Van Der Wilk, Tiannan Guan
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Patent number: 11443912Abstract: A feedthrough for providing an electrical connection is provided. The feedthrough comprises a conductor and a quartz or a glass structure configured to surround at least a portion of the conductor and provide isolation to the conductor. The conductor and the quartz or glass structure may be coaxially arranged. The feedthrough can provide an electrical connection between an inside and outside of a vacuum chamber that contains a sample.Type: GrantFiled: January 4, 2021Date of Patent: September 13, 2022Assignee: ASML Netherlands B.V.Inventor: Ronald Van Der Wilk
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Publication number: 20220277926Abstract: Systems and methods for wafer grounding and wafer grounding location adjustment are disclosed. A first method may include receiving a first value of an electric characteristic associated with the wafer being grounded by an electric signal; determining a first control parameter using at least the first value; and controlling a characteristic of the electric signal using the first control parameter and the first value. A second method for adjusting a grounding location for a wafer may include terminating an electric connection between the wafer and at least one grounding pin in contact the wafer; adjusting a relative position between the wafer and the grounding pin; and restoring the electric connection between the grounding pin and the wafer. A third method may include causing a grounding pin to penetrate through a coating on the wafer by impact; and establishing an electrical connection between the grounding pin and the wafer.Type: ApplicationFiled: August 25, 2020Publication date: September 1, 2022Applicant: ASML Netherlands B.V.Inventors: Yixiang WANG, Shibing LIU, Shanhui CAO, Kangsheng QIU, Juying DOU, Ying LUO, Yinglong LI, Qiang LI, Ronald VAN DER WILK, Jan-Gerard Cornelis VAN DER TOORN
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Publication number: 20220028648Abstract: A stage apparatus for a particle-beam apparatus is disclosed. A particle beam apparatus may comprise a conductive object and an object table, the object table being configured to support an object. The object table comprises a table body and a conductive coating, the conductive coating being provided on at least a portion of a surface of the table body. The conductive object is disposed proximate to the conductive coating and the table body is provided with a feature proximate to an edge portion of the conductive coating. Said feature is arranged so as to reduce an electric field strength in the vicinity of the edge portion of the conductive coating when a voltage is applied to both the conductive object and the conductive coating.Type: ApplicationFiled: October 8, 2021Publication date: January 27, 2022Applicant: ASML Netherlands B.V.Inventors: Han Willem Hendrik SEVERT, Jan-Gerard Cornelis VAN DER TOORN, Ronald VAN DER WILK, Allard Eelco KOOIKER
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Publication number: 20210175041Abstract: A feedthrough for providing an electrical connection is provided. The feedthrough comprises a conductor and a quartz or a glass structure configured to surround at least a portion of the conductor and provide isolation to the conductor. The conductor and the quartz or glass structure may be coaxially arranged. The feedthrough can provide an electrical connection between an inside and outside of a vacuum chamber that contains a sample.Type: ApplicationFiled: January 4, 2021Publication date: June 10, 2021Inventor: Ronald VAN DER WILK
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Patent number: 10908518Abstract: A lithographic apparatus is provided. The lithographic apparatus includes a reticle and an electrostatic clamp configured to releasably hold the reticle. The electrostatic clamp includes a first substrate having opposing first and second surfaces, a plurality of burls located on the first surface and configured to contact the reticle, a second substrate having opposing first and second surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.Type: GrantFiled: May 18, 2018Date of Patent: February 2, 2021Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Santiago E. Delpuerto, Antonius Franciscus Johannes De Groot, Kenneth C. Henderson, Raymond Wilhelmus Louis Lafarre, Matthew Lipson, Louis John Markoya, Tammo Uitterdijk, Ronald Van Der Wilk, Johannes Petrus Martinus Bernardus Vermeulen
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Patent number: 10886093Abstract: A feedthrough for providing an electrical connection is provided. The feedthrough comprises a conductor and a quartz or a glass structure configured to surround at least a portion of the conductor and provide isolation to the conductor. The conductor and the quartz or glass structure may be coaxially arranged. The feedthrough can provide an electrical connection between an inside and outside of a vacuum chamber that contains a sample.Type: GrantFiled: December 4, 2019Date of Patent: January 5, 2021Assignee: ASML Netherlands B.V.Inventor: Ronald Van Der Wilk
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Publication number: 20200185183Abstract: A feedthrough for providing an electrical connection is provided. The feedthrough comprises a conductor and a quartz or a glass structure configured to surround at least a portion of the conductor and provide isolation to the conductor. The conductor and the quartz or glass structure may be coaxially arranged. The feedthrough can provide an electrical connection between an inside and outside of a vacuum chamber that contains a sample.Type: ApplicationFiled: December 4, 2019Publication date: June 11, 2020Inventor: Ronald VAN DER WILK
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Patent number: 10613445Abstract: A diagnostic apparatus monitors a lithographic manufacturing system. First measurement data representing local deviations of some characteristic across a substrate is obtained using sensors within a lithographic apparatus, and/or a separate metrology tool. Other inspection tools perform substrate backside inspection to produce second measurement data. A high-resolution backside defect image is processed into a form in which it can be compared with lower resolution information from the first measurement data. Cross-correlation is performed to identify which of the observed defects are correlated spatially with the deviations represented in the first measurement data. A correlation map is used to identify potentially relevant clusters of defects in the more detailed original defect map. The responsible apparatus can be identified by pattern recognition as part of an automated root cause analysis. Alternatively, reticle inspection data may be used as second measurement data.Type: GrantFiled: March 25, 2019Date of Patent: April 7, 2020Assignee: ASML Netherlands B.V.Inventors: Marc Hauptmann, Dylan John David Davies, Paul Janssen, Naoko Tsugama, Richard Joseph Bruls, Kornelis Tijmen Hoekerd, Edwin Johannes Maria Janssen, Petrus Johannes Van Den Oever, Ronald Van Der Wilk, Antonius Hubertus Van Schijndel, Jorge Alberto Vieyra Salas
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Publication number: 20190219929Abstract: A diagnostic apparatus monitors a lithographic manufacturing system. First measurement data representing local deviations of some characteristic across a substrate is obtained using sensors within a lithographic apparatus, and/or a separate metrology tool. Other inspection tools perform substrate backside inspection to produce second measurement data. A high- resolution backside defect image is processed into a form in which it can be compared with lower resolution information from the first measurement data. Cross-correlation is performed to identify which of the observed defects are correlated spatially with the deviations represented in the first measurement data. A correlation map is used to identify potentially relevant clusters of defects in the more detailed original defect map. The responsible apparatus can be identified by pattern recognition as part of an automated root cause analysis. Alternatively, reticle inspection data may be used as second measurement data.Type: ApplicationFiled: March 25, 2019Publication date: July 18, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Marc Hauptmann, Dylan John David Davies, Paul Janssen, Naoko Tsugama, Richard Joseph Bruls, Kornelis Tijmen Hoekerd, Edwin Johannes Maria Janssen, Petrus Johannes Van Den Oever, Ronald Van Der Wilk, Antonius Hubertus Van Schijndel, Jorge Alberto Vieyra Salas
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Patent number: 10241418Abstract: A diagnostic apparatus monitors a lithographic manufacturing system. First measurement data representing local deviations of some characteristic across a substrate is obtained using sensors within a lithographic apparatus, and/or a separate metrology tool. Other inspection tools perform substrate backside inspection to produce second measurement data. A high-resolution backside defect image is processed into a form in which it can be compared with lower resolution information from the first measurement data. Cross-correlation is performed to identify which of the observed defects are correlated spatially with the deviations represented in the first measurement data. A correlation map is used to identify potentially relevant clusters of defects in the more detailed original defect map. The responsible apparatus can be identified by pattern recognition as part of an automated root cause analysis. Alternatively, reticle inspection data may be used as second measurement data.Type: GrantFiled: September 21, 2015Date of Patent: March 26, 2019Assignee: ASML Netherlands B.V.Inventors: Marc Hauptmann, Dylan John David Davies, Paul Janssen, Naoko Tsugama, Richard Joseph Bruls, Kornelis Tijmen Hoekerd, Edwin Johannes Maria Janssen, Petrus Johannes Van Den Oever, Ronald Van Der Wilk, Antonius Hubertus Van Schijndel, Jorge Alberto Vieyra Salas
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Patent number: 10133196Abstract: An apparatus for cleaning an object, the apparatus including: an object support for supporting the object; a low pressure chamber for exposing a first surface of the object to a low pressure when the object is arranged on the object support, an electrode arranged adjacent to and separated from the first surface of the object when the object is arranged on the object support, the electrode being in electrical communication with a surface of the object support which is adjacent the first surface of the object; and a power supply arranged to apply a voltage between the electrode and the object; thereby generating a discharge between the object and the electrode.Type: GrantFiled: March 2, 2015Date of Patent: November 20, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Ronald Van Der Wilk, Ger-Wim Jan Goorhuis
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Publication number: 20180267414Abstract: A lithographic apparatus is provided. The lithographic apparatus includes a reticle and an electrostatic clamp configured to releasably hold the reticle. The electrostatic clamp includes a first substrate having opposing first and second surfaces, a plurality of burls located on the first surface and configured to contact the reticle, a second substrate having opposing first and second surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.Type: ApplicationFiled: May 18, 2018Publication date: September 20, 2018Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Santiago E. DELPUERTO, Antonius Franciscus Johannes De Groot, Kenneth C. HENDERSON, Raymond Wilhelmus Louis LAFARRE, Matthew Lipson, Louis John Markoya, Tammo Uitterdijk, Ronald Van Der Wilk, Johannes Petrus Martinus Bernardus Vermeulen
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Patent number: 10001713Abstract: A support such as a clamp (310) is configured to releasably hold a patterning device such as a reticle (300) to secure it and prevent heat-induced deformation of it. For example, an electrostatic clamp includes a first substrate (312) having opposing first (313) and second (315) surfaces, a plurality of burls (316) located on the first surface and configured to contact the reticle, a second substrate (314) having opposing first (317) and second (319) surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements (318) are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.Type: GrantFiled: February 5, 2014Date of Patent: June 19, 2018Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Santiago E. Del Puerto, Matthew Lipson, Kenneth C. Henderson, Raymond Wilhelmus Louis LaFarre, Louis John Markoya, Tammo Uitterdijk, Johannes Petrus Martinus Bernardus Vermeulen, Antonius Franciscus Johannes De Groot, Ronald Van Der Wilk
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Publication number: 20170363969Abstract: A diagnostic apparatus monitors a lithographic manufacturing system. First measurement data representing local deviations of some characteristic across a substrate is obtained using sensors within a lithographic apparatus, and/or a separate metrology tool. Other inspection tools perform substrate backside inspection to produce second measurement data. A high-resolution backside defect image is processed into a form in which it can be compared with lower resolution information from the first measurement data. Cross-correlation is performed to identify which of the observed defects are correlated spatially with the deviations represented in the first measurement data. A correlation map is used to identify potentially relevant clusters of defects in the more detailed original defect map. The responsible apparatus can be identified by pattern recognition as part of an automated root cause analysis. Alternatively, reticle inspection data may be used as second measurement data.Type: ApplicationFiled: September 21, 2015Publication date: December 21, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Marc HAUPTMANN, Dylan John David DAVIES, Paul JANSSEN, Naoko TSUGAMA, Richard Joseph BRULS, Kornelis Tijmen HOEKERD, Edwin Johannes Maria JANSSEN, Petrus Johannes VAN DEN OEVER, Ronald VAN DER WILK, Antonius Hubertus VAN SCHIJNDEL, Jorge Alberto VIEYRA SALAS
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Patent number: 9798251Abstract: A method of manufacturing an object holder for use in a lithographic apparatus, the object holder including one or more electrically functional components, the method including: using a composite structure including a carrier sheet different from a main body of the object holder and a layered structure including one or a plurality of layers and formed on the carrier sheet; connecting the composite structure to a surface of the main body such that the layered structure is between the carrier sheet and the surface of the main body; and removing the carrier sheet from the composite structure, leaving the layered structure connected to the main body.Type: GrantFiled: February 26, 2014Date of Patent: October 24, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Raymond Wilhelmus Louis LaFarre, Satish Achanta, Matteo Filippi, Yogesh Karade, Antonius Johannes Maria Nellissen, Ronald Van Der Wilk, Hendrikus Christoffel Maria Van Doremalen, Wilhelmus Jacobus Johannes Welters
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Publication number: 20170205717Abstract: An apparatus for cleaning an object, the apparatus including: an object support for supporting the object; a low pressure chamber for exposing a first surface of the object to a low pressure when the object is arranged on the object support, an electrode arranged adjacent to and separated from the first surface of the object when the object is arranged on the object support, the electrode being in electrical communication with a surface of the object support which is adjacent the first surface of the object; and a power supply arranged to apply a voltage between the electrode and the object; thereby generating a discharge between the object and the electrode.Type: ApplicationFiled: March 2, 2015Publication date: July 20, 2017Applicant: ASML Netherlands B.V.Inventors: Ronald VAN DER WILK, Ger-Wim Jan GOORHUIS
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Patent number: 9494875Abstract: A chuck, chuck control system, lithographic apparatus and method of using a chuck are disclosed.Type: GrantFiled: September 19, 2012Date of Patent: November 15, 2016Assignee: ASML Netherlands B.V.Inventors: Sebastiaan Maria Johannes Cornelissen, Noud Jan Gilissen, Anko Jozef Cornelus Sijben, Roger Wilhelmus Antonius Henricus Schmitz, Arnoud Willem Notenboom, Ronald Van Der Wilk, Manon Elise Will
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Patent number: 9429857Abstract: An electrostatic clamp (21) configured to hold an object, the electrostatic clamp comprising an electrode (24), a resistive portion (23) formed from a resistive material located on the electrode, and a dielectric portion (22) formed from a dielectric material located on the resistive portion.Type: GrantFiled: March 19, 2013Date of Patent: August 30, 2016Assignee: ASML Netherlands B.V.Inventors: Ronald Van Der Wilk, Roger Wilhelmus Antonius Henricus Schmitz, Arnoud Willem Notenboom, Manon Elise Will