Patents by Inventor Ryo Wakabayashi

Ryo Wakabayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160355930
    Abstract: Provided is an article having a metal oxide coating employing a novel configuration exhibiting both color and metallic luster. The article having a metal oxide coating disclosed herein is provided with a base material including a metal material and a metal oxide coating including a metal oxide coated onto the surface of the base material. The metal oxide coating is formed by polishing the surface of the base material, using particles composed of the metal oxide.
    Type: Application
    Filed: December 4, 2014
    Publication date: December 8, 2016
    Applicant: FUJIMI INCORPORATED
    Inventors: Kazusei TAMAI, Hitoshi MORINAGA, Hiroshi ASANO, Maiko ASAI, Ryo WAKABAYASHI
  • Patent number: 8123227
    Abstract: A sliding member is characterized in that a sliding surface of the sliding member is coated with an amorphous hard carbon film, and a surface of the amorphous hard carbon film has a ten-point mean roughness of equal to or less than 0.7 micrometers and an initial wear height in a range of 0.07 to 0.14 micrometers.
    Type: Grant
    Filed: August 27, 2008
    Date of Patent: February 28, 2012
    Assignee: Kabushiki Kaisha Riken
    Inventors: Minoru Kawanishi, Ryo Wakabayashi, Masaki Moronuki, Katsuhiro Tsuji, Takayuki Sato
  • Publication number: 20090026712
    Abstract: A sliding member is characterized in that a sliding surface of the sliding member is coated with an amorphous hard carbon film, and a surface of the amorphous hard carbon film has a ten-point mean roughness of equal to or less than 0.7 micrometers and an initial wear height in a range of 0.07 to 0.14 micrometers.
    Type: Application
    Filed: August 27, 2008
    Publication date: January 29, 2009
    Inventors: Minoru Kawanishi, Ryo Wakabayashi, Masaki Moronuki, Katsuhiro Tsuji, Takayuki Sato
  • Publication number: 20080296704
    Abstract: Top and bottom surfaces of a gate insulating film are terminated with fluorine atoms and the top surface of the gate insulating film is then etched. New dangling bonds are formed on the top surface of the gate insulating film. Such new dangling bonds are terminated with nitrogen atoms. A semiconductor device is thus obtained that has a silicon substrate and a gate insulating film formed on the silicon substrate and that almost all dangling bonds on the top surface of the gate insulating film are terminated with nitrogen atoms and almost all dangling bonds on the bottom surface contacting the silicon substrate are terminated with fluorine atoms.
    Type: Application
    Filed: June 4, 2008
    Publication date: December 4, 2008
    Applicant: ELPIDA MEMORY, INC.
    Inventor: Ryo WAKABAYASHI