Patents by Inventor Ronald Vern Schauer
Ronald Vern Schauer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9168629Abstract: A chemical mechanical polishing system includes a carrier head having a flexible membrane and a chamber to apply pressure to the flexible membrane, a pressure control unit, a pressure supply line connecting the pressure control unit to the chamber, and a sensor located along the pressure supply line to detect a contaminant in the pressure supply line.Type: GrantFiled: March 7, 2013Date of Patent: October 27, 2015Assignee: Applied Materials, Inc.Inventor: Ronald Vern Schauer
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Publication number: 20150262798Abstract: A process chamber includes a chamber body having a chamber lid assembly disposed thereon, one or more monitoring devices coupled to the chamber lid assembly, and one or more antennas disposed adjacent to the chamber lid assembly that are in communication with the one or more monitoring devices.Type: ApplicationFiled: February 16, 2015Publication date: September 17, 2015Inventors: Simon Nicholas BINNS, Brian T. WEST, Ronald Vern SCHAUER, Roger M. JOHNSON, Michael S. COX
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Patent number: 8994950Abstract: The present invention provides methods, apparatus, and systems of sensing a substrate in a chamber. The invention includes emitting radiation of at least two different wavelengths; directing the emitted radiation of a first wavelength through a view port of a chamber at an interior of the chamber; directing the emitted radiation of a second wavelength through the view port of the chamber at a location of a hole in a blade of a substrate carrier; detecting any of the emitted radiation reflected by the blade, the interior of the chamber, or a substrate on the blade; and determining if a substrate is present on the blade based on the reflected radiation detected. Numerous additional aspects are disclosed.Type: GrantFiled: January 2, 2014Date of Patent: March 31, 2015Assignee: Applied Materials, Inc.Inventor: Ronald Vern Schauer
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Publication number: 20140374509Abstract: Embodiments of the present invention generally provide plasma etch process chamber improvements. An improved gas injection nozzle is provided for use at a central location of the lid of the chamber. The gas injection nozzle may be used in an existing plasma etch chamber and is configured to provide a series of conic gas flows across the surface of a substrate positioned within the chamber. In one embodiment, an improved exhaust kit for use in the plasma etch chamber is provided. The exhaust kit includes apparatus that may be used in an existing plasma etch chamber and is configured to provide annular flow of exhaust gases from the processing region of the chamber.Type: ApplicationFiled: September 9, 2014Publication date: December 25, 2014Inventors: Stanley DETMAR, Brian T. WEST, Ronald Vern SCHAUER
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Patent number: 8828182Abstract: Embodiments of the present invention generally provide plasma etch process chamber improvements. An improved gas injection nozzle is provided for use at a central location of the lid of the chamber. The gas injection nozzle may be used in an existing plasma etch chamber and is configured to provide a series of conic gas flows across the surface of a substrate positioned within the chamber. In one embodiment, an improved exhaust kit for use in the plasma etch chamber is provided. The exhaust kit includes apparatus that may be used in an existing plasma etch chamber and is configured to provide annular flow of exhaust gases from the processing region of the chamber.Type: GrantFiled: February 9, 2011Date of Patent: September 9, 2014Assignee: Applied Materials, Inc.Inventors: Stanley Detmar, Brian T. West, Ronald Vern Schauer
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Publication number: 20140152103Abstract: Embodiments of the invention are directed toward systems and methods that execute legacy semiconductor applications using a non-legacy controller. In some embodiments a hardware abstraction layer and/or an emulator can be used to provide communication between a non-legacy operating system and legacy components including legacy applications. In some embodiments various methods and/or devices can be used to emulate and/or translate communications between legacy and non-legacy components.Type: ApplicationFiled: February 20, 2013Publication date: June 5, 2014Applicant: APPLIED MATERIALS, INC.Inventors: Ronald Vern Schauer, Mark Roger Covington, Suresh Kumaraswami, Amitabh Puri
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Publication number: 20140139838Abstract: The present invention provides methods, apparatus, and systems of sensing a substrate in a chamber. The invention includes emitting radiation of at least two different wavelengths; directing the emitted radiation of a first wavelength through a view port of a chamber at an interior of the chamber; directing the emitted radiation of a second wavelength through the view port of the chamber at a location of a hole in a blade of a substrate carrier; detecting any of the emitted radiation reflected by the blade, the interior of the chamber, or a substrate on the blade; and determining if a substrate is present on the blade based on the reflected radiation detected. Numerous additional aspects are disclosed.Type: ApplicationFiled: January 2, 2014Publication date: May 22, 2014Applicant: Applied Materials, Inc.Inventor: Ronald Vern Schauer
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Patent number: 8649017Abstract: The present invention provides methods, apparatus, and systems of sensing a substrate in a chamber. The invention includes emitting radiation of at least two different wavelengths; directing the emitted radiation of a first wavelength through a view port of a chamber at an interior of the chamber; directing the emitted radiation of a second wavelength through the view port of the chamber at a location of a hole in a blade of a substrate carrier; detecting any of the emitted radiation reflected by the blade, the interior of the chamber, or a substrate on the blade; and determining if a substrate is present on the blade based on the reflected radiation detected. Numerous additional aspects are disclosed.Type: GrantFiled: August 10, 2012Date of Patent: February 11, 2014Assignee: Applied Materials, Inc.Inventor: Ronald Vern Schauer
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Patent number: 8539257Abstract: Methods and apparatus for detecting an idle mode of processing equipment are provided herein. In some embodiments, an apparatus for monitoring a processing system may include a first system adapter for monitoring a first process chamber and determining a state thereof; and a first support adapter for communicating with the first system adapter and a first support system coupled to the first process chamber, the support adapter configured to communicate a readiness to operate the first support system at a low power mode to a controller of the support system in response to the state of the first process chamber being in an idle mode.Type: GrantFiled: October 7, 2009Date of Patent: September 17, 2013Assignee: Applied Materials, Inc.Inventor: Ronald Vern Schauer
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Publication number: 20130237129Abstract: A chemical mechanical polishing system includes a carrier head having a flexible membrane and a chamber to apply pressure to the flexible membrane, a pressure control unit, a pressure supply line connecting the pressure control unit to the chamber, and a sensor located along the pressure supply line to detect a contaminant in the pressure supply line.Type: ApplicationFiled: March 7, 2013Publication date: September 12, 2013Inventor: Ronald Vern Schauer
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Publication number: 20130044326Abstract: The present invention provides methods, apparatus, and systems of sensing a substrate in a chamber. The invention includes emitting radiation of at least two different wavelengths; directing the emitted radiation of a first wavelength through a view port of a chamber at an interior of the chamber; directing the emitted radiation of a second wavelength through the view port of the chamber at a location of a hole in a blade of a substrate carrier; detecting any of the emitted radiation reflected by the blade, the interior of the chamber, or a substrate on the blade; and determining if a substrate is present on the blade based on the reflected radiation detected. Numerous additional aspects are disclosed.Type: ApplicationFiled: August 10, 2012Publication date: February 21, 2013Applicant: APPLIED MATERIALS, INC.Inventor: Ronald Vern Schauer
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Patent number: 8346980Abstract: Apparatus and methods for providing an interface for a semiconductor processing tool are provided. In some embodiments, the apparatus may include an input/output bridge for receiving analog and state command system control signals from, and sending return data and status information to, a system controller, wherein the analog and state command system control signals are intended to control an analog device, and for converting the analog and state command system control signal into a digital system control signal intended to control a digital device; and an upper pneumatic assembly coupled to the input/output bridge for providing pressure control to one or more pressure zones located on a polishing apparatus coupled to the upper pneumatic assembly for the polishing of semiconductor wafers.Type: GrantFiled: May 6, 2010Date of Patent: January 1, 2013Assignee: Applied Materials, Inc.Inventor: Ronald Vern Schauer
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Patent number: 8333939Abstract: Methods and apparatus for sensing a substrate in a high temperature environment are provided. The invention includes a support frame having one or more apertures; one or more optical devices positioned in and aligned by the one or more apertures and adapted to detect an edge of a substrate. The invention may also include a controller secured adjacent an end of the support frame, coupled to the one or more optical devices, and adapted to receive information from the optical devices, process the information, and determine a center of a substrate based on the processed information. The support frame may be adapted to thermally shield the one or more optical devices and the controller. Numerous other aspects are provided.Type: GrantFiled: November 17, 2006Date of Patent: December 18, 2012Assignee: Applied Materials, Inc.Inventor: Ronald Vern Schauer
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Patent number: 8255606Abstract: An apparatus for providing an interface for semiconductor processing equipment is disclosed. In some embodiments, an apparatus for providing an interface for semiconductor processing equipment having an interface card includes a display logic subsystem to provide an interface to one or more devices such as video and information displays, light pens, keyboards, computer mice, and warning light networks and alarms via a data and control bus; a bridge to provide access to the data and control bus; and a local computer subsystem coupled to the bridge and the display logic subsystem, wherein the local computer subsystem provides access to one or more remote devices.Type: GrantFiled: October 21, 2009Date of Patent: August 28, 2012Assignee: Applied Materials, Inc.Inventor: Ronald Vern Schauer
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Publication number: 20120136622Abstract: A chamber monitoring system may include a parallel architecture in which a single sensor control system is coupled to a number of different processing chamber control board sensor lines. In an illustrative embodiment, a single rotation sensor such as a tachometer may reside in a central control unit remote from the processing chambers such that rotation data may be processed by a single system and thereafter routed according to a variety of different network communication protocols to the main system controller, a factory interface, or both. In this and other embodiments, pull-up networks in the central control unit and the chamber control boards are matched so as to reduce electrical signal anomalies such as crowbar effects. The central control unit may be programmed via a main system controller to operate according to user defined parameters, which in turn may enable the system to differentiate between certain operating states.Type: ApplicationFiled: February 6, 2012Publication date: May 31, 2012Applicant: APPLIED MATERIALS, INC.Inventors: Ronald Vern Schauer, Raphael Dascoli, Shivan Bhargava
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Patent number: 8135560Abstract: A chamber monitoring system may include a parallel architecture in which a single sensor control system is coupled to a number of different processing chamber control board sensor lines. In an illustrative embodiment, a single rotation sensor such as a tachometer may reside in a central control unit remote from the processing chambers such that rotation data may be processed by a single system and thereafter routed according to a variety of different network communication protocols to the main system controller, a factory interface, or both. In this and other embodiments, pull-up networks in the central control unit and the chamber control boards are matched so as to reduce electrical signal anomalies such as crowbar effects. The central control unit may be programmed via a main system controller to operate according to user defined parameters, which in turn may enable the system to differentiate between certain operating states.Type: GrantFiled: January 30, 2009Date of Patent: March 13, 2012Assignee: Applied Materials, Inc.Inventors: Ronald Vern Schauer, Raphael Dascoli, Shivan Bhargava
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Publication number: 20110198417Abstract: Embodiments of the present invention generally provide plasma etch process chamber improvements. An improved gas injection nozzle is provided for use at a central location of the lid of the chamber. The gas injection nozzle may be used in an existing plasma etch chamber and is configured to provide a series of conic gas flows across the surface of a substrate positioned within the chamber. In one embodiment, an improved exhaust kit for use in the plasma etch chamber is provided. The exhaust kit includes apparatus that may be used in an existing plasma etch chamber and is configured to provide annular flow of exhaust gases from the processing region of the chamber.Type: ApplicationFiled: February 9, 2011Publication date: August 18, 2011Applicant: APPLIED MATERIALS, INC.Inventors: STANLEY DETMAR, BRIAN T. WEST, RONALD VERN SCHAUER
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Patent number: 7835007Abstract: The present invention provides systems, apparatus and methods for detecting a film in an electronic device disposed in an electronic device processing tool. The invention includes a mounting member adapted to couple the apparatus to a view port of the electronic device processing tool, an optical energy source disposed within the mounting member and adapted to illuminate the electronic device within the electronic device processing tool, an optical system adapted to pass wavelengths indicative of a presence of the film, and an optical detector positioned to receive optical energy reflected from the substrate and passing through the optical system adapted to detect a presence or absence of the film. Numerous other features are disclosed.Type: GrantFiled: August 1, 2008Date of Patent: November 16, 2010Assignee: Applied Materials, Inc.Inventor: Ronald Vern Schauer
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Publication number: 20100285724Abstract: Apparatus and methods for providing an interface for a semiconductor processing tool are provided. In some embodiments, the apparatus may include an input/output bridge for receiving analog and state command system control signals from, and sending return data and status information to, a system controller, wherein the analog and state command system control signals are intended to control an analog device, and for converting the analog and state command system control signal into a digital system control signal intended to control a digital device; and an upper pneumatic assembly coupled to the input/output bridge for providing pressure control to one or more pressure zones located on a polishing apparatus coupled to the upper pneumatic assembly for the polishing of semiconductor wafers.Type: ApplicationFiled: May 6, 2010Publication date: November 11, 2010Applicant: APPLIED MATERIALS, INC.Inventor: RONALD VERN SCHAUER
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Publication number: 20100198550Abstract: A chamber monitoring system may include a parallel architecture in which a single sensor control system is coupled to a number of different processing chamber control board sensor lines. In an illustrative embodiment, a single rotation sensor such as a tachometer may reside in a central control unit remote from the processing chambers such that rotation data may be processed by a single system and thereafter routed according to a variety of different network communication protocols to the main system controller, a factory interface, or both. In this and other embodiments, pull-up networks in the central control unit and the chamber control boards are matched so as to reduce electrical signal anomalies such as crowbar effects. The central control unit may be programmed via a main system controller to operate according to user defined parameters, which in turn may enable the system to differentiate between certain operating states.Type: ApplicationFiled: January 30, 2009Publication date: August 5, 2010Inventors: Ronald Vern Schauer, Raphael Dascoli, Shivan Bhargava