Patents by Inventor Ronald Vern Schauer

Ronald Vern Schauer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10564609
    Abstract: Embodiments disclosed herein include a controller for a treatment system for lessening the hazard of effluents produced in a processing system.
    Type: Grant
    Filed: August 19, 2015
    Date of Patent: February 18, 2020
    Assignee: Applied Materials, Inc.
    Inventor: Ronald Vern Schauer
  • Patent number: 10452111
    Abstract: Embodiments of the invention are directed toward systems and methods that execute legacy semiconductor applications using a non-legacy controller. In some embodiments a hardware abstraction layer and/or an emulator can be used to provide communication between a non-legacy operating system and legacy components including legacy applications. In some embodiments various methods and/or devices can be used to emulate and/or translate communications between legacy and non-legacy components.
    Type: Grant
    Filed: July 24, 2018
    Date of Patent: October 22, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Ronald Vern Schauer, Mark Roger Covington, Suresh Kumaraswami, Amitabh Puri
  • Publication number: 20190096643
    Abstract: A process chamber includes a chamber body having a chamber lid assembly disposed thereon, one or more monitoring devices coupled to the chamber lid assembly, and one or more antennas disposed adjacent to the chamber lid assembly that are in communication with the one or more monitoring devices.
    Type: Application
    Filed: November 28, 2018
    Publication date: March 28, 2019
    Inventors: Simon Nicholas BINNS, Brian T. WEST, Ronald Vern SCHAUER, Roger M. JOHNSON, Michael S. COX
  • Publication number: 20190011967
    Abstract: Embodiments of the invention are directed toward systems and methods that execute legacy semiconductor applications using a non-legacy controller. In some embodiments a hardware abstraction layer and/or an emulator can be used to provide communication between a non-legacy operating system and legacy components including legacy applications. In some embodiments various methods and/or devices can be used to emulate and/or translate communications between legacy and non-legacy components.
    Type: Application
    Filed: July 24, 2018
    Publication date: January 10, 2019
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Ronald Vern Schauer, Mark Roger Covington, Suresh Kumaraswami, Amitabh Puri
  • Patent number: 10153143
    Abstract: A process chamber includes a chamber body having a chamber lid assembly disposed thereon, one or more monitoring devices coupled to the chamber lid assembly, and one or more antennas disposed adjacent to the chamber lid assembly that are in communication with the one or more monitoring devices.
    Type: Grant
    Filed: February 16, 2015
    Date of Patent: December 11, 2018
    Assignee: Applied Materials, Inc.
    Inventors: Simon Nicholas Binns, Brian T. West, Ronald Vern Schauer, Roger M. Johnson, Michael S. Cox
  • Publication number: 20180290260
    Abstract: A chemical mechanical polishing system includes a carrier head having a flexible membrane and a chamber to apply pressure to the flexible membrane, a pressure control unit, a pressure supply line connecting the pressure control unit to the chamber, and a sensor located along the pressure supply line to detect a contaminant in the pressure supply line.
    Type: Application
    Filed: May 31, 2018
    Publication date: October 11, 2018
    Inventor: Ronald Vern Schauer
  • Patent number: 10037064
    Abstract: Embodiments of the invention are directed toward systems and methods that execute legacy semiconductor applications using a non-legacy controller. In some embodiments a hardware abstraction layer and/or an emulator can be used to provide communication between a non-legacy operating system and legacy components including legacy applications. In some embodiments various methods and/or devices can be used to emulate and/or translate communications between legacy and non-legacy components.
    Type: Grant
    Filed: June 27, 2016
    Date of Patent: July 31, 2018
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Ronald Vern Schauer, Mark Roger Covington, Suresh Kumaraswami, Amitabh Puri
  • Patent number: 9987718
    Abstract: A chemical mechanical polishing system includes a carrier head having a flexible membrane and a chamber to apply pressure to the flexible membrane, a pressure control unit, a pressure supply line connecting the pressure control unit to the chamber, and a sensor located along the pressure supply line to detect a contaminant in the pressure supply line.
    Type: Grant
    Filed: October 26, 2015
    Date of Patent: June 5, 2018
    Assignee: Applied Materials, Inc.
    Inventor: Ronald Vern Schauer
  • Patent number: 9892947
    Abstract: A chamber monitoring system may include a parallel architecture in which a single sensor control system is coupled to a number of different processing chamber control board sensor lines. In an illustrative embodiment, a single rotation sensor such as a tachometer may reside in a central control unit remote from the processing chambers such that rotation data may be processed by a single system and thereafter routed according to a variety of different network communication protocols to the main system controller, a factory interface, or both. In this and other embodiments, pull-up networks in the central control unit and the chamber control boards are matched so as to reduce electrical signal anomalies such as crowbar effects. The central control unit may be programmed via a main system controller to operate according to user defined parameters, which in turn may enable the system to differentiate between certain operating states.
    Type: Grant
    Filed: January 12, 2016
    Date of Patent: February 13, 2018
    Assignee: Applied Materials, Inc.
    Inventors: Ronald Vern Schauer, Raphael Dascoli, Shivan Bhargava
  • Patent number: 9779917
    Abstract: Embodiments of the present invention generally provide plasma etch process chamber improvements. An improved gas injection nozzle is provided for use at a central location of the lid of the chamber. The gas injection nozzle may be used in an existing plasma etch chamber and is configured to provide a series of conic gas flows across the surface of a substrate positioned within the chamber. In one embodiment, an improved exhaust kit for use in the plasma etch chamber is provided. The exhaust kit includes apparatus that may be used in an existing plasma etch chamber and is configured to provide annular flow of exhaust gases from the processing region of the chamber.
    Type: Grant
    Filed: September 9, 2014
    Date of Patent: October 3, 2017
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Stanley Detmar, Brian T. West, Ronald Vern Schauer
  • Publication number: 20160306403
    Abstract: Embodiments of the invention are directed toward systems and methods that execute legacy semiconductor applications using a non-legacy controller. In some embodiments a hardware abstraction layer and/or an emulator can be used to provide communication between a non-legacy operating system and legacy components including legacy applications. In some embodiments various methods and/or devices can be used to emulate and/or translate communications between legacy and non-legacy components.
    Type: Application
    Filed: June 27, 2016
    Publication date: October 20, 2016
    Inventors: Ronald Vern Schauer, Mark Roger Covington, Suresh Kumaraswami, Amitabh Puri
  • Patent number: 9383739
    Abstract: Embodiments of the invention are directed toward systems and methods that execute legacy semiconductor applications using a non-legacy controller. In some embodiments a hardware abstraction layer and/or an emulator can be used to provide communication between a non-legacy operating system and legacy components including legacy applications. In some embodiments various methods and/or devices can be used to emulate and/or translate communications between legacy and non-legacy components.
    Type: Grant
    Filed: February 20, 2013
    Date of Patent: July 5, 2016
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Ronald Vern Schauer, Mark Roger Covington, Suresh Kumaraswami, Amitabh Puri
  • Publication number: 20160126121
    Abstract: A chamber monitoring system may include a parallel architecture in which a single sensor control system is coupled to a number of different processing chamber control board sensor lines. In an illustrative embodiment, a single rotation sensor such as a tachometer may reside in a central control unit remote from the processing chambers such that rotation data may be processed by a single system and thereafter routed according to a variety of different network communication protocols to the main system controller, a factory interface, or both. In this and other embodiments, pull-up networks in the central control unit and the chamber control boards are matched so as to reduce electrical signal anomalies such as crowbar effects. The central control unit may be programmed via a main system controller to operate according to user defined parameters, which in turn may enable the system to differentiate between certain operating states.
    Type: Application
    Filed: January 12, 2016
    Publication date: May 5, 2016
    Applicant: Applied Materials, Inc.
    Inventors: Ronald Vern Schauer, Raphael Dascoli, Shivan Bhargava
  • Publication number: 20160077508
    Abstract: Embodiments disclosed herein include a controller for a treatment system for lessening the hazard of effluents produced in a processing system.
    Type: Application
    Filed: August 19, 2015
    Publication date: March 17, 2016
    Applicant: Applied Materials, Inc.
    Inventor: Ronald Vern SCHAUER
  • Publication number: 20160039066
    Abstract: A chemical mechanical polishing system includes a carrier head having a flexible membrane and a chamber to apply pressure to the flexible membrane, a pressure control unit, a pressure supply line connecting the pressure control unit to the chamber, and a sensor located along the pressure supply line to detect a contaminant in the pressure supply line.
    Type: Application
    Filed: October 26, 2015
    Publication date: February 11, 2016
    Applicant: APPLIED MATERIALS, INC.
    Inventor: Ronald Vern Schauer
  • Patent number: 9243319
    Abstract: A chamber monitoring system may include a parallel architecture in which a single sensor control system is coupled to a number of different processing chamber control board sensor lines. In an illustrative embodiment, a single rotation sensor such as a tachometer may reside in a central control unit remote from the processing chambers such that rotation data may be processed by a single system and thereafter routed according to a variety of different network communication protocols to the main system controller, a factory interface, or both. In this and other embodiments, pull-up networks in the central control unit and the chamber control boards are matched so as to reduce electrical signal anomalies such as crowbar effects. The central control unit may be programmed via a main system controller to operate according to user defined parameters, which in turn may enable the system to differentiate between certain operating states.
    Type: Grant
    Filed: February 6, 2012
    Date of Patent: January 26, 2016
    Assignee: Applied Materials, Inc.
    Inventors: Ronald Vern Schauer, Raphael Dascoli, Shivan Bhargava
  • Patent number: 9168629
    Abstract: A chemical mechanical polishing system includes a carrier head having a flexible membrane and a chamber to apply pressure to the flexible membrane, a pressure control unit, a pressure supply line connecting the pressure control unit to the chamber, and a sensor located along the pressure supply line to detect a contaminant in the pressure supply line.
    Type: Grant
    Filed: March 7, 2013
    Date of Patent: October 27, 2015
    Assignee: Applied Materials, Inc.
    Inventor: Ronald Vern Schauer
  • Publication number: 20150262798
    Abstract: A process chamber includes a chamber body having a chamber lid assembly disposed thereon, one or more monitoring devices coupled to the chamber lid assembly, and one or more antennas disposed adjacent to the chamber lid assembly that are in communication with the one or more monitoring devices.
    Type: Application
    Filed: February 16, 2015
    Publication date: September 17, 2015
    Inventors: Simon Nicholas BINNS, Brian T. WEST, Ronald Vern SCHAUER, Roger M. JOHNSON, Michael S. COX
  • Patent number: 8994950
    Abstract: The present invention provides methods, apparatus, and systems of sensing a substrate in a chamber. The invention includes emitting radiation of at least two different wavelengths; directing the emitted radiation of a first wavelength through a view port of a chamber at an interior of the chamber; directing the emitted radiation of a second wavelength through the view port of the chamber at a location of a hole in a blade of a substrate carrier; detecting any of the emitted radiation reflected by the blade, the interior of the chamber, or a substrate on the blade; and determining if a substrate is present on the blade based on the reflected radiation detected. Numerous additional aspects are disclosed.
    Type: Grant
    Filed: January 2, 2014
    Date of Patent: March 31, 2015
    Assignee: Applied Materials, Inc.
    Inventor: Ronald Vern Schauer
  • Publication number: 20140374509
    Abstract: Embodiments of the present invention generally provide plasma etch process chamber improvements. An improved gas injection nozzle is provided for use at a central location of the lid of the chamber. The gas injection nozzle may be used in an existing plasma etch chamber and is configured to provide a series of conic gas flows across the surface of a substrate positioned within the chamber. In one embodiment, an improved exhaust kit for use in the plasma etch chamber is provided. The exhaust kit includes apparatus that may be used in an existing plasma etch chamber and is configured to provide annular flow of exhaust gases from the processing region of the chamber.
    Type: Application
    Filed: September 9, 2014
    Publication date: December 25, 2014
    Inventors: Stanley DETMAR, Brian T. WEST, Ronald Vern SCHAUER